FI10853U1 - Hopeakoru, -kolikko, -mitali, -ruokailuväline tai -koriste-esine - Google Patents

Hopeakoru, -kolikko, -mitali, -ruokailuväline tai -koriste-esine

Info

Publication number
FI10853U1
FI10853U1 FIU20154053U FIU20154053U FI10853U1 FI 10853 U1 FI10853 U1 FI 10853U1 FI U20154053 U FIU20154053 U FI U20154053U FI U20154053 U FIU20154053 U FI U20154053U FI 10853 U1 FI10853 U1 FI 10853U1
Authority
FI
Finland
Prior art keywords
cutlery
medal
ornament
coin
silver jewelery
Prior art date
Application number
FIU20154053U
Other languages
English (en)
Swedish (sv)
Inventor
Milja Mäkelä
Pekka Soininen
Sami Sneck
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35953681&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=FI10853(U1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FIU20154053U priority Critical patent/FI10853U1/fi
Application granted granted Critical
Publication of FI10853U1 publication Critical patent/FI10853U1/fi

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • A—HUMAN NECESSITIES
    • A44—HABERDASHERY; JEWELLERY
    • A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C27/00—Making jewellery or other personal adornments
    • A44C27/001—Materials for manufacturing jewellery
    • A44C27/005—Coating layers for jewellery
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Paints Or Removers (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Physical Vapour Deposition (AREA)
  • Adornments (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Organic Insulating Materials (AREA)
  • Surface Treatment Of Glass (AREA)
FIU20154053U 2006-02-02 2015-03-17 Hopeakoru, -kolikko, -mitali, -ruokailuväline tai -koriste-esine FI10853U1 (fi)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FIU20154053U FI10853U1 (fi) 2006-02-02 2015-03-17 Hopeakoru, -kolikko, -mitali, -ruokailuväline tai -koriste-esine

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20065082A FI121341B (fi) 2006-02-02 2006-02-02 Hopean suojapinnoitus
FIU20154053U FI10853U1 (fi) 2006-02-02 2015-03-17 Hopeakoru, -kolikko, -mitali, -ruokailuväline tai -koriste-esine

Publications (1)

Publication Number Publication Date
FI10853U1 true FI10853U1 (fi) 2015-04-27

Family

ID=35953681

Family Applications (2)

Application Number Title Priority Date Filing Date
FI20065082A FI121341B (fi) 2006-02-02 2006-02-02 Hopean suojapinnoitus
FIU20154053U FI10853U1 (fi) 2006-02-02 2015-03-17 Hopeakoru, -kolikko, -mitali, -ruokailuväline tai -koriste-esine

Family Applications Before (1)

Application Number Title Priority Date Filing Date
FI20065082A FI121341B (fi) 2006-02-02 2006-02-02 Hopean suojapinnoitus

Country Status (12)

Country Link
US (2) US8883258B2 (fi)
EP (2) EP2468921A1 (fi)
JP (1) JP5297203B2 (fi)
KR (1) KR101442850B1 (fi)
CN (2) CN101379215A (fi)
AT (1) ATE548482T1 (fi)
AU (1) AU2007211451B2 (fi)
DK (1) DK1994202T4 (fi)
EA (1) EA012990B1 (fi)
ES (1) ES2379892T5 (fi)
FI (2) FI121341B (fi)
WO (1) WO2007088249A1 (fi)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200840880A (en) * 2007-04-13 2008-10-16 Hsin-Chih Lin Method of forming protection layer on contour of workpiece
FI20070991L (fi) * 2007-12-19 2009-06-20 Beneq Oy Lasituote, tuotteen käyttö ja valmistusmenetelmä
TR201910676T4 (tr) 2008-07-18 2019-08-21 Neogi Jayant Değerli taşlar üzerinde nanokristal elmas kaplamaların üretilmesine yönelik yöntem.
DE102009041264A1 (de) 2009-09-11 2011-03-24 IPHT Jena Institut für Photonische Technologien e.V. Verfahren zur Herstellung von optisch aktiven Nanostrukturen
DE102009053889B4 (de) 2009-11-20 2014-03-27 C. Hafner Gmbh + Co. Kg Verfahren zur Beschichtung einer metallischen Substratoberfläche mit einer durch einen ALD-Prozess aufgebrachten Materialschicht
US8802202B2 (en) 2010-03-05 2014-08-12 Suneeta S. Neogi Method for imparting tarnish protection or tarnish protection with color appearance to silver, silver alloys, silver films, silver products and other non precious metals
US20110236654A1 (en) * 2010-03-26 2011-09-29 Wen-Kuang Hsu Method of surface treatment and surface treated article provied by the same
CN102206810A (zh) * 2010-03-30 2011-10-05 徐文光 一种表面处理方法以及使用该方法的经表面处理的物品
JP5864089B2 (ja) 2010-08-25 2016-02-17 日亜化学工業株式会社 発光装置の製造方法
CN101974734B (zh) * 2010-11-30 2012-11-21 上海纳米技术及应用国家工程研究中心有限公司 具有多层复合防护膜的基底材料的制备方法
ITVR20120007A1 (it) * 2012-01-13 2013-07-14 Patros S R L Prodotto manufatto per la gioielleria e/o l'orificeria e/o la bigiotteria a base di ossido di zirconio e relativo metodo
US9334573B2 (en) 2012-01-16 2016-05-10 Hitachi Chemical Company, Ltd. Layered silicate silver surface treatment agent, sulfidation prevention film and light-emitting device with treated silver layer
JP5857786B2 (ja) 2012-02-21 2016-02-10 日亜化学工業株式会社 半導体発光素子の製造方法
DE102013100818B4 (de) * 2013-01-28 2023-07-27 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronischer Halbleiterchip und Verfahren zur Herstellung eines optoelektronischen Halbleiterchips
CN103757604A (zh) * 2013-12-25 2014-04-30 上海纳米技术及应用国家工程研究中心有限公司 用于银制品表面防护涂层的制备方法
WO2015102983A1 (en) * 2013-12-31 2015-07-09 Saint-Gobain Performance Plastics Corporation Composite film having superior optical and solar performance
CN104060239B (zh) * 2014-06-06 2017-05-10 华中科技大学 一种金属物品表面保护方法
US20170212280A1 (en) * 2014-07-07 2017-07-27 Scint-X Ab Production of a thin film reflector
US11365481B2 (en) * 2015-10-06 2022-06-21 City University Of Hong Kong Homogeneous and transparent protective coatings for precious metals and copper alloys
EP3173507A1 (de) * 2015-11-25 2017-05-31 Umicore AG & Co. KG Verfahren zur metallorganischen gasphasenabscheidung unter verwendung von lösungen von indiumalkylverbindungen in kohlenwasserstoffen
US10303032B2 (en) 2016-05-09 2019-05-28 Sage Electrochromics, Inc. Electrochromic device including a means for preventing ion migration and a process of forming the same
US10276411B2 (en) 2017-08-18 2019-04-30 Applied Materials, Inc. High pressure and high temperature anneal chamber
US11028480B2 (en) * 2018-03-19 2021-06-08 Applied Materials, Inc. Methods of protecting metallic components against corrosion using chromium-containing thin films
US11015252B2 (en) 2018-04-27 2021-05-25 Applied Materials, Inc. Protection of components from corrosion
US11009339B2 (en) 2018-08-23 2021-05-18 Applied Materials, Inc. Measurement of thickness of thermal barrier coatings using 3D imaging and surface subtraction methods for objects with complex geometries
EP3626854A1 (fr) 2018-09-21 2020-03-25 The Swatch Group Research and Development Ltd Procede pour ameliorer l'adherence d'une couche de protection contre le ternissement de l'argent sur un substrat comprenant une surface argentee
EP3626855A1 (fr) 2018-09-21 2020-03-25 The Swatch Group Research and Development Ltd Procede pour ameliorer l'eclat d'une surface argentee finale d'un substrat protegee contre le ternissement de l'argent par une couche de protection
EP3626856A1 (fr) * 2018-09-21 2020-03-25 The Swatch Group Research and Development Ltd Substrat comprenant une surface argentee protegee contre le ternissement de l'argent et procede de fabrication d'un tel substrat
JP7312056B2 (ja) * 2019-01-07 2023-07-20 日機装株式会社 半導体発光素子および半導体発光素子の製造方法
CN109750273B (zh) * 2019-01-25 2020-01-21 中国地质大学（北京） 一种基于原子层沉积法进行镀膜改善银饰品稳定性的方法
EP3959356A4 (en) 2019-04-26 2023-01-18 Applied Materials, Inc. METHODS FOR PROTECTING AEROSPACE ELEMENTS AGAINST CORROSION AND OXIDATION
US11794382B2 (en) 2019-05-16 2023-10-24 Applied Materials, Inc. Methods for depositing anti-coking protective coatings on aerospace components
US11697879B2 (en) 2019-06-14 2023-07-11 Applied Materials, Inc. Methods for depositing sacrificial coatings on aerospace components
US11466364B2 (en) 2019-09-06 2022-10-11 Applied Materials, Inc. Methods for forming protective coatings containing crystallized aluminum oxide
CN111172511A (zh) * 2020-01-17 2020-05-19 胜科纳米（苏州）有限公司 一种在有机材料表面制备金属膜层的方法
US11519066B2 (en) 2020-05-21 2022-12-06 Applied Materials, Inc. Nitride protective coatings on aerospace components and methods for making the same
CN115734826A (zh) 2020-07-03 2023-03-03 应用材料公司 用于翻新航空部件的方法
KR102392451B1 (ko) * 2020-09-08 2022-04-29 국민대학교산학협력단 시냅틱 트랜지스터 및 이의 제조 방법
US11185139B1 (en) * 2021-03-04 2021-11-30 Oujie Kevin Tong Coating compositions and method for jewelries

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE393967B (sv) * 1974-11-29 1977-05-31 Sateko Oy Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket
CH591566A5 (en) * 1975-02-06 1977-09-30 Selve Usines Metallurg Suisses Transparent layer of amorphous alumina - applied to silver or silver plated objects for decorative or industrial applications
FI57975C (fi) * 1979-02-28 1980-11-10 Lohja Ab Oy Foerfarande och anordning vid uppbyggande av tunna foereningshinnor
US4495254A (en) * 1981-05-18 1985-01-22 Westinghouse Electric Corp. Protectively-coated gold-plated article of jewelry or wristwatch component
JPS62180071A (ja) 1986-01-31 1987-08-07 Sumitomo Electric Ind Ltd 表面に透明硬質膜を有する貴金属製品
JPS63213655A (ja) * 1987-02-27 1988-09-06 Nippon Dento Kogyo Kk 装身具
DE4415122A1 (de) 1994-04-29 1995-11-02 Wmf Wuerttemberg Metallwaren Verfahren zur Verhinderung des Anlaufens von Gegenständen
JPH09176868A (ja) * 1995-12-26 1997-07-08 Yoichi Murayama 銀製品への変色防止用透明保護膜形成法
US6897119B1 (en) * 1999-12-22 2005-05-24 Genus, Inc. Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition
US7513815B2 (en) * 1999-12-23 2009-04-07 General Electric Company Optimal silicon dioxide protection layer thickness for silver lamp reflector
EP1525337A2 (en) 2002-07-30 2005-04-27 ASM America, Inc. Sublimation system employing carrier gas
US7132697B2 (en) * 2003-02-06 2006-11-07 Weimer Alan W Nanomaterials for quantum tunneling varistors
US6773757B1 (en) * 2003-04-14 2004-08-10 Ronald Redline Coating for silver plated circuits
US20100123993A1 (en) * 2008-02-13 2010-05-20 Herzel Laor Atomic layer deposition process for manufacture of battery electrodes, capacitors, resistors, and catalyzers

Also Published As

Publication number Publication date
US20140335272A1 (en) 2014-11-13
US8883258B2 (en) 2014-11-11
EP1994202A1 (en) 2008-11-26
US20090004386A1 (en) 2009-01-01
ATE548482T1 (de) 2012-03-15
DK1994202T3 (da) 2012-04-02
ES2379892T5 (es) 2020-06-18
KR20080103517A (ko) 2008-11-27
WO2007088249A1 (en) 2007-08-09
FI20065082A0 (fi) 2006-02-02
KR101442850B1 (ko) 2014-11-19
CN103215560A (zh) 2013-07-24
EP2468921A1 (en) 2012-06-27
FI20065082A (fi) 2007-08-03
AU2007211451B2 (en) 2011-08-11
CN101379215A (zh) 2009-03-04
FI121341B (fi) 2010-10-15
EP1994202A4 (en) 2010-04-14
AU2007211451A1 (en) 2007-08-09
EA200870142A1 (ru) 2009-02-27
JP5297203B2 (ja) 2013-09-25
DK1994202T4 (da) 2020-02-03
EP1994202B2 (en) 2019-12-18
EA012990B1 (ru) 2010-02-26
ES2379892T3 (es) 2012-05-04
EP1994202B1 (en) 2012-03-07
JP2009525406A (ja) 2009-07-09

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