JP2007266536A5 - - Google Patents

Download PDF

Info

Publication number
JP2007266536A5
JP2007266536A5 JP2006092965A JP2006092965A JP2007266536A5 JP 2007266536 A5 JP2007266536 A5 JP 2007266536A5 JP 2006092965 A JP2006092965 A JP 2006092965A JP 2006092965 A JP2006092965 A JP 2006092965A JP 2007266536 A5 JP2007266536 A5 JP 2007266536A5
Authority
JP
Japan
Prior art keywords
electrode
plasma
processing
processing apparatus
space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006092965A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007266536A (ja
JP5064708B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006092965A priority Critical patent/JP5064708B2/ja
Priority claimed from JP2006092965A external-priority patent/JP5064708B2/ja
Priority to US11/694,158 priority patent/US20070227666A1/en
Publication of JP2007266536A publication Critical patent/JP2007266536A/ja
Publication of JP2007266536A5 publication Critical patent/JP2007266536A5/ja
Application granted granted Critical
Publication of JP5064708B2 publication Critical patent/JP5064708B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006092965A 2006-03-30 2006-03-30 プラズマ処理装置 Expired - Fee Related JP5064708B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006092965A JP5064708B2 (ja) 2006-03-30 2006-03-30 プラズマ処理装置
US11/694,158 US20070227666A1 (en) 2006-03-30 2007-03-30 Plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006092965A JP5064708B2 (ja) 2006-03-30 2006-03-30 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2007266536A JP2007266536A (ja) 2007-10-11
JP2007266536A5 true JP2007266536A5 (enExample) 2009-04-02
JP5064708B2 JP5064708B2 (ja) 2012-10-31

Family

ID=38639190

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006092965A Expired - Fee Related JP5064708B2 (ja) 2006-03-30 2006-03-30 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JP5064708B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009187673A (ja) * 2008-02-01 2009-08-20 Nec Electronics Corp プラズマ処理装置及び方法
KR102775299B1 (ko) * 2020-04-24 2025-03-06 삼성디스플레이 주식회사 플라즈마 처리 장치

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03138382A (ja) * 1989-10-20 1991-06-12 Nissin Electric Co Ltd 反応性イオンエッチング装置

Similar Documents

Publication Publication Date Title
JP2010520646A5 (enExample)
TW200802597A (en) Plasma processing apparatus and plasma processing method
KR102146501B1 (ko) 프로세싱 챔버에서 튜닝 전극을 사용하여 플라즈마 프로파일을 튜닝하기 위한 장치 및 방법
JP2007266533A5 (enExample)
TW200802598A (en) Plasma processing apparatus and plasma processing method
JP2007250967A5 (enExample)
CN101978094B (zh) 磁控溅射装置和磁控溅射方法
WO2009151009A3 (ja) プラズマ処理装置
JP2020107881A5 (enExample)
TW200802596A (en) Plasma processing method and plasma processing apparatus
JP2005500684A5 (enExample)
TW200644118A (en) Plasma processor
TWI721156B (zh) 電漿處理裝置
JP2025075070A5 (enExample)
JP2007250755A5 (enExample)
US8888951B2 (en) Plasma processing apparatus and electrode for same
WO2009134588A3 (en) Nonplanar faceplate for a plasma processing chamber
CN105190843A (zh) 在处理室中使用调节环来调节等离子体分布的装置和方法
JP2016091812A5 (enExample)
JP2008300687A5 (enExample)
JP2012216737A5 (enExample)
WO2013022306A3 (ko) 플라즈마 발생장치, 플라즈마 발생장치용 회전 전극의 제조방법, 기판의 플라즈마 처리방법, 및 플라즈마를 이용한 혼합 구조의 박막 형성방법
JP5601794B2 (ja) プラズマエッチング装置
JP2006270018A5 (enExample)
JP2006066905A5 (enExample)