JP2007502032A5 - - Google Patents

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Publication number
JP2007502032A5
JP2007502032A5 JP2006533684A JP2006533684A JP2007502032A5 JP 2007502032 A5 JP2007502032 A5 JP 2007502032A5 JP 2006533684 A JP2006533684 A JP 2006533684A JP 2006533684 A JP2006533684 A JP 2006533684A JP 2007502032 A5 JP2007502032 A5 JP 2007502032A5
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JP
Japan
Prior art keywords
gas
solution
substrate
temperature
partial pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006533684A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007502032A (ja
JP4643582B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2004/018464 external-priority patent/WO2005006396A2/en
Publication of JP2007502032A publication Critical patent/JP2007502032A/ja
Publication of JP2007502032A5 publication Critical patent/JP2007502032A5/ja
Application granted granted Critical
Publication of JP4643582B2 publication Critical patent/JP4643582B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2006533684A 2003-06-11 2004-06-10 過飽和の洗浄溶液を使用したメガソニック洗浄 Expired - Fee Related JP4643582B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US47760203P 2003-06-11 2003-06-11
PCT/US2004/018464 WO2005006396A2 (en) 2003-06-11 2004-06-10 Megasonic cleaning using supersaturated cleaning solution

Publications (3)

Publication Number Publication Date
JP2007502032A JP2007502032A (ja) 2007-02-01
JP2007502032A5 true JP2007502032A5 (zh) 2007-08-02
JP4643582B2 JP4643582B2 (ja) 2011-03-02

Family

ID=34061915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006533684A Expired - Fee Related JP4643582B2 (ja) 2003-06-11 2004-06-10 過飽和の洗浄溶液を使用したメガソニック洗浄

Country Status (6)

Country Link
EP (1) EP1631396A4 (zh)
JP (1) JP4643582B2 (zh)
KR (1) KR101110905B1 (zh)
CN (1) CN1849182A (zh)
TW (1) TWI330552B (zh)
WO (1) WO2005006396A2 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010108641A (ko) * 2000-05-30 2001-12-08 강병근 무우를 주재로한 건강음료 및 그 제조방법
KR20020037177A (ko) * 2000-11-13 2002-05-18 김용현 무를 첨가한 꿀음료
KR100827618B1 (ko) * 2006-05-11 2008-05-07 한국기계연구원 세정용 초음파 장치 및 이를 이용한 초음파 세정시스템
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
WO2008050832A1 (fr) * 2006-10-27 2008-05-02 Tokyo Electron Limited Appareil et procédé de nettoyage de substrat, programme et support d'enregistrement
KR100748480B1 (ko) * 2007-06-27 2007-08-10 한국기계연구원 세정용 초음파 장치를 이용한 초음파 세정시스템
JP4532580B2 (ja) * 2008-08-20 2010-08-25 株式会社カイジョー 超音波洗浄装置
JP4915455B2 (ja) * 2010-02-25 2012-04-11 トヨタ自動車株式会社 車両等大型製品のマイクロバブルによる脱脂システム
JP2014130881A (ja) * 2012-12-28 2014-07-10 Ebara Corp 研磨装置
JP6678448B2 (ja) * 2015-12-22 2020-04-08 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄方法および基板洗浄装置
WO2020095091A1 (en) * 2018-11-06 2020-05-14 Arcelormittal Equipment improving the ultrasound cleaning
JP7233691B2 (ja) * 2019-03-28 2023-03-07 株式会社エアレックス 低温物品の除染方法及びこれに使用するパスボックス

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5368054A (en) 1993-12-17 1994-11-29 International Business Machines Corporation Ultrasonic jet semiconductor wafer cleaning apparatus
JPH1022246A (ja) 1996-07-04 1998-01-23 Tadahiro Omi 洗浄方法
CN1299333C (zh) * 1996-08-20 2007-02-07 奥加诺株式会社 清洗电子元件或其制造设备的元件的方法和装置
US5800626A (en) 1997-02-18 1998-09-01 International Business Machines Corporation Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates
US5849091A (en) * 1997-06-02 1998-12-15 Micron Technology, Inc. Megasonic cleaning methods and apparatus
US6167891B1 (en) * 1999-05-25 2001-01-02 Infineon Technologies North America Corp. Temperature controlled degassification of deionized water for megasonic cleaning of semiconductor wafers
JP3322853B2 (ja) * 1999-08-10 2002-09-09 株式会社プレテック 基板の乾燥装置および洗浄装置並びに乾燥方法および洗浄方法
US6743301B2 (en) 1999-12-24 2004-06-01 mFSI Ltd. Substrate treatment process and apparatus
US6684890B2 (en) * 2001-07-16 2004-02-03 Verteq, Inc. Megasonic cleaner probe system with gasified fluid
US20030084916A1 (en) * 2001-10-18 2003-05-08 Sonia Gaaloul Ultrasonic cleaning products comprising cleaning composition having dissolved gas

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