JP2007294852A5 - - Google Patents

Download PDF

Info

Publication number
JP2007294852A5
JP2007294852A5 JP2006341355A JP2006341355A JP2007294852A5 JP 2007294852 A5 JP2007294852 A5 JP 2007294852A5 JP 2006341355 A JP2006341355 A JP 2006341355A JP 2006341355 A JP2006341355 A JP 2006341355A JP 2007294852 A5 JP2007294852 A5 JP 2007294852A5
Authority
JP
Japan
Prior art keywords
electrostatic chuck
chuck according
elastic layer
dielectric layer
organic resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006341355A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007294852A (ja
JP4808149B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006341355A priority Critical patent/JP4808149B2/ja
Priority claimed from JP2006341355A external-priority patent/JP4808149B2/ja
Priority to KR1020070029275A priority patent/KR20070098566A/ko
Priority to TW096110483A priority patent/TW200800478A/zh
Publication of JP2007294852A publication Critical patent/JP2007294852A/ja
Publication of JP2007294852A5 publication Critical patent/JP2007294852A5/ja
Application granted granted Critical
Publication of JP4808149B2 publication Critical patent/JP4808149B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006341355A 2006-03-29 2006-12-19 静電チャック Active JP4808149B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006341355A JP4808149B2 (ja) 2006-03-29 2006-12-19 静電チャック
KR1020070029275A KR20070098566A (ko) 2006-03-29 2007-03-26 정전 척
TW096110483A TW200800478A (en) 2006-03-29 2007-03-27 Electrostatic chuck

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006090717 2006-03-29
JP2006090717 2006-03-29
JP2006341355A JP4808149B2 (ja) 2006-03-29 2006-12-19 静電チャック

Publications (3)

Publication Number Publication Date
JP2007294852A JP2007294852A (ja) 2007-11-08
JP2007294852A5 true JP2007294852A5 (enrdf_load_stackoverflow) 2009-11-05
JP4808149B2 JP4808149B2 (ja) 2011-11-02

Family

ID=38765131

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006341355A Active JP4808149B2 (ja) 2006-03-29 2006-12-19 静電チャック

Country Status (3)

Country Link
JP (1) JP4808149B2 (enrdf_load_stackoverflow)
KR (1) KR20070098566A (enrdf_load_stackoverflow)
TW (1) TW200800478A (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010182866A (ja) * 2009-02-05 2010-08-19 Nikon Corp 静電吸着保持装置、露光装置、露光方法及びデバイスの製造方法
JP5846186B2 (ja) * 2010-01-29 2016-01-20 住友大阪セメント株式会社 静電チャック装置および静電チャック装置の製造方法
TWI560803B (en) * 2014-06-13 2016-12-01 Mobile electrostatic chuck and manufacturing method of the same
DE102015210736B3 (de) * 2015-06-11 2016-10-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung mit folie zum elektrostatischen koppeln eines substrats mit einem substratträger
JP6642170B2 (ja) * 2016-03-23 2020-02-05 住友大阪セメント株式会社 静電チャック装置及びその製造方法
JP6808979B2 (ja) * 2016-06-01 2021-01-06 株式会社リコー 入力素子及び入力装置
US10899605B2 (en) * 2018-03-05 2021-01-26 Sharp Kabushiki Kaisha MEMS device and manipulation method for micro-objects
KR102093991B1 (ko) * 2018-08-31 2020-04-23 이지스코 주식회사 고무 탄성체 다이아프램 타입 정전척 및 그 제조방법
KR102292501B1 (ko) * 2019-01-24 2021-08-23 김순훈 정전척
JP7128534B2 (ja) * 2020-05-26 2022-08-31 Ａｉメカテック株式会社 基板組立装置及び基板組立方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0422153A (ja) * 1990-05-17 1992-01-27 Tokyo Electron Ltd 静電吸着装置
JP3805134B2 (ja) * 1999-05-25 2006-08-02 東陶機器株式会社 絶縁性基板吸着用静電チャック
JP3599634B2 (ja) * 2000-04-10 2004-12-08 信越化学工業株式会社 イオン注入機用静電チャック
US20070223173A1 (en) * 2004-03-19 2007-09-27 Hiroshi Fujisawa Bipolar Electrostatic Chuck

Similar Documents

Publication Publication Date Title
JP2007294852A5 (enrdf_load_stackoverflow)
JP2014526346A5 (enrdf_load_stackoverflow)
WO2010132640A3 (en) Electrostatic chuck with polymer protrusions
TW200735254A (en) Electrostatic chuck and producing method thereof
JP2011519394A5 (enrdf_load_stackoverflow)
EP2109116A4 (en) TRANSPARENT CONDUCTIVE MULTILAYER BODY AND TOUCH PANEL COMPRISING SUCH BODY
PT1915472T (pt) Substrato revestido com uma estrutura em camadas compreendendo uma camada de carbono tetraédrico e uma camada exterior mais macia
WO2013113568A3 (en) Substrate holder and lithographic apparatus
TW200631046A (en) Electric double-layer capacitor
WO2008126487A1 (ja) 密封装置
TW200642022A (en) Adhesive transfer method of carbon nanotube layer
WO2009121719A3 (de) Kolbenring
JP2011526845A5 (enrdf_load_stackoverflow)
WO2008108146A1 (ja) 静電チャック
JP2007279724A5 (enrdf_load_stackoverflow)
WO2008045745A3 (en) Chemically-directed electrostatic self-assembly of materials
JP2007294852A (ja) 静電チャック
TW200516690A (en) Electrode sheet for electrostatic chucking device, electrostatic chucking device and method of adsorption
KR101695932B1 (ko) 접촉 대전 발전기 및 그 제조 방법
SG11201909484UA (en) Wafer-retaining elastic film of cmp device
BRPI0806567A2 (pt) Substrato plano, flexível com uma superfície abrasiva, e, uso do substrato plano, flexível
JP2007163849A5 (enrdf_load_stackoverflow)
Suresh et al. The role of chemical microstructures and compositions on the actuation performance of dielectric elastomers: A materials research perspective
JP2007227001A5 (enrdf_load_stackoverflow)
TW200738490A (en) Grip for writing materials