JP2007523332A - 放射性同位元素製造のためのターゲット装置 - Google Patents
放射性同位元素製造のためのターゲット装置 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000013077 target material Substances 0.000 claims abstract description 35
- 239000000463 material Substances 0.000 claims abstract description 25
- 229910052751 metal Inorganic materials 0.000 claims abstract description 18
- 239000002184 metal Substances 0.000 claims abstract description 18
- 239000002245 particle Substances 0.000 claims abstract description 16
- 230000001678 irradiating effect Effects 0.000 claims abstract description 3
- 239000010955 niobium Substances 0.000 claims description 19
- 229910052758 niobium Inorganic materials 0.000 claims description 18
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 18
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 12
- 229910052715 tantalum Inorganic materials 0.000 claims description 10
- 239000002826 coolant Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 5
- 238000003466 welding Methods 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 238000001816 cooling Methods 0.000 description 8
- 229910052709 silver Inorganic materials 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 238000002600 positron emission tomography Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 229920002449 FKM Polymers 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- YCKRFDGAMUMZLT-BJUDXGSMSA-N fluorine-18 atom Chemical compound [18F] YCKRFDGAMUMZLT-BJUDXGSMSA-N 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000009206 nuclear medicine Methods 0.000 description 2
- 239000012217 radiopharmaceutical Substances 0.000 description 2
- 229940121896 radiopharmaceutical Drugs 0.000 description 2
- 230000002799 radiopharmaceutical effect Effects 0.000 description 2
- AOYNUTHNTBLRMT-MXWOLSILSA-N 2-Deoxy-2(F-18)fluoro-2-D-glucose Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H]([18F])C=O AOYNUTHNTBLRMT-MXWOLSILSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 206010028980 Neoplasm Diseases 0.000 description 1
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- 150000001450 anions Chemical group 0.000 description 1
- 210000004556 brain Anatomy 0.000 description 1
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- 230000015556 catabolic process Effects 0.000 description 1
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- 239000011737 fluorine Substances 0.000 description 1
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- 239000007789 gas Substances 0.000 description 1
- 230000004153 glucose metabolism Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
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- 229940100890 silver compound Drugs 0.000 description 1
- 150000003379 silver compounds Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21G—CONVERSION OF CHEMICAL ELEMENTS; RADIOACTIVE SOURCES
- G21G1/00—Arrangements for converting chemical elements by electromagnetic radiation, corpuscular radiation or particle bombardment, e.g. producing radioactive isotopes
- G21G1/04—Arrangements for converting chemical elements by electromagnetic radiation, corpuscular radiation or particle bombardment, e.g. producing radioactive isotopes outside nuclear reactors or particle accelerators
- G21G1/10—Arrangements for converting chemical elements by electromagnetic radiation, corpuscular radiation or particle bombardment, e.g. producing radioactive isotopes outside nuclear reactors or particle accelerators by bombardment with electrically charged particles
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21G—CONVERSION OF CHEMICAL ELEMENTS; RADIOACTIVE SOURCES
- G21G1/00—Arrangements for converting chemical elements by electromagnetic radiation, corpuscular radiation or particle bombardment, e.g. producing radioactive isotopes
- G21G1/02—Arrangements for converting chemical elements by electromagnetic radiation, corpuscular radiation or particle bombardment, e.g. producing radioactive isotopes in nuclear reactors
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21G—CONVERSION OF CHEMICAL ELEMENTS; RADIOACTIVE SOURCES
- G21G1/00—Arrangements for converting chemical elements by electromagnetic radiation, corpuscular radiation or particle bombardment, e.g. producing radioactive isotopes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H6/00—Targets for producing nuclear reactions
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- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Particle Accelerators (AREA)
Abstract
【選択図】図2
Description
P(ワット)=E(MeV)×I(μA)
ただし、
P=パワー(単位:ワット)
E=ビームのエネルギー(単位:MeV)
I=ビームの強度(単位:μA)
冷却媒体を供給する手段が、冷却流入口に接続される管6の形態で存在している。この管の端部に、「ディフューザ」要素3が取り付けられている。「ディフューザ」要素3は、実質的に、供給管に接続され、前記ディフューザと前記第2の部分との間に前記冷却媒体の戻り経路を形成するように空洞を囲んで配置される要素である。
Claims (17)
- ターゲット物質に粒子線を照射して目的の放射性同位元素を生成する照射セルであって、前記ターゲット物質を収容するように設計され、照射窓によって閉鎖される空洞(7)を形成する金属インサート(2)を有し、前記金属インサート(2)が、少なくとも前記空洞(7)を含む第1の部分(8)と第2の部分(9)とから構成される異なる材質の少なくとも2つの別々の金属部分(8,9)を含むことを特徴とする照射セル。
- 前記第2の部分(9)が冷却媒体を導くチャネルを形成するように前記空洞(7)を取り囲む、請求項1に記載の照射セル。
- 前記セルが、さらに、冷却媒体の供給手段(6)と、前記供給手段に連結して前記空洞(7)を取り囲むディフューザと呼ばれる要素(3)とを有し、前記ディフューザ(3)が前記空洞の周囲に前記冷却媒体を導くために配置され、前記ディフューザと前記第2の部分との間に前記冷却媒体の戻り経路を形成するように前記第2の部分(9)が前記空洞と前記ディフューザの両方を取り囲む、請求項2に記載の照射セル。
- 前記第1および第2の部分(8,9)間の接触が金属同士の接触であり、前記部分(8,9)間の封止が少なくとも1つのO−リング(33)によって得られる、請求項1〜3のいずれか1項に記載の照射セル。
- 前記第1および第2の部分(8,9)間の封止が前記部分の間に存在する金箔によって得られる、請求項1〜3のいずれか1項に記載の照射セル。
- 前記インサート(2)が2つの金属部分(8,9)から構成される、請求項1〜5のいずれか1項に記載の照射セル。
- 前記部分(8,9)がいくつかのボルト(10)によって組み立てられる、請求項1〜6のいずれか1項に記載の照射セル。
- 前記部分(8,9)が溶接によって組み立てられる、請求項1〜6のいずれか1項に記載の照射セル。
- 前記第1の部分(8)が、内側の環状縁部(50)と外側の環状縁部(51)とを有する円形で環状の平坦部(16)と、前記平坦部の内側の環状縁部から垂直に突き出た円筒部(17)と、前記円筒部の上にある半球部(18)とを含み、前記空洞(7)が前記円筒部(17)および半球部(18)内に形成される、請求項1〜8のいずれか1項に記載の照射セル。
- 前記円筒部(17)および/または前記半球部(18)が0.3〜0.7mmの壁厚を有し、および/または前記空洞が少なくとも50mmの長さを有する、請求項9に記載の照射セル。
- 前記第2の部分(9)が、円筒形の側面(54)に実質的に垂直な2つの平坦な側面(52,53)を有する中空の円筒形をなし、前記円筒形が前記第1の部分(8)の平坦部(16)に対して一方の平坦な側面(53)で接続されている、請求項9または10に記載の照射セル。
- 前記2つの部分(8,9)が互いに完全に同軸配置されるように、前記2つの部分(8,9)の一方が隆起(26)を有し、他方が前記隆起に対応する溝(27)を有する、請求項9〜11のいずれか1項に記載の照射セル。
- 前記第1の部分(8)がニオブまたはタンタル製である、前記請求項のいずれか1項に記載の照射セル。
- 前記第2の部分(9)がステンレススチール製である、請求項6に記載の照射セル。
- 前記請求項のいずれか1項に記載の照射セル内で使用するインサート(2)。
- 請求項14に記載のインサート(2)を製造する方法であって、
加工によって第1の部分(8)を形成するステップと、
第2の部分(9)を形成するステップと、
前記第1(8)および第2の部分(9)をボルト(10)で、または溶接によって組み立てるステップとを含む方法。 - 照射を開始する前に前記空洞(7)にターゲット物質の約50%を入れる、請求項1〜13のいずれか1項に記載の照射セルの使用。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04447049A EP1569243A1 (en) | 2004-02-20 | 2004-02-20 | Target device for producing a radioisotope |
EP04447049.0 | 2004-02-20 | ||
PCT/BE2005/000025 WO2005081263A2 (en) | 2004-02-20 | 2005-02-18 | Target device for producing a radioisotope |
Publications (2)
Publication Number | Publication Date |
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JP2007523332A true JP2007523332A (ja) | 2007-08-16 |
JP4958564B2 JP4958564B2 (ja) | 2012-06-20 |
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Application Number | Title | Priority Date | Filing Date |
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JP2006553394A Active JP4958564B2 (ja) | 2004-02-20 | 2005-02-18 | 放射性同位元素製造のための照射セル、及び、照射セル内で使用するインサート、並びに、照射セルの製造方法及び使用 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8288736B2 (ja) |
EP (2) | EP1569243A1 (ja) |
JP (1) | JP4958564B2 (ja) |
KR (1) | KR101106118B1 (ja) |
CN (1) | CN1922695B (ja) |
WO (1) | WO2005081263A2 (ja) |
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JP2006133138A (ja) * | 2004-11-08 | 2006-05-25 | Sumitomo Heavy Ind Ltd | 放射性同位元素製造用ターゲット |
JP2008056971A (ja) * | 2006-08-30 | 2008-03-13 | Gyoseiin Genshino Iinkai Kakuno Kenkyusho | 高圧取囲み冷却ターゲットチェンバ |
JP2013238515A (ja) * | 2012-05-16 | 2013-11-28 | Sumitomo Heavy Ind Ltd | 放射性同位元素製造装置 |
JP2017537321A (ja) * | 2014-11-25 | 2017-12-14 | テクニシェ ユニヴェルシテイト デルフト | 柔軟な照射設備 |
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- 2005-02-18 JP JP2006553394A patent/JP4958564B2/ja active Active
- 2005-02-18 WO PCT/BE2005/000025 patent/WO2005081263A2/en active Application Filing
- 2005-02-18 CN CN2005800052965A patent/CN1922695B/zh not_active Expired - Fee Related
- 2005-02-18 US US10/597,974 patent/US8288736B2/en active Active
- 2005-02-18 KR KR1020067016668A patent/KR101106118B1/ko not_active IP Right Cessation
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2006133138A (ja) * | 2004-11-08 | 2006-05-25 | Sumitomo Heavy Ind Ltd | 放射性同位元素製造用ターゲット |
JP2008056971A (ja) * | 2006-08-30 | 2008-03-13 | Gyoseiin Genshino Iinkai Kakuno Kenkyusho | 高圧取囲み冷却ターゲットチェンバ |
JP4571106B2 (ja) * | 2006-08-30 | 2010-10-27 | 行政院原子能委員会核能研究所 | 高圧取囲み冷却ターゲットチェンバ |
JP2013238515A (ja) * | 2012-05-16 | 2013-11-28 | Sumitomo Heavy Ind Ltd | 放射性同位元素製造装置 |
JP2017537321A (ja) * | 2014-11-25 | 2017-12-14 | テクニシェ ユニヴェルシテイト デルフト | 柔軟な照射設備 |
JP2020024193A (ja) * | 2018-08-06 | 2020-02-13 | イオン ビーム アプリケーションズ ソシエテ アノニムIon Beam Applications S.A. | ターゲット材料を照射するためのシステム |
Also Published As
Publication number | Publication date |
---|---|
CN1922695B (zh) | 2012-12-26 |
WO2005081263A2 (en) | 2005-09-01 |
US20080023645A1 (en) | 2008-01-31 |
EP1569243A1 (en) | 2005-08-31 |
CN1922695A (zh) | 2007-02-28 |
EP1716576B1 (en) | 2014-04-16 |
US8288736B2 (en) | 2012-10-16 |
KR101106118B1 (ko) | 2012-01-20 |
EP1716576A2 (en) | 2006-11-02 |
JP4958564B2 (ja) | 2012-06-20 |
KR20060129392A (ko) | 2006-12-15 |
WO2005081263A3 (en) | 2006-07-13 |
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