JP2007524247A - マイクロリソグラフィ投影露光設備用の照明系 - Google Patents

マイクロリソグラフィ投影露光設備用の照明系 Download PDF

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Publication number
JP2007524247A
JP2007524247A JP2007500157A JP2007500157A JP2007524247A JP 2007524247 A JP2007524247 A JP 2007524247A JP 2007500157 A JP2007500157 A JP 2007500157A JP 2007500157 A JP2007500157 A JP 2007500157A JP 2007524247 A JP2007524247 A JP 2007524247A
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JP
Japan
Prior art keywords
polarization
illumination system
compensator
rod
light
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Pending
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JP2007500157A
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English (en)
Japanese (ja)
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JP2007524247A5 (enExample
Inventor
フィオルカ ダミアン
ツェンツィンガー マルクス
Original Assignee
カール・ツァイス・エスエムティー・アーゲー
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Publication of JP2007524247A publication Critical patent/JP2007524247A/ja
Publication of JP2007524247A5 publication Critical patent/JP2007524247A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
JP2007500157A 2004-02-26 2005-02-24 マイクロリソグラフィ投影露光設備用の照明系 Pending JP2007524247A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004010569A DE102004010569A1 (de) 2004-02-26 2004-02-26 Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
PCT/EP2005/001948 WO2005083517A2 (de) 2004-02-26 2005-02-24 Beleuchtungssystem für eine mikrolithographie-projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
JP2007524247A true JP2007524247A (ja) 2007-08-23
JP2007524247A5 JP2007524247A5 (enExample) 2008-03-13

Family

ID=34853935

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007500157A Pending JP2007524247A (ja) 2004-02-26 2005-02-24 マイクロリソグラフィ投影露光設備用の照明系

Country Status (6)

Country Link
US (1) US20070263199A1 (enExample)
EP (1) EP1721219A2 (enExample)
JP (1) JP2007524247A (enExample)
KR (1) KR20060123589A (enExample)
DE (1) DE102004010569A1 (enExample)
WO (1) WO2005083517A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012212890A (ja) * 2007-09-14 2012-11-01 Carl Zeiss Smt Gmbh マイクロリソグラフィ投影露光装置の照明システム

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
TWI511179B (zh) 2003-10-28 2015-12-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
TWI511182B (zh) 2004-02-06 2015-12-01 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
WO2008119794A1 (en) * 2007-04-03 2008-10-09 Carl Zeiss Smt Ag Optical system, in particular illumination device or projection objective of a microlithographic projection exposure apparatus
DE102007055567A1 (de) 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optisches System
WO2013029178A1 (en) * 2011-09-02 2013-03-07 UNIVERSITé LAVAL Polarization-maintaining module for making optical systems polarization-independent
DE102012200370A1 (de) 2012-01-12 2013-08-01 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines polarisationsbeeinflussenden optischen Elements, sowie polarisationsbeeinflussendes optisches Element

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0653120A (ja) * 1992-07-27 1994-02-25 Nikon Corp 照明光学装置
JPH08328261A (ja) * 1995-06-06 1996-12-13 Carl Zeiss:Fa 投影マイクロリソグラフィ装置の照明手段
JPH09184918A (ja) * 1995-09-23 1997-07-15 Carl Zeiss:Fa 放射偏光光学構造及びそれを有するマイクロリソグラフィ投影露光装置
JPH11271680A (ja) * 1998-02-20 1999-10-08 Carl Zeiss:Fa 偏光補償器を有する光学系
JP2002520810A (ja) * 1998-07-02 2002-07-09 カール−ツアイス−スチフツング 減偏光子を有するマイクロリソグラフィの照明システム
JP2003035822A (ja) * 2001-05-22 2003-02-07 Carl Zeiss Semiconductor Manufacturing Technologies Ag 偏光器および偏光器を備えたマイクロリソグラフィー投影システム
JP2005166871A (ja) * 2003-12-02 2005-06-23 Nikon Corp 照明光学装置、投影露光装置、露光方法及びデバイス製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3985346B2 (ja) * 1998-06-12 2007-10-03 株式会社ニコン 投影露光装置、投影露光装置の調整方法、及び投影露光方法
JP3927753B2 (ja) * 2000-03-31 2007-06-13 キヤノン株式会社 露光装置及びデバイス製造方法
DE60124524T2 (de) * 2000-04-25 2007-03-08 Asml Holding, N.V. Optisches reduktionssystem mit kontrolle der belichtungspolarisation
DE10124474A1 (de) * 2001-05-19 2002-11-21 Zeiss Carl Mikrolithographisches Belichtungsverfahren sowie Projektionsobjektiv zur Durchführung des Verfahrens
DE10206061A1 (de) * 2002-02-08 2003-09-04 Carl Zeiss Semiconductor Mfg S Polarisationsoptimiertes Beleuchtungssystem
AU2002342890A1 (en) * 2002-03-14 2003-09-22 Carl Zeiss Smt Ag Optical system with birefringent optical elements

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0653120A (ja) * 1992-07-27 1994-02-25 Nikon Corp 照明光学装置
JPH08328261A (ja) * 1995-06-06 1996-12-13 Carl Zeiss:Fa 投影マイクロリソグラフィ装置の照明手段
JPH09184918A (ja) * 1995-09-23 1997-07-15 Carl Zeiss:Fa 放射偏光光学構造及びそれを有するマイクロリソグラフィ投影露光装置
JPH11271680A (ja) * 1998-02-20 1999-10-08 Carl Zeiss:Fa 偏光補償器を有する光学系
JP2002520810A (ja) * 1998-07-02 2002-07-09 カール−ツアイス−スチフツング 減偏光子を有するマイクロリソグラフィの照明システム
JP2003035822A (ja) * 2001-05-22 2003-02-07 Carl Zeiss Semiconductor Manufacturing Technologies Ag 偏光器および偏光器を備えたマイクロリソグラフィー投影システム
JP2005166871A (ja) * 2003-12-02 2005-06-23 Nikon Corp 照明光学装置、投影露光装置、露光方法及びデバイス製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012212890A (ja) * 2007-09-14 2012-11-01 Carl Zeiss Smt Gmbh マイクロリソグラフィ投影露光装置の照明システム
US9316920B2 (en) 2007-09-14 2016-04-19 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus with a birefringent element
US10151982B2 (en) 2007-09-14 2018-12-11 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus with a birefringent element

Also Published As

Publication number Publication date
EP1721219A2 (de) 2006-11-15
WO2005083517A2 (de) 2005-09-09
US20070263199A1 (en) 2007-11-15
WO2005083517A3 (de) 2006-04-13
DE102004010569A1 (de) 2005-09-15
KR20060123589A (ko) 2006-12-01

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