JP2008091031A - 磁気記録媒体の製造方法 - Google Patents
磁気記録媒体の製造方法 Download PDFInfo
- Publication number
- JP2008091031A JP2008091031A JP2007337140A JP2007337140A JP2008091031A JP 2008091031 A JP2008091031 A JP 2008091031A JP 2007337140 A JP2007337140 A JP 2007337140A JP 2007337140 A JP2007337140 A JP 2007337140A JP 2008091031 A JP2008091031 A JP 2008091031A
- Authority
- JP
- Japan
- Prior art keywords
- mask layer
- layer
- divided
- magnetic
- recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 35
- 239000000463 material Substances 0.000 claims description 74
- 239000000758 substrate Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 132
- 239000011241 protective layer Substances 0.000 description 41
- 238000000034 method Methods 0.000 description 31
- 239000000696 magnetic material Substances 0.000 description 22
- 239000007789 gas Substances 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 12
- 238000001312 dry etching Methods 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- 239000012495 reaction gas Substances 0.000 description 9
- 239000002002 slurry Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000001020 plasma etching Methods 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 230000003746 surface roughness Effects 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 230000004075 alteration Effects 0.000 description 4
- 238000000089 atomic force micrograph Methods 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- 238000000879 optical micrograph Methods 0.000 description 4
- 229910000531 Co alloy Inorganic materials 0.000 description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 238000006731 degradation reaction Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 229910019222 CoCrPt Inorganic materials 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- -1 Cl 2 Chemical compound 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910018503 SF6 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- DTJAVSFDAWLDHQ-UHFFFAOYSA-N [Cr].[Co].[Pt] Chemical compound [Cr].[Co].[Pt] DTJAVSFDAWLDHQ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007542 hardness measurement Methods 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007337140A JP2008091031A (ja) | 2007-12-27 | 2007-12-27 | 磁気記録媒体の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007337140A JP2008091031A (ja) | 2007-12-27 | 2007-12-27 | 磁気記録媒体の製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003086019A Division JP4076889B2 (ja) | 2003-03-26 | 2003-03-26 | 磁気記録媒体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008091031A true JP2008091031A (ja) | 2008-04-17 |
| JP2008091031A5 JP2008091031A5 (enExample) | 2009-02-26 |
Family
ID=39374997
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007337140A Pending JP2008091031A (ja) | 2007-12-27 | 2007-12-27 | 磁気記録媒体の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008091031A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015032343A (ja) * | 2013-08-02 | 2015-02-16 | エイチジーエスティーネザーランドビーブイ | 平坦化ビット・パターン化磁気媒体のための組成および方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0340219A (ja) * | 1989-07-06 | 1991-02-21 | Hitachi Ltd | 磁気ディスクの製造方法 |
-
2007
- 2007-12-27 JP JP2007337140A patent/JP2008091031A/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0340219A (ja) * | 1989-07-06 | 1991-02-21 | Hitachi Ltd | 磁気ディスクの製造方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015032343A (ja) * | 2013-08-02 | 2015-02-16 | エイチジーエスティーネザーランドビーブイ | 平坦化ビット・パターン化磁気媒体のための組成および方法 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4076889B2 (ja) | 磁気記録媒体の製造方法 | |
| JP4188125B2 (ja) | 磁気記録媒体の製造方法及び製造装置 | |
| JP4071787B2 (ja) | 磁気記録媒体の製造方法 | |
| US20080078739A1 (en) | Method for manufacturing magnetic recording medium | |
| KR20040084715A (ko) | 자기기록매체 및 자기기록매체의 제조방법 | |
| JP2005243130A (ja) | 磁気記録媒体及び磁気記録再生装置 | |
| JP4040514B2 (ja) | 磁気記録媒体及び磁気記録媒体の製造方法 | |
| JP2006012285A (ja) | 磁気記録媒体及び磁気記録媒体の製造方法 | |
| JP2007004921A (ja) | 磁気記録媒体、磁気記録再生装置及び磁気記録媒体の製造方法 | |
| JP4008420B2 (ja) | 磁気記録媒体の製造方法 | |
| JP4874188B2 (ja) | 磁気記録媒体の製造方法 | |
| US8298691B2 (en) | Magnetic recording medium and magnetic recording and reproducing apparatus | |
| US20050186356A1 (en) | Method for manufacturing a magnetic recording medium | |
| JP2008091031A (ja) | 磁気記録媒体の製造方法 | |
| CN100385507C (zh) | 磁记录介质及磁记录再现装置 | |
| JP4226586B2 (ja) | 磁気記録媒体 | |
| JP2006252772A (ja) | 磁気記録媒体の製造方法 | |
| JP4487609B2 (ja) | 磁気記録媒体 | |
| CN100395824C (zh) | 磁记录介质的制造方法 | |
| CN100568350C (zh) | 磁记录介质 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Effective date: 20090108 Free format text: JAPANESE INTERMEDIATE CODE: A523 |
|
| A977 | Report on retrieval |
Effective date: 20100216 Free format text: JAPANESE INTERMEDIATE CODE: A971007 |
|
| A131 | Notification of reasons for refusal |
Effective date: 20100223 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20100629 |