EP1721219A2 - Beleuchtungssystem für eine mikrolithographie-projektionsbelichtungsanlage - Google Patents
Beleuchtungssystem für eine mikrolithographie-projektionsbelichtungsanlageInfo
- Publication number
- EP1721219A2 EP1721219A2 EP05715516A EP05715516A EP1721219A2 EP 1721219 A2 EP1721219 A2 EP 1721219A2 EP 05715516 A EP05715516 A EP 05715516A EP 05715516 A EP05715516 A EP 05715516A EP 1721219 A2 EP1721219 A2 EP 1721219A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- polarization
- compensator
- rod
- dependent
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
Definitions
- the invention relates to an illumination system for a microlithography projection exposure system for illuminating an illumination field with the light of an associated light source, a method for producing a polarization compensator for introduction into an illumination system, and a microlithography projection exposure system with an illumination system and a projection objective.
- the performance of projection exposure systems for the microlithographic production of semiconductor components and other finely structured components is largely determined by the imaging properties of the projection objectives.
- the image quality and the wafer throughput that can be achieved with the system are significantly influenced by properties of the lighting system upstream of the projection lens. This must be able to prepare the light of a primary light source, for example a laser, with the highest possible degree of efficiency and thereby generate an intensity distribution that is as uniform as possible in an illumination field of the illumination system.
- a primary light source for example a laser
- it should be possible to set different lighting modes (settings) on the lighting system for example conventional lighting with different degrees of coherence or ring field lighting or polar lighting for generating off-axis, oblique lighting.
- optical elements can be provided which exert a polarization-changing effect on the illuminating light radiated by the assigned light source.
- a change in polarization may be desirable, for example if a projection objective following the illumination system is to be operated with light of a specific polarization direction, but it may also be undesirable.
- elements can be introduced into the lighting system that lead to at least partial compensation for the undesired change in polarization.
- the applicant's unpublished patent application DE 102 11 762 describes an optical system with a first and a second optical subsystem, each with at least one birefringent element.
- Between the first and the second optical subsystem is an optical delay system with an optical delay element which introduces a delay by half a wavelength between two mutually orthogonal polarization states.
- the optical delay element serves to compensate for a polarization-changing effect introduced by the birefringent elements of the optical system.
- the polarization change introduced by the birefringent elements of the first subsystem is to be compensated for by the birefringent elements of the second subsystem by rotating the polarization state of the light passing through the optical system with the delay element by 90 °.
- an optical system has a first subsystem with a first rod integrator as the first birefringent element and a second subsystem with a second rod integrator as the second birefringent element with almost identical dimensions.
- the polarization-changing effect of the two rod integrators can be substantially compensated for by a delay element arranged between the two rod integrators.
- EP 0 964 282 A1 describes a microlithography projection exposure system with a catadioptical projection objective which has one or more spherical and planar mirrors and several refractive optical elements.
- the planar mirrors of the objective have a different reflectivity for light polarized perpendicularly and parallel to the plane of incidence, so that when non-polarized light is irradiated into the projection objective after the light has passed through it, there is partially polarized light in the wafer plane.
- the polarization-changing effect of the planar mirrors can be substantially compensated for, so that essentially unpolarized light is present in the wafer plane, which can have a favorable effect on the quality of the image.
- the invention has for its object to provide a lighting system of the type mentioned, which in relation to
- a lighting system has at least one polarization compensator in at least one pupil plane of the lighting system, which has at least one polarization change device for influencing the polarization state of the light distribution in the pupil plane depending on the location, and for partial or complete compensation of polarization changes by angle-dependent polarization-changing optical elements in the lighting system is designed.
- the inventors have recognized that an angle-dependent change in polarization in a field plane can be at least partially compensated for very effectively by a location-dependent influence on the polarization state, provided that this takes place in or near a pupil plane. If, therefore, a location-dependent polarization change function is specified in the pupil plane or in its vicinity, a polarization change effect arises in a field plane following this, which essentially depends on the angle of entry to the field plane.
- the polarization compensator has a polarization change function that varies depending on the location With respect to an optical axis of the polarization compensator has an even-numbered radial symmetry, in particular a two-fold or four-fold radial symmetry. Angular polarization changes can be caused by optical elements that have an even radial symmetry
- a polarization compensator which has a correspondingly adjusted varying polarization-changing effect in the circumferential direction of its optical axis, can compensate the undesired effects of such elements particularly effectively.
- the lighting system has an integrator rod arrangement with a light entry surface and a light exit surface.
- the integrator rod arrangement has a polygonal, in particular rectangular cross section with rod sides and rod corners and serves to homogenize the illuminating light by means of multiple internal reflections on the rod walls. Because of its mode of operation and the need to manufacture the rod arrangement from birefringent material at small light wavelengths, it can have a polarization-changing effect on the light passing through the rod arrangement. According to the inventors' studies, this polarization-changing effect depends essentially on the angle, but only insignificantly on the location at which the illuminating light strikes the light entry surface of the arrangement.
- the polarization-changing effect of the integrator rod arrangement can therefore be at least partially compensated for in an illumination system according to the invention with the aid of a suitably adapted polarization compensator.
- the polarization compensator has a number of first sectors with a first polarization change effect corresponding to the number of rod corners and a second sector with a second polarization change effect corresponding to the number of rod sides and lying in the circumferential direction of the polarization compensator between the first sectors, the first and the second polarization change effect are different.
- the first sectors are located in the angular sections assigned to the rod corners and the second sectors in the angular sections assigned to the rod sides.
- angular sections areas in a plane perpendicular to an optical axis are referred to as angular sections, each of which lies within a specific azimuthal angle interval.
- the polarization changing effect of the rod is different for light rays incident in the rod corners or the rod sides in these.
- the symmetry of the polarization change effect of the polarization compensator coincides with the symmetry of the polarization change effect of the rod, so that the polarization change effect of the integrator rod arrangement can be at least partially compensated for with an illumination system according to the invention which has a polarization compensator developed in this way.
- the lighting system has a device for generating a quadrupole-shaped light distribution in a pupil plane.
- a device for generating a quadrupole-shaped light distribution in a pupil plane can be constructed, for example, as described in EP 747 772 A. Areas of high light intensity of the quadrupole-shaped light distribution can be localized in angular sections in which the rod corners are also located. An angle-dependent polarization compensation is particularly advantageous here, since light beams directed into the rod corners occur in particular with such a light distribution. A compensation of the The polarization change effect of the integrator rod arrangement is advantageously possible in that the polarization compensator is attached in the pupil plane in which the quadrupole-shaped light distribution is present.
- the polarization compensator is positioned in or in the vicinity of a pupil plane of the lighting system, in particular in the light path in front of the light entry surface of the integrator rod arrangement, in which a diffractive or refractive optical raster element is also attached.
- the diffractive or refractive optical raster element can be used for beam shaping, so that the light distribution can be adapted to the shape and size of the entry surface of the integrator rod arrangement. If the polarization compensation takes place in a pupil plane in front of the integrator rod, there has not yet been any light mixing by the rod, so that a particularly effective compensation is possible.
- the illumination system has an imaging lens for imaging a field plane, in particular the light exit plane of the integrator rod arrangement, onto the illumination field, the polarization compensator being attached in or in the vicinity of a pupil plane of the imaging lens. Attaching a polarization compensator in the pupil plane of the imaging lens or in the vicinity thereof can e.g. be advantageous if no other optical elements are positioned in it.
- the polarization compensator has a raster element as a polarization changing device with a two-dimensional arrangement of elements made of birefringent material of different thickness and / or different crystal orientation and / or of elements different birefringent structures.
- the pupil plane in which the location-dependent change in polarization can be adjusted with the polarization compensator, can be divided into areas of the same or similar polarization change effect by using a raster element, each of which is assigned an element of the raster arrangement.
- the raster element is advantageously designed such that it fills the pupil plane area-wide.
- Polarization changes are used, for example diffraction gratings with a structure width that is below the wavelength of the light that shines through the lighting system.
- a grating in which the diffractive structures point in a predetermined direction, acts like a birefringent bulk material through structure-induced birefringence (form birefringence).
- the polarization compensator comprises a plate as a polarization changing device, which has a height profile made of birefringent material of variable thickness.
- the height profile or thickness profile can be used to generate a location-dependent change in polarization which varies continuously or in steps over the area of the pupil plane in which the plate is positioned.
- a polarization compensator can optionally have a raster element that is polarization-changing together with a plate with a thickness profile, as a result of which a particularly advantageous polarization change effect can be generated.
- Polarization compensators can be manufactured as standard with certain spatial distributions for the polarization change function. An individual adaptation to the conditions in a particular lighting system is also possible.
- a method of the type mentioned at the outset which is suitable for this purpose comprises the following steps: determining an angle-dependent polarization change within the
- Lighting system Calculating a location-dependent varying polarization change in a pupil plane to compensate for the angle-dependent polarization change; Manufacture of the polarization compensator in such a way that the location-dependent change in polarization is suitable for at least partial compensation of the angle-dependent change in polarization. Attaching the polarization compensator in or in the vicinity of a pupil plane of the lighting system, so that the desired compensation effect occurs.
- the method according to the invention enables an inexpensive and individually adapted manufacture of a polarization compensator.
- the determination of the polarization change to be compensated can be carried out purely arithmetically on the basis of simulation calculations for a specific system structure. Alternatively or additionally, the determination can include a measurement of the polarization ratios in an illumination system.
- averaging is carried out over all points of a field plane which is in a Fourier transformation relation to the pupil plane, which is provided for attaching the polarization compensator. Averaging over all points of the field level can result in a location-dependent eventual occurrence Changes in polarization in the field plane can be compensated on average.
- the invention also relates to a microlithography projection exposure system which is equipped with an illumination system according to the invention.
- the latter has an illumination system according to the invention and a projection objective with a physical beam splitter with a polarization-selective beam splitter surface.
- a noticeable loss of light can occur on such a beam splitter if the polarization of the illuminating light is not optimally adapted to the beam splitter.
- Polarization compensation for setting a predetermined polarization state on the illumination field of the illumination system can therefore have a particularly advantageous effect in this case.
- Fig. 1 is a schematic representation to illustrate the principle of operation of the polarization compensation
- FIG. 2 is a schematic side view of an embodiment of an illumination system according to the invention for a microlithography projection exposure system
- Figure 3 is a schematic side view of part of the lighting system of Figure 2; 4 is a schematic illustration of the polarization change function of the polarization compensator necessary to compensate for the polarization change caused by an integrator rod, together with a representation of the integrator rod;
- FIG. 5 is a schematic top view of an embodiment of a polarization compensator according to the invention.
- FIG. 6 is a schematic side view of another embodiment of a polarization compensator according to the invention.
- FIG. 1 is a schematic illustration to clarify the functional principle of the polarization compensation and shows a location-dependent polarization-changing optical system 1 with a polarization compensator 2 arranged in front of it Polarization compensation is equivalent to this.
- a first and a second linearly polarized light beam 3a, 3b strike the polarization compensator 2 at two different locations, the first light beam 3a being converted by the polarization compensator into a circularly polarized light beam and the second light beam 3b into an elliptically polarized light beam. Both beams 3a, 3b enter the optical system 2 at different locations and experience a different one through this
- both beams 3a, 3b are as before entering the Polarization compensator linearly polarized.
- FIG. 2 is a schematic side view of an embodiment of an illumination system according to the invention, which together with a projection lens forms the essential part of a microlithographic projection exposure system.
- a wafer scanner can be used for the production of semiconductor components and other finely structured components and works with light from the deep ultraviolet range to achieve resolutions down to fractions of a micrometer.
- other light sources e.g. with wavelengths of 193 nm or 157 nm.
- the laser light is radiated along the optical axis 19 into a mirror arrangement 14, which is used to reduce coherence and to enlarge the beam cross section, and produces a light distribution with a rectangular cross section and with beams running essentially parallel to the optical axis.
- the mirror arrangement 14 is followed by a first optical raster element 9, which is positioned in the object plane of a subsequent objective 20.
- the object plane represents a field plane of the illumination system.
- the objective 20 is a zoom axicon objective with a pair of conical axicon elements 21 with conical axicon surfaces facing one another and an adjustable one Zoom lens 22.
- the zoom axicon lens 20 combines a zoom function for the stepless adjustment of the diameter of a light distribution passing through it by moving the zoom lens 22 with an axicon function for the radial redistribution of light intensities by axially moving the two axicon elements 21 against each other.
- the light distribution introduced by the first optical raster element 9 is converted by the lens 20 into a light distribution on the second optical raster element 8, which is positioned at a short distance behind the last optical element of the lens 20, in the region of its exit pupil, which is also a pupil plane 23 of the lighting system.
- the second optical raster element 8 increases the light conductance by a multiple and converts the distribution of the radiation incident on it into a rectangular light distribution, the aspect ratio of which is selected so that after transmission to the entry surface 5a of an integrator rod 5 by means of a coupling optics 4, this covers it exactly ,
- the optical raster element 8 In the pupil plane 23, in which the optical raster element 8 is positioned, there is a polarization compensator 11 in the light path directly in front of it, which completely fills the pupil plane 23. Its structure and operation are described in more detail below.
- a variable Masking system (REMA) 51 is arranged in the immediate vicinity of the exit surface 5b of the integrator rod 5.
- the projection lens Downstream of the lighting system is a projection lens, not shown, in the object plane of which the lighting field 7 is positioned.
- the projection lens can be a catadioptric lens with a physical beam splitter with a polarization-selective beam splitter surface. In order to keep the light loss on the beam splitter surface as low as possible, an exact setting of the polarization state can be displayed on the illumination field 7.
- FIG. 3 is a schematic side view of part of the illumination system from FIG. 2. It shows the first optical raster element 9 positioned in a field plane of the illumination system, the objective 20 represented by a lens for simplification, and the one in a pupil plane 23 together with the second optical raster element 8 attached polarization compensator 1 1, the coupling-in optics 4, which are simplified by a lens, and the light entry surface of the integrator rod arrangement 5a. With the first optical raster element 9 and the objective 20, a quadrupole-shaped light distribution can be generated in the pupil plane 23.
- the second optical raster element 8 destroys the deterministic beam spread and thereby smears the angular distribution in the rod entry surface 5a, albeit in a small angular range, the smeared angular distribution introduced by the second raster element 8 is also averaged to determine the location-dependent change in polarization.
- FIG. 4 is a schematic illustration of the polarization change function of the polarization change function required to compensate for the polarization change caused by an integrator rod 5
- Polarization compensator 11 together with a representation of the integrator rod 5.
- the polarization compensator 11 has a number of four first sectors 12 corresponding to the number of rod corners 16 with a first polarization changing effect.
- the first sectors 12 lie in the angular sections assigned to the rod corners 16, the second sectors 13 in the angular sections assigned to the rod sides 17.
- the angular sections corresponding to the first sectors 12 and the second sectors 13 are also shown as first and second regions 14, 15 on the entry surface of the integrator rod 5 for clarification. There is a gradual transition between the areas in the real system.
- the integrator rod has a rectangular cross section with a width in the x direction which is greater than the height in the y direction, which is the scanning direction of the wafer scanner equivalent. In relation to the optical axis 19, there is a two-fold radial symmetry.
- the integrator rod 5 mixes and homogenizes the light passing through it through multiple internal reflection on the side surfaces. It is made of birefringent CaF 2 , which has a polarization-changing effect on the light passing through the rod.
- each total reflection on one side surface of the integrator rod 5 reflects a first polarization component perpendicular to the plane of incidence of the light passing through the rod more strongly than a second component incident parallel to the plane of incidence and phase jumps occur.
- the polarization state of the light thus changes with each total reflection.
- the number of total reflections that a light beam experiences in the rod depends on the angle of incidence, the rod geometry and the rod length.
- the rod geometry or the symmetry of the rod influences the length of the light path that is covered between two successive reflections and thus has a direct effect on the polarization change effect of the rod.
- the symmetry of the polarization changing function of the polarization compensator 11 is adapted to the polarization changing effect of the integrator rod 5.
- the first sectors 12 usually have a stronger one
- the first sectors 13 are therefore provided with a plus symbol in the figure because of the stronger polarization-changing effect. If a quadrupole-shaped light distribution in or in adjusted in the vicinity of the pupil plane 23, so that regions of high light intensity 31 of this distribution partially lie in the first sectors 13, this is influenced by the integrator rod 5 in a particularly strong polarization-changing manner, so that in this case a particularly strong polarization compensation is necessary.
- the polarization compensator 11 used for the angle-dependent polarization compensation can be used together with a location-dependent polarization-compensating device.
- a delay element introducing a delay of ⁇ / 2 as described in DE 102 1 1 762, the disclosure content of which is made the content of the description by reference.
- This delay element can in particular be designed as a ⁇ / 2 plate attached between a first and a second part of the integrator rod arrangement.
- the polarization compensator 1 1 a has an arrangement of hexagonal, honeycomb-shaped elements 18 made of birefringent material, in this example made of CaF 2 , which are arranged next to one another to fill the area.
- the orientation of the crystallographic main axes of the elements 18 represented by arrows in the figure can be chosen so that, together with a suitable variation in the thickness of the elements 18, any change in polarization with a spatial resolution that corresponds to the size of the elements can be set.
- DE 101 24 803 A1 the disclosure content of which is made the content of this description by reference.
- FIG 6 is a schematic side view of another embodiment of a polarization compensator.
- the Polarization compensator is designed here as a one-piece plate 11 b with a height profile 30.
- a profile 30 can be produced using conventional methods for structuring surfaces and enables the variation of the polarization to be varied with a high spatial frequency.
- a plate made of a birefringent material for example magnesium fluoride or quartz, can also be used as part of a polarization compensator 11, which can have both the grid arrangement 11a and the plate 11b as a polarization changing device.
- the plate can be connected to the grid arrangement, for example by sprinkling it onto the grid arrangement. In this case, additional fine-tuning of the polarization change can be achieved by using the plate 11b.
- FIGS. 5 and 6 As an alternative to the embodiments of the polarization compensator shown in FIGS. 5 and 6, other embodiments are of course also conceivable, for example by using a plate made of structurally birefringent material, the birefringent properties of which are varied depending on the location, for producing the polarization compensator. As an alternative to the positioning of the polarization compensator shown in FIG. 2 in the pupil plane 23 in which the second optical raster element 8 is attached, it can also be arranged in the pupil plane 62 of the imaging objective.
- the angle-dependent change in polarization caused by an angle-dependent polarization-changing optical element is first determined. This can be done using simulation calculations or suitable measuring methods.
- a location-dependent polarization change function is calculated from the angle-dependent polarization change, which in a pupil plane of the lighting system should be set in order to at least partially compensate for the angle-dependent change in polarization.
- the polarization compensator is now manufactured in such a way that the calculated polarization change function can be simulated as precisely as possible.
- the polarization compensator is in a pupil plane of the
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Microscoopes, Condenser (AREA)
- Polarising Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004010569A DE102004010569A1 (de) | 2004-02-26 | 2004-02-26 | Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage |
PCT/EP2005/001948 WO2005083517A2 (de) | 2004-02-26 | 2005-02-24 | Beleuchtungssystem für eine mikrolithographie-projektionsbelichtungsanlage |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1721219A2 true EP1721219A2 (de) | 2006-11-15 |
Family
ID=34853935
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP05715516A Withdrawn EP1721219A2 (de) | 2004-02-26 | 2005-02-24 | Beleuchtungssystem für eine mikrolithographie-projektionsbelichtungsanlage |
Country Status (6)
Country | Link |
---|---|
US (1) | US20070263199A1 (de) |
EP (1) | EP1721219A2 (de) |
JP (1) | JP2007524247A (de) |
KR (1) | KR20060123589A (de) |
DE (1) | DE102004010569A1 (de) |
WO (1) | WO2005083517A2 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101547077B1 (ko) | 2003-04-09 | 2015-08-25 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
TWI573175B (zh) | 2003-10-28 | 2017-03-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法 |
TW201809801A (zh) | 2003-11-20 | 2018-03-16 | 日商尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法 |
TWI395068B (zh) | 2004-01-27 | 2013-05-01 | 尼康股份有限公司 | 光學系統、曝光裝置以及曝光方法 |
TWI389174B (zh) | 2004-02-06 | 2013-03-11 | 尼康股份有限公司 | 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法 |
JP5461387B2 (ja) * | 2007-04-03 | 2014-04-02 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 特にマイクロリソグラフィ投影露光装置の照明デバイス又は投影対物器械である光学システム |
DE102007043958B4 (de) * | 2007-09-14 | 2011-08-25 | Carl Zeiss SMT GmbH, 73447 | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
DE102007055567A1 (de) | 2007-11-20 | 2009-05-28 | Carl Zeiss Smt Ag | Optisches System |
US20140204458A1 (en) * | 2011-09-02 | 2014-07-24 | Universite Laval | Polarization-maintaining module for making optical systems polarization-independent |
DE102012200370A1 (de) | 2012-01-12 | 2013-08-01 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines polarisationsbeeinflussenden optischen Elements, sowie polarisationsbeeinflussendes optisches Element |
Family Cites Families (13)
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JP3246615B2 (ja) * | 1992-07-27 | 2002-01-15 | 株式会社ニコン | 照明光学装置、露光装置、及び露光方法 |
DE19520563A1 (de) * | 1995-06-06 | 1996-12-12 | Zeiss Carl Fa | Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät |
DE19535392A1 (de) * | 1995-09-23 | 1997-03-27 | Zeiss Carl Fa | Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit |
DE19807120A1 (de) * | 1998-02-20 | 1999-08-26 | Zeiss Carl Fa | Optisches System mit Polarisationskompensator |
JP3985346B2 (ja) * | 1998-06-12 | 2007-10-03 | 株式会社ニコン | 投影露光装置、投影露光装置の調整方法、及び投影露光方法 |
DE19829612A1 (de) * | 1998-07-02 | 2000-01-05 | Zeiss Carl Fa | Beleuchtungssystem der Mikrolithographie mit Depolarisator |
JP3927753B2 (ja) * | 2000-03-31 | 2007-06-13 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
DE60124524T2 (de) * | 2000-04-25 | 2007-03-08 | Asml Holding, N.V. | Optisches reduktionssystem mit kontrolle der belichtungspolarisation |
DE10124474A1 (de) * | 2001-05-19 | 2002-11-21 | Zeiss Carl | Mikrolithographisches Belichtungsverfahren sowie Projektionsobjektiv zur Durchführung des Verfahrens |
DE10124803A1 (de) * | 2001-05-22 | 2002-11-28 | Zeiss Carl | Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator |
DE10206061A1 (de) * | 2002-02-08 | 2003-09-04 | Carl Zeiss Semiconductor Mfg S | Polarisationsoptimiertes Beleuchtungssystem |
EP1483616A1 (de) * | 2002-03-14 | 2004-12-08 | Carl Zeiss SMT AG | Optisches system mit doppelbrechenden optischen elementen |
JP4552428B2 (ja) * | 2003-12-02 | 2010-09-29 | 株式会社ニコン | 照明光学装置、投影露光装置、露光方法及びデバイス製造方法 |
-
2004
- 2004-02-26 DE DE102004010569A patent/DE102004010569A1/de not_active Withdrawn
-
2005
- 2005-02-24 KR KR1020067017080A patent/KR20060123589A/ko not_active Application Discontinuation
- 2005-02-24 EP EP05715516A patent/EP1721219A2/de not_active Withdrawn
- 2005-02-24 WO PCT/EP2005/001948 patent/WO2005083517A2/de active Application Filing
- 2005-02-24 JP JP2007500157A patent/JP2007524247A/ja active Pending
- 2005-02-24 US US10/590,700 patent/US20070263199A1/en not_active Abandoned
Non-Patent Citations (1)
Title |
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See references of WO2005083517A3 * |
Also Published As
Publication number | Publication date |
---|---|
WO2005083517A2 (de) | 2005-09-09 |
KR20060123589A (ko) | 2006-12-01 |
DE102004010569A1 (de) | 2005-09-15 |
US20070263199A1 (en) | 2007-11-15 |
WO2005083517A3 (de) | 2006-04-13 |
JP2007524247A (ja) | 2007-08-23 |
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