JP2007328286A - Method for manufacturing optical filter for display, optical filter for display, and display and plasma display panel equipped therewith - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an optical filter with an electrode, by which formation of a ground electrode portion is facilitated. <P>SOLUTION: The method for manufacturing an optical filter for a display having a conductive layer protruding as an electrode in the periphery includes a process (A) of: forming a functional layer such as a uncured hard coat layer containing a UV-curing resin composition on the entire surface of a conducive layer of a transparent substrate having a conductive layer comprising a mesh metallic layer and a surrounding frame-like metallic layer on the surface; irradiating the surface of the transparent substrate having no conductive layer with UV rays; and removing an uncured functional layer provided on the frame-like metal layer to expose the frame-like metallic layer. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention is applicable to various displays such as a plasma display panel (PDP), a cathode ray tube (CRT) display, a liquid crystal display, an organic EL (electroluminescent) display, and a field emission display (FED) including a surface electric field display (SED). The present invention relates to an optical filter having various functions such as antireflection, near-infrared shielding, electromagnetic wave shielding, and the like, and a display provided with this optical filter, particularly a PDP.

  In the case of flat panel displays such as liquid crystal displays, plasma displays (PDP), EL displays, and CRT displays, it has been known that the light from the outside is reflected on the surface and the internal visual information is difficult to see. Various measures have been taken, such as the installation of an optical film including an antireflection film.

  In recent years, large-screen displays have become mainstream in displays, and PDPs have become common as next-generation large-screen display devices. However, in this PDP, high-frequency pulse discharge is performed on the light emitting part for image display, which may cause unnecessary electromagnetic wave radiation and infrared radiation which may cause malfunction of the infrared remote controller, etc. For this purpose, various PDP filters (electromagnetic wave shielding light transmitting window materials) having conductivity have been proposed for PDP. As the conductive layer of the electromagnetic wave shielding light transmitting window material, for example, (1) a transparent conductive thin film containing metallic silver, (2) a conductive mesh in which a metal wire or conductive fiber is made into a net, (3) on a transparent film Known are those in which a layer of copper foil or the like is etched into a net and an opening is provided, and (4) a conductive ink is printed in a mesh on a transparent film.

  Furthermore, in a large display such as a conventional PDP, various films such as an antireflection film and a near infrared cut film are bonded together. For example, Patent Document 1 (Japanese Patent Application Laid-Open No. 11-74683) discloses an electromagnetic wave shielding light transmitting window material in which a conductive mesh is interposed between two transparent substrates and bonded and integrated with a transparent adhesive resin. Are listed.

  In the electromagnetic wave shielding light transmitting window material, it is necessary to ground (ground) a conductive layer (electromagnetic wave shielding material), for example, a conductive mesh, in order to improve the electromagnetic wave shielding property by the conductive layer. There is. For this purpose, an electromagnetic wave shielding material protrudes from between two transparent substrates and is grounded by wrapping around the back side of the light transmitting window material laminate, or is in contact with the electromagnetic wave shielding material between two transparent substrates. Thus, it is necessary to sandwich the conductive adhesive tape. However, in such a method, there is a problem that the above work in the stacking process is complicated.

  Patent Document 2 (Japanese Patent Laid-Open No. 2001-142406) discloses a laminate in which a single transparent substrate, an electromagnetic wave shielding material, an outermost antireflection film, and a near infrared cut film are laminated and integrated. The conductive adhesive tape is attached across the edge and front and back edges of the transparent substrate, and the conductive adhesive tape and the edge (end) of the electromagnetic shielding material are attached by the conductive adhesive. An electromagnetic wave shielding light-transmitting laminated film is described.

Japanese Patent Laid-Open No. 11-74683 JP 2001-142406 A

  As shown in Patent Document 1, a conventional display optical filter such as a PDP generally has a complicated manufacturing process because a plurality of functional films are manufactured and then bonded together, which is disadvantageous in terms of cost.

  For this reason, in order to improve productivity and reduce costs by reducing the number of parts, a PDP filter of a type that does not include glass in a filter member as shown in Patent Document 2 (straight tension type PDP filter) has been proposed. Yes. However, such direct stretch type PDP filters are similar to conventional filters in that they are bonded together after a functional film other than glass is manufactured in advance, and it cannot be said that the cost is sufficient. .

  In order to solve these problems, it is conceivable to employ a structure in which only one resin film is used as a substrate and a plurality of functional layers are formed on the surface thereof. The simplest manufacturing method is a method in which functional layers such as an antireflection layer and a near infrared absorption layer are formed by coating on an electromagnetic wave shielding film in which a conductive mesh is formed on a resin film.

  However, when each functional layer is formed by coating as described above, the conductive mesh portion is not exposed, and there is a problem that a ground portion for electromagnetic shielding cannot be secured.

  Therefore, the present invention provides a method for producing an optical filter for a display, which can be manufactured accurately and easily, has a good electromagnetic shielding property, and has an earth electrode that can be easily attached to the display and is easily grounded. The purpose is to do.

  In addition, the present invention provides an optical filter for a display which can be manufactured with high accuracy and easily, is light and thin, has a good electromagnetic shielding property, and has an earth electrode which can be easily attached to the display and is easily grounded. An object is to provide a manufacturing method.

  Furthermore, the present invention provides an optical filter for a display, which can be manufactured with high accuracy and has a good electromagnetic wave shielding property, and has a ground electrode that can be easily attached to the display and is easily grounded. Objective.

  The present invention also provides an optical filter for a display which can be manufactured with high accuracy and easily, is light and thin, has a good electromagnetic shielding property, and has an earth electrode which can be easily mounted and grounded on a display. The purpose is to provide.

  Furthermore, the present invention provides an optical filter suitable for a PDP that can be accurately and easily manufactured, has a good electromagnetic shielding property, and has a ground electrode that can be easily attached to a display and is easily grounded. The purpose is to do.

  Another object of the present invention is to provide a display in which the optical filter having the above excellent characteristics is bonded to the surface of an image display glass plate.

  Furthermore, an object of the present invention is to provide a PDP in which the optical filter having the excellent characteristics is bonded to the surface of an image display glass plate.

Therefore, the present invention
An uncured functional layer containing an ultraviolet curable resin composition is formed on the entire surface of the transparent substrate provided with a conductive layer composed of a mesh-shaped metal layer and a surrounding frame-shaped metal layer on the surface. Irradiating the surface of the transparent substrate where the conductive layer is not formed with ultraviolet rays, and removing the uncured functional layer provided on the frame-like metal layer with a solvent to expose the frame-like metal layer A manufacturing method of an optical filter for display having a conductive layer protruding to the periphery as an electrode portion, including A;
It is in.

  According to the method of the present invention described above, the frame-shaped region of the conductive layer is formed around the layer by irradiating with ultraviolet rays using the frame-shaped metal conductive layer as a mask without producing a printing plate as described above. Thus, a hard coat layer can be formed so as to leave an optical filter, whereby an optical filter for display having a conductive layer projecting around as an electrode portion can be easily obtained.

The suitable aspect of the manufacturing method of the optical filter for displays of this invention is as follows.
(1) The functional layer is preferably a hard coat layer. The functional layer may be a near-infrared absorbing layer or an adhesive layer for forming the same. When the functional layer is a near-infrared absorbing layer, a hard coat layer or the like may be similarly provided on the near-infrared absorbing layer.
(2) After the step A, an uncured low refractive index layer containing an ultraviolet curable resin composition is formed on the hard coat layer and the exposed frame-shaped metal layer, and a conductive layer of a transparent substrate is formed. The surface B which is not exposed is irradiated with ultraviolet rays, and the uncured low refractive index layer provided on the frame-shaped metal layer is removed with a solvent to expose the frame-shaped metal layer.
(3) After the step A, an uncured high refractive index layer containing an ultraviolet curable resin composition is formed on the hard coat layer and the exposed frame-shaped metal layer, and a conductive layer of a transparent substrate is formed. The surface on the non-covered side is irradiated with ultraviolet rays, and an uncured high refractive index layer provided on the frame-shaped metal layer is removed with a solvent to expose the frame-shaped metal layer. Forming an uncured low refractive index layer containing an ultraviolet curable resin composition on the layer and the exposed frame-shaped metal layer, irradiating the surface of the transparent substrate on which the conductive layer is not formed with ultraviolet rays, Step B ′ is performed in which the uncured low refractive index layer provided on the frame-shaped metal layer is removed with a solvent to expose the frame-shaped metal layer.
(4) After all the layers are formed on the conductive layer (that is, after completion of the necessary steps), the surface having the conductive layer is further irradiated with ultraviolet rays.
(5) A near-infrared absorbing layer is provided on the surface of the transparent substrate where the conductive layer is not provided.
(6) The near infrared absorbing layer contains a neon light absorbing dye.
(7) It further has a neon light absorbing dye layer. For example, it is provided on the near-infrared absorbing layer.
(8) A neon-emitting absorption layer is provided on the near-infrared absorption layer.
(9) The hard coat layer contains an ultraviolet absorber.
(10) The transparent substrate is a transparent plastic film.

  In the present invention, a plurality of uncured functional layers containing an ultraviolet curable resin composition (that is, a hard coat layer, a low refractive index layer, etc.) are sequentially formed, and the side of the transparent substrate on which the conductive layer is not formed. The surface may be irradiated with ultraviolet rays, and a plurality of uncured functional layers provided on the frame-shaped metal layer may be removed at once with a solvent to expose the frame-shaped metal layer.

The present invention also provides
An ultraviolet curable resin composition is formed on the entire surface of the transparent substrate on which a conductive layer comprising a mesh-like metal layer or a mesh-like metal layer and a surrounding frame-like metal layer is provided. An uncured functional layer is formed, and ultraviolet rays are applied through a mask so that ultraviolet rays do not hit the outer edge of the conductive layer from the upper side of the functional layer (if there is a frame-like metal layer). Irradiating and removing the uncured functional layer provided on the frame-like region of the conductive layer with a solvent to expose the frame-like region, and having a conductive layer protruding to the periphery as an electrode part There is also a method for manufacturing an optical filter for display.

  When a hard coat layer is provided as a functional layer on the conductive layer, a low-refractive index layer, a high-refractive index layer, etc., if necessary, are irradiated with UV, developed (removed with a solvent) as described above. ).

  Furthermore, the present invention also resides in an optical filter for display having a conductive layer projecting around as an electrode portion obtained by the above-described manufacturing method.

Preferred embodiments of the optical filter for display of the present invention are as follows.
(1) When the hard coat layer is provided on the surface of the transparent film opposite to the near infrared absorption layer, the transparent adhesive layer is provided on the surface of the near infrared absorption layer opposite to the transparent film.
(2) A release sheet is provided on the transparent adhesive layer.
(3) A plasma display panel filter.

Furthermore, the present invention provides:
A display characterized in that the optical filter for display is bonded to the surface of the image display glass plate; and a plasma characterized in that the optical filter for display is bonded to the surface of the image display glass plate It is also on the display panel.

  By the method for manufacturing an optical filter for display of the present invention, an optical filter having an electrode portion (ground electrode) made of a conductive layer protruding to the periphery can be manufactured very easily and with high accuracy. That is, according to the method of the present invention, for example, the surrounding frame-shaped metal conductive layer is applied to the uncured functional layer (hard coat layer) provided on the conductive layer formed on the entire surface of the rectangular transparent substrate. By irradiating with ultraviolet rays using it as a mask, an optical filter having an electrode portion (ground electrode) made of a conductive layer protruding to the periphery can be manufactured with high accuracy and efficiency.

  The display optical filter of the present invention is an optical filter with a specific structure having a conductive layer protruding to the periphery, which is advantageously obtained by using the above-described manufacturing method, and makes the grounding installation very easy. There are advantages to being able to.

  In particular, in the present invention, since the optical filter is generally obtained by using a single transparent film, the thickness of the optical filter is extremely small, and the mass is accordingly reduced. Even after mounting, it is extremely advantageous in handling.

  Therefore, the optical filter for display of the present invention includes a field emission display (FED) including a plasma display panel (PDP), a cathode ray tube (CRT) display, a liquid crystal display, an organic EL (electroluminescence) display, and a surface electric field display (SED). It can be said that the optical filter has various functions such as anti-reflection, near-infrared shielding, and electromagnetic wave shielding for various displays such as).

  The manufacturing method of the optical filter for display with an electrode part (earth electrode) of the present invention and the optical filter for display with an electrode part of the present invention will be described in detail below.

  1 and 2 are views for explaining an example of a method for producing an optical filter for a display with an electrode portion according to the present invention.

  An uncured hard coat layer 16 containing an ultraviolet curable resin composition is formed on the entire surface of the conductive layer 13 of the rectangular transparent film 12 provided with the mesh-like conductive layer 13 on one surface (generally after coating). Form by drying; (1) and (2)). As shown in FIG. 2, the rectangular transparent film 12 provided with the mesh-like conductive layer 13 has a mesh-like metal layer 13A provided at the center of the transparent film 12, and a frame-like metal layer 13B provided around it. These constitute the conductive layer 13. The frame-like metal layer 13B has a high conductivity and a large area, so that it is extremely easy to use as a ground electrode. The mesh-like metal layer 13A and the frame-like metal layer 13B are coupled and are in a conductive state. The mesh-like metal layer 13A is a fine line, and the frame width (L) of the frame-like metal layer 13B is 2 mm or more and has a considerable width. When the ultraviolet ray is irradiated, the former also emits light behind the fine line. Although it wraps around, light hardly wraps around the back of the latter frame. Therefore, the frame-shaped metal layer 13B can be used as a mask.

Next, the back surface of the transparent film 12 having the mesh-like conductive layer 13 provided with the uncured hard coat layer 16 is irradiated with ultraviolet rays (2). In this case, it is preferable to irradiate the frame-shaped metal layer 13B with ultraviolet rays so that the ultraviolet rays do not hit too much. As described above, the irradiated ultraviolet rays reach the uncured hard coat layer behind the mesh-like metal layer 13A in the mesh-like conductive layer 13, but uncured behind the frame-like metal layer 13B. Hard coat layer is hardly reached. Therefore, after the ultraviolet irradiation, the uncured hard coat layer (unexposed portion) 16 behind the frame-shaped metal layer 13B can be removed with a solvent (development). However, it is not preferable that ultraviolet irradiation at this stage is performed until the uncured hard coat layer is completely cured. Ultraviolet irradiation should be suppressed to such an extent that the uncured hard coat layer behind the frame-shaped metal layer 13B can be removed with a solvent. In that case, the hard coat layer on the mesh-like metal layer 13A is in a semi-cured state, has a certain degree of solvent resistance, and is a semi-cured hard coat layer 16M. In general, the irradiation with ultraviolet rays at this stage is preferably 10 to 100% of the amount of ultraviolet rays required for complete curing. For example, the amount of ultraviolet rays is 100 to 1000 mJ / cm ² .

  After removing the uncured hard coat layer 16 behind the frame-shaped metal layer 13B by washing with a solvent, the hard coat layer is completely cured by irradiating the semi-cured hard coat layer 16M again with ultraviolet rays (3). As a result, an optical filter for a display with an electrode portion in which the hard coat layer 16C thus hardened is provided on the conductive layer 13 is obtained. After providing the hard coat layer cured as described above, a near-infrared absorbing layer, or a near-infrared absorbing layer and a transparent adhesive layer may be provided on the back surface of the transparent substrate 12.

  In addition, a mask having a shape so that the frame-shaped metal layer 13B is not exposed to light is disposed above the uncured hard coat layer so that the ultraviolet irradiation from the back surface of the step (2) does not come into contact therewith. You may go through a mask. The method using this mask can be performed in the same manner as described above for the conductive layer of the entire mesh metal layer without the frame-like metal layer. However, there is a disadvantage in that the complexity of manufacturing the mask, arranging the mask, and the like is increased as compared with the method using the frame-shaped metal layer 13B as a mask.

  When a low refractive index layer (lower than the refractive index of the hard coat layer) 17C is further provided on the hard coat layer 16C, or a high refractive index layer (higher than the refractive index of the hard coat layer) and a low refractive index layer (hard In the case of providing a plurality of functional layers on the hard coat layer 16C, such as when 17C (which is lower than the refractive index of the coat layer) is provided, before the hard coat layer 16 is completely cured, the low refractive index layer and the high refractive index layer It is preferable from the viewpoint of productivity.

  The figure for demonstrating another example of the manufacturing method of the optical filter for displays with an electrode part of this invention which provided the hard-coat layer and also the low-refractive-index layer on the mesh-shaped conductive layer in FIG. 3 is shown.

  As in FIG. 1, an uncured hard coat layer 16 containing an ultraviolet curable resin composition is formed on the entire surface of a rectangular transparent film 12 having a mesh-shaped conductive layer 13 provided on one surface thereof. (Generally by coating and drying; (1) and (2)), and then on the back surface of the transparent film 12 having the mesh-like conductive layer 13 provided with an uncured hard coat layer 16, ultraviolet rays Then, the uncured hard coat layer 16 (unexposed portion) behind the frame-shaped metal layer 13B is removed (development) (3). Thereafter, as shown in FIG. 3 (4), the semi-cured hard coat layer 16M is not completely cured, and the UV-curing property is formed on the semi-cured hard coat layer 16 and the surrounding frame-like metal layer 13B. An uncured low refractive index layer 17 containing a resin composition is formed, and then the back surface of the transparent film 12 having the mesh-like conductive layer 13 provided with the uncured low refractive index layer 17 is irradiated with ultraviolet rays. Thereafter, the uncured low refractive index layer 17 behind the frame-shaped metal layer 13B is removed by washing with a solvent (5). Thereafter, the semi-cured hard coat layer 16M and the semi-cured low refractive index layer 17M are again irradiated with ultraviolet rays to completely cure these layers (6). As a result, an optical filter for a display with an electrode part in which the hard coat layer 16C and the low refractive index layer 17C are provided on the conductive layer 13 is obtained.

  In the case where another layer such as an antireflection layer such as a high refractive index layer is further provided on the low refractive index layer 17C, each uncured layer is formed in the same manner as when the low refractive index layer 17C is provided, and UV using a mask is formed. It is obtained by repeating irradiation and solvent removal (development) and finally completely curing.

  Alternatively, when a plurality of functional layers containing the ultraviolet curable resin composition as described above are formed (that is, a hard coat layer, a low refractive index layer, etc.), the uncured functional layer is sequentially applied and dried. The surface of the transparent substrate on which the conductive layer is not formed is irradiated with ultraviolet rays (that is, a plurality of uncured functional layers on the mesh-like conductive layer 13 are irradiated with ultraviolet rays at once) to form a frame shape The frame-shaped metal layer can be exposed by removing a plurality of uncured functional layers provided on the metal layer at once with a solvent. According to this method, it is possible to irradiate the back surface with ultraviolet rays once, which is advantageous in terms of productivity. However, a plurality of uncured functional layers may be mixed during coating, There is a risk of impairing smoothness.

  As described above, by providing a functional layer such as a hard coat layer, these layers can be accurately provided in a predetermined region narrower than the conductive layer 13, and a transparent film having a conductive layer around the laminate ( The narrow band-like region having the width L protrudes. This protruding portion is used as an electrode portion for grounding. The width L of the strip-shaped region at both ends is preferably 2 to 100 mm, particularly 5 to 50 mm. Further, since the mesh gap of the mesh-like conductive layer can be filled by increasing the thickness of the hard coat layer or the like, there is an advantage that a smooth layer surface can be obtained.

  Usually, a near-infrared absorbing layer is provided on the back side of the substrate of the laminate having the configuration shown in FIG. Since the near-infrared absorbing layer is easily damaged by UV irradiation, it is preferably provided after the hard coat layer or the like is formed by UV irradiation or the like as described above.

  A near-infrared absorbing layer 14 (and a transparent adhesive layer) may be formed in advance on the back surface of the rectangular transparent film 12.

  FIG. 4 shows a schematic cross-sectional view of an example of a preferred embodiment of the optical filter for a display with an electrode portion of the present invention. The optical filter of FIG. 4 is provided with a near-infrared absorbing layer 14 on the back surface of the transparent film of the optical filter obtained in FIG. 3 and a transparent adhesive layer 15 thereon. That is, in FIG. 4, a mesh-like conductive layer 13 (13A and 13B), a cured hard coat layer 16C, and a cured low refractive index layer 17C (antireflection layer) are provided in this order on one surface of the transparent film 12. The other surface is provided with a near-infrared absorbing layer 14 and a transparent adhesive layer 15 thereon. And the electrode part (generally earth electrode) 13B is formed in the end surface around this laminated body. Since a mesh-like metal layer is used as the conductive layer, the electromagnetic wave shielding effect and the like are particularly excellent. The mesh voids of the mesh-like metal layer are filled with the cured hard coat layer 26C, thereby improving the transparency. A release sheet may be further provided on the transparent adhesive layer 15.

  In this configuration, the positions of the antireflection layers such as the hard coat layer 16C and the low refractive index layer 17C and the near infrared absorption layer 14 may be interchanged, and the near infrared absorption layer 14 may be replaced with the conductive layer 13. May be provided between the hard coat layer 16C and the hard coat layer 16C. However, the configuration of FIG. 4 is advantageous in that the grounding is easy to install because the conductive layer exists outside the display when the display is mounted.

  In the present invention, the conductive layer 13 is a mesh-like metal layer or metal-containing layer having a frame-like metal or metal-containing layer on the outside. The mesh-like metal layer or metal-containing layer is generally formed by etching or printing, or is a metal fiber layer. This makes it easy to obtain low resistance. In general, the mesh voids of the mesh-like metal layer or metal-containing layer are filled with the hard coat layer 16C. This improves transparency. When it is not filled with the hard coat layer 16C, it is preferably filled with another layer, for example, the near-infrared absorbing layer 14 or a transparent resin layer dedicated thereto.

  The antireflection layer is generally a low refractive index layer 17C. That is, the antireflection effect is efficiently shown by the composite film of the hard coat layer 16C and the low refractive index layer 17C provided thereon. A high refractive index layer may be provided between the low refractive index layer 17C and the hard coat layer 16C. This improves the antireflection function.

  Further, the antireflection layer may not be provided, and only the transparent film and the hard coat layer 16C having a refractive index higher or lower (preferably lower) than that of the transparent film may be used. The hard coat layer 16C and the antireflection layer are generally formed by coating. It may be formed by attaching a sheet.

The near infrared absorbing layer 14 has a function of blocking unnecessary electromagnetic waves in the near infrared region generated from the PDF. In general, it is a layer containing a dye having an absorption maximum at 800 to 1200 nm. A transparent pressure-sensitive adhesive layer generally provided on the near-infrared absorbing layer 14 is provided for easy mounting on a display. A release sheet may be provided on the transparent adhesive layer.

  The electrode portion composed of the frame-shaped metal layer 13B is a conductive layer protruding around the optical filter, and the width of the protruding band-shaped portion (L in FIG. 2) is 2 to 100 mm, particularly 5 as described above. It is preferably ~ 50 mm. Moreover, generally 1-20 micrometers and 2-10 micrometers are preferable for thickness.

  In the method for producing an optical filter for display of the present invention, as a solvent for removing the functional layer of the unexposed part, ketones such as acetone, methyl ethyl ketone, methyl ethyl isobutyl ketone, methyl acetate, ethyl acetate, butyl acetate, etc. Esters, aromatics such as toluene and xylene, and alcohols such as methanol and isopropyl alcohol can be used. Acetone, methyl ethyl ketone, methyl acetate and ethyl acetate are preferred.

  The removal (development) of the layer in the unexposed area with a solvent is generally performed by rubbing with a sponge or the like in a state where the solvent is sprayed, immersed in the solvent, or sprayed and immersed.

  The material used for the optical filter for display of this invention is demonstrated below.

  The transparent substrate is generally a transparent plastic film and a glass plate. The material is not particularly limited as long as it is transparent (meaning “transparent to visible light”), but a plastic film is preferable. Examples of plastic film materials include polyester {eg, polyethylene terephthalate (PET), polybutylene terephthalate}, polymethyl methacrylate (PMMA), acrylic resin, polycarbonate (PC), polystyrene, triacetate resin, polyvinyl alcohol, polyvinyl chloride. , Polyvinylidene chloride, polyethylene, ethylene-vinyl acetate copolymer, polyvinyl butyral, metal ion crosslinked ethylene-methacrylic acid copolymer, polyurethane, cellophane and the like. Among these, polyethylene terephthalate (PET), polycarbonate (PC), polymethyl methacrylate (PMMA), etc. are highly resistant to loads during processing (heat, solvent, bending, etc.) and particularly highly transparent. preferable. In particular, PET is preferable because it has excellent processability.

  The thickness of the transparent film varies depending on the use of the optical filter, but is generally preferably 1 μm to 10 mm, 1 μm to 5 mm, and particularly preferably 25 to 250 μm.

  The conductive layer of the present invention is a mesh-like conductive layer having a frame-shaped metal conductive layer on the outside, and the surface resistance value of the obtained optical filter is generally 10Ω / □ or less, preferably 0.001 to It is set to be in the range of 5Ω / □, particularly in the range of 0.005 to 5Ω / □.

  Examples of the mesh-like conductive layer include those obtained by etching a layer of copper foil or the like on a transparent film into a net shape and providing an opening, and those obtained by printing a conductive ink on a transparent film in a mesh shape. Can do.

  When a conductive foil such as a metal foil is subjected to pattern etching, copper, stainless steel, aluminum, nickel, iron, brass, or an alloy thereof, preferably copper, stainless steel, or aluminum is used as the metal of the metal foil.

  If the thickness of the metal foil is too thin, it is not preferable in terms of handleability and workability of pattern etching, and if it is too thick, it affects the thickness of the film obtained, and the time required for the etching process becomes long. The thickness is preferably about 1 to 200 μm.

  The shape of the etching pattern is not particularly limited, and examples thereof include a grid-like metal foil in which square holes are formed, and a punching metal-like metal foil in which circular, hexagonal, triangular or elliptical holes are formed. It is done. Further, the holes are not limited to those regularly arranged, and may be a random pattern. It is preferable that the area ratio of the opening part in the projection surface of this metal foil is 20 to 95%. The opening ratio of the conductive mesh refers to the area ratio occupied by the opening portion in the projected area of the portion excluding the frame portion of the conductive mesh.

  In addition to the above, as a mesh-like conductive layer, dots are formed on the film surface by a material soluble in a solvent, and a conductive material layer made of a conductive material insoluble in a solvent is formed on the film surface, A mesh-like conductive layer obtained by contacting the film surface with a solvent to remove the dots and the conductive material layer on the dots may be used.

  Examples of the conductive layer by coating include a coating layer in which conductive particles of an inorganic compound are dispersed in a polymer.

  Examples of the inorganic compound constituting the conductive particles include metals, alloys such as aluminum, nickel, indium, chromium, gold, vanadium, tin, cadmium, silver, platinum, copper, titanium, cobalt, lead; or ITO, oxidation Indium, tin oxide, zinc oxide, indium oxide-tin oxide (ITO, so-called indium-doped tin oxide), tin oxide-antimony oxide (ATO, so-called antimony-doped tin oxide), zinc oxide-aluminum oxide (ZAO; so-called aluminum-doped oxide) And conductive oxides such as zinc). In particular, ITO is preferable. The average particle size is preferably 10 to 10,000 nm, particularly preferably 10 to 50 nm.

  Examples of the polymer include acrylic resin, polyester resin, epoxy resin, urethane resin, phenol resin, maleic acid resin, melamine resin, urea resin, polyimide resin, and silicon-containing resin. Furthermore, it is preferable that it is a thermosetting resin among these resins.

  Alternatively, the polymer is particularly preferably an ultraviolet curable resin used for a hard coat layer described later.

  A metal plating layer may be further provided on the conductive layer in order to improve the conductivity (particularly in the case of forming dots with a material soluble in the solvent). The metal plating layer can be formed by a known electrolytic plating method or electroless plating method. As the metal used for plating, generally, copper, copper alloy, nickel, aluminum, silver, gold, zinc, tin or the like can be used, preferably copper, copper alloy, silver, or nickel, In particular, it is preferable to use copper or a copper alloy from the viewpoint of economy and conductivity.

  Moreover, you may give anti-glare performance. When this anti-glare treatment is performed, a blackening treatment may be performed on the surface of the (mesh) conductive layer. For example, oxidation treatment of a metal film, black plating such as chromium alloy, application of black or dark ink, and the like can be performed.

  The antireflection layer of the present invention is generally a composite film of a hard coat layer having a refractive index lower than that of a transparent substrate and a low refractive index layer provided thereon, or between the hard coat layer and the low refractive index layer. Further, a composite film in which a high refractive index layer is further provided. The antireflection film is effective even if only a hard coat layer having a refractive index lower than that of the transparent substrate is used. However, when the refractive index of the transparent substrate is low, a composite film of a hard coat layer having a higher refractive index than that of the transparent substrate and a low refractive index layer provided thereon may be used.

  The hard coat layer is a hardened layer composed mainly of an ultraviolet curable resin composition (consisting of an ultraviolet curable resin, a photopolymerization initiator, etc.). The thickness is usually 1 to 50 μm, preferably 1 to 10 μm.

  Examples of the ultraviolet curable resin (monomer, oligomer) include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, and 2-ethylhexyl polyethoxy (meth) acrylate. , Benzyl (meth) acrylate, isobornyl (meth) acrylate, phenyloxyethyl (meth) acrylate, tricyclodecane mono (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, acryloylmorpholine , N-vinylcaprolactam, 2-hydroxy-3-phenyloxypropyl (meth) acrylate, o-phenylphenyloxyethyl (meth) acrylate, neopentylglyce Di (meth) acrylate, neopentyl glycol dipropoxy di (meth) acrylate, neopentyl glycol di (meth) acrylate hydroxypivalate, tricyclodecane dimethylol di (meth) acrylate, 1,6-hexanediol di (meth) Acrylate, nonanediol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, tris [(meth) acryloxyethyl] isocyanurate, ditrimethylolpropane (Meth) acrylate monomers such as tetra (meth) acrylate; polyol compounds (for example, ethylene glycol, propylene glycol, neopentyl glycol, , 6-hexanediol, 3-methyl-1,5-pentanediol, 1,9-nonanediol, 2-ethyl-2-butyl-1,3-propanediol, trimethylolpropane, diethylene glycol, dipropylene glycol, polypropylene Polyols such as glycol, 1,4-dimethylolcyclohexane, bisphenol A polyethoxydiol, polytetramethylene glycol, the polyols and succinic acid, maleic acid, itaconic acid, adipic acid, hydrogenated dimer acid, phthalic acid, isophthalic acid Polyester polyols which are reaction products of polybasic acids such as acid and terephthalic acid or acid anhydrides thereof, polycaprolactone polyols which are reaction products of the polyols and ε-caprolactone, the polyols and the above, Polybasic acid or this Reaction products of these acid anhydrides with ε-caprolactone, polycarbonate polyols, polymer polyols, etc.) and organic polyisocyanates (for example, tolylene diisocyanate, isophorone diisocyanate, xylylene diisocyanate, diphenylmethane-4,4′-diisocyanate, diisocyanate) Cyclopentanyl diisocyanate, hexamethylene diisocyanate, 2,4,4′-trimethylhexamethylene diisocyanate, 2,2′-4-trimethylhexamethylene diisocyanate, etc.) and a hydroxyl group-containing (meth) acrylate (for example, 2-hydroxyethyl (meta ) Acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenyloxypropyl (meth) acrylic Rate, cyclohexane-1,4-dimethylol mono (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, glycerin di (meth) acrylate, etc.) (Meth) such as bisphenol type epoxy (meth) acrylate, which is a reaction product of bisphenol type epoxy resin such as polyurethane (meth) acrylate, bisphenol A type epoxy resin, bisphenol F type epoxy resin and (meth) acrylic acid which is a reaction product Examples include acrylate oligomers. These compounds can be used alone or in combination. These ultraviolet curable resins may be used as a thermosetting resin together with a thermal polymerization initiator.

  For the hard coat layer, among the above-mentioned ultraviolet curable resins (monomers and oligomers), hard materials such as pentaerythritol tri (meth) acrylate, pentaerythritol penta (meth) acrylate and dipentaerythritol hexa (meth) acrylate are used. It is preferable to mainly use polyfunctional monomers.

  Any compound suitable for the properties of the ultraviolet curable resin can be used as the photopolymerization initiator for the ultraviolet curable resin. For example, acetophenone such as 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1 Benzoin series such as benzyldimethyl ketal, benzophenone, 4-phenylbenzophenone, benzophenone series such as hydroxybenzophenone, thioxanthone series such as isopropylthioxanthone, 2-4-diethylthioxanthone, and other special ones include methylphenyl glyoxylate Etc. can be used. Particularly preferably, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1, Examples include benzophenone. These photopolymerization initiators may be optionally selected from one or more known photopolymerization accelerators such as benzoic acid type or tertiary amine type such as 4-dimethylaminobenzoic acid. It can be used by mixing at a ratio. Moreover, it can be used by 1 type, or 2 or more types of mixture of only a photoinitiator. Particularly preferred is 1-hydroxycyclohexyl phenyl ketone (Irgacure 184, manufactured by Ciba Specialty Chemicals).

  Generally the quantity of a photoinitiator is 0.1-10 mass% with respect to a resin composition, Preferably it is 0.1-5 mass%.

  Furthermore, the hard coat layer may contain a small amount of an infrared absorber, an anti-aging agent, a paint processing aid, a colorant and the like. The amount thereof is generally 0.1 to 10% by mass, preferably 0.1 to 5% by mass, based on the resin composition.

The high refractive index layer is also a cured layer of a layer containing an ultraviolet curable resin composition. Generally, in the ultraviolet curable resin composition, ITO, ATO, Sb ₂ O ₅ , Sb ₂ O ₃ , SbO ₂ , In _{2 are used.} A layer in which conductive metal oxide fine particles (inorganic compounds) such as ZnO and TiO ₂ doped with O ₃ , SnO ₂ , ZnO, ZrO ₂ and Al are dispersed is preferable. The metal oxide fine particles preferably have an average particle size of 10 to 10,000 nm, preferably 10 to 50 nm. In particular, ITO (especially having an average particle diameter of 10 to 50 nm) is preferable. Those having a refractive index of 1.64 or more are suitable. The film thickness is generally in the range of 10 to 500 nm, preferably 20 to 200 nm.

  When the high refractive index layer is a conductive layer, the minimum reflectance of the surface reflectance of the antireflection film is set within 1.5% by setting the refractive index of the high refractive index layer 2 to 1.64 or more. The minimum reflectance of the surface reflectance of the antireflection film can be made to be within 1.0% by setting it to 1.69 or more, preferably 1.69 to 1.82.

  The low refractive index layer is also a cured layer of a layer containing an ultraviolet curable resin composition, and generally 10 to 40% by weight of fine particles such as silica and fluororesin, preferably hollow silica, in the ultraviolet curable resin composition ( Preferably, the layer is a dispersed layer (cured layer) (preferably 10 to 30% by mass). The refractive index of this low refractive index layer is preferably 1.45 to 1.51. When the refractive index is more than 1.51, the antireflection property of the antireflection film is deteriorated. The film thickness is generally in the range of 10 to 500 nm, preferably 20 to 200 nm.

  As the hollow silica, those having an average particle diameter of 10 to 100 nm, preferably 10 to 50 nm, and a specific gravity of 0.5 to 1.0, preferably 0.8 to 0.9 are preferable.

  The hard coat layer preferably has a visible light transmittance of 85% or more. Both the visible light transmittance of the high refractive index layer and the low refractive index layer are preferably 85% or more.

  When the antireflection layer is composed of the hard coat layer and the above two layers, for example, the thickness of the hard coat layer is 2 to 20 μm, the thickness of the high refractive index layer is 75 to 90 nm, and the thickness of the low refractive index layer is It is preferable that it is 85-110 nm.

  In order to form each layer of the antireflection layer, as described above, the above-mentioned fine particles are blended with a polymer (preferably an ultraviolet curable resin) as necessary, and the obtained coating liquid is applied to the surface of the rectangular transparent substrate. After coating, and then drying, UV irradiation by mask exposure as described above is semi-cured, unexposed portions are washed away with a solvent such as methyl ethyl ketone, and then completely cured by UV irradiation. In this case, each layer may be applied and cured one by one, or all the layers may be applied and then cured together.

  As a specific method of coating, a method of coating a coating solution in which an ultraviolet curable resin containing an acrylic monomer or the like is made into a solution with a solvent such as toluene is coated with a gravure coater, and then dried, and then cured by ultraviolet rays. Can be mentioned. This wet coating method has the advantage that the film can be uniformly formed at high speed at low cost. After this coating, for example, by irradiating and curing with ultraviolet rays, the effect of improving the adhesion and increasing the hardness of the film can be obtained. The conductive layer can be formed similarly.

  In the case of ultraviolet curing, many light sources that emit light in the ultraviolet to visible range can be used as the light source, such as ultra-high pressure, high pressure, low pressure mercury lamp, chemical lamp, xenon lamp, halogen lamp, mercury lamp, carbon arc lamp, incandescent lamp. And laser light. The irradiation time cannot be determined unconditionally depending on the type of lamp and the intensity of the light source, but is about several seconds to several minutes. Moreover, in order to accelerate curing, the laminate may be preheated to 40 to 120 ° C. and irradiated with ultraviolet rays.

  A near-infrared absorption layer is generally obtained by forming a layer containing a pigment or the like on the surface of a transparent film. A near-infrared absorption layer is obtained by, for example, applying and drying a coating liquid containing the above-described pigment and binder resin. When used as a film, it is generally a near-infrared cut film, such as a film containing a pigment or the like. The dye generally has an absorption maximum at a wavelength of 800 to 1200 nm. Examples include phthalocyanine dyes, metal complex dyes, nickel dithiolene complex dyes, cyanine dyes, squarylium dyes, polymethine dyes, Examples thereof include azomethine dyes, azo dyes, polyazo dyes, diimonium dyes, aminium dyes, and anthraquinone dyes, and cyanine dyes and squarylium dyes are particularly preferable. These dyes can be used alone or in combination. Examples of the binder resin include thermoplastic resins such as acrylic resins.

  In the present invention, the near-infrared absorbing layer may be provided with a function of adjusting color tone by providing a function of absorbing neon light emission. For this purpose, a neon-emission absorption layer may be provided, but a neon-emission selective absorption dye may be included in the near-infrared absorption layer.

  Neon luminescent selective absorption dyes include cyanine dyes, squarylium dyes, anthraquinone dyes, phthalocyanine dyes, polymethine dyes, polyazo dyes, azurenium dyes, diphenylmethane dyes, and triphenylmethane dyes. it can. Such a selective absorption dye is required to have a selective absorption of neon emission near 585 nm and a small absorption at other visible light wavelengths, so that the absorption maximum wavelength is 575 to 595 nm and the absorption spectrum half width is What is 40 nm or less is preferable.

  Also, when combining multiple types of near-infrared or neon luminescent absorbing dyes, if there is a problem with the solubility of the dye, if there is a reaction between the dyes due to mixing, if there is a decline in heat resistance, moisture resistance, etc. All the near-infrared absorbing dyes need not be contained in the same layer, and may be contained in another layer.

  Further, as long as the optical properties are not greatly affected, coloring pigments, ultraviolet absorbers, antioxidants and the like may be further added.

  As a near-infrared absorption characteristic of the optical filter of the present invention, it is preferable that the transmittance at 850 to 1000 nm is 20% or less, and further 15%. Moreover, as selective absorptivity, it is preferable that the transmittance | permeability of 585 nm is 50% or less. Especially in the former case, there is an effect of reducing the transmittance in a wavelength region where malfunction of a remote controller of a peripheral device is pointed out. In the latter case, an orange color having a peak at 575 to 595 nm is color reproducibility. This has the effect of absorbing the orange wavelength, thereby improving the redness and improving the color reproducibility.

  The layer thickness of the near infrared absorbing layer is generally 0.5 to 50 μm.

  In the case of using a conductive adhesive tape, for example, an adhesive layer in which conductive particles are dispersed is provided on one surface of a metal foil, and this adhesive layer includes acrylic, rubber, silicon It is possible to use a PSA adhesive, an epoxy resin, a phenol resin, or the like.

  The conductive particles dispersed in the adhesive layer may be any electrically good conductor, and various types can be used. For example, metal powder such as copper, silver, nickel, etc., resin coated with such metal, ceramic powder, or the like can be used. Further, the shape is not particularly limited, and any shape such as a flake shape, a dendritic shape, a granular shape, and a pellet shape can be taken.

  It is preferable that the compounding quantity of this electroconductive particle is 0.1-50 mass% with respect to the polymer which comprises an adhesion layer, and it is preferable that the average particle diameter is 0.1-100 micrometers. Thus, by prescribing the blending amount and the particle size, it is possible to prevent the conductive particles from condensing and obtain good conductivity.

  As metal foil used as the base material of the conductive pressure-sensitive adhesive tape, foil of copper, silver, nickel, aluminum, stainless steel or the like can be used, and the thickness thereof is usually 1 to 100 μm.

  The pressure-sensitive adhesive layer is coated with a roll coater, die coater, knife coater, my cover coater, flow coater, spray coater, etc., in which the above-mentioned pressure-sensitive adhesive and conductive particles are uniformly mixed with this metal foil in a predetermined ratio. By doing so, it can be easily formed.

  The thickness of this adhesive layer is usually 5 to 100 μm.

  The transparent adhesive layer of the present invention is a layer for adhering the optical film of the present invention to a display, and any resin can be used as long as it has an adhesive function. For example, acrylic adhesives, rubber adhesives, SEBS (styrene / ethylene / butylene / styrene) and SBS (styrene / butadiene / styrene) and other thermoplastic elastomers (TPE) as main components TPE-based pressure-sensitive adhesives and adhesives can also be used.

  The layer thickness is generally in the range of 5 to 500 μm, particularly 10 to 100 μm. In general, the optical filter can be bonded to the glass plate of the display via the pressure-sensitive adhesive layer.

  The transparent resin layer may also utilize the transparent adhesive layer.

  When two transparent films are used in the present invention, for example, ethylene-vinyl acetate copolymer, ethylene-methyl acrylate copolymer, acrylic resin (eg, ethylene- (meth) acrylic acid copolymer) Polymer, ethylene- (meth) ethyl acrylate copolymer, ethylene- (meth) methyl acrylate copolymer, metal ion crosslinked ethylene- (meth) acrylic acid copolymer), partially saponified ethylene-vinyl acetate copolymer Examples thereof include ethylene copolymers such as a polymer, a carboxylated ethylene-vinyl acetate copolymer, an ethylene- (meth) acryl-maleic anhydride copolymer, and an ethylene-vinyl acetate- (meth) acrylate copolymer. ("(Meth) acryl" means "acryl or methacryl"). In addition, polyvinyl butyral (PVB) resin, epoxy resin, phenol resin, silicon resin, polyester resin, urethane resin, rubber adhesive, thermoplastic elastomers such as SEBS and SBS can be used, but good adhesion Acrylic resin adhesives and epoxy resins are easily obtained.

  The layer thickness is generally 10 to 50 μm, preferably 20 to 30 μm. In general, the optical filter can be equipped by heat-pressing the pressure-sensitive adhesive layer to a glass plate of a display.

  When EVA is also used as the material for the transparent pressure-sensitive adhesive layer, EVA has a vinyl acetate content of 5 to 50% by weight, preferably 15 to 40% by weight. When the vinyl acetate content is less than 5% by weight, there is a problem in transparency, and when it exceeds 40% by weight, the mechanical properties are remarkably deteriorated and the film formation becomes difficult and the films are easily blocked.

  As the cross-linking agent, an organic peroxide is suitable for heat cross-linking and is selected in consideration of sheet processing temperature, cross-linking temperature, storage stability, and the like. Examples of peroxides that can be used include 2,5-dimethylhexane-2,5-dihydroperoxide; 2,5-dimethyl-2,5-di (t-butylperoxy) hexane-3; -Butyl peroxide; t-butylcumyl peroxide; 2,5-dimethyl-2,5-di (t-butylperoxy) hexane; dicumyl peroxide; α, α'-bis (t-butylperoxyisopropyl) ) Benzene; n-butyl-4,4-bis (t-butylperoxy) valerate; 2,2-bis (t-butylperoxy) butane; 1,1-bis (t-butylperoxy) cyclohexane; , 1-bis (t-butylperoxy) -3,3,5-trimethylcyclohexane; t-butylperoxybenzoate; benzoyl peroxide; Luperoxyacetate; 2,5-dimethyl-2,5-bis (tertiarybutylperoxy) hexyne-3; 1,1-bis (tertiarybutylperoxy) -3,3,5-trimethylcyclohexane; 1-bis (tert-butylperoxy) cyclohexane; methyl ethyl ketone peroxide; 2,5-dimethylhexyl-2,5-bisperoxybenzoate; tert-butyl hydroperoxide; p-menthane hydroperoxide; p-chlorobenzoyl Peroxides; tertiary butyl peroxyisobutyrate; hydroxyheptyl peroxide; chlorohexanone peroxide. These peroxides are used singly or in combination of two or more, and are usually used at a ratio of 5 parts by mass or less, preferably 0.5 to 5.0 parts by mass with respect to 100 parts by weight of EVA. .

  The organic peroxide is usually kneaded with EVA using an extruder, a roll mill or the like, but may be dissolved in an organic solvent, a plasticizer, a vinyl monomer or the like and added to the EVA film by an impregnation method.

  Various acryloxy group or methacryloxy group and allyl group-containing compounds can be added to improve EVA physical properties (mechanical strength, optical properties, adhesiveness, weather resistance, whitening resistance, crosslinking speed, etc.). . As the compound used for this purpose, acrylic acid or methacrylic acid derivatives, for example, esters and amides thereof are the most common. As the ester residue, in addition to alkyl groups such as methyl, ethyl, dodecyl, stearyl, lauryl, cyclohexyl groups , Tetrahydrofurfuryl group, aminoethyl group, 2-hydroxyethyl group, 3-hydroxypropyl group, 3-chloro-2-hydroxypropyl group and the like. Further, esters with polyfunctional alcohols such as ethylene glycol, triethylene glycol, polyethylene glycol, trimethylolpropane, and pentaerythritol can also be used. A typical amide is diacetone acrylamide.

  Examples thereof include polyfunctional esters such as acrylic or methacrylic acid esters such as trimethylolpropane, pentaerythritol, glycerin, triallyl cyanurate, triallyl isocyanurate, diallyl phthalate, diallyl isophthalate, diallyl maleate, etc. Examples include allyl group-containing compounds. These are used alone or in combination of two or more, and are usually used in an amount of 0.1 to 2 parts by weight, preferably 0.5 to 5 parts by weight, based on 100 parts by weight of EVA. .

  When EVA is crosslinked by light, a photosensitizer is usually used in an amount of 5 parts by mass or less, preferably 0.1 to 3.0 parts by mass based on 100 parts by mass of EVA instead of the peroxide.

  In this case, usable photosensitizers include, for example, benzoin, benzophenone, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, dibenzyl, 5-nitroacenaphthene, hexachlorocyclopentadiene, p-nitrodiphenyl. , P-nitroaniline, 2,4,6-trinitroaniline, 1,2-benzanthraquinone, 3-methyl-1,3-diaza-1,9-benzanthrone, and the like. Alternatively, two or more types can be mixed and used.

  Moreover, a silane coupling agent is used in combination as an adhesion promoter. As this silane coupling agent, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, γ-methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycid Xylpropyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-chloropropylmethoxysilane, vinyltrichlorosilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N- β (aminoethyl) -γ-aminopropyltrimethoxysilane and the like can be mentioned.

  The silane coupling agent is generally used in an amount of 0.001 to 10 parts by mass, preferably 0.001 to 5 parts by mass, based on 100 parts by mass of EVA, and one or more types are mixed and used.

  In addition, the EVA adhesive layer according to the present invention may further contain a small amount of an ultraviolet absorber, an infrared absorber, an anti-aging agent, a coating processing aid, a colorant, and the like. A small amount of a filler such as hydrophobic silica or calcium carbonate may be included.

  For example, after the EVA and the above-mentioned additive are mixed and kneaded with an extruder, a roll or the like, the adhesive layer is formed into a predetermined shape by a film forming method such as a calendar, roll, T-die extrusion, or inflation. Manufactured by.

  A protective layer may be provided on the antireflection layer. The protective layer is preferably formed in the same manner as the hard coat layer.

  The material of the release sheet provided on the transparent adhesive layer is preferably a transparent polymer having a glass transition temperature of 50 ° C. or higher. Examples of such a material include polyesters such as polyethylene terephthalate, polycyclohexylene terephthalate, and polyethylene naphthalate. In addition to polyamide resins such as nylon resins, nylon 46, modified nylon 6T, nylon MXD6, polyphthalamide, ketone resins such as polyphenylene sulfide and polythioether sulfone, and sulfone resins such as polysulfone and polyether sulfone, Mainly composed of polymers such as polyether nitrile, polyarylate, polyether imide, polyamide imide, polycarbonate, polymethyl methacrylate, triacetyl cellulose, polystyrene, polyvinyl chloride That the resin can be used. Of these, polycarbonate, polymethyl methacrylate, polyvinyl chloride, polystyrene, and polyethylene terephthalate can be suitably used. The thickness is preferably 10 to 200 μm, particularly preferably 30 to 100 μm.

  The optical filter with an electrode part of the present invention can be manufactured as described above using the above material. The display optical filter of the present invention thus obtained is used by being bonded to the surface of an image display glass plate of a display such as a PDP.

  Since the PDP display device of the present invention uses a plastic film as the transparent substrate, the optical filter of the present invention can be directly bonded to the surface of the glass plate, so that one transparent film is used. In this case, the PDP itself can contribute to weight reduction, thickness reduction, and cost reduction. Compared with the case where a front plate made of a transparent molded body is installed on the front side of the PDP, an air layer having a low refractive index can be eliminated between the PDP and the PDP filter, so that visible light reflection due to interface reflection can be achieved. Problems such as an increase in rate and double reflection can be solved, and the visibility of the PDP can be further improved.

Therefore, the display having the optical filter of the present invention is excellent in antireflection effect and antistatic property, hardly emits dangerous electromagnetic waves, is easy to see, is hardly attached with dust and the like, and can be called a safe display.

  EXAMPLES Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated concretely, this invention is not limited to a following example.

[Example 1]
<Preparation of optical filter for display having electrode part>
(1) Formation of mesh-like conductive layer A 10 μm thick copper foil (conductive material) is bonded to the entire surface of a 100 μm thick polyethylene terephthalate (PET) film (transparent substrate) with an adhesive (polyester urethane: 15 μm thick). Laminated. The obtained PET film with copper foil is subjected to a photolithography process (resist film sticking-exposure-development-chemical etching-resist film peeling), and a copper foil having a lattice pattern (wire diameter: 10 μm, pitch: 250 μm; strip shape of outer frame) Region width: 5 mm; see FIG. 2).

  The line width of the conductive layer on the film surface was 10 μm, and the aperture ratio was 92%. The average thickness of the conductive layer (copper layer) was 10 μm.

(2) Formation of hard coat layer The following formulation:
Dipentaerythritol hexaacrylate (DPHA) 80 parts by mass ITO (average particle size 150 nm) 20 parts by mass Methyl ethyl ketone 100 parts by mass Toluene 100 parts by mass Irgacure 184 (manufactured by Ciba Specialty Chemicals) Coated liquid obtained by mixing 4 parts by mass Was applied to the entire surface of the mesh-like conductive layer using a bar coater and dried.

Ultraviolet irradiation (irradiation amount: 1000 mJ / cm ² ) was performed from the back surface of the polyethylene terephthalate film having an uncured hard coat layer and a conductive layer. Next, methyl ethyl ketone was sprayed onto the uncured hard coat layer in the unexposed area, and the uncured hard coat layer on the frame-shaped metal layer was washed and removed (development).

  Thereby, a semi-cured hard coat layer (refractive index 1.52) having a thickness of 5 μm was formed on the mesh-like conductive layer.

(3) Formation of low refractive index layer The following formulation:
OPSTAR JN-7212 (manufactured by Nippon Synthetic Rubber Co., Ltd.) 100 parts by weight Methyl ethyl ketone 117 parts by weight Methyl isobutyl ketone 117 parts by weight A coating liquid obtained by mixing a semi-cured hard coat layer The entire surface was coated using a bar coater and dried in an oven at 80 ° C. for 5 minutes.

Ultraviolet irradiation (irradiation amount: 1000 mJ / cm ² ) was performed from the back surface of a polyethylene terephthalate film having an uncured low refractive index layer, a semi-cured hard coat layer, and a conductive layer. Next, methyl ethyl ketone was sprayed onto the uncured low refractive index layer in the unexposed area, and the uncured low refractive index layer on the frame-like metal layer was washed and removed (development).

  Thereby, a semi-cured low refractive index layer (refractive index: 1.42) having a thickness of 90 nm was formed on the hard coat layer.

From the semi-cured low refractive index layer, UV irradiation (irradiation amount: 1000 mJ / cm ² ) was applied to completely cure the semi-cured hard coat layer and the low refractive index layer.

(4) Formation of near-infrared absorbing layer (having color tone correction function)
Polymethylmethacrylate 30 parts by mass TAP-2 (manufactured by Yamada Chemical Co., Ltd.) 0.4 parts by mass Plast Red 380 (Arimoto Chemical Industry Co., Ltd. 0.1 parts by mass CIR-1085 (manufactured by Nippon Carlit Co., Ltd.) ) 1.3 parts by mass IR-10A (manufactured by Nippon Shokubai Co., Ltd.) 0.6 parts by mass Methyl ethyl ketone 152 parts by mass Methyl isobutyl ketone 18 parts by mass was mixed on the entire back surface of the polyethylene film. It was applied using a bar coater and dried for 5 minutes in an oven at 80 ° C. Thereby, a near-infrared absorbing layer (having a color tone correction function) having a thickness of 5 μm was formed on the polyethylene film.

(5) Formation of transparent adhesive layer The following formulation:
SK Dyne 1811L (manufactured by Soken Chemical Co., Ltd.) 100 parts by mass Curing agent L-45 (manufactured by Soken Chemical Co., Ltd.) 0.45 parts by mass Toluene 15 parts by mass Ethyl acetate 4 parts by mass Was coated on the near infrared absorbing layer using a bar coater and dried in an oven at 80 ° C. for 5 minutes. This formed a 25-micrometer-thick transparent adhesive layer on the near-infrared absorption layer.

  Thereby, an optical filter for display having an electrode portion (frame-like metal layer) protruding to the periphery was obtained.

[Evaluation of optical filter]
(1) Dimensional accuracy of surrounding strip-shaped conductive layer The width of the strip-shaped conductive layer around the obtained optical filter was measured at 10 points on each side, and the accuracy was evaluated.

  There was almost no difference between the maximum width and the minimum width, and good dimensional accuracy was shown.

It is a figure for demonstrating one example of the manufacturing method of the optical filter for displays with an electrode part of this invention. It is a top view of one example of the transparent film provided with the mesh-like conductive layer of the present invention. It is a figure for demonstrating one preferable example of the manufacturing method of the optical filter for displays with an electrode part of this invention. It is a schematic sectional drawing of one example of the preferable aspect of the optical filter for displays with an electrode part of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Display optical filter 12 Transparent film 13 Mesh-like conductive layer 16 Uncured hard coat layer 16M Semi-cured hard coat layer 16C Cured hard coat layer 17 Uncured low refractive index layer 17M Semi-cured low refractive index layer 17C Cured low refractive index Rate layer 14 Near-infrared absorbing layer 15 Transparent adhesive layer

Claims (17)

  An uncured functional layer containing an ultraviolet curable resin composition is formed on the entire surface of the transparent substrate provided with a conductive layer composed of a mesh-shaped metal layer and a surrounding frame-shaped metal layer on the surface. Irradiating the surface of the transparent substrate where the conductive layer is not formed with ultraviolet rays, and removing the uncured functional layer provided on the frame-like metal layer with a solvent to expose the frame-like metal layer The manufacturing method of the optical filter for displays which has the conductive layer which protruded to the circumference as an electrode part containing A.   The manufacturing method according to claim 1, wherein the functional layer is a hard coat layer.   After the step A, an uncured low refractive index layer containing an ultraviolet curable resin composition is formed on the hard coat layer and the exposed frame-shaped metal layer, and the side on which the conductive layer of the transparent substrate is not formed The manufacturing method of Claim 2 which performs the process B which irradiates an ultraviolet-ray to the surface of this, and removes the uncured low refractive index layer provided on the frame-shaped metal layer with a solvent, and exposes the frame-shaped metal layer . After the step A, an uncured high refractive index layer containing an ultraviolet curable resin composition is formed on the hard coat layer and the exposed frame-shaped metal layer, and the side on which the conductive layer of the transparent substrate is not formed The surface of the substrate is irradiated with ultraviolet rays, and an uncured high refractive index layer provided on the frame metal layer is removed with a solvent to expose the frame metal layer, and then the high refractive index layer and the exposure An uncured low refractive index layer containing an ultraviolet curable resin composition is formed on the frame-shaped metal layer, and the surface of the transparent substrate on which the conductive layer is not formed is irradiated with ultraviolet rays. The manufacturing method of Claim 2 which performs process B 'which removes the uncured low refractive index layer provided on the layer with a solvent to expose the frame-shaped metal layer.   The method according to claim 1, wherein after forming all the layers on the conductive layer, the surface having the conductive layer is further irradiated with ultraviolet rays.   The manufacturing method of any one of Claims 2-5 in which the near-infrared absorption layer is provided in the surface by which the conductive layer of the transparent substrate is not provided.   The manufacturing method of Claim 6 in which a near-infrared absorption layer contains a neon light absorption pigment | dye.   Furthermore, the manufacturing method of Claim 6 which has a neon light absorption pigment | dye layer.   The manufacturing method of any one of Claims 2-8 in which a hard-coat layer contains a ultraviolet absorber.   The manufacturing method according to claim 1, wherein the transparent substrate is a plastic film.   An ultraviolet curable resin composition is formed on the entire surface of the transparent substrate on which a conductive layer comprising a mesh-like metal layer or a mesh-like metal layer and a surrounding frame-like metal layer is provided. An uncured functional layer is formed, and ultraviolet rays are irradiated from above the functional layer through a mask so as not to irradiate the frame region on the outer edge of the conductive layer, and on the frame region of the conductive layer. A method for producing an optical filter for a display having a conductive layer protruding to the periphery as an electrode part, comprising a step A ′ of removing a provided uncured functional layer with a solvent to expose a frame-like region.   The optical filter for a display which has the electroconductive layer which protruded to the circumference | surroundings as an electrode part obtained by the manufacturing method of any one of Claims 1-11.   The optical filter for display according to claim 12, wherein a transparent adhesive layer is provided on the surface of the near infrared absorbing layer opposite to the transparent substrate.   The optical filter for display according to claim 13, wherein a release sheet is provided on the transparent adhesive layer.   It is a filter for plasma display panels, The optical filter for displays of any one of Claims 12-14.   The display optical filter of any one of Claims 12-14 is bonded together on the surface of the image display glass plate, The display characterized by the above-mentioned. A plasma display panel, wherein the display optical filter according to any one of claims 12 to 14 is bonded to a surface of an image display glass plate.