JP2008047780A5 - - Google Patents

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Publication number
JP2008047780A5
JP2008047780A5 JP2006223534A JP2006223534A JP2008047780A5 JP 2008047780 A5 JP2008047780 A5 JP 2008047780A5 JP 2006223534 A JP2006223534 A JP 2006223534A JP 2006223534 A JP2006223534 A JP 2006223534A JP 2008047780 A5 JP2008047780 A5 JP 2008047780A5
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JP
Japan
Prior art keywords
insulating film
interlayer insulating
thin film
film transistor
microlens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006223534A
Other languages
English (en)
Japanese (ja)
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JP2008047780A (ja
JP4969177B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2006223534A priority Critical patent/JP4969177B2/ja
Priority claimed from JP2006223534A external-priority patent/JP4969177B2/ja
Publication of JP2008047780A publication Critical patent/JP2008047780A/ja
Publication of JP2008047780A5 publication Critical patent/JP2008047780A5/ja
Application granted granted Critical
Publication of JP4969177B2 publication Critical patent/JP4969177B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006223534A 2006-08-18 2006-08-18 半導体装置の作製方法 Expired - Fee Related JP4969177B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006223534A JP4969177B2 (ja) 2006-08-18 2006-08-18 半導体装置の作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006223534A JP4969177B2 (ja) 2006-08-18 2006-08-18 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2008047780A JP2008047780A (ja) 2008-02-28
JP2008047780A5 true JP2008047780A5 (https=) 2009-09-17
JP4969177B2 JP4969177B2 (ja) 2012-07-04

Family

ID=39181202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006223534A Expired - Fee Related JP4969177B2 (ja) 2006-08-18 2006-08-18 半導体装置の作製方法

Country Status (1)

Country Link
JP (1) JP4969177B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118042890B (zh) * 2024-01-17 2024-10-11 惠科股份有限公司 显示面板、显示面板的制备方法以及显示装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2755223B2 (ja) * 1995-09-20 1998-05-20 日本電気株式会社 バイアホール形成方法および装置
JP4932173B2 (ja) * 2004-03-25 2012-05-16 株式会社半導体エネルギー研究所 膜パターンの形成方法
US7579224B2 (en) * 2005-01-21 2009-08-25 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a thin film semiconductor device

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