JP2008010849A5 - - Google Patents
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- Publication number
- JP2008010849A5 JP2008010849A5 JP2007141450A JP2007141450A JP2008010849A5 JP 2008010849 A5 JP2008010849 A5 JP 2008010849A5 JP 2007141450 A JP2007141450 A JP 2007141450A JP 2007141450 A JP2007141450 A JP 2007141450A JP 2008010849 A5 JP2008010849 A5 JP 2008010849A5
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- impurity region
- impurity
- film
- semiconductor films
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 claims 36
- 239000012535 impurity Substances 0.000 claims 34
- 239000003990 capacitor Substances 0.000 claims 6
- 238000004519 manufacturing process Methods 0.000 claims 4
- 238000000034 method Methods 0.000 claims 3
- 239000000463 material Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007141450A JP2008010849A (ja) | 2006-06-01 | 2007-05-29 | 半導体装置及び半導体装置の作製方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006153548 | 2006-06-01 | ||
| JP2007141450A JP2008010849A (ja) | 2006-06-01 | 2007-05-29 | 半導体装置及び半導体装置の作製方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008010849A JP2008010849A (ja) | 2008-01-17 |
| JP2008010849A5 true JP2008010849A5 (zh) | 2010-06-17 |
Family
ID=39068726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007141450A Withdrawn JP2008010849A (ja) | 2006-06-01 | 2007-05-29 | 半導体装置及び半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008010849A (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010038584A1 (en) | 2008-09-30 | 2010-04-08 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| JP5349945B2 (ja) | 2008-12-25 | 2013-11-20 | 株式会社半導体エネルギー研究所 | 半導体装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4332244B2 (ja) * | 1998-10-30 | 2009-09-16 | シャープ株式会社 | Ｍｏｓ型容量素子 |
| JP2001007292A (ja) * | 1999-06-24 | 2001-01-12 | Sanyo Electric Co Ltd | 半導体集積回路およびその配置方法 |
| JP4916658B2 (ja) * | 2003-12-19 | 2012-04-18 | 株式会社半導体エネルギー研究所 | 半導体装置 |
-
2007
- 2007-05-29 JP JP2007141450A patent/JP2008010849A/ja not_active Withdrawn
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