JP2007258634A5 - - Google Patents

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Publication number
JP2007258634A5
JP2007258634A5 JP2006084543A JP2006084543A JP2007258634A5 JP 2007258634 A5 JP2007258634 A5 JP 2007258634A5 JP 2006084543 A JP2006084543 A JP 2006084543A JP 2006084543 A JP2006084543 A JP 2006084543A JP 2007258634 A5 JP2007258634 A5 JP 2007258634A5
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JP
Japan
Prior art keywords
film
sol
gel
ceramic
samples
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Application number
JP2006084543A
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English (en)
Japanese (ja)
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JP5014656B2 (ja
JP2007258634A (ja
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Application filed filed Critical
Priority claimed from JP2006084543A external-priority patent/JP5014656B2/ja
Priority to JP2006084543A priority Critical patent/JP5014656B2/ja
Priority to US12/224,784 priority patent/US20090101070A1/en
Priority to KR1020087025800A priority patent/KR101030937B1/ko
Priority to CNA2007800109093A priority patent/CN101432461A/zh
Priority to PCT/JP2007/053002 priority patent/WO2007111058A1/ja
Publication of JP2007258634A publication Critical patent/JP2007258634A/ja
Publication of JP2007258634A5 publication Critical patent/JP2007258634A5/ja
Publication of JP5014656B2 publication Critical patent/JP5014656B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
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JP2006084543A 2006-03-27 2006-03-27 プラズマ処理装置用部材およびその製造方法 Expired - Fee Related JP5014656B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2006084543A JP5014656B2 (ja) 2006-03-27 2006-03-27 プラズマ処理装置用部材およびその製造方法
PCT/JP2007/053002 WO2007111058A1 (ja) 2006-03-27 2007-02-20 プラズマ処理装置用部材およびその製造方法
KR1020087025800A KR101030937B1 (ko) 2006-03-27 2007-02-20 플라즈마 처리 장치용 부재 및 그 제조 방법
CNA2007800109093A CN101432461A (zh) 2006-03-27 2007-02-20 等离子体处理装置用构件及其制造方法
US12/224,784 US20090101070A1 (en) 2006-03-27 2007-02-20 Member for a Plasma Processing Apparatus and Method of Manufacturing the Same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006084543A JP5014656B2 (ja) 2006-03-27 2006-03-27 プラズマ処理装置用部材およびその製造方法

Publications (3)

Publication Number Publication Date
JP2007258634A JP2007258634A (ja) 2007-10-04
JP2007258634A5 true JP2007258634A5 (enrdf_load_stackoverflow) 2009-03-26
JP5014656B2 JP5014656B2 (ja) 2012-08-29

Family

ID=38540991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006084543A Expired - Fee Related JP5014656B2 (ja) 2006-03-27 2006-03-27 プラズマ処理装置用部材およびその製造方法

Country Status (5)

Country Link
US (1) US20090101070A1 (enrdf_load_stackoverflow)
JP (1) JP5014656B2 (enrdf_load_stackoverflow)
KR (1) KR101030937B1 (enrdf_load_stackoverflow)
CN (1) CN101432461A (enrdf_load_stackoverflow)
WO (1) WO2007111058A1 (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5411460B2 (ja) * 2008-06-24 2014-02-12 一般財団法人ファインセラミックスセンター バリア性能評価方法及びバリア性能評価装置
FR2988404B1 (fr) * 2012-03-21 2015-02-13 Centre Techn Ind Mecanique Procede de depot d'un revetement anticorrosion
KR101740845B1 (ko) 2013-03-28 2017-05-26 오에스지 가부시키가이샤 가공 공구용 경질 피막 및 경질 피막 피복 금속 가공 공구
KR101290539B1 (ko) * 2013-04-15 2013-07-31 와이엠씨 주식회사 아노다이징 필름 제조 방법
CN103639157B (zh) * 2013-11-15 2016-06-08 广州福耀玻璃有限公司 玻璃附件的表面处理方法
TW201546007A (zh) * 2014-06-11 2015-12-16 Creating Nano Technologies Inc 玻璃結構之製造方法與設備
TWI714965B (zh) * 2018-02-15 2021-01-01 日商京瓷股份有限公司 電漿處理裝置用構件及具備其之電漿處理裝置
JP7431176B2 (ja) * 2019-01-10 2024-02-14 日本碍子株式会社 放熱部材
JP2020132947A (ja) * 2019-02-20 2020-08-31 日本特殊陶業株式会社 膜付き部材及びその製造方法
CN115803469B (zh) * 2021-06-28 2024-11-01 株式会社日立高新技术 内壁构件的再生方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3527839B2 (ja) * 1998-01-28 2004-05-17 京セラ株式会社 半導体素子製造装置用部材
JP3510993B2 (ja) * 1999-12-10 2004-03-29 トーカロ株式会社 プラズマ処理容器内部材およびその製造方法
TW593196B (en) * 2001-11-01 2004-06-21 Toray Industries Photosensitive ceramics composition and multi-layer substrate using it
SG107103A1 (en) * 2002-05-24 2004-11-29 Ntu Ventures Private Ltd Process for producing nanocrystalline composites
US7311797B2 (en) * 2002-06-27 2007-12-25 Lam Research Corporation Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
TW200423195A (en) * 2002-11-28 2004-11-01 Tokyo Electron Ltd Internal member of a plasma processing vessel
JP4486372B2 (ja) * 2003-02-07 2010-06-23 東京エレクトロン株式会社 プラズマ処理装置
CN100418187C (zh) * 2003-02-07 2008-09-10 东京毅力科创株式会社 等离子体处理装置、环形部件和等离子体处理方法
JP4603254B2 (ja) * 2003-10-23 2010-12-22 日本曹達株式会社 金属酸化物ゾル液の製造方法、結晶質金属複酸化物ゾルおよび金属酸化物膜
JP2005217350A (ja) * 2004-02-02 2005-08-11 Toto Ltd 耐プラズマ性を有する半導体製造装置用部材およびその作製方法
US20080029032A1 (en) * 2006-08-01 2008-02-07 Sun Jennifer Y Substrate support with protective layer for plasma resistance

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