FI20065082A - Hopeaa suojaava päällystys - Google Patents

Hopeaa suojaava päällystys Download PDF

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Publication number
FI20065082A
FI20065082A FI20065082A FI20065082A FI20065082A FI 20065082 A FI20065082 A FI 20065082A FI 20065082 A FI20065082 A FI 20065082A FI 20065082 A FI20065082 A FI 20065082A FI 20065082 A FI20065082 A FI 20065082A
Authority
FI
Finland
Prior art keywords
silver
protective coating
metal
coating material
coating
Prior art date
Application number
FI20065082A
Other languages
English (en)
Swedish (sv)
Other versions
FI121341B (fi
FI20065082A0 (fi
Inventor
Milja Maekelae
Pekka Soininen
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35953681&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=FI20065082(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20065082A priority Critical patent/FI121341B/fi
Publication of FI20065082A0 publication Critical patent/FI20065082A0/fi
Priority to JP2008552836A priority patent/JP5297203B2/ja
Priority to PCT/FI2007/050056 priority patent/WO2007088249A1/en
Priority to DK07704826.2T priority patent/DK1994202T4/da
Priority to CNA2007800040863A priority patent/CN101379215A/zh
Priority to KR1020087018930A priority patent/KR101442850B1/ko
Priority to EP12158081A priority patent/EP2468921A1/en
Priority to CN2013100854271A priority patent/CN103215560A/zh
Priority to US12/162,051 priority patent/US8883258B2/en
Priority to EA200870142A priority patent/EA012990B1/ru
Priority to ES07704826T priority patent/ES2379892T5/es
Priority to AT07704826T priority patent/ATE548482T1/de
Priority to AU2007211451A priority patent/AU2007211451B2/en
Priority to EP07704826.2A priority patent/EP1994202B2/en
Publication of FI20065082A publication Critical patent/FI20065082A/fi
Publication of FI121341B publication Critical patent/FI121341B/fi
Application granted granted Critical
Priority to US14/445,651 priority patent/US20140335272A1/en
Priority to FIU20154053U priority patent/FI10853U1/fi

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/403Oxides of aluminium, magnesium or beryllium
    • AHUMAN NECESSITIES
    • A44HABERDASHERY; JEWELLERY
    • A44CPERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C27/00Making jewellery or other personal adornments
    • A44C27/001Materials for manufacturing jewellery
    • A44C27/005Coating layers for jewellery
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/405Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]
    • C23C16/45555Atomic layer deposition [ALD] applied in non-semiconductor technology
FI20065082A 2006-02-02 2006-02-02 Hopean suojapinnoitus FI121341B (fi)

Priority Applications (16)

Application Number Priority Date Filing Date Title
FI20065082A FI121341B (fi) 2006-02-02 2006-02-02 Hopean suojapinnoitus
EP07704826.2A EP1994202B2 (en) 2006-02-02 2007-01-31 Protective coating of silver
CN2013100854271A CN103215560A (zh) 2006-02-02 2007-01-31 银的保护性涂敷
ES07704826T ES2379892T5 (es) 2006-02-02 2007-01-31 Revestimiento protector de plata
DK07704826.2T DK1994202T4 (da) 2006-02-02 2007-01-31 Beskyttelsescoating til sølv
CNA2007800040863A CN101379215A (zh) 2006-02-02 2007-01-31 银的保护性涂敷
KR1020087018930A KR101442850B1 (ko) 2006-02-02 2007-01-31 은의 보호 피복
EP12158081A EP2468921A1 (en) 2006-02-02 2007-01-31 Protective coating of metal
JP2008552836A JP5297203B2 (ja) 2006-02-02 2007-01-31 銀の保護被覆
US12/162,051 US8883258B2 (en) 2006-02-02 2007-01-31 Protective coating of silver
EA200870142A EA012990B1 (ru) 2006-02-02 2007-01-31 Защитное покрытие для серебра
PCT/FI2007/050056 WO2007088249A1 (en) 2006-02-02 2007-01-31 Protective coating of silver
AT07704826T ATE548482T1 (de) 2006-02-02 2007-01-31 Schutzbeschichtung für silber
AU2007211451A AU2007211451B2 (en) 2006-02-02 2007-01-31 Protective coating of silver
US14/445,651 US20140335272A1 (en) 2006-02-02 2014-07-29 Protective coating of silver
FIU20154053U FI10853U1 (fi) 2006-02-02 2015-03-17 Hopeakoru, -kolikko, -mitali, -ruokailuväline tai -koriste-esine

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20065082 2006-02-02
FI20065082A FI121341B (fi) 2006-02-02 2006-02-02 Hopean suojapinnoitus

Publications (3)

Publication Number Publication Date
FI20065082A0 FI20065082A0 (fi) 2006-02-02
FI20065082A true FI20065082A (fi) 2007-08-03
FI121341B FI121341B (fi) 2010-10-15

Family

ID=35953681

Family Applications (2)

Application Number Title Priority Date Filing Date
FI20065082A FI121341B (fi) 2006-02-02 2006-02-02 Hopean suojapinnoitus
FIU20154053U FI10853U1 (fi) 2006-02-02 2015-03-17 Hopeakoru, -kolikko, -mitali, -ruokailuväline tai -koriste-esine

Family Applications After (1)

Application Number Title Priority Date Filing Date
FIU20154053U FI10853U1 (fi) 2006-02-02 2015-03-17 Hopeakoru, -kolikko, -mitali, -ruokailuväline tai -koriste-esine

Country Status (12)

Country Link
US (2) US8883258B2 (fi)
EP (2) EP2468921A1 (fi)
JP (1) JP5297203B2 (fi)
KR (1) KR101442850B1 (fi)
CN (2) CN103215560A (fi)
AT (1) ATE548482T1 (fi)
AU (1) AU2007211451B2 (fi)
DK (1) DK1994202T4 (fi)
EA (1) EA012990B1 (fi)
ES (1) ES2379892T5 (fi)
FI (2) FI121341B (fi)
WO (1) WO2007088249A1 (fi)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200840880A (en) * 2007-04-13 2008-10-16 Hsin-Chih Lin Method of forming protection layer on contour of workpiece
FI20070991L (fi) * 2007-12-19 2009-06-20 Beneq Oy Lasituote, tuotteen käyttö ja valmistusmenetelmä
ES2736731T3 (es) 2008-07-18 2020-01-07 Suneeta Neogi Método para producir recubrimientos de diamante nanocristalino sobre piedras preciosas
DE102009041264A1 (de) 2009-09-11 2011-03-24 IPHT Jena Institut für Photonische Technologien e.V. Verfahren zur Herstellung von optisch aktiven Nanostrukturen
DE102009053889B4 (de) 2009-11-20 2014-03-27 C. Hafner Gmbh + Co. Kg Verfahren zur Beschichtung einer metallischen Substratoberfläche mit einer durch einen ALD-Prozess aufgebrachten Materialschicht
US8802202B2 (en) 2010-03-05 2014-08-12 Suneeta S. Neogi Method for imparting tarnish protection or tarnish protection with color appearance to silver, silver alloys, silver films, silver products and other non precious metals
US20110236654A1 (en) * 2010-03-26 2011-09-29 Wen-Kuang Hsu Method of surface treatment and surface treated article provied by the same
CN102206810A (zh) * 2010-03-30 2011-10-05 徐文光 一种表面处理方法以及使用该方法的经表面处理的物品
JP5864089B2 (ja) 2010-08-25 2016-02-17 日亜化学工業株式会社 発光装置の製造方法
CN101974734B (zh) * 2010-11-30 2012-11-21 上海纳米技术及应用国家工程研究中心有限公司 具有多层复合防护膜的基底材料的制备方法
ITVR20120007A1 (it) * 2012-01-13 2013-07-14 Patros S R L Prodotto manufatto per la gioielleria e/o l'orificeria e/o la bigiotteria a base di ossido di zirconio e relativo metodo
KR20140112032A (ko) * 2012-01-16 2014-09-22 히타치가세이가부시끼가이샤 은의 표면 처리제 및 발광 장치
JP5857786B2 (ja) * 2012-02-21 2016-02-10 日亜化学工業株式会社 半導体発光素子の製造方法
DE102013100818B4 (de) * 2013-01-28 2023-07-27 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronischer Halbleiterchip und Verfahren zur Herstellung eines optoelektronischen Halbleiterchips
CN103757604A (zh) * 2013-12-25 2014-04-30 上海纳米技术及应用国家工程研究中心有限公司 用于银制品表面防护涂层的制备方法
US20150185382A1 (en) * 2013-12-31 2015-07-02 Saint-Gobain Performance Plastics Corporation Composite film having superior optical and solar performance
CN104060239B (zh) * 2014-06-06 2017-05-10 华中科技大学 一种金属物品表面保护方法
KR20170028419A (ko) * 2014-07-07 2017-03-13 씬트-엑스 에이비 박막 반사 장치의 제조
US11365481B2 (en) * 2015-10-06 2022-06-21 City University Of Hong Kong Homogeneous and transparent protective coatings for precious metals and copper alloys
EP3173507A1 (de) * 2015-11-25 2017-05-31 Umicore AG & Co. KG Verfahren zur metallorganischen gasphasenabscheidung unter verwendung von lösungen von indiumalkylverbindungen in kohlenwasserstoffen
EP3455673A4 (en) 2016-05-09 2019-12-18 Sage Electrochromics, Inc. ELECTROCHROME DEVICE WITH MEANS FOR PREVENTING ION MIGRATION AND METHOD FOR SHAPING THEM
US10276411B2 (en) 2017-08-18 2019-04-30 Applied Materials, Inc. High pressure and high temperature anneal chamber
CN111936664A (zh) 2018-03-19 2020-11-13 应用材料公司 在航空航天部件上沉积涂层的方法
US11015252B2 (en) 2018-04-27 2021-05-25 Applied Materials, Inc. Protection of components from corrosion
US11009339B2 (en) 2018-08-23 2021-05-18 Applied Materials, Inc. Measurement of thickness of thermal barrier coatings using 3D imaging and surface subtraction methods for objects with complex geometries
EP3626854A1 (fr) 2018-09-21 2020-03-25 The Swatch Group Research and Development Ltd Procede pour ameliorer l'adherence d'une couche de protection contre le ternissement de l'argent sur un substrat comprenant une surface argentee
EP3626856A1 (fr) 2018-09-21 2020-03-25 The Swatch Group Research and Development Ltd Substrat comprenant une surface argentee protegee contre le ternissement de l'argent et procede de fabrication d'un tel substrat
EP3626855A1 (fr) 2018-09-21 2020-03-25 The Swatch Group Research and Development Ltd Procede pour ameliorer l'eclat d'une surface argentee finale d'un substrat protegee contre le ternissement de l'argent par une couche de protection
JP7312056B2 (ja) * 2019-01-07 2023-07-20 日機装株式会社 半導体発光素子および半導体発光素子の製造方法
CN109750273B (zh) * 2019-01-25 2020-01-21 中国地质大学(北京) 一种基于原子层沉积法进行镀膜改善银饰品稳定性的方法
WO2020219332A1 (en) 2019-04-26 2020-10-29 Applied Materials, Inc. Methods of protecting aerospace components against corrosion and oxidation
US11794382B2 (en) 2019-05-16 2023-10-24 Applied Materials, Inc. Methods for depositing anti-coking protective coatings on aerospace components
US11697879B2 (en) 2019-06-14 2023-07-11 Applied Materials, Inc. Methods for depositing sacrificial coatings on aerospace components
US11466364B2 (en) 2019-09-06 2022-10-11 Applied Materials, Inc. Methods for forming protective coatings containing crystallized aluminum oxide
CN111172511A (zh) * 2020-01-17 2020-05-19 胜科纳米(苏州)有限公司 一种在有机材料表面制备金属膜层的方法
US11519066B2 (en) 2020-05-21 2022-12-06 Applied Materials, Inc. Nitride protective coatings on aerospace components and methods for making the same
US11739429B2 (en) 2020-07-03 2023-08-29 Applied Materials, Inc. Methods for refurbishing aerospace components
KR102392451B1 (ko) * 2020-09-08 2022-04-29 국민대학교산학협력단 시냅틱 트랜지스터 및 이의 제조 방법
US11185139B1 (en) * 2021-03-04 2021-11-30 Oujie Kevin Tong Coating compositions and method for jewelries

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE393967B (sv) * 1974-11-29 1977-05-31 Sateko Oy Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket
CH591566A5 (en) * 1975-02-06 1977-09-30 Selve Usines Metallurg Suisses Transparent layer of amorphous alumina - applied to silver or silver plated objects for decorative or industrial applications
FI57975C (fi) * 1979-02-28 1980-11-10 Lohja Ab Oy Foerfarande och anordning vid uppbyggande av tunna foereningshinnor
US4495254A (en) * 1981-05-18 1985-01-22 Westinghouse Electric Corp. Protectively-coated gold-plated article of jewelry or wristwatch component
JPS62180071A (ja) 1986-01-31 1987-08-07 Sumitomo Electric Ind Ltd 表面に透明硬質膜を有する貴金属製品
JPS63213655A (ja) * 1987-02-27 1988-09-06 Nippon Dento Kogyo Kk 装身具
DE4415122A1 (de) 1994-04-29 1995-11-02 Wmf Wuerttemberg Metallwaren Verfahren zur Verhinderung des Anlaufens von Gegenständen
JPH09176868A (ja) * 1995-12-26 1997-07-08 Yoichi Murayama 銀製品への変色防止用透明保護膜形成法
US6897119B1 (en) * 1999-12-22 2005-05-24 Genus, Inc. Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition
US7513815B2 (en) * 1999-12-23 2009-04-07 General Electric Company Optimal silicon dioxide protection layer thickness for silver lamp reflector
KR101183109B1 (ko) 2002-07-30 2012-09-24 에이에스엠 아메리카, 인코포레이티드 캐리어 가스를 이용하는 승화 시스템
US7132697B2 (en) * 2003-02-06 2006-11-07 Weimer Alan W Nanomaterials for quantum tunneling varistors
US6773757B1 (en) * 2003-04-14 2004-08-10 Ronald Redline Coating for silver plated circuits
US20100123993A1 (en) * 2008-02-13 2010-05-20 Herzel Laor Atomic layer deposition process for manufacture of battery electrodes, capacitors, resistors, and catalyzers

Also Published As

Publication number Publication date
KR20080103517A (ko) 2008-11-27
JP2009525406A (ja) 2009-07-09
FI121341B (fi) 2010-10-15
AU2007211451B2 (en) 2011-08-11
EP1994202B1 (en) 2012-03-07
FI20065082A0 (fi) 2006-02-02
KR101442850B1 (ko) 2014-11-19
DK1994202T3 (da) 2012-04-02
EP1994202A1 (en) 2008-11-26
EP1994202B2 (en) 2019-12-18
CN101379215A (zh) 2009-03-04
JP5297203B2 (ja) 2013-09-25
EA200870142A1 (ru) 2009-02-27
DK1994202T4 (da) 2020-02-03
WO2007088249A1 (en) 2007-08-09
EA012990B1 (ru) 2010-02-26
US8883258B2 (en) 2014-11-11
EP2468921A1 (en) 2012-06-27
FI10853U1 (fi) 2015-04-27
AU2007211451A1 (en) 2007-08-09
ES2379892T3 (es) 2012-05-04
US20140335272A1 (en) 2014-11-13
US20090004386A1 (en) 2009-01-01
CN103215560A (zh) 2013-07-24
ES2379892T5 (es) 2020-06-18
ATE548482T1 (de) 2012-03-15
EP1994202A4 (en) 2010-04-14

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