JP2007279451A - Postprocessing apparatus for glass substrate with reduced thickness - Google Patents

Postprocessing apparatus for glass substrate with reduced thickness Download PDF

Info

Publication number
JP2007279451A
JP2007279451A JP2006106644A JP2006106644A JP2007279451A JP 2007279451 A JP2007279451 A JP 2007279451A JP 2006106644 A JP2006106644 A JP 2006106644A JP 2006106644 A JP2006106644 A JP 2006106644A JP 2007279451 A JP2007279451 A JP 2007279451A
Authority
JP
Japan
Prior art keywords
glass substrate
post
unit
processing apparatus
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006106644A
Other languages
Japanese (ja)
Other versions
JP4001209B2 (en
Inventor
Toshihiro Nishiyama
智弘 西山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NISHAMA STAINLESS CHEM KK
Nishiyama Stainless Chemical Co Ltd
Original Assignee
NISHAMA STAINLESS CHEM KK
Nishiyama Stainless Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NISHAMA STAINLESS CHEM KK, Nishiyama Stainless Chemical Co Ltd filed Critical NISHAMA STAINLESS CHEM KK
Priority to JP2006106644A priority Critical patent/JP4001209B2/en
Priority to SG200607235-9A priority patent/SG136855A1/en
Publication of JP2007279451A publication Critical patent/JP2007279451A/en
Application granted granted Critical
Publication of JP4001209B2 publication Critical patent/JP4001209B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Abstract

<P>PROBLEM TO BE SOLVED: To provide a postprocessing apparatus with which a glass substrate for an FPD, of which the thickness is more and more reduced, is suitably handled. <P>SOLUTION: The postprocessing apparatus EQU receives a stuck glass substrate GL of which the thickness is reduced with chemical polishing and conducts postprocessing thereafter. The postprocessing apparatus is constructed by being provided with a conveyance route using a roll RL to convey the glass substrate, an introducing section 1 to pass the received glass substrate to the conveyance route, and a deriving section 5 to receive and derive the glass substrate GL from the conveyance route. The introducing section 1 has a placing section 10 to hold the glass substrate, and a driving section 20 to erect and drop the placing section 10, and performs switching between the dropping state and the erecting state of the placing section 10 in accordance with the reciprocating motion of the driving section 20. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、化学研磨処理などによって薄型化されたガラス基板を、次の工程に円滑に移行させる後処理装置に関し、特にフラットパネルディスプレイ用ガラス基板の後処理装置に関する。   The present invention relates to a post-processing apparatus that smoothly shifts a glass substrate thinned by a chemical polishing process or the like to the next step, and more particularly to a post-processing apparatus for a glass substrate for a flat panel display.

フラットパネルディスプレイ(以下FPDと称す)は、CRTディスプレイのブラウン管のように膨らみを持った表示装置と対比される用語であり、奥行きが少なく省スペースで、且つ、表示パネルに膨らみがない点に大きな特徴があり、液晶ディスプレイ、プラズマディスプレイ、有機ELディスプレイなどが実用化されている。FPDのうち、特に、液晶ディスプレイは、テレビ受像機だけでなく、携帯電話機やコンピュータ機器などの表示装置としても広く普及している。   Flat panel display (hereinafter referred to as FPD) is a term that is contrasted with a display device having a bulge, such as a cathode ray tube of a CRT display, and is significant in that it has a small depth and space-saving, and the display panel does not bulge. There is a feature, and a liquid crystal display, a plasma display, an organic EL display, etc. are put into practical use. Among FPDs, in particular, liquid crystal displays are widely used not only as television receivers but also as display devices for mobile phones and computer equipment.

ところで、液晶ディスプレイの軽量化と薄型化の要請に基づき、最近では、液晶ディスプレイを構成する貼合せガラス基板を極限まで化学研磨する方法が好適に採用されている。具体的には、複数の表示パネル領域PN・・・PNを設けた第一と第二のガラス基板60,60を貼合せ、貼り合わせガラス基板GLの外周62を厳重に封止した状態で、フッ酸を含んだ水溶液に浸漬させて化学研磨して薄型化している(図5参照)。この化学研磨方法によれば、複数枚の表示パネルPN・・・PNをまとめて製造できるだけでなく、機械研磨に比べて処理速度が速いので、生産性に優れるという利点がある。また、貼合せガラス基板GLを限界まで薄型化できるので表示パネルPNの薄型化と軽量化の更なる要請にも応えることができる。   By the way, based on the demand for lighter and thinner liquid crystal displays, recently, a method of chemically polishing a laminated glass substrate constituting a liquid crystal display to the limit is suitably employed. Specifically, the first and second glass substrates 60 and 60 provided with a plurality of display panel regions PN... PN are bonded together, and the outer periphery 62 of the bonded glass substrate GL is tightly sealed. It is immersed in an aqueous solution containing hydrofluoric acid and chemically polished to reduce the thickness (see FIG. 5). According to this chemical polishing method, not only can a plurality of display panels PN... PN be manufactured together, but also the processing speed is higher than that of mechanical polishing, so that there is an advantage that the productivity is excellent. Further, since the laminated glass substrate GL can be thinned to the limit, it is possible to meet further demands for thinning and lightening the display panel PN.

しかし、貼合せガラス基板GLを薄型化すればするほど、化学研磨後の処理が極めて煩雑であるという問題がある。すなわち、化学研磨された貼合せガラス基板GLを、その後の研磨液洗浄処理や板厚測定処理に移行させる場合に、万一、この過程で貼合せガラス基板を傷付けたのでは、それまでの作業が全部無駄になり生産効率や生産コストを著しく悪化させる。なお、貼合せガラス基板の価格は、例えば、数万円/枚のように高価であり、化学研磨処理後の後工程で破損させるか否かは極めて重大な意味をもつ。以上の点は、液晶ディスプレイ用のガラス基板に固有の問題ではなく、他のFPD用のガラス基板にも同様に問題となる。   However, there is a problem that the thinner the laminated glass substrate GL, the more complicated the processing after chemical polishing. In other words, when the bonded glass substrate GL that has been chemically polished is transferred to the subsequent polishing liquid cleaning process or plate thickness measurement process, if the bonded glass substrate is damaged in this process, All become useless, and production efficiency and production cost are remarkably deteriorated. Note that the price of the laminated glass substrate is expensive, for example, tens of thousands of yen / sheet, and whether or not it is damaged in a subsequent process after the chemical polishing treatment has a very important meaning. The above points are not problems inherent to glass substrates for liquid crystal displays, but also to other FPD glass substrates.

本発明は、上記の問題点に鑑みてなされものであり、益々薄型化されるFPD用のガラス基板を適切に扱うことのできる後処理装置を提供することを目的とする。   The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a post-processing apparatus that can appropriately handle an FPD glass substrate that is becoming increasingly thinner.

上記の目的を達成するため、本発明は、薄型化処理されたガラス基板を受入れて、その後の処理を実行する後処理装置であって、前記ガラス基板を搬送する搬送路と、受入れたガラス基板を前記搬送路に引き渡す導入部と、前記搬送路からガラス基板を受取って取り出す導出部とを備えて構成され、前記導入部は、ガラス基板を保持する載置部と、前記載置部を起立及び降下させる駆動部とを有し、前記駆動部の往復運動に対応して、前記載置部が降下状態と起立状態とに切り換るようになっている。   In order to achieve the above object, the present invention is a post-processing device that receives a thinned glass substrate and performs subsequent processing, a transport path for transporting the glass substrate, and the received glass substrate. And a lead-out part that receives and takes out the glass substrate from the transport path, and the introduction part stands the mounting part that holds the glass substrate and the mounting part described above. And a lowering drive unit, and the placement unit switches between a lowered state and an upright state corresponding to the reciprocating motion of the drive unit.

本発明のガラス基板は、好ましくは、一対のガラス基板を貼合わせた貼合せガラス基板である。更に好ましくは、液晶ディスプレイ用の貼合せガラス基板である。   The glass substrate of the present invention is preferably a laminated glass substrate obtained by laminating a pair of glass substrates. More preferably, it is a laminated glass substrate for a liquid crystal display.

前記薄型化処理は、好ましくは、フッ酸を含有する化学研磨液を用いて実行される。また、前記搬送路を移動する前記ガラス基板に対して、洗浄処理と液切り処理とを施すのが好ましい。更にまた、前記搬送路を移動する前記ガラス基板に対して、板厚計測処理を施すのが好ましい。   The thinning process is preferably performed using a chemical polishing liquid containing hydrofluoric acid. Moreover, it is preferable to perform a cleaning process and a liquid draining process on the glass substrate that moves in the transport path. Furthermore, it is preferable to perform a plate thickness measurement process on the glass substrate moving on the conveyance path.

前記載置部と前記駆動部とは、好適には、前記駆動部の出力回転軸を通して連結されている。前記載置部は、好適には、一対の回動アームと、前記一対の回動アームに両端を保持されて前記ガラス基板を支持する複数の支持板とを中心に構成されている。更に好適には、前記駆動部は、出力軸の両端を回転可能に軸支する保持部と、前記出力軸に固着される連結腕と、前記連結腕を揺動させる駆動源とを備えて構成されている。   The mounting portion and the driving portion are preferably connected through an output rotation shaft of the driving portion. The mounting portion is preferably configured around a pair of pivot arms and a plurality of support plates that are held at both ends by the pair of pivot arms and support the glass substrate. More preferably, the drive unit includes a holding unit that rotatably supports both ends of the output shaft, a connection arm fixed to the output shaft, and a drive source that swings the connection arm. Has been.

上記した本発明は、ガラス基板を保持する載置部と、前記載置部を起立及び降下させる駆動部とを有する導入部を特徴的に具備するので、ガラス基板を如何に薄型化しても、これを適切に扱うことができる。   Since the present invention described above characteristically includes an introduction portion having a placement portion that holds the glass substrate and a drive portion that raises and lowers the placement portion described above, no matter how thin the glass substrate is, This can be handled appropriately.

以下、本発明を実施例に基づいて本発明を詳細に説明する。図1は、化学研磨処理によって薄型化したガラス基板について、洗浄処理、乾燥処理、及び板厚測定処理を連続的に実行する後処理装置EQUを図示したものである。図1には、後処理装置EQUの平面図(a)と、正面図(b)と、左側面図(c)とが概略的に図示されている。   Hereinafter, the present invention will be described in detail based on examples. FIG. 1 illustrates a post-processing apparatus EQU that continuously executes a cleaning process, a drying process, and a plate thickness measurement process on a glass substrate thinned by a chemical polishing process. FIG. 1 schematically shows a plan view (a), a front view (b), and a left side view (c) of the post-processing apparatus EQU.

ここで、ガラス基板GLは、特に限定されないが、本実施例では、二枚のガラス基板60,60の間に、液晶封入領域61を設けた液晶ディスプレイ用の貼合せガラス基板GLを対象としている(図5参照)。また、化学研磨処理も、特に限定されないが、前記した貼合せガラス基板GLの周縁62が耐酸性の封止剤で封止された状態で、例えば、フッ酸を主成分とする研磨液中に浸漬されることで均一に薄型化される。   Here, the glass substrate GL is not particularly limited, but in this embodiment, the glass substrate GL for a liquid crystal display in which a liquid crystal sealing region 61 is provided between the two glass substrates 60 and 60 is used. (See FIG. 5). Also, the chemical polishing treatment is not particularly limited, but, for example, in a polishing liquid mainly composed of hydrofluoric acid in a state where the peripheral edge 62 of the laminated glass substrate GL is sealed with an acid-resistant sealant. By being immersed, the thickness is uniformly reduced.

図1に示す後処理装置EQUは、研磨処理を終えた貼合せガラス基板GLを受入れる導入部1と、受入れた貼合せガラス基板GLの上下面を水洗浄する洗浄部2と、エアーナイフAKを用いた水切り部3と、乾燥した貼合せガラス基板GLの板厚を計測する計測部4と、計測処理を終えた貼合せガラス基板GLを取り出す導出部5とで構成されている。   The post-processing apparatus EQU shown in FIG. 1 includes an introduction unit 1 that receives a bonded glass substrate GL that has been polished, a cleaning unit 2 that cleans the upper and lower surfaces of the received bonded glass substrate GL, and an air knife AK. It consists of a draining unit 3 used, a measuring unit 4 for measuring the thickness of the dried laminated glass substrate GL, and a deriving unit 5 for taking out the laminated glass substrate GL after the measurement processing.

そして、導入部1から導出部5に向けて、同一平面上に複数の回転ローラRL・・・RLが設けられ、この回転ローラRLの上を貼合せガラス基板GLが搬送される過程で、研磨液の洗浄処理と、乾燥処理と、板厚測定処理とが自動的に実行される。なお、導入部1と導出部5とは、実質的に同一構成であるが、正反対の動作をする。   Then, a plurality of rotating rollers RL... RL are provided on the same plane from the introducing unit 1 to the deriving unit 5, and polishing is performed in the process of transferring the laminated glass substrate GL on the rotating roller RL. The liquid cleaning process, the drying process, and the plate thickness measurement process are automatically executed. In addition, although the introduction part 1 and the derivation | leading-out part 5 are substantially the same structures, the operation | movement of opposite is carried out.

図2及び図3は、導入部1(導出部5)の構成を示す斜視図であり、貼合せガラス基板GLを保持する載置部10と、載置部10を起伏させる駆動部20とを図示している。載置部10と駆動部20は、駆動部20の出力軸21を通して連結されており、駆動部20のピストン往復運動に対応して、載置部10が水平面に位置する降下状態(図2参照)と、60〜80°程度の姿勢に立ち上がる起立状態に切り換るようになっている。   2 and 3 are perspective views showing the configuration of the introduction unit 1 (lead-out unit 5). The mounting unit 10 that holds the laminated glass substrate GL and the drive unit 20 that raises and lowers the mounting unit 10 are shown. It is shown. The placement unit 10 and the drive unit 20 are connected through an output shaft 21 of the drive unit 20 and correspond to the piston reciprocating motion of the drive unit 20 so that the placement unit 10 is positioned in a horizontal plane (see FIG. 2). ) And the standing state rising to a posture of about 60 to 80 °.

図2を参照しつつ載置部10について更に説明すると、図示の載置部10は、櫛状に形成された一対の回動アーム11,11と、回動アーム11の基端に固着される固定ブロック12,12と、貼合せガラス基板GLを支持する複数の支持板13・・・13とを中心に構成されている。   The mounting unit 10 will be further described with reference to FIG. 2. The illustrated mounting unit 10 is fixed to a pair of rotating arms 11 and 11 formed in a comb shape and a base end of the rotating arm 11. The fixing blocks 12 and 12 and a plurality of support plates 13... 13 that support the laminated glass substrate GL are mainly configured.

これら各部11〜13は、例えば、アルミ合金からなり、回動アーム11と固定ブロック12とは、アルミ溶接その他の方法で一体化されている。そして、回動アーム11と固定ブロック12には、出力軸21を受入れる貫通穴が形成されている。なお、貫通穴はキー溝KYを有しており、このキー溝KYに、出力軸21のキーが嵌合することで、出力軸21の回転が回動アーム11,11に確実に伝達されるようになっている。   Each of these parts 11 to 13 is made of, for example, an aluminum alloy, and the rotating arm 11 and the fixed block 12 are integrated by aluminum welding or other methods. A through hole for receiving the output shaft 21 is formed in the rotating arm 11 and the fixed block 12. The through hole has a key groove KY, and the rotation of the output shaft 21 is reliably transmitted to the rotating arms 11 and 11 by fitting the key of the output shaft 21 into the key groove KY. It is like that.

図2(b)に示すように、回動アーム11は、全体としてL字状の本体部BDYと、本体部BDYから突出する櫛歯部CMBとで一体的に構成されている。櫛歯部CMBの配列ピッチは、回転ローラRLの配列ピッチと同一であるが、櫛歯部CMBと回転ローラRLとは互いに半ピッチずれており、回動アーム11の降下状態(図2)では、隣接する回転ローラRL,RLの間に、櫛歯部CMBが進入するようになっている。但し、櫛歯部CMBには、一箇所だけ欠落部SPが設けられており、この欠落部SPを利用して、作業員が貼合せガラス基板GLの裏面まで手を延ばし、確実に貼合せガラス基板GLを把持できるようにしている。なお、回動アーム11の最降下状態では、それまで回動アーム11に保持されていた貼合せガラス基板GLは、回転ローラRLに保持される(図2(b)参照)。   As shown in FIG. 2B, the turning arm 11 is integrally configured by an L-shaped main body part BDY as a whole and a comb tooth part CMB protruding from the main body part BDY. The arrangement pitch of the comb teeth CMB is the same as the arrangement pitch of the rotation rollers RL, but the comb teeth CMB and the rotation rollers RL are shifted from each other by a half pitch, and in the lowered state of the rotation arm 11 (FIG. 2). The comb-tooth portion CMB enters between the adjacent rotating rollers RL and RL. However, the comb tooth portion CMB is provided with a missing portion SP only at one location. Using this missing portion SP, an operator reaches his back to the back surface of the laminated glass substrate GL to ensure the laminated glass. The substrate GL can be gripped. In addition, in the lowest-lowering state of the rotating arm 11, the bonded glass substrate GL that has been held by the rotating arm 11 is held by the rotating roller RL (see FIG. 2B).

図2(b)に示すように、櫛歯部CMBの先端はU字状に突出しており、言い換えると、櫛歯部CMBの先端には、支持板13の板厚に対応した切欠14が形成されている。そして、支持板13の両端が切欠14に嵌合された状態で、回動アーム11の先端に阻止板15が固着され、この阻止板15によって支持板13が回動アーム11に固定的に保持される。   As shown in FIG. 2B, the tip of the comb-tooth portion CMB protrudes in a U-shape. In other words, a notch 14 corresponding to the thickness of the support plate 13 is formed at the tip of the comb-tooth portion CMB. Has been. In the state where both ends of the support plate 13 are fitted in the notches 14, a blocking plate 15 is fixed to the tip of the rotating arm 11, and the supporting plate 13 is fixedly held on the rotating arm 11 by the blocking plate 15. Is done.

支持板13は、詳細には、上下幅の異なる二種類の支持板13A,13Bに区分される。このうち、回動アーム11の基端側に配置される支持板13Aは、その他の支持板13Bより幅広であり、支持板13Aの貼合せガラス基板GL周縁との接触面には、クッション材16が貼着されて貼合せガラス基板GLを保護している。   Specifically, the support plate 13 is divided into two types of support plates 13A and 13B having different vertical widths. Among these, the support plate 13A disposed on the proximal end side of the rotating arm 11 is wider than the other support plates 13B, and the cushion material 16 is provided on the contact surface of the support plate 13A with the peripheral edge of the bonded glass substrate GL. Is attached to protect the laminated glass substrate GL.

一方、その他の支持板13Bには、各々複数個のOリング17が巻着されて、支持板13B上の貼合せガラス基板GLの裏面を保護している。但し、先に説明した通り、図2に示す載置部10の降下状態では、貼合せガラス基板GLは、Oリング17との接触を離れて、回転ローラRLに接触している。   On the other hand, a plurality of O-rings 17 are wound around the other support plate 13B to protect the back surface of the laminated glass substrate GL on the support plate 13B. However, as described above, in the lowered state of the mounting portion 10 illustrated in FIG. 2, the bonded glass substrate GL leaves the contact with the O-ring 17 and is in contact with the rotating roller RL.

図3は、駆動部20の具体的構成を例示する斜視図である。この駆動部20は、出力軸21の両端を回転可能に軸支する保持部22A,22Bと、一方側の保持部22Aから突出する出力軸21に固着される連結腕23と、連結腕23を揺動させる駆動源24とで構成されている。   FIG. 3 is a perspective view illustrating a specific configuration of the drive unit 20. The drive unit 20 includes holding units 22A and 22B that rotatably support both ends of the output shaft 21, a connecting arm 23 fixed to the output shaft 21 protruding from the holding unit 22A on one side, and a connecting arm 23. The drive source 24 is made to swing.

駆動源24は、揺動自在に配置されたシリンダ25と、不図示の制御装置に制御されて往復運動するピストン26とで構成されている。ここで、ピストン26の先端には、円柱穴が径方向に貫通して設けられており、この円柱穴に挿通された貫通ピン27が連結腕23に固定されている。なお、貫通ピン27は、ピストン26の円柱穴に遊嵌されており、その結果、連結腕23とピストン26とは、互いに回動可能に連結される。また、シリンダ25の基端部は、支持軸28によって軸支されており、駆動源24全体として揺動可能に構成されている。   The drive source 24 includes a cylinder 25 that is swingably disposed and a piston 26 that reciprocates under the control of a control device (not shown). Here, a cylindrical hole is provided at the tip of the piston 26 so as to penetrate in a radial direction, and a through pin 27 inserted through the cylindrical hole is fixed to the connecting arm 23. The penetrating pin 27 is loosely fitted in the cylindrical hole of the piston 26. As a result, the connecting arm 23 and the piston 26 are connected to each other so as to be rotatable. Further, the base end portion of the cylinder 25 is supported by a support shaft 28 and is configured to be swingable as a whole of the drive source 24.

連結腕23と駆動源24は上記の通りに連結されているので、ピストン26がシリンダ25に引き込まれる第1状態では(図1(d)参照)、載置部10が水平状態まで降下する。一方、ピストン26がシリンダ25から突出する第2状態では(図1(b)参照)、載置部10が水平状態から60°〜80°程度立ち上がって起立する。   Since the connecting arm 23 and the drive source 24 are connected as described above, in the first state in which the piston 26 is pulled into the cylinder 25 (see FIG. 1D), the mounting portion 10 is lowered to a horizontal state. On the other hand, in the second state in which the piston 26 protrudes from the cylinder 25 (see FIG. 1B), the mounting portion 10 rises from the horizontal state by about 60 ° to 80 ° and stands up.

以上の点も踏まえて図1に示す後処理装置EQUの動作内容を説明する。係員が制御装置(不図示)に対する適宜なスイッチ操作を行うと、導入部1の駆動部20は、第1状態から第2状態に移行し、その結果、導入部1の載置部10は、降下状態から起立状態に立ち上がる。   Based on the above points, the operation content of the post-processing apparatus EQU shown in FIG. 1 will be described. When the clerk performs an appropriate switch operation on the control device (not shown), the drive unit 20 of the introduction unit 1 shifts from the first state to the second state. As a result, the placement unit 10 of the introduction unit 1 Standing up from a descent state.

この時、導入部1の位置には、化学研磨処理を終えた貼合せガラス基板GLが搬送されているので、係員はその貼合せガラス基板GLを1枚保持し、起立状態の載置部10に載せる。この載置作業時に係員は、貼合せガラス基板GLの上下方向中央の左右縁を把持するが、回動アーム11,11には櫛歯の欠落部SPが設けられているので、この欠落部SPを利用することで、把持した貼合せガラス基板GLをやさしく載置部10に載せることが可能となる。なお、この載置状態では、貼合せガラス基板GLの下方周縁は、支持板13Aのクッション材16に当接し、貼合せガラス基板GLの裏面は、支持板13BのOリング17に当接する。   At this time, the bonded glass substrate GL that has been subjected to the chemical polishing treatment is transported to the position of the introduction unit 1, so the attendant holds one of the bonded glass substrates GL, and the standing mounting unit 10. Put it on. During this placement work, the clerk holds the left and right edges of the center of the laminated glass substrate GL in the vertical direction, but since the pivot arms 11 and 11 are provided with a comb-tooth missing portion SP, this missing portion SP. It is possible to place the gripped laminated glass substrate GL on the placement unit 10 easily. In this mounting state, the lower peripheral edge of the laminated glass substrate GL contacts the cushion material 16 of the support plate 13A, and the back surface of the bonded glass substrate GL contacts the O-ring 17 of the support plate 13B.

その後、係員が更にスイッチ操作を行うと、導入部1の駆動部20は、第2状態から第1状態にゆっくり移行し、導入部1の載置部10は、起立状態から降下状態に戻る。先に説明した通り、載置部10の最降下状態では、貼合せガラス基板GLの裏面は、Oリング17との接触を離れて、回転ローラRLに接触している。   Thereafter, when the clerk performs further switch operation, the drive unit 20 of the introduction unit 1 slowly shifts from the second state to the first state, and the placement unit 10 of the introduction unit 1 returns from the standing state to the lowered state. As described above, in the lowest lowered state of the placement unit 10, the back surface of the laminated glass substrate GL leaves the contact with the O-ring 17 and is in contact with the rotating roller RL.

そのため、載置部10が最降下状態に至った状態で回転ローラRLを回転させることで、導入部1に受け入れられた貼合せガラス基板GLは、水洗浄部2に送られることになる。水洗浄部2を移動する貼合せガラス基板GLの表裏面には、洗浄水が流されるので、化学研磨処理で付着したガラス表面の研磨液が洗い流されることになる。   Therefore, the laminated glass substrate GL received by the introduction unit 1 is sent to the water cleaning unit 2 by rotating the rotation roller RL in a state where the placing unit 10 reaches the lowest lowered state. Since cleaning water flows on the front and back surfaces of the bonded glass substrate GL that moves through the water cleaning unit 2, the polishing liquid on the glass surface that has adhered by the chemical polishing process is washed away.

このような水洗浄部2の動作を経た貼合せガラス基板GLは、その後、水切り部3に送られる。そして、水切り部3では、図1の右方向に搬送中の貼合せガラス基板GLに対して、細い線状に形成された高圧エアーが、勢い良く吹き付けられることによって、貼合せガラス基板GLの表裏面に付着している洗浄水が確実に除去される。そして、貼合せガラス基板GLのその後の搬送によって、貼合せガラス基板の表裏面は乾燥状態となる。   The laminated glass substrate GL that has undergone the operation of the water washing unit 2 is then sent to the draining unit 3. And in the draining part 3, the high pressure air formed in the thin line shape is blown with force with respect to the bonding glass substrate GL currently conveyed in the right direction of FIG. The washing water adhering to the back surface is surely removed. And the front and back of a bonding glass substrate will be in a dry state by the subsequent conveyance of the bonding glass substrate GL.

このようにして表裏面が清浄化された状態で、貼合せガラス基板GLは、計測部4を通過する。計測部4は、搬送路を移動する貼合せガラス基板GLの上下位置に配置された二組のレーザ変位計41,42を備えて構成されている(図4(a)参照)。この計測部4では、貼合せガラス基板GLの外表面及び外裏面で反射される各レーザ光RY1,RY2に基づいて、レーザ変位計41,42と貼合せガラス基板GLとの距離D1,D2を特定している。   The laminated glass substrate GL passes through the measuring unit 4 with the front and back surfaces being cleaned in this way. The measuring unit 4 includes two sets of laser displacement meters 41 and 42 arranged at the upper and lower positions of the bonded glass substrate GL that moves in the conveyance path (see FIG. 4A). In this measurement part 4, based on each laser beam RY1, RY2 reflected by the outer surface and outer back surface of the bonding glass substrate GL, distances D1, D2 between the laser displacement meters 41, 42 and the bonding glass substrate GL are set. I have identified.

そして、二台のレーザ変位計41,42の離間距離D0は、予め正確に特定されているので、W=D0−D1−D2の計算に基づいて、貼合せガラス基板GLの板厚Wを正確に算出することができる。また、この実施例では、各貼合せガラス基板GLについて、その幅方向の3箇所の測定ラインLN1〜LN3について、サンプリング周期毎に板厚を測定している。したがって、各貼合せガラス基板GLの板有のバラツキなどの管理データは、貼合せガラス基板GLの計測部4の通過時に自動的に取得できることになる。   Since the distance D0 between the two laser displacement meters 41 and 42 is accurately specified in advance, the thickness W of the bonded glass substrate GL is accurately determined based on the calculation of W = D0−D1−D2. Can be calculated. Moreover, in this Example, about each bonding glass substrate GL, plate | board thickness is measured for every sampling period about three measurement lines LN1-LN3 of the width direction. Therefore, management data, such as the variation of each laminated glass substrate GL with a plate, can be automatically acquired when the measuring glass 4 passes through the laminated glass substrate GL.

その後、貼合せガラス基板GLは、導出部5の位置に移動して停止する。導出部5は、図2及び図3に示す導入部1と同一構成であり、貼合せガラス基板GLが搬入された状態では、導出部5の載置部10は、降下状態で待機している。   Thereafter, the laminated glass substrate GL moves to the position of the lead-out part 5 and stops. The derivation unit 5 has the same configuration as the introduction unit 1 shown in FIGS. 2 and 3, and the placement unit 10 of the derivation unit 5 stands by in a lowered state in a state where the laminated glass substrate GL is loaded. .

載置部10の上に貼合せガラス基板GLが搬入された状態で、係員が適宜なスイッチ操作を行うと、これに応答して載置部10はゆっくり上昇動作を開始し、それまで回転ローラRLに保持されていた貼合せガラス基板GLは、載置部10の支持板13Bに引き渡されて上昇する。なお、この上昇過程で、ガラス基板GLが、支持板13BのOリング17上を滑ろうとするが、貼合せガラス基板GLの下方側の周縁はクッション材16で受け止められるので、貼合せガラス基板GLが滑って破損するおそれはない。   When the clerk performs an appropriate switch operation in a state where the laminated glass substrate GL is carried on the placement unit 10, the placement unit 10 starts to slowly move up in response to this, and the rotating roller until then. The laminated glass substrate GL held by the RL is transferred to the support plate 13B of the placement unit 10 and rises. In this ascending process, the glass substrate GL tries to slide on the O-ring 17 of the support plate 13B, but the lower peripheral edge of the laminated glass substrate GL is received by the cushion material 16, and therefore the laminated glass substrate GL. There is no risk of slipping and breaking.

載置部10は、限界位置まで上昇して静止するので、その後、係員は、回動アーム11の欠落部SPを利用して、貼合せガラス基板GLの裏側に手を回しガラス基板GLを把持する。そして、把持した貼合せガラス基板を導出部5から取り出す。取り出された貼合せガラス基板GLは、化学研磨処理によって所定厚さまで薄型化されているので、その後は、貼合せガラス基板GLの周縁の封止を解除して、液晶の封入工程などの次処理に移行される。   Since the mounting part 10 is raised to a limit position and stops, the clerk then uses the missing part SP of the rotating arm 11 to turn the hand to the back side of the laminated glass substrate GL to hold the glass substrate GL. To do. Then, the gripped laminated glass substrate is taken out from the lead-out unit 5. Since the taken out laminated glass substrate GL has been thinned to a predetermined thickness by a chemical polishing process, after that, the sealing of the periphery of the laminated glass substrate GL is released, and a subsequent process such as a liquid crystal sealing step. It is transferred to.

以上の通り、本実施例では、特徴的な構成を有する導入部1と導出部5を備えるので、高価な貼合せガラス基板GLを破損するおそれなく、迅速に化学研磨工程からその後の処理に移行させることができる。典型的には、その後、各表示パネルPNの領域毎に切断分離されて、液晶の封入処理や偏光膜の貼着処理に移行される。   As described above, in this embodiment, since the introduction unit 1 and the lead-out unit 5 having a characteristic configuration are provided, there is no risk of damaging the expensive bonded glass substrate GL, and the process is quickly shifted from the chemical polishing step to the subsequent processing. Can be made. Typically, after that, each display panel PN is cut and separated for each region, and the process proceeds to a liquid crystal sealing process or a polarizing film sticking process.

実施例に係る後処理装置の全体構成を図示したものである。1 illustrates the overall configuration of a post-processing apparatus according to an embodiment. 導入部の一部を示す斜視図である。It is a perspective view which shows a part of introduction part. 導入部の別の一部を示す斜視図である。It is a perspective view which shows another part of introduction part. 計測部の構成と動作を図示したものである。The structure and operation | movement of a measurement part are illustrated. 貼合せガラス基板の概略構成を図示したものである。The schematic structure of a bonded glass substrate is illustrated.

符号の説明Explanation of symbols

GL ガラス基板
EQU 後処理装置
1 導入部
5 導出部
10 載置部
20 駆動部
GL Glass substrate EQ Post-processing device 1 Introducing unit 5 Deriving unit 10 Mounting unit 20 Driving unit

上記の目的を達成するため、本発明は、薄型化処理されたガラス基板を受入れて、その後の処理を実行する後処理装置であって、同一平面上に設けられた複数の回転ローラによって前記ガラス基板を搬送する搬送路と、受入れたガラス基板を前記搬送路の回転ローラに引き渡す導入部とを備えて構成され、前記導入部は、ガラス基板を保持する載置部と、前記載置部を起立及び降下させる駆動部とを有し、前記駆動部の往復運動に対応して、前記載置部が降下状態と起立状態とに切り換るようになっており、前記載置部は、櫛歯部を有して全体として櫛状に形成された左右一対の回動アームと、自らの左右両端が前記櫛歯部に保持される複数の支持板とを有して構成され、前記複数の支持板の上にガラス基板を載置した状態で、前記回動アームを降下させると、隣接する前記回転ローラの間に前記櫛歯部が前記支持板と共に進入することで、前記回転ローラの上にガラス基板が引き渡されるようになっている。 In order to achieve the above object, the present invention is a post-processing apparatus that receives a thinned glass substrate and performs subsequent processing, and the glass is formed by a plurality of rotating rollers provided on the same plane. A transport path for transporting the substrate; and an introduction section for delivering the received glass substrate to the rotation roller of the transport path. The introduction section includes a placement section for holding the glass substrate, and the placement section described above. and a drive unit for erecting and lowering, in response to reciprocating motion of the drive unit, the mounting section has become a換Ru so cut in the descent state and the upright position, the placement section is comb A pair of left and right rotating arms formed in a comb shape with teeth and a plurality of support plates each having its left and right ends held by the comb teeth; With the glass substrate placed on the support plate, When lowering, so that the comb teeth between the rotary rollers adjacent that enters together with the support plate, the glass substrate is transferred onto the rotating roller.

前記載置部と前記駆動部とは、好適には、前記駆動部の出力回転軸を通して連結されている。更に好適には、前記駆動部は、出力軸の両端を回転可能に軸支する保持部と、前記出力軸に固着される連結腕と、前記連結腕を揺動させる駆動源とを備えて構成されている。   The mounting portion and the driving portion are preferably connected through an output rotation shaft of the driving portion. More preferably, the drive unit includes a holding unit that rotatably supports both ends of the output shaft, a connection arm fixed to the output shaft, and a drive source that swings the connection arm. Has been.

上記の目的を達成するため、本発明は、薄型化処理されたガラス基板を受入れて、その後の処理を実行する後処理装置であって、同一平面上に設けられた複数の回転ローラによって前記ガラス基板を搬送する搬送路と、受入れたガラス基板を前記搬送路の回転ローラに引き渡す導入部とを備えて構成され、前記導入部は、ガラス基板を保持する載置部と、前記載置部を起立及び降下させる駆動部とを有し、前記駆動部の往復運動に対応して、前記載置部が降下状態と起立状態とに切り換るようになっており、前記載置部は、前記回転ローラと同一の配列ピッチで本体部から突出された櫛歯部を有して全体として櫛状に形成された左右一対の回動アームと、自らの左右両端が前記櫛歯部に保持される複数の支持板とを有して構成され、前記複数の支持板の上にガラス基板を載置した状態で、前記回動アームを降下させると、隣接する前記回転ローラの間に前記櫛歯部が前記支持板と共に進入することで、前記回転ローラの上にガラス基板が引き渡されるようになっている。 In order to achieve the above object, the present invention is a post-processing apparatus that receives a thinned glass substrate and performs subsequent processing, and the glass is formed by a plurality of rotating rollers provided on the same plane. A transport path for transporting the substrate; and an introduction section for delivering the received glass substrate to the rotation roller of the transport path. The introduction section includes a placement section for holding the glass substrate, and the placement section described above. and a drive unit for erecting and lowering, in response to reciprocating motion of the drive unit, the mounting section has become a換Ru so cut in the descent state and the raised state, the mounting section, the A pair of left and right rotating arms formed in a comb shape as a whole with comb teeth protruding from the main body at the same arrangement pitch as the rotating rollers, and both left and right ends of the arms are held by the comb teeth. A plurality of support plates, the plurality When the rotating arm is lowered while the glass substrate is placed on the support plate, the comb tooth portion enters together with the support plate between the adjacent rotation rollers, so that A glass substrate is handed over.

前記駆動部は、好ましくは、出力軸の両端を回転可能に軸支する保持部と、前記出力軸に固着される連結腕と、前記連結腕を揺動させる駆動源とを備えて構成され前記回動アームに一体化された固定部のキー溝と前記出力軸のキーとが嵌合されて連結されている。 The drive unit is preferably configured to include a holding unit that rotatably supports both ends of the output shaft, a connection arm fixed to the output shaft, and a drive source that swings the connection arm . The key groove of the fixed portion integrated with the rotating arm and the key of the output shaft are fitted and connected.

Claims (7)

薄型化処理されたガラス基板を受入れて、その後の処理を実行する後処理装置であって、前記ガラス基板を搬送する搬送路と、受入れたガラス基板を前記搬送路に引き渡す導入部と、前記搬送路からガラス基板を受取って取り出す導出部とを備えて構成され、
前記導入部は、ガラス基板を保持する載置部と、前記載置部を起立及び降下させる駆動部とを有し、前記駆動部の往復運動に対応して、前記載置部が降下状態と起立状態とに切り換るようになっているフラットパネルディスプレイ用ガラス基板の後処理装置。
A post-processing apparatus that receives a thinned glass substrate and performs subsequent processing, a conveyance path that conveys the glass substrate, an introduction unit that delivers the received glass substrate to the conveyance path, and the conveyance And a lead-out part that receives and takes out the glass substrate from the road,
The introduction part has a placement part for holding the glass substrate and a drive part for raising and lowering the placement part, and the placement part is in a lowered state corresponding to the reciprocating motion of the drive part. A glass substrate post-processing apparatus for a flat panel display which is switched to a standing state.
前記薄型化処理は、フッ酸を含有する化学研磨液を用いて実行される請求項1に記載の後処理装置。 The post-processing apparatus according to claim 1, wherein the thinning process is performed using a chemical polishing liquid containing hydrofluoric acid. 前記搬送路を移動する前記ガラス基板に対して、洗浄処理と液切り処理とが実行される請求項1又は2に記載の後処理装置。 The post-processing apparatus according to claim 1, wherein a cleaning process and a liquid draining process are performed on the glass substrate moving on the transport path. 前記搬送路を移動する前記ガラス基板に対して、板厚計測処理が実行される請求項1〜3の何れかに記載の後処理装置。 The post-processing apparatus in any one of Claims 1-3 with which plate | board thickness measurement process is performed with respect to the said glass substrate which moves the said conveyance path. 前記載置部と前記駆動部とは、前記駆動部の出力回転軸を通して連結されている請求項1〜4の何れかに記載の後処理装置。 The post-processing apparatus according to claim 1, wherein the placement unit and the drive unit are connected through an output rotation shaft of the drive unit. 前記載置部は、一対の回動アームと、前記一対の回動アームに両端を保持されて前記ガラス基板を支持する複数の支持板とを中心に構成されている請求項1〜5の何れかに記載の後処理装置。 Any one of Claims 1-5 in which the said mounting part is comprised centering on a pair of rotation arm and the several support plate which hold | maintains both ends by the said pair of rotation arm, and supports the said glass substrate. A post-processing device according to claim 1. 前記駆動部は、出力軸の両端を回転可能に軸支する保持部と、前記出力軸に固着される連結腕と、前記連結腕を揺動させる駆動源とを備えて構成されている請求項1〜6の何れかに記載の後処理装置。 The drive unit includes a holding unit that rotatably supports both ends of an output shaft, a connecting arm fixed to the output shaft, and a drive source that swings the connecting arm. The post-processing apparatus in any one of 1-6.
JP2006106644A 2006-04-07 2006-04-07 Post-processing device for thin glass substrate Expired - Fee Related JP4001209B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006106644A JP4001209B2 (en) 2006-04-07 2006-04-07 Post-processing device for thin glass substrate
SG200607235-9A SG136855A1 (en) 2006-04-07 2006-10-20 Post-processing apparatus for thinned glass substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006106644A JP4001209B2 (en) 2006-04-07 2006-04-07 Post-processing device for thin glass substrate

Publications (2)

Publication Number Publication Date
JP2007279451A true JP2007279451A (en) 2007-10-25
JP4001209B2 JP4001209B2 (en) 2007-10-31

Family

ID=38680953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006106644A Expired - Fee Related JP4001209B2 (en) 2006-04-07 2006-04-07 Post-processing device for thin glass substrate

Country Status (2)

Country Link
JP (1) JP4001209B2 (en)
SG (1) SG136855A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111959964A (en) * 2020-09-08 2020-11-20 平顶山市安科支护洗选设备有限公司 Vibrating type anti-blocking coal dropping barrel

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62264197A (en) * 1986-02-21 1987-11-17 ゲルハルト・フインクバイナ− Hydraulic lift
JPH0926116A (en) * 1995-07-12 1997-01-28 Nippon Sharyo Seizo Kaisha Ltd Stoker type refuse incinerator
JPH1111661A (en) * 1997-06-23 1999-01-19 Shirai Tekkosho:Kk Feeding device for sheet glass
JPH1191965A (en) * 1997-09-26 1999-04-06 Miura Kikai:Kk Handler mechanism to remove insertion of intervening paper
JPH11220005A (en) * 1997-11-26 1999-08-10 Dainippon Screen Mfg Co Ltd Wafer processing system
JP2003226553A (en) * 2002-02-01 2003-08-12 Nishiyama Stainless Chem Kk Glass substrate for plasma display panel and method for manufacturing the same
JP2005060033A (en) * 2003-08-13 2005-03-10 Hitachi High-Tech Electronics Engineering Co Ltd Thin sheet work transfer device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62264197A (en) * 1986-02-21 1987-11-17 ゲルハルト・フインクバイナ− Hydraulic lift
JPH0926116A (en) * 1995-07-12 1997-01-28 Nippon Sharyo Seizo Kaisha Ltd Stoker type refuse incinerator
JPH1111661A (en) * 1997-06-23 1999-01-19 Shirai Tekkosho:Kk Feeding device for sheet glass
JPH1191965A (en) * 1997-09-26 1999-04-06 Miura Kikai:Kk Handler mechanism to remove insertion of intervening paper
JPH11220005A (en) * 1997-11-26 1999-08-10 Dainippon Screen Mfg Co Ltd Wafer processing system
JP2003226553A (en) * 2002-02-01 2003-08-12 Nishiyama Stainless Chem Kk Glass substrate for plasma display panel and method for manufacturing the same
JP2005060033A (en) * 2003-08-13 2005-03-10 Hitachi High-Tech Electronics Engineering Co Ltd Thin sheet work transfer device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111959964A (en) * 2020-09-08 2020-11-20 平顶山市安科支护洗选设备有限公司 Vibrating type anti-blocking coal dropping barrel
CN111959964B (en) * 2020-09-08 2024-03-26 中平能化集团天工机械制造有限公司 Vibration type anti-blocking coal dropping cylinder

Also Published As

Publication number Publication date
JP4001209B2 (en) 2007-10-31
SG136855A1 (en) 2007-11-29

Similar Documents

Publication Publication Date Title
JP5833959B2 (en) Substrate processing apparatus and substrate processing method
US8186410B2 (en) Separating device
CN107481958B (en) Alignment bonding equipment and alignment bonding method
JP2013117713A (en) Substrate laminating method and substrate laminating system
JP5724152B1 (en) Optical display device production system
JP6397667B2 (en) Bonding apparatus, bonding method, optical display device production system, and optical display device production method
TW200410017A (en) Polarizer bonding device(II)
WO2016006547A1 (en) Bonding apparatus, bonding method, optical-display-device production system, and optical-display-device production method
JP4293150B2 (en) Substrate transfer device, substrate transfer method, and electro-optical device manufacturing method
KR100556339B1 (en) Vertical type apparatus for attaching a polarizing plate to lcd panel
JP4001209B2 (en) Post-processing device for thin glass substrate
JP2011026143A (en) Apparatus and method for sticking workpiece
JP2008191438A (en) Method of sticking optical film, apparatus of sticking optical film and method of manufacturing display panel
JP2013207159A (en) Peeling device
TWI596018B (en) Removing method, removing apparatus and printing system
JP2012001291A (en) Film peeling device and method
JP6346505B2 (en) Bonding apparatus, bonding method, optical display device production system, and optical display device production method
KR20140118325A (en) Touch panel laminating system
KR101430670B1 (en) System for attaching functional film using porous belt
JP2006039238A (en) Sticking device for functional film such as polarizing plate and ar film
TW201026583A (en) Transmission apparatus
JP6322527B2 (en) Printing apparatus, printing method, and carrier used in the printing apparatus
JP2007163694A (en) Apparatus and method for sticking optical film and method for manufacturing display panel
CN104392905B (en) Method and apparatus for peeling film for semiconductor
KR101697130B1 (en) Apparatus for adhering polarized film

Legal Events

Date Code Title Description
TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20070710

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20070807

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100824

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees