JP2007505219A5 - - Google Patents
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- Publication number
- JP2007505219A5 JP2007505219A5 JP2006526286A JP2006526286A JP2007505219A5 JP 2007505219 A5 JP2007505219 A5 JP 2007505219A5 JP 2006526286 A JP2006526286 A JP 2006526286A JP 2006526286 A JP2006526286 A JP 2006526286A JP 2007505219 A5 JP2007505219 A5 JP 2007505219A5
- Authority
- JP
- Japan
- Prior art keywords
- tetraalkylorthosilicate
- film coating
- sec
- substrate
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 claims 11
- 239000007888 film coating Substances 0.000 claims 5
- 238000009501 film coating Methods 0.000 claims 5
- 239000007789 gas Substances 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical group CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims 3
- 239000012159 carrier gas Substances 0.000 claims 3
- 239000000203 mixture Substances 0.000 claims 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims 1
- 239000003570 air Substances 0.000 claims 1
- 229910052786 argon Inorganic materials 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000011437 continuous method Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 239000001307 helium Substances 0.000 claims 1
- 229910052734 helium Inorganic materials 0.000 claims 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US50147703P | 2003-09-09 | 2003-09-09 | |
| PCT/US2004/029442 WO2005049228A2 (en) | 2003-09-09 | 2004-09-07 | Glow discharge-generated chemical vapor deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007505219A JP2007505219A (ja) | 2007-03-08 |
| JP2007505219A5 true JP2007505219A5 (https=) | 2007-11-08 |
Family
ID=34619293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006526286A Withdrawn JP2007505219A (ja) | 2003-09-09 | 2004-09-07 | グロー放電発生化学蒸着 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20060222779A1 (https=) |
| EP (1) | EP1663518A2 (https=) |
| JP (1) | JP2007505219A (https=) |
| KR (1) | KR20060082858A (https=) |
| CN (1) | CN100450647C (https=) |
| BR (1) | BRPI0413769A (https=) |
| CA (1) | CA2537075A1 (https=) |
| MX (1) | MXPA06002679A (https=) |
| WO (1) | WO2005049228A2 (https=) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2007119782A (ru) * | 2004-10-29 | 2008-12-10 | Дау Глобал Текнолоджиз Инк. (Us) | Износостойкие покрытия, полученные посредством плазменного химического осаждения из паровой фазы |
| JP2009538989A (ja) | 2006-05-30 | 2009-11-12 | フジフィルム マニュファクチャリング ユーロプ ビー．ブイ． | パルス化大気圧グロー放電を使用する堆積の方法及び装置 |
| US8338307B2 (en) | 2007-02-13 | 2012-12-25 | Fujifilm Manufacturing Europe B.V. | Substrate plasma treatment using magnetic mask device |
| CN101679655A (zh) * | 2007-05-21 | 2010-03-24 | 陶氏环球技术公司 | 涂布物体 |
| EP2183407A1 (en) * | 2007-07-30 | 2010-05-12 | Dow Global Technologies Inc. | Atmospheric pressure plasma enhanced chemical vapor deposition process |
| US20100255216A1 (en) * | 2007-11-29 | 2010-10-07 | Haley Jr Robert P | Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate |
| WO2009096785A1 (en) | 2008-02-01 | 2009-08-06 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for plasma surface treatment of a moving substrate |
| ATE523067T1 (de) | 2008-02-08 | 2011-09-15 | Fujifilm Mfg Europe Bv | Verfahren zur herstellung einer mehrschichtigen stapelstruktur mit verbesserter wvtr- grenzeigenschaft |
| US20110014424A1 (en) | 2008-02-21 | 2011-01-20 | Fujifilm Manufacturing Europe B.V. | Plasma treatment apparatus and method for treatment of a substrate with atmospheric pressure glow discharge electrode configuration |
| US8609203B2 (en) * | 2008-06-06 | 2013-12-17 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for plasma surface treatment of moving substrate |
| DE102009006484A1 (de) * | 2009-01-28 | 2010-07-29 | Ahlbrandt System Gmbh | Vorrichtung zum Modifizieren der Oberflächen von Bahn-, Platten- und Bogenware mit einer Einrichtung zur Erzeugung eines Plasmas |
| EP2396451B1 (en) | 2009-02-12 | 2012-11-07 | Fujifilm Manufacturing Europe BV | Two layer barrier on polymeric substrate |
| CN111085411B (zh) * | 2020-01-07 | 2022-05-13 | 大连交通大学 | 一种高绝缘电阻二氧化硅薄膜材料及其制备方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2990608B2 (ja) * | 1989-12-13 | 1999-12-13 | 株式会社ブリヂストン | 表面処理方法 |
| US5344462A (en) * | 1992-04-06 | 1994-09-06 | Plasma Plus | Gas plasma treatment for modification of surface wetting properties |
| JPH06330326A (ja) * | 1993-03-26 | 1994-11-29 | Shin Etsu Chem Co Ltd | シリカ薄膜の製造方法 |
| FR2704558B1 (fr) * | 1993-04-29 | 1995-06-23 | Air Liquide | Procede et dispositif pour creer un depot d'oxyde de silicium sur un substrat solide en defilement. |
| US5372876A (en) * | 1993-06-02 | 1994-12-13 | Appleton Mills | Papermaking felt with hydrophobic layer |
| US6106659A (en) * | 1997-07-14 | 2000-08-22 | The University Of Tennessee Research Corporation | Treater systems and methods for generating moderate-to-high-pressure plasma discharges for treating materials and related treated materials |
| GB9816077D0 (en) * | 1998-07-24 | 1998-09-23 | Secr Defence | Surface coatings |
| US6118218A (en) * | 1999-02-01 | 2000-09-12 | Sigma Technologies International, Inc. | Steady-state glow-discharge plasma at atmospheric pressure |
| WO2000070117A1 (en) * | 1999-05-14 | 2000-11-23 | The Regents Of The University Of California | Low-temperature compatible wide-pressure-range plasma flow device |
| JP2004504446A (ja) * | 2000-07-24 | 2004-02-12 | ダウ グローバル テクノロジーズ インコーポレイティド | 熱可塑性超吸収性ポリマーブレンド組成物および該組成物の調製 |
| ATE402277T1 (de) * | 2002-02-05 | 2008-08-15 | Dow Global Technologies Inc | Chemische dampfphasenabscheidung auf einem substrat mittels eines korona-plasmas |
-
2004
- 2004-09-07 KR KR1020067004736A patent/KR20060082858A/ko not_active Withdrawn
- 2004-09-07 MX MXPA06002679A patent/MXPA06002679A/es unknown
- 2004-09-07 WO PCT/US2004/029442 patent/WO2005049228A2/en not_active Ceased
- 2004-09-07 EP EP04816852A patent/EP1663518A2/en not_active Withdrawn
- 2004-09-07 JP JP2006526286A patent/JP2007505219A/ja not_active Withdrawn
- 2004-09-07 BR BRPI0413769-8A patent/BRPI0413769A/pt not_active IP Right Cessation
- 2004-09-07 CA CA002537075A patent/CA2537075A1/en not_active Abandoned
- 2004-09-07 CN CNB2004800250618A patent/CN100450647C/zh not_active Expired - Fee Related
- 2004-09-07 US US10/567,144 patent/US20060222779A1/en not_active Abandoned
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