JP2008065150A - Color filter, member for display device and its manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To suppress occurrence of a clearance between a base material and a photosensitive material when the photosensitive material is provided and to suppress occurrence of a pinhole when an ITO (indium tin oxide) film is formed. <P>SOLUTION: A manufacturing method of a member for a display device comprises a process of providing a photosensitive material containing at least a photosensitive resin in a liquid state on the base material and a process of performing post exposure to the photosensitive material on the base material by using a metal halide lamp. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a display device member used in a display device such as a liquid crystal display device, a manufacturing method thereof, and a color filter.

  A color filter, which is a member for a display device, generally has a structure in which red, green, and blue dot-like images (pixels) are arranged in a matrix on a substrate such as glass and the boundary is divided by a black matrix. Can do.

  As a manufacturing method of such a color filter, conventionally, a substrate such as glass is used as a support, and 1) a colored photosensitive resin liquid method manufactured by repeating application of a colored photosensitive resin liquid, exposure and development. (Colored resist method; see, for example, Patent Document 1) and 2) On a substrate using a transfer material in which a photosensitive colored layer is formed by applying a pre-colored photosensitive resin liquid on a temporary support. A method (transfer method) is known in which a photosensitive color layer is transferred, exposed and developed by repeating a desired number of hues to form a multicolor image (for example, see Patent Documents 2 and 3).

  In recent years, 3) A method of forming a multicolor image by ejecting a photosensitive material (colored ink) containing a colorant onto a recess surrounded by a black matrix of a substrate on which a black matrix is formed by an inkjet method. (For example, refer to Patent Documents 4 and 5).

When manufacturing a member for a display device such as the color filter, there is a problem that a defect occurs in the member for a display device during the manufacturing process. As one method for solving such a problem, an attempt has been made to prevent defects in display device members by performing post-exposure. For example, when a color filter is manufactured by a transfer method, it has been proposed to perform post exposure using a metal halide lamp (see, for example, Patent Document 3). In addition, when a color filter is manufactured by an ink jet method, it has been proposed to prevent color mixing and white spots by performing post-exposure before baking (see, for example, Patent Document 5).
Japanese Patent Laid-Open No. 1-152449 JP-A-61-99102 Japanese Patent Laid-Open No. 2005-3861 JP-A-8-227010 JP 2002-156520 A

  However, when forming a member for a display device (for example, a color filter) by directly applying a photosensitive resin liquid to the surface of the support (for example, a glass substrate), for example, the layer of the photosensitive resin liquid and the glass substrate There is a problem that a gap is generated between them, and a problem that a pinhole is formed when an ITO film is formed on the color filter. These problems cannot be solved by the above prior art, and further improvements have been desired in terms of adhesion to the support and prevention of pinholes.

  The present invention has been made in view of the above, and when a photosensitive material is provided, the generation of a gap with a base material is suppressed, and the generation of a pinhole during the formation of an ITO film is suppressed. It aims at providing the member for manufacturing, its manufacturing method, and a color filter, and makes it a subject to achieve this objective.

Specific means for achieving the above object are as follows.
<1> A display having a step of providing a photosensitive material containing at least a photosensitive resin on a substrate in a liquid state, and a step of performing post-exposure using a metal halide lamp on the photosensitive material on the substrate. It is a manufacturing method of the member for apparatuses.
<2> An image is formed by the step of providing the photosensitive material on a substrate, and the post-exposure is performed on each side of the image formed by the step of providing the photosensitive material on a substrate, 500 to 5000 mJ. / cm carried out in ^two exposure energy <1> is a manufacturing method of the display device member according to.
<3> An image is formed by the step of providing the photosensitive material on a substrate, and the post-exposure is performed at 50 to 500 mW / cm ^{2 for} each image formed by the step of providing the photosensitive material on the substrate. It is a manufacturing method of the member for display apparatuses as described in <1> or <2> performed by the exposure illumination intensity of this.
<4> For each image, the post-exposure is performed such that the monomer reaction rate in the image is 5 to 40%, and the post-exposure image is further baked, The method for producing a member for a display device according to <2> or <3>, wherein the monomer reaction rate after baking all is 60% or more.
<5> A display device member manufactured by the method for manufacturing a display device member according to any one of <1> to <4>.
<6> A color filter manufactured by the method for manufacturing a member for a display device according to any one of <1> to <4>.

  According to the present invention, when a photosensitive material is provided, the generation of a gap between the substrate and the substrate is suppressed, and the generation of pinholes during the formation of the ITO film is suppressed, and the method for manufacturing the display device member and A color filter can be provided.

The method for producing a member for a display device of the present invention includes (1) a step of providing a photosensitive material containing at least a photosensitive resin on a base material, and (2) a metal halide lamp for the photosensitive material on the base material. And a step of performing post-exposure using (hereinafter also referred to as “post-exposure step”).
By using a metal halide lamp as an exposure means for post-exposure, a pin hole generated when forming an ITO film on a color filter or a gap generated between the photosensitive material and the substrate when the photosensitive material is provided on the substrate. Can be effectively prevented, so that a high-quality display device member can be manufactured.
Hereinafter, the manufacturing method of the member for display apparatuses of this invention is demonstrated later on in order of a process.

<Method for Manufacturing Display Device Member>
(1) Step of providing a photosensitive material on a base material This step is performed by applying a slit coating method, a spin coating method, or a stripe Geyser method (using a Geyser with fine droplet ejection holes on a substrate). And a photosensitive material to be described later on the substrate by coating by a known coating method such as a method of forming a stripe-shaped pixel) or by droplet ejection by an inkjet method.

  Examples of application using the coating method and the inkjet method include Japanese Patent Application Laid-Open Nos. 2004-89851, 2004-17043, 2003-170098, 2003-164787, and 2003. No. 10767, JP 2002-79163 A, JP 2001-310147 A, etc., a slit-like nozzle and a slit coater, a spin coating method described in Japanese Patent Application Laid-Open No. 5-224011, No. 323472, a method of continuously ejecting charged ink and controlling it by an electric field, a method of intermittently ejecting ink using a piezoelectric element, and intermittently utilizing heating and foaming of the ink An ink jet method such as a method of spraying on the surface can be used. In addition, for example, the method described in “Coating Engineering” (published by Yuji Harasaki, Asakura Shoten, Showa 47 etc.) can be mentioned.

  Here, as the base material to which the photosensitive material is applied, a transparent substrate is suitable, for example, a soda glass plate having a silicon oxide film on its surface, a low expansion glass, a non-alkali glass, a quartz glass plate and the like. A glass plate, a plastic film, etc. can be mentioned. In addition, the base material can have good adhesion with a layer made of a photosensitive material (hereinafter also simply referred to as “photosensitive resin layer”) by performing a coupling treatment in advance. As the coupling treatment, a method described in JP 2000-39033 A is preferably used.

  As the thickness of the photosensitive material provided on the base material, a thickness desired for design is required for structural materials such as pillars, but when the thickness is not particularly specified, it is 4 μm or less, and further 2 μm or less. Is preferred. When the thickness is 4 μm or less, the step of the overlapping portion where a plurality of pixels overlap each other can be reduced, and alignment film formation failure and liquid crystal alignment disorder can be prevented.

  This step is a step of patterning the photosensitive material provided on the substrate as described above, or applying a liquid photosensitive material in a pattern to form an image (hereinafter referred to as “image forming step”). May be included.). By providing the image forming step, an image constituting the display device member (including the color filter) can be formed. When patterning the photosensitive material on the substrate, the image forming process can include the exposure and development processes described in paragraph numbers [0040] to [0042] of JP-A-2006-23696. In the case of the ink jet method, an image can be formed by ejecting (droplet ejecting) a photosensitive material like an image. In addition, when the display device member of the present invention is manufactured by the ink jet method, it is described in paragraphs [0054] to [0101] of JP-A-2006-154804 from the viewpoint of preventing color mixing of colored layers such as RGB. A water repellent process may be included. Details of the photosensitive material will be described later.

  In the method for producing a member for a display device of the present invention, a black matrix can be formed by providing a photosensitive resin layer using a photosensitive material on a substrate. By subjecting the black image formed by the above method to post-exposure described later, a black matrix having high adhesion to the substrate can be obtained.

  The black matrix formed in the present invention preferably has a high optical density at 555 nm, more preferably 2.5 or more, more preferably 2.5 to 10.0, and more preferably 2.5 to 6 0.0 is more preferable, and 3.0 to 5.0 is particularly preferable. Further, since the photosensitive resin layer is preferably cured by a photoinitiating system, the optical density with respect to the exposure wavelength (generally the ultraviolet region) is also important. That is, the value is preferably 2.0 to 10.0. If it is 2.0 or more, the black matrix can be formed into a desired shape, and if it is within 10.0, the polymerization can be started without hindrance and it is easy to form a black matrix. More preferably, it is 2.5-6.0, Most preferably, it is 3.0-5.0.

  Further, the width of the black matrix formed as described above (that is, the interval between pixels when a color filter is formed) is not particularly limited and can be appropriately selected according to the purpose. It is preferable to set it to -200 micrometers.

In the color filter of the present invention, a photosensitive material containing a colorant is applied to a substrate with or without using the substrate having the black matrix, and red (R), green (G), blue (G), etc. It can be obtained by forming a colored image (hereinafter also referred to as a pixel).
A method for applying the photosensitive material containing the colorant is not particularly limited, and an inkjet method, a slit coating method, a stripe Geyser coating method (using Geyser with fine droplet ejection holes). A known method such as a method of applying a droplet onto a substrate to form a stripe pixel can be appropriately used. In particular, in the present invention, it is preferable to use an ink jet method or a slit coat method.

-Water repellent treatment-
In the case of the ink jet method, it is preferable to perform a water repellent treatment in advance on the black matrix formed on the substrate. By applying water repellent treatment, the water contact angle on the upper surface of the black matrix can be adjusted, and in the subsequent colored image formation, a droplet of a photosensitive material containing a colorant is placed between the black matrix ( When applied to the opening), it is possible to suppress problems such as ink overcoming the black matrix and mixing with the adjacent color.

  The water repellent treatment includes a method of containing a water repellent material in the black matrix, a method of newly providing a water repellent layer on the black matrix, a method of applying a water repellent material on the top surface of the black matrix, and a repellent property directly bonded to the top surface of the black matrix. Examples thereof include a method for producing an oil / water repellency compound, a method for imparting water repellency to the black matrix by plasma treatment (plasma water repellency treatment), and the like. Among these, plasma water repellency treatment is particularly preferable from the viewpoint of simplicity of the process.

In the plasma water repellency treatment, a plasma treatment is performed on a substrate on which a black matrix is formed in the presence of a gas containing fluorine atoms.
In this method, a gas containing at least fluorine atoms is introduced, and as the gas, a halogen gas selected from CF ₄ , CHF ₃ , C ₂ F ₆ , SF ₆ , C ₃ F ₈ , and C ₅ F ₈ is used. It is preferable to use one or more. In particular, C ₅ F ₈ (octafluorocyclopentene) has an ozone depletion ability of 0, and at the same time, has an atmospheric life (CF ₄ : 50,000 years, C ₄ F ₈ : 3200 years) as compared with conventional gases. It is very short with 98 years. Therefore, the global warming potential is 90 (100-year integrated value assuming CO ₂ = 2), which is very small (CF ₄ : 6500, C ₄ F ₈ : 8700) compared to conventional gases, and the ozone layer and the global environment It is extremely effective for protection and is desirable for use in the present invention.

Further, as the introduced gas, a gas such as oxygen, argon, or helium may be used in combination as necessary. In this step, when a mixed gas of at least one halogen gas selected from CF ₄ , CHF ₃ , C ₂ F ₆ , SF ₆ , C ₃ F ₈ , and C ₅ F ₈ and O ₂ is used, It is possible to control the degree of ink repellency on the surface of the black matrix processed in this step. However, in the mixed gas, the oxidation reaction mixture ratio by O ₂ exceeds 30 wt% of O ₂ becomes dominant, ink repellency enhancing effect is prevented, also, O ₂ mixing ratio is 30 mass% If it exceeds, damage to the resin becomes significant. Therefore, when the mixed gas is used, it is preferable to use the mixed gas at a O ₂ mixing ratio of 30% or less.

  As a method for generating plasma, methods such as low frequency discharge, high frequency discharge, and microwave discharge can be used, and conditions such as pressure, gas flow rate, discharge frequency, and processing time during plasma processing are arbitrarily set. Can do.

  Each pixel constituting the color filter of the present invention can be manufactured, for example, by ejecting or applying a photosensitive material containing a colorant on a substrate on which a black matrix is formed. Specifically, a black matrix is formed by, for example, depositing / coating a photosensitive material containing a colorant for forming each pixel of RGB into a recess surrounded by a black matrix formed on a substrate. An image is formed by intruding into the enclosed recess. The shape of the color filter may be a shape in which RGB pixels composed of at least three primary colors are arranged in a mosaic shape or a stripe shape.

  There is no restriction | limiting in particular as a dimension of each pixel, According to the objective, it can select suitably, For example, it is preferable to set it as 40-200 micrometers. In the case of a stripe shape, a width of 40 to 200 μm is usually used.

  For the pixel formation by the inkjet method, a known method such as a method of thermally curing ink, a method of photocuring, or a method of ejecting droplets after forming a transparent image receiving layer on a substrate in advance can be used.

  Preferably, after each pixel is formed, a heating step of performing a heat treatment (so-called baking treatment) is provided. The bake process will be described later.

  The pattern shape of the color filter formed in this manner is not particularly limited, and may be a general black matrix shape such as a stripe shape, a lattice shape, or a delta arrangement. May be.

The slit coating method refers to a method in which a photosensitive material containing a colorant for slit coating is applied by a slit-shaped nozzle having a slit-shaped hole in a portion where liquid is discharged.
Specific examples of the slit-like nozzle (slit coater) include Japanese Patent Application Laid-Open Nos. 2004-89851, 2004-17043, 2003-170098, 2003-164787, and 2003-10767. And the slit coater described in Japanese Patent Laid-Open No. 2002-79163, Japanese Patent Laid-Open No. 2001-310147, and the like.

(2) Post-exposure step This step is a step of performing post-exposure using a metal halide lamp on the photosensitive material provided on the substrate. The monomer in the photosensitive material reacts by the post exposure. In the present invention, the post-exposure is preferably performed such that the monomer reaction rate in the image is 5 to 40% for each image formed by the step of providing the photosensitive material on the substrate. When the monomer reaction rate is in the range of 5 to 40%, it is possible to prevent the generation of a gap between the image and the substrate, and more efficiently generate pinholes when forming the ITO film on the color filter. Can be suppressed. The range of the monomer reaction rate in the image for each image by the post-exposure is preferably 10 to 35%, more preferably 20 to 30%, from the viewpoint of preventing gaps and preventing pinholes. Is particularly preferred.
In addition, it is preferable to perform the said post exposure from the side in which the image on a base material is formed at least, and may perform it from the surface on the opposite side.

Here, the method for measuring the monomer reaction rate will be described.
As a measurement sample, a thin layer is cut out from an image within 24 hours after post exposure, and a tablet (having a height of 500 μm and a diameter of 2 mm) mixed with KBr so as to be 50 times the weight of the photosensitive resin layer is prepared.
The absorbance ratio of the tablets at wavelengths of 810 cm ⁻¹ and 700 cm ⁻¹ was measured with an FT-IR measuring device (FTS-7000 / manufactured by Varian Technologies Japan), and monomers such as acrylate (polymerizable) The monomer reaction rate is calculated by determining the residual ratio of the compound.

  In the present invention, the value of the monomer reaction rate in the image after post-exposure is, for example, that of a color filter composed of a black matrix (BM), a red (R) pixel, a green (G) pixel, and a blue (B) pixel. In the case of the manufacturing process, the monomer reaction rate in the BM after the post-exposure when forming the black matrix, the monomer reaction rate in the R pixel after the post-exposure when forming the R pixel, and the post when forming the G pixel The monomer reaction rate in the G pixel after the exposure, and the monomer reaction rate in the B pixel after the post-exposure when forming the B pixel are the values when the above absorbance measurement was performed for the reaction rate after the post-exposure. . Therefore, “for each image” means each pixel such as RGB and BM or each BM.

  The monomer reaction rate in the image after the post-exposure can be controlled by appropriately adjusting both the post-exposure illuminance and the exposure energy (post-exposure amount) by the metal halide lamp.

-Post exposure illuminance-
In this invention, it is preferable that the illumination intensity of the post exposure by a metal halide lamp is 50-500 mW / cm < ² >. When the illuminance is 50 to 500 mW / cm ^2, it is easy to control the monomer reaction rate within the above range in relation to the exposure energy (post-exposure amount), and is effective for preventing a gap between the image and the substrate. Thus, the occurrence of pinholes during the formation of the ITO film on the color filter can be more efficiently suppressed.
Also more preferably the illuminance is 100 to 350 mW / cm ^2, and particularly preferably 150~250mW / cm ^2.

  The post-exposure illuminance can be adjusted by measuring the illuminance with an illuminometer. In the present invention, “UIT150” manufactured by USHIO INC. Was used as the illuminance meter (illuminance measuring device).

-Exposure energy (post exposure)-
In this invention, it is preferable that the exposure energy (exposure amount) by a metal halide lamp is 500-5000 mJ / cm < ² >. When the exposure energy is 500 to 5000 mJ / cm ^2, it is easy to control the monomer reaction rate within the above range in relation to the post-exposure illuminance, and a gap is generated between the image (photosensitive resin layer) and the substrate. And the occurrence of pinholes during the formation of the ITO film on the color filter can be more efficiently suppressed.
Further, the exposure energy is more preferably from 1000~3000mJ / cm ^2, and particularly preferably 1500~2500mJ / cm ^2. As described above, the post-exposure in this step may be performed from one side or both sides of the base material, and the exposure energy here refers to the total exposure energy of the base material at the time of one post-exposure.

  The exposure energy (post-exposure amount) can be adjusted by selecting the exposure time after adjusting the post-exposure illuminance as described above.

  Here, the measurement of the exposure illuminance and the exposure energy (exposure amount) in the present invention can be performed by using “UIT150” manufactured by USHIO INC. As a measuring device and setting the measurement wavelength to 365 nm.

  As the metal halide lamp used in the present invention, for example, a metal halide lamp “Eye Multi Beam”, “Hilux Beam”, “Eye Cleanse” manufactured by Eye Graphics, “Pana Beam” manufactured by Matsushita Electric Works, Ltd., and the like are suitable. Used.

(3) Baking process It is preferable to further provide a baking process for baking the post-exposure image after the image forming process and the post-exposure process. By carrying out the bake treatment, the monomer is reacted to cure the photosensitive material. By providing the baking process, a high-quality display device member having high hardness and no defects can be obtained.
In the present invention, the monomer reaction rate of the monomer in the photosensitive material that reacts by the baking treatment is preferably 60 to 100%. When the monomer reaction rate is 60 to 100%, the generation of a gap between the photosensitive resin layer and the substrate is effectively prevented, and the occurrence of pinholes during the formation of the ITO film on the color filter is further improved. It can be suppressed efficiently. The range of the monomer reaction rate by the post-exposure is preferably 70 to 100%, particularly preferably 80 to 100%, from the viewpoints of preventing gaps and preventing pinholes.

The monomer reaction rate after the baking treatment can be controlled by the baking temperature and time.
As said baking temperature, 120-270 degreeC is preferable, 180-250 degreeC is more preferable, 200-250 degreeC is especially preferable. When the baking temperature is 120 to 270 ° C., it is easy to control the monomer reaction rate within the above range in relation to the baking time, and it is possible to prevent the occurrence of a gap between the photosensitive resin layer and the substrate, Generation of pinholes when forming the ITO film on the color filter can be more efficiently suppressed.

  Moreover, it is preferable to adjust baking time suitably with the said temperature, However, 20-120 minutes are preferable, 30-80 minutes are more preferable, 40-60 minutes are especially preferable. When the baking time is 20 to 120 minutes, it is easy to control the monomer reaction rate within the above range in relation to the baking temperature, and because it can be processed at a low temperature, the load on the production facility can be reduced, and the photosensitivity can be achieved. Generation | occurrence | production of the clearance gap between a resin layer and a base material can be prevented, and generation | occurrence | production of the pinhole at the time of ITO film | membrane formation on a color filter can be suppressed more efficiently.

  Here, examples of the apparatus used for the baking treatment include an electric furnace, a dryer, a hot plate, and an infrared lamp.

  In addition, the measuring method of a monomer reaction rate can be performed like the measuring method of the monomer reaction rate after the said post-exposure except having produced the sample from the photosensitive resin layer after baking.

<Display device member>
The display device member of the present invention is a member provided in the display device, and is manufactured by the display device member manufacturing method of the present invention. Specifically, it is made of a photosensitive material provided on a support (for example, a glass substrate), and is preferably composed of a pattern formed of the photosensitive material.
For example, a color filter (including those having a partition) including a color image of a single color or a plurality of colors, a partition (for example, a black matrix), a spacer, a liquid crystal alignment control protrusion, and the like can be given. Among these, a color filter is preferable in that the effect of the present invention appears more remarkably.

-Photosensitive material-
Hereinafter, the photosensitive material will be described in detail. As the photosensitive material, a material having a property of being cured in response to light can be used, and includes a component for forming a display device member such as a color filter, a partition wall, a spacer, and a liquid crystal alignment control protrusion.
For example, the components constituting the photosensitive layer described in paragraph numbers [0050] to [0108] of JP-A-2006-18222 can be used. When forming a light shielding part such as a black matrix, a component constituting the photosensitive black resin layer of JP-A-2005-3861 or a coloring composition of JP-A-2004-240039 can be used. Further, when forming colored pixels such as RGB, it can be formed in the same manner as a layer made of a colored photosensitive material described in JP-A-2006-23696.
In the case of forming the black matrix and RGB colored pixels by the ink jet method, the curable coloring composition disclosed in JP-A-2004-339368 can be used. When forming a spacer or the like, it can be formed in the same manner as the photosensitive resin layer of JP-A-2006-64921. When forming a liquid crystal alignment control projection or the like, the photosensitive of JP-A-2006-64765 is used. It can be formed in the same manner as the conductive resin layer.

Specifically, the photosensitive material can be configured using a monomer or oligomer, a photopolymerization initiator or photopolymerization initiator system, a colorant, a binder, and the like.
In addition, the photosensitive material can form a photosensitive resin layer by performing droplet ejection or coating on a substrate. The components that can constitute the photosensitive material will be described below.

(i) Monomer or Oligomer The monomer or oligomer is preferably a monomer or oligomer that has two or more ethylenically unsaturated double bonds and undergoes addition polymerization upon irradiation with light. Examples of such monomers and oligomers include compounds having at least one addition-polymerizable ethylenically unsaturated group in the molecule and having a boiling point of 100 ° C. or higher at normal pressure.

  Examples include monofunctional acrylates and monofunctional methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) ) Acrylate, trimethylolethane triacrylate, trimethylolpropane tri (meth) acrylate, trimethylolpropane diacrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, di Pentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, hexane All di (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin tri (meth) acrylate; multifunctional such as trimethylolpropane and glycerin Polyfunctional acrylates and polyfunctional methacrylates such as those obtained by adding ethylene oxide or propylene oxide to alcohol and then (meth) acrylated can be mentioned.

Further, urethane acrylates described in JP-B-48-41708, JP-B-50-6034 and JP-A-51-37193; JP-A-48-64183, JP-B-49-43191 And polyester acrylates described in Japanese Patent Publication No. 52-30490; polyfunctional acrylates and methacrylates such as epoxy acrylates which are reaction products of epoxy resin and (meth) acrylic acid.
Among these, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and dipentaerythritol penta (meth) acrylate are preferable.

In addition, “polymerizable compound B” described in JP-A-11-133600 can also be mentioned as a preferable example.
These monomers or oligomers may be used alone or in admixture of two or more. The content of the photosensitive material with respect to the total solid content is generally 5 to 50% by mass, and 10 to 40% by mass. preferable.

(ii) Photopolymerization initiator or photopolymerization initiator system Examples of the photopolymerization initiator or photopolymerization initiator system include vicinal polyketaldonyl compounds disclosed in U.S. Pat. No. 2,367,660, U.S. Pat. No. 2,448,828. The acyloin ether compounds described in U.S. Pat. No. 2,722,512 and the aromatic acyloin compounds substituted with α-hydrocarbons described in U.S. Pat. No. 2,722,512, U.S. Pat. Nos. 3,046,127 and 2,951,758. A polynuclear quinone compound described in US Pat. No. 3,549,367, a combination of a triarylimidazole dimer and a p-aminoketone, a benzothiazole compound described in Japanese Patent Publication No. 51-48516, and a trihalomethyl-s-triazine Compound, trihalomethyl described in US Pat. No. 4,239,850 Triazine compound include a trihalomethyl oxadiazole compounds described in U.S. Pat. No. 4,212,976. In particular, trihalomethyl-s-triazine, trihalomethyloxadiazole, and triarylimidazole dimer are preferable.
In addition, “polymerization initiator C” described in JP-A-11-133600 can also be mentioned as a preferable example.

These photopolymerization initiators or photopolymerization initiator systems may be used singly or as a mixture of two or more, but it is particularly preferable to use two or more. When at least two kinds of photopolymerization initiators are used, display characteristics, particularly display unevenness, can be reduced.
The content of the photopolymerization initiator or the photopolymerization initiator system with respect to the total solid content of the photosensitive material is generally 0.5 to 20% by mass, and preferably 1 to 15% by mass.

(iii) Colorant The colorant is not particularly limited, and a conventionally known colorant can be appropriately used. From the viewpoint of obtaining a good color hue, (i) R (red) In the photosensitive material, C.I. I. Pigment Red (C.I.P.R.) 254 and C.I. I. Pigment Red (CIPR) 177 is used in combination, and (ii) G (green) photosensitive material is C.I. I. Pigment Green (C.I.P.G.) 36 and C.I. I. CI (pigment yellow) 150 is used in combination, and (iii) B (blue) photosensitive material is C.I. I. Pigment Blue (C.I.P.B.) 15: 6 and C.I. I. Pigment Violet (CIPV) 23 is preferably used in combination.

Moreover, a well-known colorant can be added as needed other than the said colorant. In the case of using a pigment among the known colorants, it is desirable that the pigment is uniformly dispersed in the photosensitive material. Therefore, the particle diameter is preferably 0.1 μm or less, particularly 0.08 μm or less.
Specific examples of the known colorant include color materials described in JP-A-2005-17716 [0038] to [0040] and JP-A-2005-361447 [0068] to [0072]. And pigments described in JP-A-2005-17521 [0080] to [0088] can be preferably used.

These pigments are preferably used as a dispersion. This dispersion can be prepared by adding and dispersing a composition obtained by previously mixing the pigment and the pigment dispersant in an organic solvent (or vehicle) described later. The vehicle refers to a portion of the medium in which the pigment is dispersed when the paint is in a liquid state, and is a liquid portion that binds to the pigment and hardens the coating film (binder), which is dissolved and diluted. Component (organic solvent). The disperser used when dispersing the pigment is not particularly limited, and examples thereof include known dispersers such as a kneader, roll mill, atrider, super mill, dissolver, homomixer, and sand mill.
The colorant (pigment) used in the present invention preferably has a particle diameter of 0.1 μm or less, particularly 0.08 μm or less.

(iv) Binder (resin / polymer)
As the binder, a polymer having a polar group such as a carboxylic acid group or a carboxylic acid group in the side chain is preferable. Examples thereof include JP-A-59-44615, JP-B-54-34327, JP-B-58-12577, JP-B-54-25957, JP-A-59-53836, and JP-A-57-36. A methacrylic acid copolymer, an acrylic acid copolymer, an itaconic acid copolymer, a crotonic acid copolymer, a maleic acid copolymer, a partially esterified maleic acid copolymer as described in JP-A-59-71048 Etc.

  Moreover, the cellulose derivative which has a carboxylic acid group in a side chain can also be mentioned, In addition to this, what added the cyclic acid anhydride to the polymer which has a hydroxyl group can also be used preferably. Particularly preferred examples include copolymers of benzyl (meth) acrylate and (meth) acrylic acid described in US Pat. No. 4,139,391, and benzyl (meth) acrylate, (meth) acrylic acid and other monomers. Mention may be made of multi-component copolymers. The binder polymer having these polar groups may be used alone, or may be used in the state of a composition used in combination with a normal film-forming polymer. The content of the photosensitive material relative to the total solid content is 20-50 mass% is common and 25-45 mass% is preferable.

(v) Solvent In the photosensitive material, an organic solvent may be used in addition to the above components. Examples of the organic solvent include methyl ethyl ketone, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, cyclohexanone, cyclohexanol, methyl isobutyl ketone, ethyl lactate, methyl lactate, caprolactam and the like.

(vi) Surfactant In the color filter of the present invention, an appropriate interface in the photosensitive material can be controlled from a viewpoint that it can be controlled to a uniform film thickness and effectively prevent coating unevenness (color unevenness due to film thickness fluctuation). It is preferable to contain an activator.
Preferred examples of the surfactant include surfactants disclosed in JP-A Nos. 2003-337424 and 11-133600.

(vii) Ultraviolet absorber The photosensitive material may contain an ultraviolet absorber as necessary. Examples of the ultraviolet absorber include salicylate series, benzophenone series, benzotriazole series, cyanoacrylate series, nickel chelate series, hindered amine series and the like in addition to the compounds described in JP-A-5-72724.
Specifically, phenyl salicylate, 4-t-butylphenyl salicylate, 2,4-di-t-butylphenyl-3 ′, 5′-di-t-4′-hydroxybenzoate, 4-t-butylphenyl salicylate 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-n-octoxybenzophenone, 2- (2′-hydroxy-5′-methylphenyl) benzotriazole, 2- (2 '-Hydroxy-3'-t-butyl-5'-methylphenyl) -5-chlorobenzotriazole, ethyl-2-cyano-3,3-di-phenyl acrylate, 2,2'-hydroxy-4-methoxybenzophenone , Nickel dibutyldithiocarbamate, bis (2,2,6,6-tetramethyl-4-pyridine) -Sebake 4-t-butylphenyl salicylate, phenyl salicylate, 4-hydroxy-2,2,6,6-tetramethylpiperidine condensate, succinic acid-bis (2,2,6,6-tetramethyl-4- Piperidenyl) -ester, 2- [2-hydroxy-3,5-bis (α, α-dimethylbenzyl) phenyl] -2H-benzotriazole, 7-{[4-chloro-6- (diethylamino) -5-triazine -2-yl] amino} -3-phenylcoumarin and the like.
In addition, 0.5-15 mass% is common as content of the ultraviolet absorber with respect to the total solid of a photosensitive material, 1-12 mass% is preferable, and 1.2-10 mass% is especially preferable.

(viii) Thermal polymerization inhibitor The photosensitive material preferably contains a thermal polymerization inhibitor. Examples of the thermal polymerization inhibitor include hydroquinone, hydroquinone monomethyl ether, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl). -6-t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), 2-mercaptobenzimidazole, phenothiazine and the like.
The content of the thermal polymerization inhibitor with respect to the total solid content of the photosensitive material is generally from 0.01 to 1% by mass, preferably from 0.02 to 0.7% by mass, and from 0.05 to 0.00%. 5% by mass is particularly preferred.
In the photosensitive material, in addition to the above additives, “adhesion aid” described in JP-A-11-133600, other additives, and the like can be contained.

(ix) Metal Particles The photosensitive material used for forming the black matrix of the present invention can contain metal particles as an additive. The metal particles may be used in combination of two or more metals, may be a metal compound, or may be a composite particle of a metal compound and a metal. Examples of the metal particles in the present invention include core-shell fine particles described in paragraph numbers [0024] to [0027] of JP-A-2006-18201, and paragraph numbers [0018] to [0024] of JP-A-2005-017322. ] The metal particle etc. whose aspect-ratio described in 2 or more are mentioned as a preferable thing. Further, the metal particles may be used alone, as an alloy, or used together with a pigment such as carbon black.

-Oxygen barrier film-
In the method for producing a member for a display device according to the present invention, the exposure is performed in an oxygen-poor atmosphere to increase the exposure sensitivity, and thus on the photosensitive material (the photosensitive resin layer when provided on the substrate). It is preferable to provide an oxygen barrier film. Under the oxygen-poor atmosphere, as described in paragraphs [0048] to [0053] of JP-A No. 2006-154804, it is under an inert gas, under a reduced pressure, and under a protective layer capable of blocking oxygen. The details are as follows.

The inert gas refers to a general gas such as N ₂ , H ₂ or CO ₂ or a rare gas such as He, Ne or Ar. Among these, N ₂ is preferably used because of safety, availability, and cost.

  Under reduced pressure refers to a state of 500 hPa or less, preferably 100 hPa or less.

  Examples of the protective layer capable of blocking oxygen include, for example, polyvinyl ether / maleic anhydride polymer, water-soluble salt of carboxyalkyl cellulose described in JP-A Nos. 46-2121 and 56-40824. Water-soluble cellulose ethers, water-soluble salts of carboxyalkyl starch, polyvinyl alcohol, polyvinylpyrrolidone, various polyacrylamides, various water-soluble polyamides, water-soluble salts of polyacrylic acid, gelatin, ethylene oxide polymers, various starches And a group of water-soluble salts thereof, styrene / maleic acid copolymers, maleate resins, and combinations of two or more thereof. Among these, a combination of polyvinyl alcohol and polyvinyl pyrrolidone is particularly preferable. The polyvinyl alcohol preferably has a saponification rate of 80% or more, and the content of polyvinyl pyrrolidone is preferably 1 to 75% by mass, more preferably 1 to 50% by mass, and still more preferably alkali-soluble resin layer solids. It is 10-40 mass%.

The oxygen permeability coefficient of the protective layer capable of blocking oxygen produced in this way is preferably 2000 cm ³ / (m ² · day · atm) or less, but 100 cm ³ / (m ² · day · atm) or less. Is more preferably 50 cm ³ / (m ² · day · atm) or less.
When the oxygen permeability is higher than 2000 cm ³ / (m ² · day · atm), oxygen cannot be blocked efficiently, and it may be difficult to make the separation wall into the shape described later.

<Display device>
Examples of the display device include display devices such as a liquid crystal display device, a plasma display display device, an EL display device, and a CRT display device. For the definition of display devices and explanation of each display device, refer to “Electronic Display Devices (Akio Sasaki, published by Industrial Research Institute 1990)”, “Display Devices (Junaki Ibuki, Industrial Books Co., Ltd.) Issue)).
Of the display devices provided with the color filter of the present invention, a liquid crystal display device is particularly preferable. The liquid crystal display device is described in, for example, “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by Kogyo Kenkyukai 1994)”. The liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to various types of liquid crystal display devices described in, for example, the “next generation liquid crystal display technology”. Among these, the present invention is particularly effective for a color TFT liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Further, the present invention can be applied to a liquid crystal display device with a wide viewing angle such as a lateral electric field driving method such as IPS and a pixel division method such as MVA. These methods are described, for example, on page 43 of "EL, PDP, LCD display-latest technology and market trends-(issued in 2001 by Toray Research Center Research Division)".

  In addition to the color filter, the liquid crystal display device includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle compensation film. The color filter of the present invention can be applied to a liquid crystal display device composed of these known members. For example, “'94 Liquid Crystal Display Peripheral Materials and Chemicals Market (Kentaro Shima, CMC Co., Ltd., 1994)”, “2003 Liquid Crystal Related Market Status and Future Prospects (Volume 2)” (Table Yoshiyoshi) Fuji Chimera Research Institute, published in 2003) ”.

  In addition, as a target use, it can apply without a restriction | limiting in particular to uses, such as portable terminals, such as a television, a personal computer, a liquid crystal projector, a game machine, a mobile phone, a digital camera, and a car navigation system.

  The present invention will be described more specifically with reference to the following examples. The materials, reagents, ratios, equipment, operations, and the like shown in the following examples can be appropriately changed without departing from the scope of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. In the following examples, “%” and “parts” represent “mass%” and “parts by mass” unless otherwise specified, and the molecular weight indicates the weight average molecular weight.

(Example 1)
[Preparation of photosensitive material for forming black matrix]
First, K pigment dispersion 1 and propylene glycol monomethyl ether acetate in the amounts shown in Table 1 were weighed out, mixed at a temperature of 24 ° C. (± 2 ° C.), stirred at 150 rpm for 10 minutes, and then stirred as described in Table 1. Methyl ethyl ketone, binder 1, hydroquinone monomethyl ether, DPHA solution, 2,4-bis (trichloromethyl) -6- [4 '-(N, N-bisdiethoxycarbonylmethyl) amino-3'-bromophenyl] -S-triazine and surfactant 1 are weighed out, added in this order at a temperature of 25 ° C. (± 2 ° C.), and stirred at 150 rpm for 30 minutes at a temperature of 40 ° C. (± 2 ° C.). Obtained.

<K pigment dispersion 1>,
・ Carbon black (Nippex 35 manufactured by Degussa) 13.1%
・ Dispersant (Compound 1 below) 0.65%
・ Polymer 6.72%
(Random copolymer of benzyl methacrylate / methacrylic acid = 72/28 molar ratio,
(Molecular weight 37,000)
Propylene glycol monomethyl ether acetate 79.53%

<Binder 1>
・ Polymer 27%
(Random copolymer of benzyl methacrylate / methacrylic acid = 78/22 molar ratio,
(Molecular weight 38,000)
・ Propylene glycol monomethyl ether acetate 73%

<DPHA solution>
・ Dipentaerythritol hexaacrylate 76%
(Containing polymerization inhibitor MEHQ 500ppm, Nippon Kayaku Co., Ltd.,
(Product name: KAYARAD DPHA) Propylene glycol monomethyl ether acetate 24%

<Surfactant 1>
・ The following structure 1 30%
・ Methyl ethyl ketone 70%

[Formation of black matrix]
(1) Coating process The alkali-free glass substrate was cleaned with a UV cleaning apparatus, then brush-cleaned with a cleaning agent, and further ultrasonically cleaned with ultrapure water. The substrate was heat-treated at 120 ° C. for 3 minutes to stabilize the surface state.
Photosensitivity prepared as described above with a glass substrate coater (manufactured by FS Asia Co., Ltd., trade name: MH-1600) having a slit-like nozzle after cooling the substrate and adjusting the temperature to 23 ° C. Material K1 was applied. Subsequently, a part of the solvent was dried with a VCD (vacuum drying apparatus, manufactured by Tokyo Ohka Kogyo Co., Ltd.) for 30 seconds to eliminate the fluidity of the coating layer, and then pre-baked at 120 ° C. for 3 minutes to give a film thickness of 1.7 μm. A resin layer K1 was obtained.

(2) Exposure process With a proximity type exposure machine (manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd.) having an ultra-high pressure mercury lamp, a substrate on which the photosensitive resin layer K1 is formed and a mask (quartz exposure mask having an image pattern) In a state of being set up vertically, the distance between the exposure mask surface and the photosensitive resin layer K1 was set to 200 μm, and pattern exposure was performed in a nitrogen atmosphere with an exposure amount of 300 mJ / cm ² and a black matrix width of 20 μm and a space width of 100 μm.

(3) Development Step Next, after spraying pure water with a shower nozzle to uniformly wet the surface of the photosensitive resin layer K1, a KOH developer (containing a nonionic surfactant, trade name: CDK-) 1, Fujifilm Electronics Materials Co., Ltd. 100-fold diluted) was subjected to shower development at 23 ° C. for 80 seconds and a flat nozzle pressure of 0.04 MPa to obtain a patterning image. Subsequently, ultrapure water was sprayed at a pressure of 9.8 MPa with an ultrahigh pressure washing nozzle to remove residues.

(4) Post-exposure step Further, post-exposure was performed in the air with the light source (lamp), illuminance, and exposure amount shown in Table 3. For the post-exposure, a metal halide lamp “eye multibeam” manufactured by Eye Graphics Co., Ltd. was used as a metal halide lamp.

(5) Baking process Subsequently, it heated at 220 degreeC for 10 minute (s) with the board | substrate preheating apparatus. A striped black matrix having an opening with a thickness of 1.5 μm, an optical density of 3.4, and a width of 100 μm was obtained.

[Production of RGB pixels]
-Preparation of photosensitive material-
Photosensitive materials R1, G1, and B1 having the compositions shown in Table 2 below were prepared.

(1) Application Step-Formation of Red (R) Pixel-
The film thickness is 1 using a glass substrate coater MH-1600 (manufactured by FAS Asia) provided with a slit nozzle on the BM forming surface side of the glass substrate on which the black matrix (BM) is formed. The photosensitive material R1 obtained as described above was applied so as to have a thickness of 2 μm, and dried at 100 ° C. for 5 minutes to form a photosensitive resin layer R1.

(2) Exposure process
Subsequently, using a proximity type exposure machine (manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd.) equipped with an ultra high pressure mercury lamp, the mask (quartz exposure mask having an image pattern) and the substrate on which the BM and the photosensitive resin layer R1 are formed are vertically aligned. Then, the entire surface was exposed at an exposure amount of 300 mJ / cm ² with the distance between the mask surface and the photosensitive resin layer R1 being 200 μm.

(3) Development Step Next, the photosensitive resin layer R1 after the exposure is obtained by diluting the development processing solution T-CD1 (manufactured by Fuji Photo Film Co., Ltd .; alkaline developer) five times (pH in use is 10.2). ) Was used for development processing (33 ° C., 20 seconds; development step), and R pixels were formed on the glass substrate on which the black matrix (BM) was formed.

(4) Post-exposure process Subsequently, post-exposure was performed in the atmosphere with the illuminance and exposure amount shown in Table 3 in the same manner as the formation of the black matrix.

(5) Baking Step Next, the glass substrate on which the R pixel was formed was heated at 220 ° C. for 10 minutes by a substrate preheating device.

-Formation of green (G) pixels-
The same steps (1) to (5) as the formation of the R pixel described above are performed using the photosensitive material G1 obtained above on the surface of the glass substrate on which the black matrix and the R pixel are formed, such as the BM. In line, a heat-treated G pixel was formed.

-Formation of blue (B) pixels-
Using the photosensitive material B1 obtained as described above on the surface of the glass substrate on which the black matrix, R pixel, and G pixel are formed, the same steps (1) to ( 5) was performed to form a heat-treated B pixel.

(6) Final baking Next, the glass substrate on which the black matrix, R pixel, G pixel, and B pixel were formed was heated at 240 ° C. for the time shown in Table 3.
As described above, a color filter (hereinafter also referred to as “color filter substrate”) was produced.

In addition, the detail of each composition in photosensitive material R1 of the said Table 2 is as follows.
* Composition of R Pigment Dispersion 1 I. Pigment Red 254: 8.0 parts (Brand name: Irgaphor Red B-CF,
Ciba Specialty Chemicals Co., Ltd.)
Dispersant (Compound 1) 0.8 parts Polymer 8 parts (benzyl methacrylate / methacrylic acid (= 72/28 [molar ratio])
Random copolymer, molecular weight: 30,000)
・ Propylene glycol monomethyl ether acetate: 83 parts

* Composition of R pigment dispersion 2 C.I. I. Pigment Red 177 ... 18 parts (Brand name: Chromophthal Red A2B,
Ciba Specialty Chemicals Co., Ltd.)
Polymer: 12 parts (benzyl methacrylate / methacrylic acid (= 72/28 [molar ratio])
Random copolymer, weight average molecular weight 37,000))
・ Propylene glycol monomethyl ether acetate: 70 parts

* Binder 2 composition / polymer: 27 parts (benzyl methacrylate / methacrylic acid / methyl methacrylate (= 38/25/37 [molar ratio]) random copolymer, molecular weight: 40,000)
・ Propylene glycol monomethyl ether acetate: 73 parts

* DPHA solution and surfactant 1 are the same as those used for photosensitive material K1.

The details of each composition in the photosensitive material G1 shown in Table 2 are as follows.
* G pigment dispersion 1
Product name: GT-2 (Fuji Film Electronics Materials Co., Ltd.)
* Y pigment dispersion 1
Product name: CF Yellow EX3393 (manufactured by Gokoku Color Co., Ltd.)
* Binder 1, DPHA liquid and surfactant 1 are the same as those used for photosensitive material K1.

The details of each composition in the photosensitive material B1 shown in Table 2 are as follows.
* B Pigment dispersion 1
Product name: CF Blue EX3357 (Mikuni Dye Co., Ltd.)
* B Pigment dispersion 2
Product name: CF Blue EX3383 (manufactured by Gokoku Color Co., Ltd.)

* Composition of binder 3-Random copolymer of polymer (benzyl methacrylate / methacrylic acid / methyl methacrylate (= 36/22/42 [molar ratio]), weight average molecular weight 38)
... 27 parts ・ Propylene glycol monomethyl ether acetate 73 parts

* DPHA solution and surfactant 1 are the same as those used for photosensitive material K1.

  A transparent electrode of ITO (Indium Tin Oxide) having a thickness of about 2000 angstroms is further formed on the R pixel, G pixel, B pixel and black matrix of the color filter substrate obtained as described above, and an argon gas of 0.5 Pa. It was formed by sputtering at 100 ° C. for 5 minutes in a mixed oxygen gas atmosphere.

[Formation of photo spacer]
Photo spacers were produced by the same steps (1) to (5) as described above except that the photosensitive material K1 was changed to a photo spacer forming resin composition having the following composition. The dry layer thickness of the photosensitive material for the photospacer was 2.5 μm.
The obtained spacer pattern was formed on the ITO film formed on the laminated portion of the black matrix and the red (R) pixel, and had a diameter of 16 μm and an average height of 2.0 μm.

-Composition of resin composition for forming photo spacer-
1-methoxy-2-propyl acetate 452 parts methyl ethyl ketone 327 parts methanol 0.035 parts binder 4 101 parts (methacrylic acid / allyl methacrylate copolymer (= 20/80 [molar ratio], weight average molecular weight 36000; Polymeric substances))
99 parts of the DPHA solution 2.5 parts of 2,4-bis (trichloromethyl) -6- [4 ′-(N, N-bisethoxycarbonylmethyl) amino-3′-bromophenyl] -s-triazine Hydroquinone monomethyl ether 0.039 parts ・ Surfactant 1 0.86 parts ・ Decolorizer 17 parts (trade name: Victoria Pure Blue BOH-M, manufactured by Hodogaya Chemical Co., Ltd.)

[Production of liquid crystal display devices]
Separately, a glass substrate was prepared as a counter substrate, and the PVA mode was patterned on the transparent electrode and the counter substrate of the color filter substrate obtained above, and an alignment film made of polyimide was further provided thereon.
After that, a UV curable resin sealant is applied by a dispenser method at a position corresponding to the outer periphery of the black matrix provided around the pixel group of the color filter, and a liquid crystal for PVA mode is dropped and attached to the counter substrate. After bonding, the bonded substrate was irradiated with UV, and then heat-treated to cure the sealant. Polarizing plates HLC2-2518 manufactured by Sanlitz Co., Ltd. were attached to both surfaces of the liquid crystal cell thus obtained. Next, FR1112H (chip type LED manufactured by Stanley Electric Co., Ltd.) as a red (R) LED, DG1112H (chip type LED manufactured by Stanley Electric Co., Ltd.) as a green (G) LED, and DB1112H (as a blue (B) LED. A side-light type backlight was constructed using a chip-type LED manufactured by Stanley Electric Co., Ltd. and placed on the back side of the liquid crystal cell provided with the polarizing plate to obtain a liquid crystal display device.

The post-exposure illuminance was set by measuring the illuminance with an illuminometer (the following measuring device). Further, the post-exposure amount (exposure energy) was adjusted by selecting the exposure time after setting the exposure illuminance as described above.
The exposure illuminance and exposure dose (exposure energy) were measured using “UIT150” manufactured by USHIO INC. As a measuring device and setting the measurement wavelength to 365 nm.

(Examples 2 to 16)
In Example 1, except that the conditions of (4) the post-exposure process, (5) the baking process, and (6) the final baking process were changed to the conditions shown in Table 3, a color filter, A liquid crystal display device was produced.

(Comparative Example 1)
In Example 1, a color filter and a liquid crystal display device were produced in the same manner as in Example 1 except that the post-exposure method was changed to a method using high-pressure mercury.
The high-pressure mercury used was an ultra-high pressure mercury lamp manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd.

[Evaluation methods]
The color filter and liquid crystal display device obtained above were evaluated as follows.
<Measurement of monomer reaction rate>
First, regarding the monomer reaction rate after post-exposure for each of the black matrix, R, G, and B colored pixels, a thin layer was cut out from the photosensitive resin layer 24 hours after post-exposure as a measurement sample, and the photosensitive resin layer A tablet (having a height of 500 μm and a diameter of 2 mm) mixed with KBr so as to be 50 times the weight was prepared. Next, by measuring the absorbance ratio at wavelengths of 810 cm ⁻¹ and 700 cm ⁻¹ with an FT-IR measurement device (FTS-7000 / manufactured by Varian Technologies Japan), the residual ratio of acrylate is obtained. The monomer reaction rate was calculated. The residual rate before pattern exposure was set to 100, and the reaction rate was calculated from the residual rate after each step.
Further, the monomer reaction rate after the final baking was calculated in the same manner except that (6) a sample was prepared from the photosensitive resin layer 24 hours after the final baking.

<Gap with glass substrate>
From a side opposite to the color filter forming surface of the color filter substrate, 50 spots were randomly observed in 100 cm ^{2 with a} microscope, and evaluated according to the following evaluation criteria. The results are shown in Table 4.
The evaluation was performed on a color filter substrate (before ITO and spacer formation) provided with a black matrix, R, G, and B pixels formed directly on a glass substrate.
(Evaluation criteria)
○: No voids were observed.
(Triangle | delta): The space | gap was recognized by 1-2 places.
Δ ×: Voids were observed at 3 to 4 places.
X: Voids were observed at 5 or more locations.

<Pin hole when ITO is applied>
The ITO formation surface of the color filter substrate on which ITO was formed was observed with a microscope at 100 cm ² and evaluated according to the following evaluation criteria. The results are shown in Table 4.
The evaluation was performed on the color filter substrate after ITO formation (before spacer formation).
(Evaluation criteria)
○: No pinhole was observed.
Δ: Pinhole was observed in part.
X: Pinholes were observed on the entire surface.

<Display unevenness>
For each of the liquid crystal display devices, the gray display when a gray test signal was input was visually observed, and the presence or absence of display unevenness was evaluated according to the following evaluation criteria.
(Evaluation criteria)
○: Display unevenness was not recognized at all.
Δ: Display unevenness was slightly recognized.
X: Display unevenness was recognized remarkably.

As shown in Table 4, Examples 1 to 16 were able to prevent voids with glass and pinholes when ITO was applied, but Comparative Example 1 could not obtain such an effect.
Among the examples, those having a post-exposure illuminance in the range of 50 to 500 mW / cm ² effectively suppresses the gap between the glass and the pinhole when ITO is applied (see Examples 2 and 5). . In addition, as can be seen from Example 6 and Example 9, the exposure energy (exposure amount) of the post-exposure is in the range of 500 to 5000 mJ / cm ² on both sides, as well as the gap between the glass and the ITO applied. Pinholes are effectively suppressed. In addition, as can be seen from Examples 14 to 16, the longer the baking time of the final baking, the better the monomer reaction rate after the final baking, and pinholes at the time of applying ITO are prevented.
Moreover, the display unevenness was not recognized at all in the liquid crystal display devices manufactured in Examples 1 to 16, and the display unevenness was recognized remarkably in Comparative Example 1.

Claims (6)

  A member for a display device, comprising: a step of providing a photosensitive material containing at least a photosensitive resin on a substrate in a liquid state; and a step of performing post-exposure on the photosensitive material on the substrate using a metal halide lamp. Manufacturing method. An image is formed by the step of providing the photosensitive material on a substrate, and the post-exposure is 500 to 5000 mJ / cm ^{2 for} each image formed by the step of providing the photosensitive material on the substrate. The manufacturing method of the member for display apparatuses of Claim 1 performed by the exposure energy of. An image is formed by the step of providing the photosensitive material on a substrate, and the post-exposure is performed at an exposure illuminance of 50 to 500 mW / cm ² for each image formed by the step of providing the photosensitive material on the substrate. The manufacturing method of the member for display apparatuses of Claim 1 or 2 performed by.   For each of the images, the post-exposure is performed such that the monomer reaction rate in the image is 5 to 40%, and the post-exposure image is further baked, and all desired images are baked. The manufacturing method of the member for display apparatuses of Claim 2 or 3 which makes the monomer reaction rate after having performed 60% or more.   The member for display apparatuses manufactured by the manufacturing method of the member for display apparatuses of any one of Claims 1-4.   The color filter manufactured by the manufacturing method of the member for display apparatuses of any one of Claims 1-4.