JP2008080230A - 基板処理装置および基板処理方法 - Google Patents

基板処理装置および基板処理方法 Download PDF

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Publication number
JP2008080230A
JP2008080230A JP2006261994A JP2006261994A JP2008080230A JP 2008080230 A JP2008080230 A JP 2008080230A JP 2006261994 A JP2006261994 A JP 2006261994A JP 2006261994 A JP2006261994 A JP 2006261994A JP 2008080230 A JP2008080230 A JP 2008080230A
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JP
Japan
Prior art keywords
substrate
microbubbles
nanobubbles
processing apparatus
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2006261994A
Other languages
English (en)
Japanese (ja)
Inventor
Junhei Kawane
旬平 川根
Akihito Shioda
明仁 塩田
Satoshi Suzuki
聡 鈴木
Satoshi Yamamoto
悟史 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP2006261994A priority Critical patent/JP2008080230A/ja
Priority to TW096131936A priority patent/TW200830387A/zh
Priority to KR1020070096598A priority patent/KR20080028804A/ko
Priority to CNA2007101616148A priority patent/CN101154566A/zh
Publication of JP2008080230A publication Critical patent/JP2008080230A/ja
Abandoned legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/26—Reducing the size of particles, liquid droplets or bubbles, e.g. by crushing, grinding, spraying, creation of microbubbles or nanobubbles
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006261994A 2006-09-27 2006-09-27 基板処理装置および基板処理方法 Abandoned JP2008080230A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006261994A JP2008080230A (ja) 2006-09-27 2006-09-27 基板処理装置および基板処理方法
TW096131936A TW200830387A (en) 2006-09-27 2007-08-28 Substrate processing apparatus and substrate processing method
KR1020070096598A KR20080028804A (ko) 2006-09-27 2007-09-21 기판 처리 장치 및 기판 처리 방법
CNA2007101616148A CN101154566A (zh) 2006-09-27 2007-09-27 基板处理装置和基板处理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006261994A JP2008080230A (ja) 2006-09-27 2006-09-27 基板処理装置および基板処理方法

Publications (1)

Publication Number Publication Date
JP2008080230A true JP2008080230A (ja) 2008-04-10

Family

ID=39256129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006261994A Abandoned JP2008080230A (ja) 2006-09-27 2006-09-27 基板処理装置および基板処理方法

Country Status (4)

Country Link
JP (1) JP2008080230A (zh)
KR (1) KR20080028804A (zh)
CN (1) CN101154566A (zh)
TW (1) TW200830387A (zh)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009302406A (ja) * 2008-06-16 2009-12-24 Shibaura Mechatronics Corp 基板の処理装置及び処理方法
JP2010131544A (ja) * 2008-12-05 2010-06-17 Shibaura Mechatronics Corp 微小気泡発生装置及び微小気泡発生方法
JP2010165825A (ja) * 2009-01-15 2010-07-29 Shibaura Mechatronics Corp 基板処理装置および基板処理方法
CN102284447A (zh) * 2010-06-17 2011-12-21 芝浦机械电子装置股份有限公司 清洗方法和清洗装置
KR101154094B1 (ko) 2008-06-03 2012-06-11 시바우라 메카트로닉스 가부시키가이샤 미소 기포 생성 장치, 미소 기포 생성 방법 및 기판 처리 장치
KR101177194B1 (ko) * 2008-10-24 2012-08-24 도쿄엘렉트론가부시키가이샤 기판 세정 장치
JP2013034916A (ja) * 2011-08-04 2013-02-21 Alps Electric Co Ltd 超音波洗浄装置
JP2013146714A (ja) * 2012-01-23 2013-08-01 Idec Corp 微細気泡生成装置
JP2013175681A (ja) * 2012-02-27 2013-09-05 Kyoto Univ 基板洗浄方法、基板洗浄装置及び真空処理装置
JP2018094503A (ja) * 2016-12-13 2018-06-21 サントリーホールディングス株式会社 洗浄液生成方法、洗浄方法及び洗浄液生成設備

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5585076B2 (ja) * 2009-12-24 2014-09-10 栗田工業株式会社 洗浄方法
KR101399763B1 (ko) * 2012-08-07 2014-05-27 주식회사 주원리테크 납축전지 재활용방법
JP6232212B2 (ja) * 2012-08-09 2017-11-15 芝浦メカトロニクス株式会社 洗浄液生成装置及び基板洗浄装置
CN110639870A (zh) * 2018-06-26 2020-01-03 联合汽车电子有限公司 气液混合冲洗系统

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101154094B1 (ko) 2008-06-03 2012-06-11 시바우라 메카트로닉스 가부시키가이샤 미소 기포 생성 장치, 미소 기포 생성 방법 및 기판 처리 장치
JP2009302406A (ja) * 2008-06-16 2009-12-24 Shibaura Mechatronics Corp 基板の処理装置及び処理方法
KR101177194B1 (ko) * 2008-10-24 2012-08-24 도쿄엘렉트론가부시키가이샤 기판 세정 장치
JP2010131544A (ja) * 2008-12-05 2010-06-17 Shibaura Mechatronics Corp 微小気泡発生装置及び微小気泡発生方法
JP2010165825A (ja) * 2009-01-15 2010-07-29 Shibaura Mechatronics Corp 基板処理装置および基板処理方法
CN102284447B (zh) * 2010-06-17 2014-08-27 芝浦机械电子装置股份有限公司 清洗方法和清洗装置
CN102284447A (zh) * 2010-06-17 2011-12-21 芝浦机械电子装置股份有限公司 清洗方法和清洗装置
JP2013034916A (ja) * 2011-08-04 2013-02-21 Alps Electric Co Ltd 超音波洗浄装置
JP2013146714A (ja) * 2012-01-23 2013-08-01 Idec Corp 微細気泡生成装置
JP2013175681A (ja) * 2012-02-27 2013-09-05 Kyoto Univ 基板洗浄方法、基板洗浄装置及び真空処理装置
KR101768758B1 (ko) * 2012-02-27 2017-08-30 도쿄엘렉트론가부시키가이샤 기판 세정 방법, 기판 세정 장치 및 진공 처리 장치
US9881815B2 (en) 2012-02-27 2018-01-30 Tokyo Electron Limited Substrate cleaning method, substrate cleaning device, and vacuum processing device
JP2018094503A (ja) * 2016-12-13 2018-06-21 サントリーホールディングス株式会社 洗浄液生成方法、洗浄方法及び洗浄液生成設備

Also Published As

Publication number Publication date
TW200830387A (en) 2008-07-16
KR20080028804A (ko) 2008-04-01
CN101154566A (zh) 2008-04-02

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A621 Written request for application examination

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Effective date: 20090205

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Effective date: 20090701