CN104891817B - Soaking type etching machine for glass substrate - Google Patents
Soaking type etching machine for glass substrate Download PDFInfo
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- CN104891817B CN104891817B CN201510314348.2A CN201510314348A CN104891817B CN 104891817 B CN104891817 B CN 104891817B CN 201510314348 A CN201510314348 A CN 201510314348A CN 104891817 B CN104891817 B CN 104891817B
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- inside casing
- glass substrate
- etching machine
- horizontal fixed
- bubbling plate
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Abstract
The invention provides a soaking type etching machine for a glass substrate. The etching machine comprises a trough body (10), a bottom bubbling plate (20) positioned at the bottom of the trough body (10), an inner frame (30) arranged in the trough body (10) and positioned on the bottom bubbling plate (20) and a plurality of layers of inner frame bubbling plates (40) arranged with a certain interval in the inner frame (30). Compared with the structure that a bubbling plate is only arranged at the bottom of a conventional etching machine, the etching machine provided by the invention has the following advantages: the trough liquor circulation in the trough can be strengthened; the resultants generated on the surface of the glass substrate are timely removed; the trough liquor circulation in the trough is enabled to be more uniform; water ripple and abnormal thickness etching are avoided.
Description
Technical field
The present invention relates to the processing procedure field of display, more particularly to a kind of immersion type glass substrate etching machine.
Background technology
In display technology field, liquid crystal display (Liquid Crystal Display, LCD) with fuselage it is thin, save point,
It is radiationless to wait many merits, it is widely used, such as：Mobile phone, personal digital assistant (PDA), digital camera, calculating
Machine screen or notebook screens etc..
Thin film transistor (TFT) (Thin Film Transistor, TFT) liquid crystal display generally comprises housing, in housing
Liquid crystal panel and the backlight module (backlight module) in housing.The operation principle of display panels be
Liquid crystal molecule is placed in the middle of the parallel glass substrate of two panels, whether is powered to controlling liquid crystal molecule change side by glass substrate
To the light of backlight module is reflected generation picture.
The processing procedure of above-mentioned TFT-LCD is generally comprised：Leading portion array (Array) processing procedure, stage casing into box (Cell) processing procedure and after
Section module group assembling processing procedure.Leading portion array process includes again：It is the cleaning of glass substrate and drying, plated film, resist coating, exposure, aobvious
The processing procedures such as shadow, etching, removal photoresist.
FEOL is limited to, the thickness of glass substrate that glass substrate manufacturer can be provided can only arrive 0.5mm, and show and produce
It is even more thin that product require that the thickness of glass substrate has reached 0.3mm.Accordingly, it would be desirable to carry out thinning work to flat glass substrate
Skill, will be realized thinning into the double-sided glass substrate after box by either physically or chemically removing one layer.Wherein, chemistry side
Method is chemical etching, generally glass substrate is etched completely into etching medicinal liquid using immersion way.
Refer to such as Fig. 1, bubbling (bubble) mechanism is arranged at the only bottom of immersion type etching machine 100 of existing glass substrate
110 drive tank liquors circulation, but this bottom bubble mechanisms 110 can not uniformly by the reaction product (Sludge) of glass surface and
When remove, and glass surface etching solution replacement rate is low, once bottom bubble mechanisms 110 deform or part hole position therein
111 blockings, will cause to etch abnormal glass substrate after water ripples being produced on the glass substrate after such as etching or being etched
Thickness abnormity.Furthermore, increase with glass from generation to generation, need the glass size for carrying out thinning technique to be continuously increased, the glass of G5.1 generations
Glass size increases 1200mm*1300mm by 730mm*920mm compared to G4.5 generations, for existing immersion type etching side
Formula, drives the difficulty of overall tank liquor circulation to increase only by bottom bubble mechanisms, and the abnormal risk of corresponding etching is also increasing
Plus.
The content of the invention
It is an object of the invention to provide a kind of immersion type glass substrate etching machine, is provided with multilamellar bubbling plate in equipment,
Tank liquor circulation in strengthening device so that the product of glass surface can be removed in time, and tank liquor interior circulation can be made more uniform.
For achieving the above object, the present invention provides a kind of immersion type glass substrate etching machine, it is characterised in that including a groove
Body, the bottom bubbling plate positioned at the cell body bottom, be placed in the cell body and be located at the bottom bubbling plate on inside casing and
Positioned at several layers of spaced inside casing bubbling plate of interior inframe；
The bottom bubbling plate includes several sparger tubes respectively with inside casing bubbling plate, and the sparger tube has multiple drums
Abscess.
Several horizontal fixed strips are arranged at intervals with the two lateral walls of the inside casing respectively vertically, it is described relative
Several horizontal fixed strip on two side is oppositely arranged respectively.
Bearing of trend of the horizontal fixed strip towards on the side inside inside casing along the horizontal fixed strip is provided with several
Spaced first groove, first groove are used to fix glass substrate to be etched.
Bearing of trend on the upper surface of the horizontal fixed strip along the horizontal fixed strip is provided with several spaced
Second groove, second groove are used to fix the inside casing bubbling plate.
Several sparger tubes of the inside casing bubbling plate are arranged in several second grooves on the horizontal fixed strip respectively
In, so that the inside casing bubbling plate is fixed on the horizontal fixed strip.
To be fixedly connected between the horizontal fixed strip and the inside casing, the inside casing bubbling plate and the horizontal fixed strip
Between to be fixedly connected.
First groove is crisscross arranged on the horizontal fixed strip with second groove.
The air vent openings of the bubble holes on the sparger tube are downward.
The plurality of bubble holes are uniformly distributed along sparger tube, and each bubble holes are circular blister hole.
The inside casing bubbling plate also includes the outer pipeline support being connected with several sparger tubes of the inside casing bubbling plate,
The wall outer position relative to the horizontal fixed strip in the inside casing side is provided with extension bearing structure, and the extension bearing structure is used
In the carrying outer pipeline support.
Beneficial effects of the present invention：The immersion type glass substrate etching machine of the present invention, by arranging multilamellar drum in interior inframe
Bubble plate, compared in existing etching machine, only bottom is provided with the structure of bubbling plate, can strengthen tank liquor circulation in groove, make glass substrate
The product that surface produces is timely removed, and tank liquor circulation in groove can be made more uniform, it is to avoid water ripples and thickness etching
Abnormal generation.
In order to be able to be further understood that the feature and technology contents of the present invention, refer to below in connection with the detailed of the present invention
Illustrate and accompanying drawing, but accompanying drawing only provides with reference to and illustrates to use, not for being any limitation as to the present invention.
Description of the drawings
Below in conjunction with the accompanying drawings, described in detail by the specific embodiment to the present invention, technical scheme will be made
And other beneficial effects are apparent.
In accompanying drawing,
Fig. 1 is the dimensional structure diagram of existing immersion type glass substrate etching machine；
Fig. 2 is the dimensional structure diagram of the immersion type glass substrate etching machine of the present invention；
Fig. 3 be the present invention immersion type glass substrate etching machine in horizontal fixed strip dimensional structure diagram；
Fig. 4 be the present invention immersion type glass substrate etching machine in horizontal fixed strip front view；
Fig. 5 be the present invention immersion type glass substrate etching machine in horizontal fixed strip top view；
Top views of the Fig. 6 for the monolayer inside casing bubbling plate in the immersion type glass substrate etching machine of Fig. 2.
Specific embodiment
Further to illustrate the technological means taken of the present invention and its effect, below in conjunction with embodiments of the invention and
Its accompanying drawing is described in detail.
Refer to Fig. 2-6, the present invention provides a kind of immersion type glass substrate etching machine, including a cell body 10, positioned at described
The bottom bubbling plate 20 of 10 bottom of cell body, be placed in the cell body 10 and the inside casing 30 on the bottom bubbling plate 20, and
The several layers of spaced inside casing bubbling plate 40 in inside casing 30；
The bottom bubbling plate 20 includes several sparger tubes with inside casing bubbling plate 40, has equal on the sparger tube
The circular blister hole of even distribution；
Specifically, the air vent openings in the circular blister hole on the sparger tube are downward.The opposite sides of the inside casing 30
Several vertically spaced horizontal fixed strips 31 are respectively equipped with wall, it is several laterally solid in the two lateral walls
Determine bar 31 to be correspondingly arranged respectively.
Bearing of trend of the horizontal fixed strip 31 towards on the side inside inside casing 30 along the horizontal fixed strip 31 sets
There are several spaced first grooves 311, first groove 311 is used to fix glass substrate to be etched.
Bearing of trend on the upper surface of the horizontal fixed strip 31 along the fixed strip 31 is provided with several spaced
Second groove 312, second groove 312 are used to fix the inside casing bubbling plate 40；Specifically, the inside casing bubbling plate 40
Several sparger tubes are arranged in several second grooves 312 on the horizontal fixed strip 31 respectively, so that inside casing drum
Bubble plate 40 is fixed on horizontal fixed strip 31.
Preferably, between the horizontal fixed strip 31 and the inside casing 30 to be fixedly connected, the inside casing bubbling plate 40 with
It is to be fixedly connected between the horizontal fixed strip 31 so that the inside casing bubbling plate 40 is mounted directly and is fixed on inside casing 30,
Without the need for dismounting per batch.
Specifically, during use, after being put into glass substrate in inside casing 30, two sides of glass substrate are respectively clamped into inside casing 30
Two lateral walls on multiple horizontal fixed strip 31 in the first groove 311 for opening up to realize fixation.Due to described first
Groove 311 is crisscross arranged on the horizontal fixed strip 31 with second groove 312 so that the glass substrate after fixed with it is every
The sparger tube of layer inside casing bubbling plate 40 is staggered.With reference to Fig. 6, i.e., each glass substrate is respectively positioned on every layer of inside casing bubbling plate 40
Between two adjacent sparger tubes, in the present embodiment, the plane that glass substrate is located is approximately perpendicular to 40 institute of inside casing bubbling plate
Plane.
In actual applications, the number of plies of the inside casing bubbling plate 40 can be according to actual trough body structure and glass substrate size
It is adjusted, the embodiment shown in Fig. 2 is illustrated with the inside casing bubbling plate 40 as three layers.
Fig. 6 is referred to, the inside casing bubbling plate 40 also includes being connected with several sparger tubes of the inside casing bubbling plate 40
Logical outer pipeline support 50, the outer position relative to the horizontal fixed strip 31 of 30 side wall of the inside casing are provided with extension and carry knot
Structure 32, the extension bearing structure 32 are used to carry the outer pipeline support 50.The inside casing bubbling plate 40 also include respectively with
Intake line support and outlet tube that the outer pipeline support 50 at several sparger tube two ends of the inside casing bubbling plate 40 is connected
Road support.
Outer pipeline support 50 is hollow pipeline structure in the present invention, all in monolayer inside casing bubbling plate 40 for connecting
Sparger tube.Specifically, the two ends of each sparger tube are by outer pipeline support 50 and intake line support or output pipe
Support is connected.Equally, intake line support and output pipe support are hollow pipeline structure.
In sum, immersion type glass substrate etching machine of the invention, by arranging multilamellar bubbling plate in interior inframe, compares
In existing etching machine, only bottom is provided with the structure of bubbling plate, can strengthen tank liquor circulation in groove, produce glass baseplate surface
Product be timely removed, and tank liquor circulation can be made in groove more uniform, it is to avoid the abnormal product of water ripples and thickness etching
It is raw.
The above, for the person of ordinary skill of the art, can be with technology according to the present invention scheme and technology
Other various corresponding changes and deformation are made in design, and all these changes and deformation should all belong to appended right of the invention
The protection domain of requirement.
Claims (10)
1. a kind of immersion type glass substrate etching machine, it is characterised in that including a cell body (10), positioned at the cell body (10) bottom
Bottom bubbling plate (20), be placed in the cell body (10) and the inside casing (30) on the bottom bubbling plate (20), and position
The several layers of spaced inside casing bubbling plate (40) in inside casing (30)；
The bottom bubbling plate (20) includes several sparger tubes respectively with inside casing bubbling plate (40), and the sparger tube has many
Individual bubble holes；
During use, each glass substrate is respectively positioned between two adjacent sparger tubes of every layer of inside casing bubbling plate (40).
2. immersion type glass substrate etching machine as claimed in claim 1, it is characterised in that the opposite sides of the inside casing (30)
Several horizontal fixed strips (31), the several horizontal fixation two lateral walls in are arranged at intervals with wall respectively vertically
Bar (31) is oppositely arranged respectively.
3. immersion type glass substrate etching machine as claimed in claim 2, it is characterised in that horizontal fixed strip (31) direction
Bearing of trend on the internal side of inside casing (30) along the horizontal fixed strip (31) is provided with several spaced first grooves
(311), first groove (311) is for fixing glass substrate to be etched.
4. immersion type glass substrate etching machine as claimed in claim 3, it is characterised in that the horizontal fixed strip (31) it is upper
Bearing of trend on end face along the horizontal fixed strip (31) is provided with several spaced second grooves (312), and described second
Groove (312) is for fixing the inside casing bubbling plate (40).
5. immersion type glass substrate etching machine as claimed in claim 4, it is characterised in that the number of the inside casing bubbling plate (40)
Bar sparger tube is arranged in several second grooves (312) on the horizontal fixed strip (31) respectively, so that the inside casing
Bubbling plate (40) is fixed on the horizontal fixed strip (31).
6. immersion type glass substrate etching machine as claimed in claim 2, it is characterised in that the horizontal fixed strip (31) and institute
State to be fixedly connected between inside casing (30), be the company of fixation between the inside casing bubbling plate (40) and the horizontal fixed strip (31)
Connect.
7. immersion type glass substrate etching machine as claimed in claim 4, it is characterised in that first groove (311) and institute
State the second groove (312) to be crisscross arranged on the horizontal fixed strip (31).
8. immersion type glass substrate etching machine as claimed in claim 1, it is characterised in that the bubble holes on the sparger tube
Air vent openings it is downward.
9. immersion type glass substrate etching machine as claimed in claim 1, it is characterised in that the plurality of bubble holes are along bubbling pipe
Road is uniformly distributed, and each bubble holes are circular blister hole.
10. immersion type glass substrate etching machine as claimed in claim 2, it is characterised in that the inside casing bubbling plate (40) is also
Including the outer pipeline support (50) being connected with several sparger tubes of the inside casing bubbling plate (40), inside casing (30) side wall
The outer position relative to the horizontal fixed strip (31) is provided with extension bearing structure (32), and the extension bearing structure (32) is used
In the carrying outer pipeline support (50).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510314348.2A CN104891817B (en) | 2015-06-09 | 2015-06-09 | Soaking type etching machine for glass substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510314348.2A CN104891817B (en) | 2015-06-09 | 2015-06-09 | Soaking type etching machine for glass substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104891817A CN104891817A (en) | 2015-09-09 |
| CN104891817B true CN104891817B (en) | 2017-05-03 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510314348.2A Active CN104891817B (en) | 2015-06-09 | 2015-06-09 | Soaking type etching machine for glass substrate |
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| Country | Link |
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| CN (1) | CN104891817B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108516692A (en) * | 2018-06-14 | 2018-09-11 | 成都市欣和风特种玻璃有限公司 | Glare glass immersion formula etch process |
| CN108558227A (en) * | 2018-06-14 | 2018-09-21 | 成都市欣和风特种玻璃有限公司 | Glare glass etching formula of liquid |
| CN108558228A (en) * | 2018-06-14 | 2018-09-21 | 成都市欣和风特种玻璃有限公司 | Ultra-thin glass etches formula of liquid |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101062837A (en) * | 2006-04-27 | 2007-10-31 | 三星电子株式会社 | Etching apparatus for glass plate and method of glass etching using the same |
| CN101215100A (en) * | 2008-01-16 | 2008-07-09 | 京东方科技集团股份有限公司 | Flat glass substrate attenuation etching groove |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100595303B1 (en) * | 2001-09-25 | 2006-07-03 | 엘지.필립스 엘시디 주식회사 | Bubble plate for etching, and etching apparatus using the same |
-
2015
- 2015-06-09 CN CN201510314348.2A patent/CN104891817B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101062837A (en) * | 2006-04-27 | 2007-10-31 | 三星电子株式会社 | Etching apparatus for glass plate and method of glass etching using the same |
| CN101215100A (en) * | 2008-01-16 | 2008-07-09 | 京东方科技集团股份有限公司 | Flat glass substrate attenuation etching groove |
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| Publication number | Publication date |
|---|---|
| CN104891817A (en) | 2015-09-09 |
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