JP2007227952A - Rotary substrate processing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a sheet type rotary substrate processing device of which recovery rate of a used chemical liquid is raised, a device cost is decreased, vibration is suppressed, and atmosphere separation, between the chemical liquid and waste liquid, is performed. <P>SOLUTION: A cup 20 for receiving liquid splashed from a substrate 1 is provided around a rotary mechanism 10 which supports and rotates the substrate 1 horizontally. The cup 20 is coupled with an upper stage liquid guide 30 and a lower stage liquid guide 40 which are cylindrical and lifting type. The upper stage liquid guide 30 overlaps with the power stage liquid guide 40 at a lower waiting position to close a liquid guide-in opening formed between both guides, and moves to an upper recovery position from the waiting position, to guide a first liquid splashed from the substrate 1 to the outside of the cup 20. The lower stage liquid guide 40 moves to an upper recovery position from the waiting position to guide a second liquid splashed from the substrate 1 into the cup 20. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a rotary substrate processing apparatus used for wet processing of substrates such as semiconductor wafers and glass substrates for liquid crystal, and more particularly to a single wafer type rotary substrate processing apparatus that processes the substrates one by one.

  A single-wafer type rotary substrate processing apparatus used in the manufacture of semiconductor devices and liquid crystal panels places a substrate horizontally on a rotor in a processing tank, and rotates the rotor at a predetermined speed while liquid on the upper surface of the substrate. The upper surface is wet-treated by spraying. The liquid sprayed on the upper surface of the substrate is scattered around by centrifugal force. In addition, the rotor is rotated at a high speed in order to remove the liquid accumulated on the substrate after the liquid is sprayed, and at this time, the liquid is scattered from the substrate to the surroundings. In order to collect these scattered liquids, a cup is provided around the rotating mechanism.

  By the way, in this type of rotary substrate processing apparatus, chemical processing such as etching and cleaning processing with pure water may be continuously performed in the same tank. In this case, it is necessary to separate and recover the chemical solution after use and the waste liquid (liquid in which pure water and chemical solution are mixed) generated in the cleaning process, and the following three are known as the separation and recovery mechanism.

  The first is a three-way valve system shown in FIG. In this configuration, a drain pipe 4 is provided at the bottom of a cup 3 provided around a rotating mechanism 2 that rotates the substrate 1, and a three-way valve 4a is provided in the middle of the pipe. And the chemical | medical solution and a waste liquid are isolate | separated and collect | recovered by operating the three-way valve 4a.

  The second method is a cup lifting type shown in FIGS. In this configuration, the cup 3 can be moved up and down by using an expansion / contraction member 5 such as a bellows or a telescope, and a partition portion 3 a for partitioning the inner space of the cup 3 up and down is provided on the inner surface of the cup 3. When recovering the chemical solution, as shown in FIG. 6, the cup 3 is fixed at a height at which the partition portion 3 a is below the substrate 1. Thereby, a chemical | medical solution is collect | recovered by the space above the partition part 3a in the cup 3, and it takes out out of the cup 3 via the flexible pipe | tube 6a. When collecting the waste liquid, as shown in FIG. 7, the cup 3 is fixed to a height at which the partition portion 3 a is above the substrate 1. Thereby, waste liquid is collect | recovered by the space below the partition part 3a in the cup 3, and it is derived | led-out outside the cup 3 via the flexible pipe | tube 6b.

  The third method is a rotor lifting type shown in FIGS. In this configuration, the cup 3 provided with the partition portion 3a is fixed, and the rotating mechanism 2 is moved up and down by the cylinder 7 instead. By moving the rotating mechanism 2 up and down, the chemical solution and the waste solution are separated and recovered as in the case of the cup lifting type. However, since the cup 3 is fixed unlike the case of the cup lifting type, the flexible tubes 6a and 6b are not required, and the chemical solution and waste liquid collected in the cup 3 are pockets 8a attached to the outer surface of the cup 3. , 8b is led out of the cup 3.

  However, these separation and recovery mechanisms have the following problems.

  In the case of the three-way valve system shown in FIG. 5, since a part of the cup 2 and the drain pipe 4 is shared between the chemical liquid and the waste liquid, the first few seconds after switching to the chemical liquid treatment remained in the previous cleaning process. Pure water enters the chemical. For this reason, the chemical | medical solution collect | recovered in the meantime must be made into a waste liquid, and the fall of a chemical | medical solution collection rate is caused.

  In the case of the cup lifting type shown in FIGS. 6 and 7, the cup 3 provided around the rotating mechanism 2 must be lifted and lowered with respect to the rotating mechanism 2. Need to be sealed by. Further, in order to lead the liquid collected in the cup 3 out of the cup 3, it is necessary to use the flexible pipes 6a and 6b for the lead-out pipe. As the chemical solution here, for example, hydrogen fluoride or the like having a very strong corrosive property is used in the case of an etching process. Therefore, depending on the type of the chemical solution, the materials of the expandable member 5 and the flexible pipes 6a and 6b are limited. It becomes expensive.

  In the case of the rotor lifting type shown in FIGS. 8 and 9, since the cup 3 is a fixed type, there is no need to use a flexible pipe as a lead-out pipe for leading the liquid from the cup to the outside of the cup. However, the expansion / contraction member 5 as a sealing member for sealing between the roller 2 and the cup 3 is still necessary. For this reason, the cost which the expansion-contraction member 5 requires remains as a big problem. Moreover, since it is necessary to make the rotating mechanism 2 a movable structure that can be raised and lowered, there is a problem that vibration tends to increase.

  The object of the present invention is to provide a high chemical recovery rate, as well as to reduce the cost of the apparatus by eliminating movable parts that require a flexible material as much as possible, and a rotary type with less vibration It is to provide a substrate processing apparatus.

  In order to achieve the above object, the present applicant has previously filed a patent application for a two-stage cup type rotary substrate processing apparatus by Japanese Patent Application No. 9-288016.

  As shown in FIGS. 10 to 12, this prior application device includes a rotating mechanism 2 that horizontally supports and rotates a substrate 1 to be processed, and a rotating mechanism that collects liquid that is scattered from the substrate 1 by the rotation of the substrate 1. 2 and a cup 3 provided around 2. The cup 3 is divided into a movable upper cup 3A having a cylindrical shape and a fixed lower cup 3B that accommodates the upper cup 3A. The movable upper cup 3 </ b> A moves up and down by the synchronous operation of the cylinders 7 and 7. The upper end portion of the upper cup 3A is an annular upper liquid guide portion 3 'inclined inward. Below the upper liquid guide portion 3 ′, an annular lower liquid guide portion 3 ″ inclined inward is provided as a partition portion that partitions the inner space vertically.

  During standby for loading / unloading the substrate 1, the upper cup 3 </ b> A is held at a position where the upper liquid guide portion 3 ′ is below the substrate 1 as shown in FIG. 10. At the time of the chemical treatment, as shown in FIG. 11, the upper cup 3A is raised to the chemical recovery position where the upper liquid guide portion 3 ′ is located above the substrate 1 and the lower liquid guide portion 3 ″ is below the substrate 1. When the substrate 1 is rotated in this state, the chemical solution on the substrate 1 is collected outside the lower cup 3B (inside the upper cup 3A), and is guided from the first pockets 8a and 8a to the gas-liquid separation box for the chemical solution. At the time of the cleaning process with pure water, the upper cup 20A further moves up to the waste liquid recovery position where the lower liquid guide portion 3 ″ is above the substrate 1, as shown in FIG. When the substrate 1 is rotated in this state, the waste liquid on the substrate 1 is collected in the fixed lower cup 3B and guided to a gas-liquid separation box for waste liquid through the second pockets 8b and 8b.

  Thus, in the prior application apparatus, movable parts that require a flexible material are eliminated as much as possible, and the apparatus price is reduced. Moreover, vibration is suppressed by fixing the rotation mechanism.

  However, on the other hand, the space between the upper liquid guide portion 3 ′ and the lower liquid guide portion 3 ″, which are the chemical liquid inlets of the upper cup 3A, is always open. There is a problem in that the chemical vapor escapes upward from between the lower liquid guide portion 3 ″, and the atmosphere having a high concentration of the chemical and the atmosphere having a low concentration of the chemical generated from the waste liquid are mixed. In order to solve this problem, a down flow is given, but there is a problem that the equipment cost and operation cost of the motor for driving the fan increase. Also, even with downflow, it is difficult to completely separate the atmosphere of the chemical liquid and the waste liquid.

  That is, with the prior application apparatus, even if the chemical solution and the waste liquid can be separated and recovered, it is difficult to separate the respective atmospheres.

  Further, the upper cup 3 </ b> A needs to be lowered to a standby position where the upper liquid guide portion 3 ′ is below the substrate 1. At this time, the lower liquid guide portion 3 ″ is lowered more than necessary below the substrate 1. On the other hand, when the lower liquid guide portion 3 ″ is raised to the waste liquid collecting position, the upper liquid guide portion 3 ′ is recovered by the chemical solution. Raise more than necessary to the top of the position. For this reason, the raising / lowering stroke of the upper cup 3A is very large. The size of the stroke, particularly the downward descent more than necessary, causes the depth of the lower cup 3B to increase, leading to an increase in the height of the apparatus.

  The rotary substrate processing apparatus of the present invention eliminates these disadvantages while retaining the advantages of the prior application apparatus, and is a cup provided around the rotation mechanism to collect one of the two types of liquids. A cylindrical movable lower liquid guide that moves up and down between a standby position below the substrate position and an upper collection position and guides one liquid scattered from the substrate at the upper collection position into the cup, and a substrate A cylindrical, movable upper stage that moves up and down independently from the lower liquid guide between the standby position below the position and the upper collection position and guides the other liquid scattered from the substrate at the upper collection position to the outside of the cup. And a liquid guide.

  In the rotary substrate processing apparatus of the present invention, the double action of the two-stage annular liquid guide that moves up and down independently with respect to the cup suppresses the escape of the chemical vapor while leaving the advantages of the prior application apparatus, and the lifting unit The operation stroke is suppressed.

  That is, the upper liquid guide and the lower liquid guide are overlapped at the standby position below the substrate position. As a result, the liquid outlet opening formed between the upper liquid guide and the lower liquid guide is closed. Further, lowering of the lower liquid guide than necessary is avoided. When recovering the other of the two types of liquids, only the upper liquid guide is raised to a recovery position above the substrate position. Thereby, the liquid outlet formed between the upper liquid guide and the lower liquid guide is opened, and the other liquid that escapes from the substrate is discharged from the liquid outlet to the outside of the cup. When recovering one liquid, the lower liquid guide is raised to a recovery position above the substrate position. As a result, one liquid that escapes from the substrate is collected in the cup.

  When collecting one liquid, if the upper liquid guide is not raised and only the lower liquid guide is raised and overlapped with the upper liquid guide, the liquid outlet between the upper liquid guide and the lower liquid guide is closed. The Further, the upper liquid guide is prevented from rising more than necessary. The upper liquid guide is driven to rise in two stages from the lower standby position, and when the upper liquid guide is driven to the first higher position, the lower liquid guide is held at the lower standby position, and the upper liquid guide is moved to the second stage. If the lower liquid guide is connected to the upper liquid guide so that the lower liquid guide is pulled up to the upper recovery position when driven to the raised position of the eyes, the drive mechanism for the lower liquid guide is not required, and Unnecessary descent of the liquid guide is avoided.

  If an annular splash prevention cover that is inserted inside each liquid guide when the upper liquid guide and the lower liquid guide are raised to the upper recovery position is provided above the rotation mechanism, the liquid splash is effectively prevented. In addition, when the upper liquid guide and the lower liquid guide rise to the upper recovery position, the liquid outlet formed between the upper liquid guide and the lower liquid guide is closed by the scattering prevention cover. .

  The rotary substrate processing apparatus according to the present invention avoids liquid mixing by combining a cup provided around the rotating mechanism with two upper and lower liquid guides that can be moved up and down independently, and has a high chemical recovery rate. Can be secured. Moreover, the movable part which requires a flexible material can be eliminated as much as possible, and the apparatus price can be reduced. Furthermore, since the rotation mechanism can be fixed, vibration can be suppressed. In addition to these, it is possible to prevent the chemical vapor from escaping and to separate the atmosphere of the chemical from the waste liquid, to suppress the cost required to prevent the chemical vapor from escaping, and to suppress the height of the apparatus.

  Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic longitudinal sectional view of a rotary substrate processing apparatus according to an embodiment of the present invention, showing a standby state. FIG. 2 is a schematic longitudinal sectional view of the rotary substrate processing apparatus, showing the time of chemical processing. FIG. 3 is a schematic longitudinal sectional view of the rotary substrate processing apparatus, showing a cleaning process. FIG. 4 is a schematic longitudinal sectional view of the rotary substrate processing apparatus, showing the time of the drying process.

  As shown in FIGS. 1 to 4, the rotary substrate processing apparatus according to the embodiment of the present invention starts from the substrate 1 by rotating the substrate 1 and the rotating mechanism 10 that horizontally supports and rotates the substrate 1 to be processed. A cup 20 provided around the rotating mechanism 10 to collect the scattered liquid, a cylindrical upper liquid guide 30 and a lower liquid guide 40 combined with the cup 20, and an annular provided above the rotating mechanism 10. The anti-scattering cover 50 is provided. These are provided in a casing 60 that also serves as a treatment tank. A clean fan 70 is provided on the ceiling surface of the casing 60 in order to form a downflow.

  The rotation mechanism 10 includes a rotor 11 that horizontally supports the substrate 1 and a drive unit 12. The cup 20 collects the waste liquid. The cup 20 is cylindrical and fixed, and has a double peripheral wall 21. An annular collection portion 20 ′ is integrally provided outside the peripheral wall 21 in order to collect the chemical solution.

  As shown in FIGS. 3 and 4, the waste liquid collected in the cup 20 is taken out below the cup 20 via the conduits 22, 22 serving as exhaust ducts connected to the bottom surface of the cup 20. It is sent to the gas-liquid separation box 23. As shown in FIGS. 1 and 2, the chemical solution collected in the collecting unit 20 ′ provided outside the cup 20 is collected through conduits 24 and 24 connected to the bottom surface of the collecting unit 20 ′. And is sent to a gas-liquid separation box 25 for chemicals. Both liquid recovery systems are arranged 90 ° displaced in the circumferential direction in the horizontal plane in order to avoid interference.

  The upper liquid guide 30 combined with the cup 20 includes a cylindrical portion 31 that is externally fitted to the cup 20, and an inclined portion 32 that is inclined inward from the upper end of the cylindrical portion 31 and extends upward. 32 protrudes above the cup 20. The upper liquid guide 30 is used for recovering the chemical liquid, and is supported by the inner surface of the peripheral wall of the chemical liquid recovery section 20 'so that it can be raised and lowered. The upper liquid guide 30 is moved upward from a standby position by a drive mechanism (not shown). Driven in two stages.

  In the standby position, the upper end (inner edge) of the inclined portion 32 is positioned below the rotor 11. The rising position of the first stage is a chemical solution recovery position, and at this position, the upper end (inner edge) of the inclined portion 32 is located above the substrate 1 on the rotor 11. The second-stage lift position is a pull-up position for pulling up the lower-stage liquid guide 40 to the waste liquid collection position.

  The lower liquid guide 40 is disposed inside the upper liquid guide 30 and is used for collecting the waste liquid. Similar to the upper liquid guide 30, the lower liquid guide 40 includes a cylindrical portion 41 and an inclined portion 42 that is inclined inward from the upper end of the cylindrical portion 41 and extends upward. The cylindrical portion 41 is inserted into the double peripheral wall 21 of the cup 20. The inclined portion 42 protruding above the cup 20 is located below the inclined portion 32 of the upper liquid guide 30 and is inclined inward at an angle that is the same as or slightly smaller than the inclined portion 32.

  The lower liquid guide 40 is supported to be movable up and down with the peripheral wall 21 of the cup 20 as a guide. At the lowest standby position, the upper end (inner edge) of the inclined portion 42 is positioned below the rotor 11 in the same manner as the upper liquid guide 30. To do. The upper liquid guide 30 and the lower liquid guide 40 are connected by a plurality of rods 33, 33,... Arranged at intervals in the circumferential direction. Each rod 33 is coupled and fixed to the inclined portion 32 of the upper liquid guide 30, and extends downward from the inclined portion 32. Each rod 33 is passed through a guide 43 attached to the outer surface of the upper end portion of the cylindrical portion 41 so as to be movable up and down, and is prevented from being detached by a stopper at the lower end.

  Thus, when the upper liquid guide 30 is in the standby position, the rods 33 are inserted deeply into the guides 43, whereby the lower liquid guide 40 is held in the standby position, and the inclined portion 32 of the upper liquid guide 30 is It overlaps with the inclined portion 42 of the lower liquid guide 40 (FIG. 1). While the upper liquid guide 30 is raised to the first raised position (chemical solution collecting position), each rod 33 is pulled out from each guide 43, and the lower liquid guide 40 is held at the standby position (FIG. 2). When the upper liquid guide 30 is raised to the second-stage raised position (pickup position), the lower liquid guide 40 is raised by the upper liquid guide 30 and moved to the waste liquid collection position.

  In order to avoid interference with the rotor 11 when the upper liquid guide 30 and the lower liquid guide 40 are raised, the upper end opening diameters of the inclined portions 32 and 42 are set larger than the outer diameter of the rotor 11.

  An annular scattering prevention cover 50 provided above the rotation mechanism 10 has a cylindrical portion 51 disposed concentrically above the rotor 11 and a flange portion 52 projecting inward from the upper end portion of the cylindrical portion 51. is doing. The cylindrical portion 51 secures a gap between the rotor 11 and the rotor 11 for setting and resetting the substrate 1. The outer diameter of the upper and lower liquid guides 30 and 40 is smaller than the upper end opening diameter of the inclined portions 32 and 42 so as not to hinder the elevation of the upper liquid guide 30 and the lower liquid guide 40. The height of the cylindrical portion 51 is such that the upper liquid guide 30 is raised to the second raised position (pickup position) and the lower liquid guide 40 is raised to the waste liquid collection position, and the inclined portions 32 and 42 of both guides are raised. Is set so as to fit around the cylindrical portion 51.

  Next, functions of the rotary substrate processing apparatus according to the embodiment of the present invention will be described.

  The substrate 1 is set on the rotor 11 in a standby state shown in FIG. 1, that is, in a state where the upper liquid guide 30 is lowered to the standby position. In this state, the upper liquid guide 30 and the lower liquid guide 40 are located at substantially the same height below the rotor 11, and the inclined portion 32 of the upper liquid guide 30 overlaps the inclined portion 42. For this reason, the chemical | medical solution inlet between the inclination parts 32 and 42 is closed over the perimeter, and dispersion | distribution of the chemical | medical solution vapor | steam into the casing 60 is prevented.

  In the casing 60, a down flow is always formed by the clean fan 70. During standby, this downflow passes through the inside of the anti-scatter cover 50 and enters the cup 20 through an annular minute gap formed between the rotor 11 and the liquid guides 30 and 40, and is a conduit for collecting waste liquid. 22 and 22 and the gas-liquid separation box 23 and the like are led out of the casing 60. For this reason, the escape of the waste liquid vapor into the casing 60 is prevented. Accordingly, it is possible to separate the atmosphere of the chemical liquid and the waste liquid even with a relatively weak downflow.

  Further, since the lower liquid guide 40 is substantially at the same height as the upper liquid guide 30, the lower liquid guide 40 is prevented from being lowered more than necessary, and the depth of the cup 20 is suppressed.

  When performing chemical processing, as shown in FIG. 2, the upper liquid guide 30 is driven to the chemical processing position. Thereby, the chemical | medical solution inlet between the inclination parts 32 and 42 opens. Further, the inclined portion 32 of the upper liquid guide 30 is fitted on the cylindrical portion 51 of the anti-scatter cover 50 with a slight gap. The lower liquid guide 40 remains in the standby position. In this state, the substrate 1 rotates, and a chemical solution is sprayed onto the substrate 1 from the chemical solution ejection nozzle 80 in the scattering prevention cover 50. When spraying is completed, the substrate 1 is rotated at a high speed to remove the chemical solution on the substrate 1. The chemical solution on the substrate 1 moves outward due to the centrifugal force accompanying the rotation of the substrate 1, and flows into the recovery portion 20 ′ outside the cup 20 from the chemical solution inlet between the inclined portions 32 and 42 and is recovered.

  At this time, the scattering prevention cover 50 is provided above the rotor 11, and the inclined portion 32 of the upper liquid guide 30 is fitted to the outside thereof. For this reason, scattering of the chemical solution from the substrate 1 is prevented, and the escape of the chemical solution vapor is suppressed to the minimum. Furthermore, since the lower liquid guide 40 remains in the standby position and the gap between the rotor 11 and the rotor 11 is very small, the downflow is mainly from the chemical solution inlet between the inclined portions 32 and 42 to the recovery portion 20 ′ outside the cup 20. Inflow. For this reason, the penetration of the chemical vapor into the cup 20 is also suppressed to a minimum. Therefore, the atmosphere separation of the chemical liquid and the waste liquid is also achieved here.

  When the chemical treatment is completed, the cleaning process is performed. At this time, as shown in FIG. 3, the upper liquid guide 30 is driven from the chemical solution processing position to the upper pulling position. As a result, the lower liquid guide 40 rises to the waste liquid collection position and increases the gap with the rotor 11, and the inclined portion 32 is fitted over the cylindrical portion 51 of the anti-scattering cover 50 with a slight gap. . Further, the inclined portion 32 of the upper liquid guide 30 is continuously fitted to the cylindrical portion 51 of the scattering prevention cover 50 with a slight gap.

  In this state, the substrate 1 rotates, and pure water is sprayed onto the substrate 1 from the pure water ejection nozzle 90 in the scattering prevention cover 50. When spraying is finished, the substrate 1 is rotated at a high speed to remove the waste liquid on the substrate 1. The waste liquid on the substrate 1 moves outward by the centrifugal force accompanying the rotation of the substrate 1, is guided by the inclined portion 42 of the lower liquid guide 40, flows into the cup 20, and is collected.

  At this time, the scattering prevention cover 50 is above the rotor 11, and the inclined portions 32 and 40 of the liquid guides 30 and 40 are doubly fitted on the outside thereof. For this reason, scattering of waste liquid from the substrate 1 is prevented. Further, the chemical solution inlet between the inclined portions 32 and 42 is substantially closed by the cylindrical portion 51 of the anti-scattering cover 50, and the downflow is mainly caused by the increased gap between the lower liquid guide 40 and the rotor 11. 20 flows in. Therefore, here again, the escape of the chemical vapor is suppressed to a minimum, and the chemical liquid and the waste liquid are separated from each other.

  When the cleaning process is completed, a drying process is performed. At this time, as shown in FIG. 4, the upper liquid guide 30 and the lower liquid guide 40 are held at the collection position, and the gas jet nozzle 100 in the scattering prevention cover 50 is placed at the center of the upper surface of the rotating substrate 1. Nitrogen gas is purged and nitrogen gas is purged through the rotation mechanism 10 to the center of the lower surface of the substrate 1. These purge gases are led out of the casing 60 from the inside of the cup 20 through the conduits 22 and 22 for collecting the waste liquid and the gas-liquid separation box 23 together with the down flow.

  According to such separation and recovery, the chemical liquid and the waste liquid are not mixed. Accordingly, there is no reduction in chemical recovery efficiency due to the mixing of waste liquid.

  Since the rotation mechanism 10 is fixed, there is little vibration.

  Since the rotating mechanism 10 is fixed and the cup 20 for collecting the waste liquid is also a fixed type, an expansion member is not required and a flexible tube is not required to seal between the two. Therefore, the apparatus cost does not increase even when a highly corrosive chemical solution is used.

  The double action of the upper liquid guide 30 and the lower liquid guide 40 closes the inclined portions 32 and 42, which are chemical liquid inlets, during standby, so that the chemical liquid vapor is prevented from escaping and the chemical liquid and waste liquid atmosphere can be separated. become. In addition, the equipment cost and operating cost of the clean fan 70 for preventing the escape of the chemical vapor are reduced. Further, since the lower liquid guide 40 is prevented from descending more than necessary, the cup 20 becomes shallow and the height of the apparatus is reduced.

  The combination of the movable liquid guides 30 and 40 and the anti-scattering cover 50 prevents the chemical liquid and the waste liquid from scattering, and further prevents the chemical vapor from escaping and separating the chemical liquid and the waste liquid from the atmosphere.

  Since only the upper liquid guide 30 is forcibly driven, the guide driving mechanism is simple.

  As for the guide drive, the upper liquid guide 30 and the lower liquid guide 40 can be driven independently. According to the independent drive, when the lower liquid guide 40 is at the waste liquid recovery position, the upper liquid guide 30 can be superimposed on the lower liquid guide 40, so that the operation of moving the upper liquid guide 30 upward from the chemical liquid recovery position becomes unnecessary. .

It is a schematic longitudinal cross-sectional view of the rotary substrate processing apparatus which concerns on embodiment of this invention, and shows the time of standby. It is a schematic longitudinal cross-sectional view of the rotary substrate processing apparatus, and shows the time of chemical treatment. It is a schematic longitudinal cross-sectional view of the same rotary substrate processing apparatus, and shows a cleaning process. It is a schematic longitudinal cross-sectional view of the rotary substrate processing apparatus, and shows the time of the drying process. It is a schematic longitudinal cross-sectional view which shows the structure of the conventional rotary substrate processing apparatus (three-way valve type). The structure of a conventional rotary substrate processing apparatus (cup elevating type) is shown in the case of a chemical solution recovery operation, (a) is a schematic plan view, and (b) is a schematic longitudinal sectional view. The structure of a conventional rotary substrate processing apparatus (cup elevating type) is shown in the case of waste liquid recovery operation, (a) is a schematic plan view, and (b) is a schematic longitudinal sectional view. The structure of a conventional rotary substrate processing apparatus (rotor raising / lowering type) is shown in the case of a chemical solution recovery operation, (a) a schematic plan view, and (b) a schematic longitudinal sectional view. The structure of a conventional rotary substrate processing apparatus (rotor raising / lowering type) is shown in the case of a waste liquid recovery operation, (a) a schematic plan view, and (b) a schematic longitudinal sectional view. The rotary substrate processing apparatus of a prior application is shown, (a) is a schematic plan view, (b) is a schematic longitudinal cross-sectional view. The chemical substrate processing time of the rotary substrate processing apparatus is shown, (a) is a schematic plan view, (b) is a schematic longitudinal sectional view. The time of the cleaning process of the rotary substrate processing apparatus is shown, (a) is a schematic plan view, and (b) is a schematic longitudinal sectional view.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Board | substrate 10 Rotating mechanism 11 Rotor 12 Drive part 20 Cup for waste liquid collection | recovery 20 'Chemical solution collection | recovery part 30 Upper stage liquid guide 31 Cylindrical part 32 Inclination part 33 Rod 40 Lower stage liquid guide 41 Cylindrical part 42 Inclination part 43 Guide 50 Scatter prevention cover 60 Casing 70 Clean fan 80 Chemical solution injection nozzle 90 Pure water injection nozzle 100 Gas injection nozzle

Claims (1)

  In a single-wafer type rotary substrate processing apparatus for rotating and supporting a substrate to be processed horizontally by a rotating mechanism and separating and recovering two types of liquid scattered from the substrate by the rotation, one of the two types of liquid A cup provided around the rotation mechanism to collect the liquid, and a liquid that is lifted and lowered between a standby position below the substrate position and an upper collection position, and splashes from the substrate at the upper collection position into the cup. A cylindrical, movable lower liquid guide that guides and moves up and down independently of the lower liquid guide between the standby position below the substrate position and the upper recovery position, and the other liquid that scatters from the substrate at the upper recovery position. A rotary substrate processing apparatus comprising a cylindrical and movable upper liquid guide guided outside the cup.

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