JP4969177B2 - 半導体装置の作製方法 - Google Patents
半導体装置の作製方法 Download PDFInfo
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- JP4969177B2 JP4969177B2 JP2006223534A JP2006223534A JP4969177B2 JP 4969177 B2 JP4969177 B2 JP 4969177B2 JP 2006223534 A JP2006223534 A JP 2006223534A JP 2006223534 A JP2006223534 A JP 2006223534A JP 4969177 B2 JP4969177 B2 JP 4969177B2
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- Prior art keywords
- insulating film
- light
- film
- substrate
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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Images
Landscapes
- Liquid Crystal (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Thin Film Transistor (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006223534A JP4969177B2 (ja) | 2006-08-18 | 2006-08-18 | 半導体装置の作製方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006223534A JP4969177B2 (ja) | 2006-08-18 | 2006-08-18 | 半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008047780A JP2008047780A (ja) | 2008-02-28 |
| JP2008047780A5 JP2008047780A5 (https=) | 2009-09-17 |
| JP4969177B2 true JP4969177B2 (ja) | 2012-07-04 |
Family
ID=39181202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006223534A Expired - Fee Related JP4969177B2 (ja) | 2006-08-18 | 2006-08-18 | 半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4969177B2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118042890B (zh) * | 2024-01-17 | 2024-10-11 | 惠科股份有限公司 | 显示面板、显示面板的制备方法以及显示装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2755223B2 (ja) * | 1995-09-20 | 1998-05-20 | 日本電気株式会社 | バイアホール形成方法および装置 |
| JP4932173B2 (ja) * | 2004-03-25 | 2012-05-16 | 株式会社半導体エネルギー研究所 | 膜パターンの形成方法 |
| US7579224B2 (en) * | 2005-01-21 | 2009-08-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing a thin film semiconductor device |
-
2006
- 2006-08-18 JP JP2006223534A patent/JP4969177B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008047780A (ja) | 2008-02-28 |
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