JP2007503016A5 - - Google Patents
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- Publication number
- JP2007503016A5 JP2007503016A5 JP2006523840A JP2006523840A JP2007503016A5 JP 2007503016 A5 JP2007503016 A5 JP 2007503016A5 JP 2006523840 A JP2006523840 A JP 2006523840A JP 2006523840 A JP2006523840 A JP 2006523840A JP 2007503016 A5 JP2007503016 A5 JP 2007503016A5
- Authority
- JP
- Japan
- Prior art keywords
- phosphonate
- phototool
- fluorinated phosphate
- article
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 125000002467 phosphate group Chemical class [H]OP(=O)(O[H])O[*] 0.000 claims 5
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 claims 5
- 239000000463 material Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 238000000059 patterning Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/645,020 US7189479B2 (en) | 2003-08-21 | 2003-08-21 | Phototool coating |
| PCT/US2004/021017 WO2005024520A2 (en) | 2003-08-21 | 2004-06-30 | Phototool coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007503016A JP2007503016A (ja) | 2007-02-15 |
| JP2007503016A5 true JP2007503016A5 (cg-RX-API-DMAC7.html) | 2007-08-16 |
Family
ID=34194211
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006523840A Withdrawn JP2007503016A (ja) | 2003-08-21 | 2004-06-30 | フォトツールのコーティング |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US7189479B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1656588A2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2007503016A (cg-RX-API-DMAC7.html) |
| KR (1) | KR20060080182A (cg-RX-API-DMAC7.html) |
| CN (1) | CN1839351A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2005024520A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE346852T1 (de) * | 2003-08-21 | 2006-12-15 | 3M Innovative Properties Co | Perfluorpolyetheramidgebundene phosphonate, phosphate und derivate davon |
| CN101010632A (zh) * | 2004-05-28 | 2007-08-01 | 奥布杜卡特公司 | 用于压印工艺中的改性金属模 |
| EP1998833B1 (en) * | 2006-03-24 | 2012-12-26 | 3M Innovative Properties Company | Medicinal formulation container with a treated metal surface |
| US8337959B2 (en) * | 2006-11-28 | 2012-12-25 | Nanonex Corporation | Method and apparatus to apply surface release coating for imprint mold |
| US20090114618A1 (en) * | 2007-06-21 | 2009-05-07 | 3M Innovative Properties Company | Method of making hierarchical articles |
| US20080315459A1 (en) * | 2007-06-21 | 2008-12-25 | 3M Innovative Properties Company | Articles and methods for replication of microstructures and nanofeatures |
| US20090041986A1 (en) * | 2007-06-21 | 2009-02-12 | 3M Innovative Properties Company | Method of making hierarchical articles |
| CN101952047A (zh) * | 2007-12-31 | 2011-01-19 | 3M创新有限公司 | 施用可涂覆型材料的方法 |
| EP2269116A4 (en) * | 2008-03-11 | 2011-09-07 | 3M Innovative Properties Co | PHOTOGRAPHIC MASKS HAVING PROTECTIVE LAYER |
| CN102015122A (zh) * | 2008-03-26 | 2011-04-13 | 3M创新有限公司 | 坡流涂布两种或更多种流体的方法 |
| JP5491492B2 (ja) * | 2008-03-26 | 2014-05-14 | スリーエム イノベイティブ プロパティズ カンパニー | 複数ユニットポリマー前駆体を含有するスライド塗布液の方法 |
| JP5519629B2 (ja) * | 2008-03-26 | 2014-06-11 | スリーエム イノベイティブ プロパティズ カンパニー | ２種以上の流体をスライド塗布する方法 |
| WO2010080353A2 (en) * | 2008-12-18 | 2010-07-15 | 3M Innovative Properties Company | Method of contacting hydrocarbon-bearing formations with fluorinated phosphate and phosphonate compositions |
| US9096712B2 (en) | 2009-07-21 | 2015-08-04 | 3M Innovative Properties Company | Curable compositions, method of coating a phototool, and coated phototool |
| KR101768237B1 (ko) | 2009-09-16 | 2017-08-14 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 플루오르화된 코팅 및 그로 제조된 포토툴 |
| CN102686642B (zh) | 2009-09-16 | 2016-06-29 | 3M创新有限公司 | 氟化涂料和用其制作的底片 |
| US8420281B2 (en) | 2009-09-16 | 2013-04-16 | 3M Innovative Properties Company | Epoxy-functionalized perfluoropolyether polyurethanes |
| JP5617239B2 (ja) * | 2009-12-25 | 2014-11-05 | 富士通株式会社 | 保護膜付きレジストパターン形成用部材とその製造方法、及びレジストパターンの製造方法 |
| US8747092B2 (en) | 2010-01-22 | 2014-06-10 | Nanonex Corporation | Fast nanoimprinting apparatus using deformale mold |
| US10108086B2 (en) | 2013-03-15 | 2018-10-23 | Nanonex Corporation | System and methods of mold/substrate separation for imprint lithography |
| US10105883B2 (en) | 2013-03-15 | 2018-10-23 | Nanonex Corporation | Imprint lithography system and method for manufacturing |
| US10534120B2 (en) | 2015-04-03 | 2020-01-14 | Moxtek, Inc. | Wire grid polarizer with protected wires |
| US9995864B2 (en) | 2015-04-03 | 2018-06-12 | Moxtek, Inc. | Wire grid polarizer with silane protective coating |
| US10054717B2 (en) * | 2015-04-03 | 2018-08-21 | Moxtek, Inc. | Oxidation and moisture barrier layers for wire grid polarizer |
| US20160289458A1 (en) * | 2015-04-03 | 2016-10-06 | Moxtek, Inc. | Hydrophobic Phosphonate and Silane Chemistry |
| EP3410214B1 (en) * | 2016-01-27 | 2025-07-30 | LG Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
| US10969677B2 (en) | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask |
| KR102126110B1 (ko) | 2016-01-27 | 2020-06-24 | 주식회사 엘지화학 | 필름 마스크, 이의 제조방법, 이를 이용한 패턴 형성 방법 및 이를 이용하여 형성된 패턴 |
| CN114326304B (zh) * | 2021-12-30 | 2024-08-20 | 苏州瑞红电子化学品有限公司 | 一种耐刻蚀的正性光刻胶 |
| JP7365086B1 (ja) | 2023-04-04 | 2023-10-19 | 株式会社ハーベス | パーフルオロポリエーテル基含有ホスホネート化合物、表面処理剤、及び該表面処理剤で処理された物品 |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3492374A (en) | 1963-06-14 | 1970-01-27 | Du Pont | Polyfluoropolyoxa-alkyl phosphates |
| US3306855A (en) | 1966-03-24 | 1967-02-28 | Du Pont | Corrosion and rust inhibited poly (hexafluoropropylene oxide) oil compositions |
| US3810874A (en) | 1969-03-10 | 1974-05-14 | Minnesota Mining & Mfg | Polymers prepared from poly(perfluoro-alkylene oxide) compounds |
| JPS5950444A (ja) | 1982-09-16 | 1984-03-23 | Tokyo Ohka Kogyo Co Ltd | 微細加工用ホトマスク |
| US4514489A (en) | 1983-09-01 | 1985-04-30 | Motorola, Inc. | Photolithography process |
| JPH071390B2 (ja) | 1985-08-19 | 1995-01-11 | 富士写真フイルム株式会社 | 複数の感光性平版印刷版の保管方法 |
| JPH01268696A (ja) | 1988-04-19 | 1989-10-26 | Daikin Ind Ltd | 含フッ素リン酸エステル及びその製法並びに含フッ素防錆剤 |
| JP2582893B2 (ja) | 1989-03-31 | 1997-02-19 | 日立マクセル株式会社 | 有機電解液電池 |
| US5032279A (en) | 1989-09-21 | 1991-07-16 | Occidental Chemical Corporation | Separation of fluids using polyimidesiloxane membrane |
| CA2039667C (en) | 1990-04-07 | 2001-10-02 | Tetsuya Masutani | Leather treatment composition and process for treating leather |
| JPH0473652A (ja) | 1990-07-13 | 1992-03-09 | Sumitomo Metal Mining Co Ltd | 露光方法 |
| JP3020320B2 (ja) | 1991-07-23 | 2000-03-15 | 信越化学工業株式会社 | リソグラフィ−用ペリクル |
| JP3009010B2 (ja) | 1992-05-08 | 2000-02-14 | 東洋紡績株式会社 | 感光性樹脂積層体 |
| IT1256721B (it) | 1992-12-16 | 1995-12-15 | Ausimont Spa | Processo per impartire oleo- ed idro-repellenza alla superficie di materiali ceramici porosi |
| IT1270654B (it) | 1994-10-13 | 1997-05-07 | Ausimont Spa | Processo per impartire oleo- ed idro-repellenza a fibre tessili, pelle cuoio e simili |
| US5550277A (en) | 1995-01-19 | 1996-08-27 | Paciorek; Kazimiera J. L. | Perfluoroalkyl and perfluoroalkylether substituted aromatic phosphates, phosphonates and related compositions |
| US5851674A (en) | 1997-07-30 | 1998-12-22 | Minnesota Mining And Manufacturing Company | Antisoiling coatings for antireflective surfaces and methods of preparation |
| JPH1180594A (ja) | 1997-08-29 | 1999-03-26 | Toagosei Co Ltd | 被覆用樹脂組成物およびこれを被覆してなるフォトマスク |
| US6277485B1 (en) | 1998-01-27 | 2001-08-21 | 3M Innovative Properties Company | Antisoiling coatings for antireflective surfaces and methods of preparation |
| CN1132821C (zh) | 1998-01-27 | 2003-12-31 | 美国3M公司 | 氟化物苯并三唑 |
| US6184187B1 (en) | 1998-04-07 | 2001-02-06 | E. I. Dupont De Nemours And Company | Phosphorus compounds and their use as corrosion inhibitors for perfluoropolyethers |
| US6300042B1 (en) | 1998-11-24 | 2001-10-09 | Motorola, Inc. | Lithographic printing method using a low surface energy layer |
| US6177357B1 (en) | 1999-04-30 | 2001-01-23 | 3M Innovative Properties Company | Method for making flexible circuits |
| US6387787B1 (en) | 2001-03-02 | 2002-05-14 | Motorola, Inc. | Lithographic template and method of formation and use |
| US6824882B2 (en) * | 2002-05-31 | 2004-11-30 | 3M Innovative Properties Company | Fluorinated phosphonic acids |
| US6762013B2 (en) * | 2002-10-04 | 2004-07-13 | Eastman Kodak Company | Thermally developable materials containing fluorochemical conductive layers |
| ATE346852T1 (de) * | 2003-08-21 | 2006-12-15 | 3M Innovative Properties Co | Perfluorpolyetheramidgebundene phosphonate, phosphate und derivate davon |
-
2003
- 2003-08-21 US US10/645,020 patent/US7189479B2/en not_active Expired - Fee Related
-
2004
- 2004-06-30 CN CNA2004800239943A patent/CN1839351A/zh active Pending
- 2004-06-30 WO PCT/US2004/021017 patent/WO2005024520A2/en not_active Ceased
- 2004-06-30 KR KR1020067003411A patent/KR20060080182A/ko not_active Withdrawn
- 2004-06-30 JP JP2006523840A patent/JP2007503016A/ja not_active Withdrawn
- 2004-06-30 EP EP04756433A patent/EP1656588A2/en not_active Withdrawn
-
2007
- 2007-02-05 US US11/671,366 patent/US20070128557A1/en not_active Abandoned