JP2008010484A - 半導体光素子及び光送信モジュール - Google Patents
半導体光素子及び光送信モジュール Download PDFInfo
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- JP2008010484A JP2008010484A JP2006176655A JP2006176655A JP2008010484A JP 2008010484 A JP2008010484 A JP 2008010484A JP 2006176655 A JP2006176655 A JP 2006176655A JP 2006176655 A JP2006176655 A JP 2006176655A JP 2008010484 A JP2008010484 A JP 2008010484A
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- H—ELECTRICITY
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- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0265—Intensity modulators
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- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
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- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
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- H01S5/00—Semiconductor lasers
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- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
- H01S5/0287—Facet reflectivity
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- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
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- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
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- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
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- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
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- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2213—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on polyimide or resin
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- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34306—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000nm, e.g. InP based 1300 and 1500nm lasers
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Abstract
【解決手段】レーザ部と変調器部のメサ構造を異なる構造にする。すなわち、レーザ部はメサ周囲が空気であるリッジ導波路構造、変調器部はメサ周囲を有機絶縁物で埋め込んで平坦化したリッジ導波路構造とする。
【選択図】図2
Description
Claims (10)
- 変調器と半導体レーザとが同一半導体基板上に集積された半導体光素子であって、
前記変調器及び前記半導体レーザを形成する光導波路構造はリッジ導波路構造であり、
前記変調器側のリッジ導波路構造の両脇が有機絶縁物で埋め込まれ、
前記半導体レーザ側のリッジ導波路構造の両脇が有機絶縁物で埋め込まれていない半導体光素子。 - 変調器と半導体レーザとが同一半導体基板上に集積された半導体光素子であって、
前記変調器及び前記半導体レーザを形成する光導波路構造はリッジ導波路構造であり、
前記変調器側において、
光導波路の中心軸からみて、電極が配されている方向と垂直な方向に、有機絶縁物が配されており、
前記半導体レーザ側において、
光導波路の中心軸からみて、電極が配されている方向と垂直な方向に、有機絶縁物が配されていない、
ことを特徴とする半導体光素子。 - 前記変調器側において、
前記有機絶縁膜は、光導波路又は光導波路のパッシベーション膜に隣接して配されていることを特徴とする請求項1又は2に記載の半導体光素子。 - 前記有機絶縁物は、ポリイミド樹脂である、請求項1又は2に記載の半導体光素子。
- 前記有機絶縁物は、ベンゾシクロブテン樹脂である、請求項1又は2に記載の半導体光素子。
- 前記変調器は、電界吸収型変調器、またはマッハツェンダー型変調器であることを特徴とする、請求項1〜5のいずれか一項に記載の半導体光素子。
- 前記半導体レーザは、分布帰還型レーザ、または分布反射型レーザであることを特徴とする、請求項1〜5のいずれか一項に記載の半導体光素子。
- 前記変調器、前記半導体レーザの少なくともいずれか一方は、インジウムガリウム砒素燐、または、インジウムガリウムアルミニウム砒素を材料とする多重量子井戸から構成されることを特徴とする請求項1〜7のいずれか一項に記載の半導体光素子。
- 前記変調器は、2.5Gbit/s以上の伝送速度において動作可能であることを特徴とする、請求項1〜8のいずれか一項に記載の半導体光素子。
- 請求項1〜9のいずれか一項に記載の半導体光素子を搭載することを特徴とする光送信モジュール。
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JP2006176655A JP2008010484A (ja) | 2006-06-27 | 2006-06-27 | 半導体光素子及び光送信モジュール |
US11/668,204 US7593445B2 (en) | 2006-06-27 | 2007-01-29 | Semiconductor optical device and optical transmission module |
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JP2006176655A JP2008010484A (ja) | 2006-06-27 | 2006-06-27 | 半導体光素子及び光送信モジュール |
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Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010230978A (ja) * | 2009-03-27 | 2010-10-14 | Fujitsu Ltd | 光半導体装置及びその製造方法 |
JP2012058432A (ja) * | 2010-09-08 | 2012-03-22 | Opnext Japan Inc | 半導体ゲイン領域集積型マッハツェンダ変調器 |
JP2012069800A (ja) * | 2010-09-24 | 2012-04-05 | Furukawa Electric Co Ltd:The | 半導体導波路アレイ素子の製造方法 |
JP2012252290A (ja) * | 2011-06-07 | 2012-12-20 | Japan Oclaro Inc | 光素子、光素子を含む変調器モジュール、光素子を含むレーザ集積変調器モジュール、及び、光素子の製造方法 |
JP2013021139A (ja) * | 2011-07-12 | 2013-01-31 | Nippon Telegr & Teleph Corp <Ntt> | 半導体レーザ |
US8526478B2 (en) | 2010-06-10 | 2013-09-03 | Mitsubishi Electric Corporation | Semiconductor optical integrated element |
JP2013191683A (ja) * | 2012-03-13 | 2013-09-26 | Sumitomo Electric Ind Ltd | 光半導体素子の製造方法 |
CN103656824A (zh) * | 2008-11-27 | 2014-03-26 | 帝人制药株式会社 | 呼吸用面罩的佩戴件以及呼吸用面罩 |
JP2014089403A (ja) * | 2012-10-31 | 2014-05-15 | Sumitomo Electric Ind Ltd | 半導体光素子を作製する方法 |
US8811444B2 (en) | 2012-01-06 | 2014-08-19 | Sumitomo Electric Industries, Ltd. | Semiconductor integrated device and method for producing the same |
US9285613B2 (en) | 2012-06-04 | 2016-03-15 | Sumitomo Electric Industries, Ltd. | Semiconductor Mach-Zehnder modulator and method for manufacturing semiconductor Mach-Zehnder modulators |
JP2016171135A (ja) * | 2015-03-11 | 2016-09-23 | 三菱電機株式会社 | 光半導体装置の製造方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5001760B2 (ja) * | 2007-09-10 | 2012-08-15 | 日本オプネクスト株式会社 | 半導体素子の製造方法 |
JP5265929B2 (ja) * | 2008-01-10 | 2013-08-14 | Nttエレクトロニクス株式会社 | 半導体光変調器及び光変調装置 |
JP5897414B2 (ja) * | 2011-08-23 | 2016-03-30 | 日本オクラロ株式会社 | 光デバイスの製造方法 |
US20130101295A1 (en) * | 2011-10-20 | 2013-04-25 | Nicolas Dupuis | Compact tunable optical ofdm source |
KR101922107B1 (ko) | 2012-06-22 | 2019-02-13 | 삼성전자주식회사 | 반도체소자 및 그 제조방법 |
EP2908392B8 (en) * | 2014-02-13 | 2018-05-16 | Alcatel Lucent | Tunable laser device |
US20220115842A1 (en) * | 2020-10-13 | 2022-04-14 | Lumentum Japan, Inc. | Optical semiconductor device and semiconductor light-emitting device |
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JPH08162706A (ja) * | 1994-11-30 | 1996-06-21 | Oki Electric Ind Co Ltd | 集積化半導体光素子の製造方法 |
JPH08248364A (ja) * | 1995-03-08 | 1996-09-27 | Oki Electric Ind Co Ltd | 光強度変調素子及び光強度変調素子付き半導体レーザ |
JP2003069153A (ja) * | 2001-08-29 | 2003-03-07 | Hitachi Ltd | 半導体光デバイス及び集積型光半導体装置 |
JP2003234533A (ja) * | 2002-02-12 | 2003-08-22 | Sumitomo Electric Ind Ltd | 半導体光集積素子 |
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US5764670A (en) * | 1995-02-27 | 1998-06-09 | Canon Kabushiki Kaisha | Semiconductor laser apparatus requiring no external modulator, method of driving semiconductor laser device, and optical communication system using the semiconductor laser apparatus |
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Patent Citations (4)
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JPH08162706A (ja) * | 1994-11-30 | 1996-06-21 | Oki Electric Ind Co Ltd | 集積化半導体光素子の製造方法 |
JPH08248364A (ja) * | 1995-03-08 | 1996-09-27 | Oki Electric Ind Co Ltd | 光強度変調素子及び光強度変調素子付き半導体レーザ |
JP2003069153A (ja) * | 2001-08-29 | 2003-03-07 | Hitachi Ltd | 半導体光デバイス及び集積型光半導体装置 |
JP2003234533A (ja) * | 2002-02-12 | 2003-08-22 | Sumitomo Electric Ind Ltd | 半導体光集積素子 |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103656824A (zh) * | 2008-11-27 | 2014-03-26 | 帝人制药株式会社 | 呼吸用面罩的佩戴件以及呼吸用面罩 |
JP2010230978A (ja) * | 2009-03-27 | 2010-10-14 | Fujitsu Ltd | 光半導体装置及びその製造方法 |
US8526478B2 (en) | 2010-06-10 | 2013-09-03 | Mitsubishi Electric Corporation | Semiconductor optical integrated element |
JP2012058432A (ja) * | 2010-09-08 | 2012-03-22 | Opnext Japan Inc | 半導体ゲイン領域集積型マッハツェンダ変調器 |
JP2012069800A (ja) * | 2010-09-24 | 2012-04-05 | Furukawa Electric Co Ltd:The | 半導体導波路アレイ素子の製造方法 |
JP2012252290A (ja) * | 2011-06-07 | 2012-12-20 | Japan Oclaro Inc | 光素子、光素子を含む変調器モジュール、光素子を含むレーザ集積変調器モジュール、及び、光素子の製造方法 |
US9110315B2 (en) | 2011-06-07 | 2015-08-18 | Oclaro Japan, Inc. | Optical device, modulator module, and method for manufacturing the optical device |
JP2013021139A (ja) * | 2011-07-12 | 2013-01-31 | Nippon Telegr & Teleph Corp <Ntt> | 半導体レーザ |
US8811444B2 (en) | 2012-01-06 | 2014-08-19 | Sumitomo Electric Industries, Ltd. | Semiconductor integrated device and method for producing the same |
JP2013191683A (ja) * | 2012-03-13 | 2013-09-26 | Sumitomo Electric Ind Ltd | 光半導体素子の製造方法 |
US9285613B2 (en) | 2012-06-04 | 2016-03-15 | Sumitomo Electric Industries, Ltd. | Semiconductor Mach-Zehnder modulator and method for manufacturing semiconductor Mach-Zehnder modulators |
JP2014089403A (ja) * | 2012-10-31 | 2014-05-15 | Sumitomo Electric Ind Ltd | 半導体光素子を作製する方法 |
JP2016171135A (ja) * | 2015-03-11 | 2016-09-23 | 三菱電機株式会社 | 光半導体装置の製造方法 |
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US7593445B2 (en) | 2009-09-22 |
US20070297475A1 (en) | 2007-12-27 |
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