JP2007266504A5 - - Google Patents

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Publication number
JP2007266504A5
JP2007266504A5 JP2006092338A JP2006092338A JP2007266504A5 JP 2007266504 A5 JP2007266504 A5 JP 2007266504A5 JP 2006092338 A JP2006092338 A JP 2006092338A JP 2006092338 A JP2006092338 A JP 2006092338A JP 2007266504 A5 JP2007266504 A5 JP 2007266504A5
Authority
JP
Japan
Prior art keywords
substrate
exposure apparatus
liquid
peripheral portion
deformation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006092338A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007266504A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006092338A priority Critical patent/JP2007266504A/ja
Priority claimed from JP2006092338A external-priority patent/JP2007266504A/ja
Priority to US11/685,449 priority patent/US7705969B2/en
Priority to TW096108637A priority patent/TW200739278A/zh
Priority to KR1020070026552A priority patent/KR100883810B1/ko
Publication of JP2007266504A publication Critical patent/JP2007266504A/ja
Publication of JP2007266504A5 publication Critical patent/JP2007266504A5/ja
Withdrawn legal-status Critical Current

Links

JP2006092338A 2006-03-29 2006-03-29 露光装置 Withdrawn JP2007266504A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006092338A JP2007266504A (ja) 2006-03-29 2006-03-29 露光装置
US11/685,449 US7705969B2 (en) 2006-03-29 2007-03-13 Exposure apparatus
TW096108637A TW200739278A (en) 2006-03-29 2007-03-13 Exposure apparatus
KR1020070026552A KR100883810B1 (ko) 2006-03-29 2007-03-19 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006092338A JP2007266504A (ja) 2006-03-29 2006-03-29 露光装置

Publications (2)

Publication Number Publication Date
JP2007266504A JP2007266504A (ja) 2007-10-11
JP2007266504A5 true JP2007266504A5 (OSRAM) 2009-05-14

Family

ID=38558376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006092338A Withdrawn JP2007266504A (ja) 2006-03-29 2006-03-29 露光装置

Country Status (4)

Country Link
US (1) US7705969B2 (OSRAM)
JP (1) JP2007266504A (OSRAM)
KR (1) KR100883810B1 (OSRAM)
TW (1) TW200739278A (OSRAM)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8102512B2 (en) * 2004-09-17 2012-01-24 Nikon Corporation Substrate holding device, exposure apparatus, and device manufacturing method
US7433016B2 (en) 2005-05-03 2008-10-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5020662B2 (ja) 2006-05-26 2012-09-05 キヤノン株式会社 ステージ装置、露光装置、及びデバイス製造方法
US20080137055A1 (en) * 2006-12-08 2008-06-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20080198346A1 (en) * 2007-02-16 2008-08-21 Canon Kabushiki Kaisha Exposure apparatus and method for manufacturing device
US20080198348A1 (en) * 2007-02-20 2008-08-21 Nikon Corporation Apparatus and methods for minimizing force variation from immersion liquid in lithography systems
US8514365B2 (en) * 2007-06-01 2013-08-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2010140958A (ja) * 2008-12-09 2010-06-24 Canon Inc 露光装置及びデバイス製造方法
NL2005874A (en) * 2010-01-22 2011-07-25 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
JP5918965B2 (ja) 2011-10-25 2016-05-18 キヤノン株式会社 加工機システム及び加工機の配置方法
KR101911400B1 (ko) * 2012-05-29 2018-10-24 에이에스엠엘 네델란즈 비.브이. 대상물 홀더 및 리소그래피 장치
WO2013178484A1 (en) * 2012-05-29 2013-12-05 Asml Netherlands B.V. Support apparatus, lithographic apparatus and device manufacturing method
JP5943742B2 (ja) * 2012-07-04 2016-07-05 三菱電機株式会社 半導体試験治具およびそれを用いた半導体試験方法
US10578959B2 (en) 2015-04-29 2020-03-03 Asml Netherlands B.V. Support apparatus, lithographic apparatus and device manufacturing method
JP6556869B2 (ja) 2015-06-23 2019-08-07 エーエスエムエル ネザーランズ ビー．ブイ． 支持装置、リソグラフィ装置、及びデバイス製造方法
WO2024188552A1 (en) * 2023-03-13 2024-09-19 Asml Netherlands B.V. Substrate support and lithographic apparatus

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002158154A (ja) 2000-11-16 2002-05-31 Canon Inc 露光装置
SG121822A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7110081B2 (en) * 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI232357B (en) * 2002-11-12 2005-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7372541B2 (en) * 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101470360B (zh) * 2002-11-12 2013-07-24 Asml荷兰有限公司 光刻装置和器件制造方法
DE60335595D1 (de) * 2002-11-12 2011-02-17 Asml Netherlands Bv Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
JP3953460B2 (ja) 2002-11-12 2007-08-08 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ投影装置
CN1723541B (zh) * 2002-12-10 2010-06-02 株式会社尼康 曝光装置和器件制造方法
JP4529433B2 (ja) 2002-12-10 2010-08-25 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005072132A (ja) 2003-08-21 2005-03-17 Nikon Corp 露光装置及びデバイス製造方法
TWI263859B (en) * 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1695148B1 (en) * 2003-11-24 2015-10-28 Carl Zeiss SMT GmbH Immersion objective
TW201804262A (zh) * 2003-12-03 2018-02-01 尼康股份有限公司 曝光裝置、曝光方法、元件製造方法
JP2005175016A (ja) * 2003-12-08 2005-06-30 Canon Inc 基板保持装置およびそれを用いた露光装置ならびにデバイス製造方法
US7227619B2 (en) * 2004-04-01 2007-06-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005302880A (ja) 2004-04-08 2005-10-27 Canon Inc 液浸式露光装置
JP2007123525A (ja) * 2005-10-27 2007-05-17 Toshiba Corp 液浸露光装置及び半導体装置の製造方法
US7787101B2 (en) * 2006-02-16 2010-08-31 International Business Machines Corporation Apparatus and method for reducing contamination in immersion lithography
US20080198346A1 (en) * 2007-02-16 2008-08-21 Canon Kabushiki Kaisha Exposure apparatus and method for manufacturing device

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