JP2007300118A5 - - Google Patents

Claims (10)

An etching container for accommodating a plurality of glass substrates arranged in parallel to each other perpendicular to the bottom, and
A bubble injector for injecting bubbles between the glass substrates on the glass substrate accommodated in the etching container,
A substrate etching apparatus including a gas supply device that is disposed outside the etching container and supplies gas to the bubble injector. The bubble injector
An injection plate having a gas passage formed therein;
The substrate etching apparatus according to claim 1, further comprising: a plurality of spray nozzles formed on a surface of the spray plate facing the glass substrate and connected to the gas passage portion. The bubble injector
A frame having an opening in the center;
A first tube disposed within the frame and connected to the gas supply;
A second tube having a plurality of injection ports that are connected to the first tube at regular intervals and vertically cut through the opening, and are formed corresponding to surfaces facing the glass substrates. 2. The substrate etching apparatus according to 1. Arranging a plurality of glass substrates arranged parallel to each other perpendicular to the bottom plate of the etching vessel;
Placing a bubble injector to be interposed between each of the glass substrates;
Supplying gas from the gas supply device disposed outside the etching container to the bubble injector;
A substrate etching method including: a step of ejecting bubbles onto the glass substrate to remove impurities.   5. The substrate according to claim 4, wherein the bubble injector injects bubbles through a plurality of injection nozzles formed on a surface of the injection plate having a gas passage portion connected to the gas supply unit and facing the glass substrate. Etching method. An etching container that houses a plurality of glass substrates arranged in parallel to each other and parallel to the bottom plate;
A bubble injection tube that is arranged so that the arrangement direction of the glass substrate accommodated in the etching container and the longitudinal direction thereof coincide with each other and injects bubbles to the glass substrate,
A substrate etching apparatus comprising: a gas supply device that is disposed outside the etching container and supplies gas to the bubble jet tube.   The substrate etching apparatus according to claim 6, wherein the bubble injection tubes are arranged in a pair with the glass substrate interposed therebetween, and inject bubbles into the glass substrate.   The substrate etching apparatus according to claim 6, wherein the bubble injection tube has a plurality of injection ports formed at regular intervals at positions where bubbles are injected onto the glass substrate. Arranging a plurality of glass substrates arranged parallel to each other perpendicularly to the bottom of the etching vessel;
Placing two bubble jet tubes across the glass substrate;
And a step of removing impurities by ejecting bubbles to the glass substrate while moving the bubble injection tube in a direction intersecting with the direction of arrangement of the glass substrate. The substrate etching method according to claim 9, wherein the bubble jet tubes move at the same speed.