CN105161442B - A kind of cleaning liquid collection device - Google Patents
A kind of cleaning liquid collection device Download PDFInfo
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- CN105161442B CN105161442B CN201510431795.6A CN201510431795A CN105161442B CN 105161442 B CN105161442 B CN 105161442B CN 201510431795 A CN201510431795 A CN 201510431795A CN 105161442 B CN105161442 B CN 105161442B
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- gas
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
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- Engineering & Computer Science (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a kind of cleaning liquid collection device, including induction part, cleaning liquid collects the gentle liquid separate section in part, part is collected to cleaning liquid by induction part and is passed through gas, circular curtain is formed in gas outlet, inelastic collision occurs with the cleaning liquid that crystal column surface is thrown away, cleaning liquid is set to change the direction of motion, into gas and liquid collecting cavity, and separated and discharged by gas-liquid separation device, splash of the liquid rinse medium in liquid collection structure side-walls can be reduced, prevent the generation of secondary pollution, and the organic efficiency of liquid rinse medium can be improved simultaneously.
Description
Technical field
The present invention relates to semiconductor cleaning device field, more particularly, to a kind of cleaning liquid collection device.
Background technology
In recent years, with the continuous diminution of integrated circuit feature size, the requirement for wafer cleaning technique is also increasingly
It is high.Cleaning equipment has also developed into the also higher monolithic cleaning of increasingly complex while precision from initial slot type cleaning.In wafer
During monolithic cleans, drive wafer to rotate using the rotary body of cleaning equipment, can by the cleaning decoction of crystal column surface or
The cleansing mediums such as person's ultra-pure water are thrown away, and recycle or are discharged.
In general, liquid collection structure can be provided with around the rotary body of cleaning equipment.When cleansing medium is rotating
It when being thrown away in the presence of centrifugal force from crystal column surface, touching the side wall of equipment liquid collection structure, can flow down, converge along side wall
Get together, into liquids recovery pipeline or discharge line.In this course, because the liquid particles thrown away at a high speed carry
Very high kinetic energy, when hitting the side wall of liquid collection structure, bounce-back can be likely to occur, causes chemical reagent and wash products
Splash pollutes to the edge of wafer, even wafer rear., can be in wafer if this pollution can not be removed in time
Defect is caused at edge and the back side, especially during follow-up high-temperature processing technology, can make crystal round fringes and the pollutant at the back side
Front is diffused into, has a strong impact on the quality of wafer.On the other hand, the splash of liquid rinse medium will also result in the waste of decoction,
Increase production cost.
In existing technology, at present still without the method that can effectively prevent liquid rinse medium splash so that wafer
Quality can not further improve.
Therefore, it is necessary to provide a kind of cleaning liquid collection device simple in construction, easy to use, nationality is with by rational
Structure design, and corresponding technical arrangement plan, cleansing medium is reduced in the splash of the side-walls of liquid collection structure, is prevented
The generation of secondary pollution, while improve the organic efficiency of liquid rinse medium.
The content of the invention
It is an object of the invention to overcome drawbacks described above existing for prior art, there is provided a kind of simple in construction, easy to use
Cleaning liquid collection device, by rational structure design, and corresponding technical arrangement plan, cleansing medium can be reduced and existed
The splash of the side-walls of liquid collection structure, the generation of secondary pollution is prevented, and the recovery of liquid rinse medium can be improved simultaneously
Efficiency.
To achieve the above object, technical scheme is as follows：
A kind of cleaning liquid collection device, for wafer monolithic cleaning equipment, including：
Cleaning liquid collects part, including a main body, and the main ring is set around the rotary body of wafer monolithic cleaning equipment,
Cleaning liquid collection structure is provided with around the rotary body in the main body, the collection structure is provided around the rotary body
Upper, annular gas vent and bottom gas and liquid collecting cavity, the gas vent are set towards the gas and liquid collecting cavity；
Induction part, connect the gas vent and for being passed through gas to it；
Gas-liquid separation part, including gas-liquid separation device, it is empty that the gas-liquid separation device connects the gas and liquid collecting
Chamber；Wherein, the gas-liquid separation device is provided with drain line and gas exhaust piping, and connects the gas-liquid by air inlet pipeline and receive
Collect cavity；
Wherein, by spraying gas by the gas vent, the annular vertical gas towards the gas and liquid collecting cavity is formed
Curtain, inelastic collision occurs with the cleaning liquid that the crystal column surface by being placed on the rotary body is thrown away, makes the cleaning liquid
Change the direction of motion, into the gas and liquid collecting cavity, and separated and discharged by the gas-liquid separation device.
Preferably, the collection structure is additionally provided with the closed upper part formula gas cavity around the rotary body, the gas
The bottom surface of cavity exports provided with the annular gas, and the gas cavity connects the induction part by air inlet.
Preferably, the collection structure can be arranged concentrically an as dried layer around the rotary body.
Preferably, if collection structure described in dried layer in the horizontal direction or vertical direction is arranged around the rotary body successively with one heart
Row.
Preferably, the relative position between the collection structure and the rotary body in vertical direction is adjustable.
Preferably, the induction part connects the air inlet of the gas cavity by air inlet pipe.
Preferably, the air inlet pipe is provided with gas flowmeter.
Preferably, the gas-liquid separation device connects the gas and liquid collecting sky by one to air inlet pipeline several described
Chamber.
Preferably, the bottom part body is provided with process cavity base ring and discharging tube, for collecting from the rotation body sidewall
The cleaning liquid of drippage and discharge.
The present invention has following remarkable advantage compared with prior art：
1st, using gas formation circular curtain is passed through, instead of the solid side wall of existing liquid collection structure, it is allowed to and crystalline substance
Inelastic collision occurs for the cleaning liquid that circular surfaces are thrown away, and can prevent cleaning liquid from elastic collision occurs in solid side-walls, returns
Splash the edge to wafer, even wafer rear and cause the phenomenon of secondary pollution；
2nd, cleaning liquid is separated with gas using gas-liquid separation device, then recycled, can both improve cleaning
The recycling efficiency of liquids and gases, the cross pollution between different cleaning liquids can be prevented again, while saved and be produced into
This.
Brief description of the drawings
Fig. 1 is a kind of cleaning liquid collection device structure isometric side view of the embodiment of the present invention one；
Fig. 2 is a kind of cleaning liquid collection device structure front cross-section view of the embodiment of the present invention one；
Fig. 3 is A portions structure partial zoomed-in view in Fig. 2；
Fig. 4 is a kind of cleaning liquid collection device structure isometric side view of the embodiment of the present invention two；
Fig. 5 is a kind of cleaning liquid collection device structure front cross-section view of the embodiment of the present invention two；
Fig. 6 is B portions structure partial zoomed-in view in Fig. 5.
Embodiment
Below in conjunction with the accompanying drawings, the embodiment of the present invention is described in further detail.
It should be noted that in following embodiments, when embodiments of the present invention are described in detail, in order to clear
Ground represents the structure of the present invention in order to illustrate, special that structure in accompanying drawing is not drawn according to general proportion, and has carried out part
Amplification, deformation and simplified processing, therefore, should avoid being understood in this, as limitation of the invention.
The gas curtain that the cleaning liquid collection device of the present invention can utilize gas to be formed changes the direction of motion of cleaning liquid, makes
Entrance cleaning liquid collection structure, finally separated and recovered in gas-liquid separation device.Of the invention below specific real
Apply in mode, referring to Fig. 1, Fig. 1 is a kind of cleaning liquid collection device structure isometric side view of the embodiment of the present invention one.Such as
Shown in Fig. 1, a kind of cleaning liquid collection device of the invention, wafer monolithic cleaning equipment is can be applied to, including：Induction part,
Cleaning liquid collect part it is gentle-liquid separate section.Cleaning liquid collection portion point includes a main body 1, and the main body 1 is around wafer
The rotary body of monolithic cleaning equipment is set, and the rotary body is used to place single-wafer 2 thereon, and drives wafer 2 to rotate,
Decoction cleaning is carried out in the cavity of cleaning equipment.Induction part connects the cleaning liquid and collects part, for being passed through gas to it
Body.Gas-liquid separation part includes gas-liquid separation device 11,9, and the gas-liquid separation device 11,9 connects the cleaning liquid and received
Collect part, the solution-air cleansing medium for collecting portion collection to cleaning liquid is carried out separating discharge and reclaimed.
Refer to Fig. 2 and combine and refer to Fig. 1, Fig. 2 is a kind of cleaning liquid collection device structure of the embodiment of the present invention one
Front cross-section view.As shown in Fig. 2 it is provided with cleaning liquid collection structure 20,21 and around the rotary body 14 in the main body 1
19、22.As optional embodiment, the collection structure can be arranged concentrically around the rotary body 14 one as dried layer (figure
It is shown as two layers, the collection structure 20,21 and 19,22 that respectively horizontal alignment is set, refers to aftermentioned)；Also, when set two layers and
During above collection structure, each layer collection structure can in the horizontal direction or vertical direction is arranged around the rotary body successively with one heart
Row are set.
Please continue to refer to Fig. 2.In the present embodiment, exemplified by using two layers of collection structure 20,21 and 19,22, and with water
It is flat to be directed around the rotary body 14 and be set up in parallel with one heart.Every layer of collection structure 20,21 or 19,22 is provided around the rotation
Gas and liquid collecting cavity 20 or 19 corresponding to the upper, annular gas vent 24 or 23 of swivel 14 and bottom, the gas vent 24,
23 are set towards the gas and liquid collecting cavity 20,19.Gas and liquid collecting cavity corresponding to upper, annular gas vent 24,23 and bottom
20th, it is open between 19, for receiving the cleaning liquid particle thrown away from the surface of wafer 2.
Referring to Fig. 3, Fig. 3 is A portions structure partial zoomed-in view in Fig. 2.As shown in figure 3, as a preferable embodiment party
Formula, every layer of collection structure is provided around the closed upper part formula gas cavity 21,22 of the rotary body 14, in the gas space
The bottom surface of chamber 21,22 is correspondingly provided with the annular gas outlet 24,23, and two annular gas outlets 24,23 are corresponded under it respectively
The gas and liquid collecting cavity 20,19 of side.Protected between the side wall top of gas and liquid collecting cavity 20,19 and the bottom surface of gas cavity 21,22
Certain distance is held, forms the opening towards rotary body 14, to receive the cleaning liquid particle thrown away from the surface of wafer 2.
Preferably, vertically opposite movement can be formed between each layer collection structure and the rotary body 14, such as can be with
Using realizing the lifting of cleaning liquid collection structure, wafer and rotary body lifting, or the form such as combination of two ways.
Please continue to refer to Fig. 2.The gas cavity 21,22 upper ends in every layer of collection structure have air inlet, and
The respective induction part can be connected by air inlet.So, each induction part can be connected respective by air inlet
The gas cavity 21,22 and gas vent 24,23.As an optional embodiment, each induction part is provided with
One air inlet pipe 3,6, each air inlet pipe 3,6 connect on the body 1 and connect each self-corresponding gas through main body 1
The air inlet of cavity 21,22.Preferably, gas flowmeter 4,5 is further respectively had in the air inlet pipe 3,6, passed through for adjusting
Gas flow, to form the gas curtain that works well in gas vent 24,23.
Please refer to Fig. 1 and Fig. 2.Every layer of collection structure is respectively communicated with the gas-liquid separation dress of a gas-liquid separation part
Put 11,9.Specifically, each gas-liquid separation device 11,9 can be provided with lower section drain line 18,8 and top gas exhaust piping
12nd, 10, and pass through the gas and liquid collecting cavity 20 of each self-corresponding collection structure of the connection of air inlet pipeline 17,7,19 bottoms.It is excellent
Selection of land, each gas-liquid separation device 11,9 can connect each self-corresponding by one to air inlet pipeline several described 17,7
The gas and liquid collecting cavity 20,19, the setting quantity of the air inlet pipeline 17,7 depend on the flow of gas, and air inlet pipeline
The factor such as diameter.
Refer to Fig. 2.As a preferred embodiment, the He of process cavity base ring 16 is additionally provided with the bottom of main body 1
Discharging tube 13, for collecting cleaning liquid and discharge from the side wall of rotary body 14 drippage, prevent liquid from entering rotary body electricity
The structures such as machine 15.
The operation principle of cleaning liquid collection device is in the present embodiment, and the controllable gas of flow is respectively along air inlet pipe 3,6
Into and be full of annular gas cavity 21,22, then along annular gas outlet 24,23 spray, formed twice vertical direction ring
Shape gas curtain；Gas curtain is downwardly into gas and liquid collecting cavity 20,19, and is separated by gas-liquid separation device 11,9, with liquids and gases
Mode is discharged respectively.The purpose for setting two layers of collection structure is to be utilized for collecting different cleaning liquids in order to be separately recovered
And discharge.According to the difference of rotary body speed, using the collection structure of internal layer when speed is low, using the collection of outer layer when speed is high
Structure., can be according to the gas of the selectively opened corresponding collection structure layer of the current cleaning liquid to be collected when carrying out cleaning
Body implements cleaning liquid collection work.
During the cleaning liquid collection device work of the present invention, wafer 2 is clamped on rotary body 14, under the drive of motor 15
It is rotated.Before cleaning starts, the flow of setting cleaning decoction, the rotary speed of wafer 2, and select corresponding
Cleaning liquid collecting layer, set the gas flow of this layer.During cleaning, when wafer 2 rotates, the inertia force of cleaning liquid
More than the viscous force between liquid and wafer, cleaning liquid is thrown away from the surface of wafer 2.During to peripheral motor, cleaning
Inelastic collision occurs for decoction and the gas curtain in liquid collection structure inner vertical direction, then changes the direction of motion, is downwardly into
Corresponding gas and liquid collecting cavity 20,19.Subsequent gas and cleaning liquid along air inlet pipeline 17,7 enter gas-liquid separation device 11,
9, the separation process of gas and liquid is completed wherein.Finally, gas is entered by the gas exhaust piping 12,10 of gas-liquid separation device
Row recycles or discharge；Liquid is recycled or discharged by the drain line 18,8 of gas-liquid separation device.
Compared in traditional cleaning liquid collection device, the solid side wall of cleaning liquid and liquid collection structure occurs
Elastic collision, the method used in of the invention reduce the possibility of liquid spitting back, can effectively prevent the generation of secondary pollution.
Fig. 4~Fig. 6 is referred to again, and it shows a kind of cleaning liquid collection device structure of the embodiment of the present invention two.At this
In embodiment, equally exemplified by using two layers of collection structure, but with vertical direction around the rotary body upper and lower setting with one heart.
As shown in fig. 6, it shows B portions structure partial zoomed-in view in Fig. 5.As a preferred embodiment, every layer of described collects is tied
Structure is provided around the closed upper part formula gas cavity 21,22 of the rotary body 14, corresponding in the bottom surface of the gas cavity 21,22
Provided with annular gas outlet 24,23, every layer of annular gas outlet 24,23 corresponds to gas and liquid collecting cavity below respectively
20、19.Gas and liquid collecting cavity 20,19 is open towards the direction of rotary body 14, to receive the cleaning liquid thrown away from the surface of wafer 2
Particle.Preferably, vertically opposite movement can be formed between each layer collection structure and the rotary body 14, such as can be used
Realize the lifting of cleaning liquid collection structure, wafer and rotary body lifting, or the form such as combination of two ways.
As shown in figure 5, the gas cavity 21,22 sides in every layer of collection structure have air inlet, and can lead to
Cross the air inlet pipe 3,6 that air inlet connects respective induction part.Each air inlet pipe 3,6 connects on the body 1 and passes through main body 1
Connect the air inlet of each self-corresponding gas cavity 21,22.Gas flowmeter 4,5 is again provided with the air inlet pipe 3,6,
For adjusting the gas flow passed through.Vertically disposed two layers of collection structure be equally applicable to collect different cleaning liquids so as to
Utilize and discharge in being separately recovered., can be according to the current selectively opened phase of the cleaning liquid to be collected when carrying out cleaning
The gas of collection structure layer is answered to implement cleaning liquid collection work.
Refer to Fig. 4 and Fig. 5.Every layer of collection structure is respectively communicated with the gas-liquid separation device of a gas-liquid separation part
11、9.The gas-liquid separation device 11,9 can equally be provided with lower section drain line 18,8 and top gas exhaust piping 12,10, and lead to
Cross gas and liquid collecting cavity 20,19 side bottoms that air inlet pipeline 17,7 connects each self-corresponding collection structure.Also, each institute
State gas-liquid separation device 11,9 equally can connect each self-corresponding gas-liquid by one to air inlet pipeline several described 17,7
Cavity 20,19 is collected, this depends on the flow of gas, and the factor such as diameter of air inlet pipeline.
Other aspects of the embodiment of the present invention two are roughly the same with previous embodiment one, can combine reference implementation example one, this
Example is not reinflated to be illustrated one by one.
In summary, the gas curtain that the present invention is formed using gas changes the direction of motion of cleaning liquid, feeds them into cleaning
Liquid collection structure, is finally separated and recovered in gas-liquid separation device.Therefore, the present invention has compared with prior art
Following remarkable advantage：
1st, using gas formation circular curtain is passed through, instead of the solid side wall of existing liquid collection structure, it is allowed to and crystalline substance
Inelastic collision occurs for the cleaning liquid that circular surfaces are thrown away, and can prevent cleaning liquid from elastic collision occurs in solid side-walls, returns
Splash the edge to wafer, even wafer rear and cause the phenomenon of secondary pollution；
2nd, cleaning liquid is separated with gas using gas-liquid separation device, then recycled, can both improve cleaning
The recycling efficiency of liquids and gases, the cross pollution between different cleaning liquids can be prevented again, while saved and be produced into
This.
Above-described is only the preferred embodiments of the present invention, the embodiment and the patent guarantor for being not used to the limitation present invention
Scope, therefore the equivalent structure change that every specification and accompanying drawing content with the present invention is made are protected, similarly should be included in
In protection scope of the present invention.
Claims (9)
- A kind of 1. cleaning liquid collection device, for wafer monolithic cleaning equipment, it is characterised in that including：Cleaning liquid collects part, including a main body, and the main ring is set around the rotary body of wafer monolithic cleaning equipment, described Cleaning liquid collection structure is provided with around the rotary body in main body, the collection structure is provided around the top of the rotary body Annular gas export and bottom gas and liquid collecting cavity, the gas vent are set towards the gas and liquid collecting cavity；Induction part, connect the gas vent and for being passed through gas to it；Gas-liquid separation part, including gas-liquid separation device, the gas-liquid separation device connect the gas and liquid collecting cavity；Its In, the gas-liquid separation device is provided with drain line and gas exhaust piping, and connects the gas and liquid collecting sky by air inlet pipeline Chamber；Wherein, by by the gas vent spray gas, form the annular vertical gas curtain towards the gas and liquid collecting cavity, with Inelastic collision occurs for the cleaning liquid thrown away by the crystal column surface placed on the rotary body, the cleaning liquid is changed fortune Dynamic direction, into the gas and liquid collecting cavity, and separated and discharged by the gas-liquid separation device.
- 2. cleaning liquid collection device according to claim 1, it is characterised in that the collection structure is additionally provided with around institute The closed upper part formula gas cavity of rotary body is stated, the bottom surface of the gas cavity exports provided with the annular gas, the gas Cavity connects the induction part by air inlet.
- 3. cleaning liquid collection device according to claim 1, it is characterised in that the collection structure can surround the rotation Swivel is arranged concentrically an as dried layer.
- 4. cleaning liquid collection device according to claim 3, it is characterised in that if collection structure edge is horizontal described in dried layer Direction or vertical direction are arranged in order with one heart around the rotary body.
- 5. the cleaning liquid collection device according to Claims 1 to 4 any one, it is characterised in that the collection structure Relative position in vertical direction between the rotary body is adjustable.
- 6. cleaning liquid collection device according to claim 2, it is characterised in that the induction part is connected by air inlet pipe Lead to the air inlet of the gas cavity.
- 7. cleaning liquid collection device according to claim 6, it is characterised in that the air inlet pipe is provided with gas flow Meter.
- 8. cleaning liquid collection device according to claim 1, it is characterised in that the gas-liquid separation device passes through one The gas and liquid collecting cavity is connected to air inlet pipeline several described.
- 9. cleaning liquid collection device according to claim 1, it is characterised in that the bottom part body is provided with process cavity Base ring and discharging tube, for collecting cleaning liquid and discharge from the rotation body sidewall drippage.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510431795.6A CN105161442B (en) | 2015-07-21 | 2015-07-21 | A kind of cleaning liquid collection device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510431795.6A CN105161442B (en) | 2015-07-21 | 2015-07-21 | A kind of cleaning liquid collection device |
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| CN105161442A CN105161442A (en) | 2015-12-16 |
| CN105161442B true CN105161442B (en) | 2018-02-23 |
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Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110460751B (en) * | 2019-07-03 | 2021-04-27 | 浙江大华技术股份有限公司 | Dustproof cleaning device and camera |
| CN110729180B (en) * | 2019-11-26 | 2021-10-15 | 上海华力集成电路制造有限公司 | Crystal edge washing process method |
| CN111146122B (en) * | 2019-12-26 | 2022-10-28 | 厦门通富微电子有限公司 | Liquid collection device, developing/etching machine table and developing/etching method |
| CN114471037B (en) * | 2022-04-15 | 2022-07-01 | 智程半导体设备科技(昆山)有限公司 | Gas-liquid separation device for multi-station single wafer cleaning machine |
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| JP2007227952A (en) * | 2007-03-30 | 2007-09-06 | Sumitomo Precision Prod Co Ltd | Rotary substrate processing device |
| CN101060069A (en) * | 2006-04-18 | 2007-10-24 | 东京毅力科创株式会社 | Liquid treatment device |
| CN101159227A (en) * | 2006-10-03 | 2008-04-09 | 大日本网目版制造株式会社 | Substrate processing apparatus |
| CN204792723U (en) * | 2015-07-21 | 2015-11-18 | 北京七星华创电子股份有限公司 | A cleaning fluid collection device for wafer monolithic cleaning equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003273064A (en) * | 2002-03-15 | 2003-09-26 | Fujitsu Ltd | Method and apparatus for removing deposit |
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| CN101060069A (en) * | 2006-04-18 | 2007-10-24 | 东京毅力科创株式会社 | Liquid treatment device |
| CN101159227A (en) * | 2006-10-03 | 2008-04-09 | 大日本网目版制造株式会社 | Substrate processing apparatus |
| JP2007227952A (en) * | 2007-03-30 | 2007-09-06 | Sumitomo Precision Prod Co Ltd | Rotary substrate processing device |
| CN204792723U (en) * | 2015-07-21 | 2015-11-18 | 北京七星华创电子股份有限公司 | A cleaning fluid collection device for wafer monolithic cleaning equipment |
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Address after: 100015 No. 1 East Jiuxianqiao Road, Beijing, Chaoyang District Patentee after: North China Science and technology group Limited by Share Ltd. Address before: 100016 No. 1 East Jiuxianqiao Road, Beijing, Chaoyang District Patentee before: BEIJING SEVENSTAR ELECTRONICS Co.,Ltd. |
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