CN204792723U - A cleaning fluid collection device for wafer monolithic cleaning equipment - Google Patents
A cleaning fluid collection device for wafer monolithic cleaning equipment Download PDFInfo
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- CN204792723U CN204792723U CN201520532330.5U CN201520532330U CN204792723U CN 204792723 U CN204792723 U CN 204792723U CN 201520532330 U CN201520532330 U CN 201520532330U CN 204792723 U CN204792723 U CN 204792723U
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- gas
- liquid
- cleaning liquid
- cleaning
- rotary body
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Abstract
The utility model discloses a cleaning fluid collection device for wafer monolithic cleaning equipment, including admitting air the part, cleaning fluid collects subtotal gas -liquid separation part, it is partial to the partial gas that lets in of cleaning fluid collection through admitting air, the department forms annular gas curtain at the gas outlet, get rid of the cleaning fluid who leaves with the wafer surface and take place inelastic collision, make cleaning fluid change the direction of motion, it collects the cavity to get into the gas -liquid, and discharge through the separation of solution -air separator, reducible liquid cleansing medium is collected returning of structure lateral wall department at liquid and is spattered, prevent secondary pollution's emergence, and can improve the recovery efficiency of liquid cleansing medium simultaneously.
Description
Technical field
The utility model relates to semiconductor cleaning device field, more specifically, relates to a kind of cleaning liquid gathering-device for wafer monolithic cleaning equipment.
Background technology
In recent years, along with constantly reducing of integrated circuit feature size, the requirement for wafer cleaning technique is also more and more higher.Cleaning equipment has also developed into more complicated, that precision is also higher simultaneously monolithic cleaning from the cleaning of initial slot type.In the process of wafer monolithic cleaning, utilize the rotary body of cleaning equipment to drive wafer to rotate, the cleansing mediums such as the cleaning liquid of crystal column surface or ultra-pure water can be thrown away, carry out recycling or discharging.
Generally speaking, liquid collection structure can be provided with around the rotary body of cleaning equipment.When throwing away, touch the sidewall of equipment liquid collection structure under the effect of cleansing medium at rotary centrifugal force from crystal column surface, can flow down along sidewall, be gathered together, enter liquids recovery pipeline or discharge line.In this course, because the liquid particles thrown away at a high speed is with very high kinetic energy, when clashing into the sidewall of liquid collection structure, can likely rebound, cause chemical reagent and wash products splash to the edge of wafer, or even wafer rear, and pollute.If this pollution can not be removed in time, defect can be caused at crystal round fringes and the back side, especially in follow-up high-temperature processing technology process, the Pollutants Diffusion at crystal round fringes and the back side can be made to front, have a strong impact on the quality of wafer.On the other hand, the splash of liquid rinse medium also can cause the waste of liquid, increases production cost.
In existing technology, still there is no the method that effectively can prevent liquid rinse medium splash at present, the quality of wafer cannot be improved further.
Therefore, be necessary the cleaning liquid gathering-device providing a kind of structure simple, easy to use, nationality is with by rational structural design, and corresponding technical arrangement plan, reduce the splash of cleansing medium in the side-walls of liquid collection structure, prevent the generation of secondary pollution, improve the organic efficiency of liquid rinse medium simultaneously.
Utility model content
The purpose of this utility model is the above-mentioned defect overcoming prior art existence, the cleaning liquid gathering-device that a kind of structure is simple, easy to use is provided, by rational structural design, and corresponding technical arrangement plan, the splash of cleansing medium in the side-walls of liquid collection structure can be reduced, prevent the generation of secondary pollution, and the organic efficiency of liquid rinse medium can be improved simultaneously.
For achieving the above object, the technical solution of the utility model is as follows:
For a cleaning liquid gathering-device for wafer monolithic cleaning equipment, for wafer monolithic cleaning equipment, comprising:
Cleaning liquid collects part, comprise a main body, described main ring is arranged around the rotary body of wafer monolithic cleaning equipment, cleaning liquid collection structure is provided with around described rotary body in described main body, described collection structure is provided with upper, annular gas vent around described rotary body and bottom gas and liquid collecting cavity, and described gas vent is arranged towards described gas and liquid collecting cavity;
Induction part, is communicated with described gas vent and for passing into gas to it;
Gas-liquid separation part, comprises gas-liquid separation device, and described gas-liquid separation device is communicated with described gas and liquid collecting cavity;
Wherein, by spraying gas by described gas vent, formed towards the annular vertical gas curtain of described gas and liquid collecting cavity, with the cleaning liquid generation inelastic collision thrown away by the crystal column surface that described rotary body is placed, described cleaning liquid is made to change the direction of motion, enter described gas and liquid collecting cavity, and be separated discharge by described gas-liquid separation device.
Preferably, described collection structure is also provided with the closed upper part formula gas cavity around described rotary body, and the bottom surface of described gas cavity is provided with the outlet of described annular gas, and described gas cavity is communicated with described induction part by air inlet.
Preferably, described collection structure can arrange an as dried layer with one heart around described rotary body.
Preferably, the described collection structure of some layers in the horizontal direction or vertical direction be arranged in order with one heart around described rotary body.
Preferably, between described collection structure and described rotary body, relative position is in the vertical direction adjustable.
Preferably, described induction part is communicated with the air inlet of described gas cavity by air inlet pipe.
Preferably, described air inlet pipe is provided with gas flowmeter.
Preferably, described gas-liquid separation device is provided with drain line and gas exhaust piping, and is communicated with described gas and liquid collecting cavity by air inlet pipeline.
Preferably, described gas-liquid separation device is communicated with described gas and liquid collecting cavity by one to air inlet pipeline described in several.
Preferably, described bottom part body is provided with process cavity base ring and discharging tube, discharges for the cleaning liquid collected from described rotary body sidewall drippage.
The utility model compared with prior art has following remarkable advantage:
1, utilization passes into gas and forms circular curtain, replace the solid sidewall of existing liquid collection structure, make it the cleaning liquid generation inelastic collision thrown away with crystal column surface, cleaning liquid can be prevented in solid side-walls generation elastic collision, and splash causes the phenomenon of secondary pollution to the edge of wafer or even wafer rear;
2, utilize gas-liquid separation device that cleaning liquid is separated from the gas, recycle subsequently, both can improve the recycling efficiency of cleaning liquid and gas, the cross pollution between different cleaning liquid can be prevented again, saved production cost simultaneously.
Accompanying drawing explanation
Fig. 1 is the axis side views such as a kind of cleaning liquid gathering-device structure for wafer monolithic cleaning equipment of the utility model embodiment one;
Fig. 2 is a kind of cleaning liquid gathering-device structure front cross-section view for wafer monolithic cleaning equipment of the utility model embodiment one;
Fig. 3 is A portion structure partial zoomed-in view in Fig. 2;
Fig. 4 is the axis side views such as a kind of cleaning liquid gathering-device structure for wafer monolithic cleaning equipment of the utility model embodiment two;
Fig. 5 is a kind of cleaning liquid gathering-device structure front cross-section view for wafer monolithic cleaning equipment of the utility model embodiment two;
Fig. 6 is B portion structure partial zoomed-in view in Fig. 5.
Embodiment
Below in conjunction with accompanying drawing, embodiment of the present utility model is described in further detail.
It should be noted that, in following embodiment, when describing execution mode of the present utility model in detail, in order to clearly represent structure of the present utility model so that explanation, special to the structure in accompanying drawing not according to general scale, and carried out partial enlargement, distortion and simplify processes, therefore, should avoid being understood in this, as to restriction of the present utility model.
The gas curtain that cleaning liquid gathering-device of the present utility model can utilize gas to be formed changes the direction of motion of cleaning liquid, makes it to enter cleaning liquid collection structure, finally in gas-liquid separation device, carries out separation and recovery.In following embodiment of the present utility model, refer to Fig. 1, Fig. 1 is the axis side views such as a kind of cleaning liquid gathering-device structure for wafer monolithic cleaning equipment of the utility model embodiment one.As shown in Figure 1, a kind of cleaning liquid gathering-device of the present utility model, can be applicable to wafer monolithic cleaning equipment, comprising: gentle-liquid separate section that induction part, cleaning liquid collect part.Cleaning liquid collection unit is divided and is comprised a main body 1, and described main body 1 is arranged around the rotary body of wafer monolithic cleaning equipment, and described rotary body is used for placing single-wafer 2 thereon, and drives wafer 2 to rotate, in the cavity of cleaning equipment, carry out liquid cleaning.Induction part is communicated with described cleaning liquid collection part, for passing into gas to it.Gas-liquid separation part comprises gas-liquid separation device 11,9, and described gas-liquid separation device 11,9 is communicated with described cleaning liquid and collects part, and the solution-air cleansing medium for collecting portion collection to cleaning liquid carries out separation and discharges and reclaim.
Refer to Fig. 2 and combine and consult Fig. 1, Fig. 2 is a kind of cleaning liquid gathering-device structure front cross-section view for wafer monolithic cleaning equipment of the utility model embodiment one.As shown in Figure 2, cleaning liquid collection structure 20,21 and 19,22 is provided with around described rotary body 14 in described main body 1.As optional execution mode, described collection structure can around described rotary body 14 arrange with one heart one as dried layer (be illustrated as two-layer, be respectively horizontal alignment arrange collection structure 20,21 and 19,22, refer to aftermentioned); Further, when arranging two-layer and above collection structure, the described collection structure of each layer can in the horizontal direction or vertical direction be arranged in order setting with one heart around described rotary body.
Please continue to refer to Fig. 2.In the present embodiment, to adopt two-layer collection structure 20,21 and 19,22, and be set up in parallel with one heart around described rotary body 14 with horizontal direction.Every layer of described collection structure 20,21 or 19,22 is provided with around gas and liquid collecting cavity 20 or 19 corresponding to the upper, annular gas vent 24 or 23 of described rotary body 14 and bottom, and described gas vent 24,23 is arranged towards described gas and liquid collecting cavity 20,19.Be uncovered between gas and liquid collecting cavity 20,19 corresponding to upper, annular gas vent 24,23 and bottom, for receiving the cleaning liquid particle thrown away from wafer 2 surface.
Refer to Fig. 3, Fig. 3 is A portion structure partial zoomed-in view in Fig. 2.As shown in Figure 3, as one preferred embodiment, every layer of described collection structure is provided with the closed upper part formula gas cavity 21,22 around described rotary body 14, be provided with described annular gas outlet 24,23 in the bottom surface correspondence of described gas cavity 21,22, two annular gas outlet 24,23 is corresponding gas and liquid collecting cavity 20,19 below it respectively.Keep certain distance between the sidewall top of gas and liquid collecting cavity 20,19 and the bottom surface of gas cavity 21,22, forming surface is uncovered to rotary body 14, to receive the cleaning liquid particle thrown away from wafer 2 surface.
Preferably, between the described collection structure of each layer and described rotary body 14, vertically opposite movement can be formed, such as, can adopt and make that cleaning liquid collection structure is elevated, wafer and rotary body lifting, or the form such as the combination of two kinds of modes realizes.
Please continue to refer to Fig. 2.Have air inlet in described gas cavity 21,22 upper end of every layer of collection structure, and be communicated with respective described induction part by air inlet.Like this, namely each induction part is communicated with respective described gas cavity 21,22 and gas vent 24,23 by air inlet.As an optional execution mode, each described induction part is provided with an air inlet pipe 3,6, and each described air inlet pipe 3,6 connects on the body 1 and is communicated with the air inlet of each self-corresponding described gas cavity 21,22 through main body 1.Preferably, be also respectively equipped with gas flowmeter 4,5 in described air inlet pipe 3,6, for regulating the gas flow passed through, to form respond well gas curtain at gas vent 24,23.
Incorporated by reference to consulting Fig. 1 and Fig. 2.Every layer of collection structure is communicated with the gas-liquid separation device 11,9 of a gas-liquid separation part respectively.Concrete, each described gas-liquid separation device 11,9 can be provided with below drain line 18,8 and top gas exhaust piping 12,10, and bottom the gas and liquid collecting cavity 20,19 being communicated with each self-corresponding described collection structure by air inlet pipeline 17,7.Preferably, each described gas-liquid separation device 11,9 is communicated with each self-corresponding described gas and liquid collecting cavity 20,19 by one to air inlet pipeline described in several 17,7, the magnitude setting of described air inlet pipeline 17,7 depends on the factors such as the flow of gas, and the diameter of air inlet pipeline.
Refer to Fig. 2.As one preferred embodiment, bottom described main body 1, be also provided with process cavity base ring 16 and discharging tube 13, discharge for the cleaning liquid collected from described rotary body 14 sidewall drippage, prevent liquid from entering the structures such as rotary body motor 15.
In the present embodiment, the operation principle of cleaning liquid gathering-device is, the controlled gas of flow enters along air inlet pipe 3,6 respectively and is full of annular gas cavity 21,22, and annularly gas vent 24,23 sprays subsequently, forms the circular curtain of twice vertical direction; Gas curtain enters gas and liquid collecting cavity 20,19 downwards, and is separated by gas-liquid separation device 11,9, discharges respectively in liquids and gases mode.The object arranging two-layer collection structure is for collecting different cleaning liquids so that recycle respectively and discharge.According to the difference of rotary body speed, use the collection structure of internal layer when speed is low, during speed height, adopt outer field collection structure.When carrying out cleaning, cleaning liquid collection work can be implemented according to the gas of the selectively opened corresponding collection structure layer of the current cleaning liquid that will collect.
During cleaning liquid gathering-device work of the present utility model, wafer 2 is clamped on rotary body 14, is rotated under the drive of motor 15.Before cleaning starts, the flow of setting cleaning liquid, the rotary speed of wafer 2, and select corresponding cleaning liquid collecting layer, set the gas flow of this layer.In cleaning process, when wafer 2 rotates, the inertia force of cleaning liquid is greater than the viscous force between liquid and wafer, and cleaning liquid throws away from wafer 2 surface.In the process of moving towards periphery, the gas curtain generation inelastic collision of cleaning liquid and liquid collection inside configuration vertical direction, changes the direction of motion subsequently, enters corresponding gas and liquid collecting cavity 20,19 downwards.Gas and cleaning liquid enter gas-liquid separation device 11,9 along air inlet pipeline 17,7 subsequently, complete the separation process of gas and liquid wherein.Finally, gas is undertaken recycling or discharging by the gas exhaust piping 12,10 of gas-liquid separation device; Liquid is undertaken recycling or discharging by the drain line 18,8 of gas-liquid separation device.
Compared in traditional cleaning liquid gathering-device, the solid sidewall generation elastic collision of cleaning liquid and liquid collection structure, the method adopted in the utility model decreases the possibility of liquid spitting back, effectively can prevent the generation of secondary pollution.
Refer to Fig. 4 ~ Fig. 6 again, a kind of cleaning liquid gathering-device structure for wafer monolithic cleaning equipment of its display the utility model embodiment two.In the present embodiment, equally to adopt two-layer collection structure, but with vertical direction around the concentric upper and lower setting of described rotary body.As shown in Figure 6, B portion structure partial zoomed-in view in its display Fig. 5.As one preferred embodiment, every layer of described collection structure is provided with the closed upper part formula gas cavity 21,22 around described rotary body 14, be provided with described annular gas outlet 24,23 in the bottom surface correspondence of described gas cavity 21,22, the annular gas of every layer outlet 24,23 is corresponding gas and liquid collecting cavity 20,19 below it respectively.Gas and liquid collecting cavity 20,19 is uncovered towards rotary body 14 direction, to receive the cleaning liquid particle thrown away from wafer 2 surface.Preferably, between the described collection structure of each layer and described rotary body 14, vertically opposite movement can be formed, such as, can adopt and make that cleaning liquid collection structure is elevated, wafer and rotary body lifting, or the form such as the combination of two kinds of modes realizes.
As shown in Figure 5, have air inlet at described gas cavity 21,22 side of every layer of collection structure, and be communicated with the air inlet pipe 3,6 of respective induction part by air inlet.Each described air inlet pipe 3,6 connects on the body 1 and is communicated with the air inlet of each self-corresponding described gas cavity 21,22 through main body 1.Gas flowmeter 4,5 is provided with equally, for regulating the gas flow passed through in described air inlet pipe 3,6.Vertically disposed two-layer collection structure can be used for collecting different cleaning liquids so that recycle respectively and discharge equally.When carrying out cleaning, cleaning liquid collection work can be implemented according to the gas of the selectively opened corresponding collection structure layer of the current cleaning liquid that will collect.
Refer to Fig. 4 and Fig. 5.Every layer of collection structure is communicated with the gas-liquid separation device 11,9 of a gas-liquid separation part respectively.Described gas-liquid separation device 11,9 can be provided with below drain line 18,8 and top gas exhaust piping 12,10 equally, and is communicated with gas and liquid collecting cavity 20,19 side bottom of each self-corresponding described collection structure by air inlet pipeline 17,7.Further, each described gas-liquid separation device 11,9 is equally communicated with each self-corresponding described gas and liquid collecting cavity 20,19 by one to air inlet pipeline described in several 17,7, and this depends on the flow of gas, and the factor such as the diameter of air inlet pipeline.
Other aspects of the utility model embodiment two are roughly the same with previous embodiment one, can in conjunction with reference example one, and this example is no longer launched to illustrate one by one.
In sum, the gas curtain that the utility model utilizes gas to be formed changes the direction of motion of cleaning liquid, makes it to enter cleaning liquid collection structure, finally in gas-liquid separation device, carries out separation and recovery.Therefore, the utility model compared with prior art has following remarkable advantage:
1, utilization passes into gas and forms circular curtain, replace the solid sidewall of existing liquid collection structure, make it the cleaning liquid generation inelastic collision thrown away with crystal column surface, cleaning liquid can be prevented in solid side-walls generation elastic collision, and splash causes the phenomenon of secondary pollution to the edge of wafer or even wafer rear;
2, utilize gas-liquid separation device that cleaning liquid is separated from the gas, recycle subsequently, both can improve the recycling efficiency of cleaning liquid and gas, the cross pollution between different cleaning liquid can be prevented again, saved production cost simultaneously.
Above-describedly be only preferred embodiment of the present utility model; described embodiment is also not used to limit scope of patent protection of the present utility model; therefore the equivalent structure that every utilization specification of the present utility model and accompanying drawing content are done changes, and in like manner all should be included in protection range of the present utility model.
Claims (10)
1., for a cleaning liquid gathering-device for wafer monolithic cleaning equipment, for wafer monolithic cleaning equipment, it is characterized in that, comprising:
Cleaning liquid collects part, comprise a main body, described main ring is arranged around the rotary body of wafer monolithic cleaning equipment, cleaning liquid collection structure is provided with around described rotary body in described main body, described collection structure is provided with upper, annular gas vent around described rotary body and bottom gas and liquid collecting cavity, and described gas vent is arranged towards described gas and liquid collecting cavity;
Induction part, is communicated with described gas vent and for passing into gas to it;
Gas-liquid separation part, comprises gas-liquid separation device, and described gas-liquid separation device is communicated with described gas and liquid collecting cavity;
Wherein, by spraying gas by described gas vent, formed towards the annular vertical gas curtain of described gas and liquid collecting cavity, with the cleaning liquid generation inelastic collision thrown away by the crystal column surface that described rotary body is placed, described cleaning liquid is made to change the direction of motion, enter described gas and liquid collecting cavity, and be separated discharge by described gas-liquid separation device.
2. cleaning liquid gathering-device according to claim 1, it is characterized in that, described collection structure is also provided with the closed upper part formula gas cavity around described rotary body, the bottom surface of described gas cavity is provided with the outlet of described annular gas, and described gas cavity is communicated with described induction part by air inlet.
3. cleaning liquid gathering-device according to claim 1, is characterized in that, described collection structure can arrange an as dried layer with one heart around described rotary body.
4. cleaning liquid gathering-device according to claim 3, is characterized in that, the described collection structure of some layers in the horizontal direction or vertical direction be arranged in order with one heart around described rotary body.
5. the cleaning liquid gathering-device according to Claims 1 to 4 any one, is characterized in that, between described collection structure and described rotary body, relative position is in the vertical direction adjustable.
6. cleaning liquid gathering-device according to claim 2, is characterized in that, described induction part is communicated with the air inlet of described gas cavity by air inlet pipe.
7. cleaning liquid gathering-device according to claim 6, is characterized in that, described air inlet pipe is provided with gas flowmeter.
8. cleaning liquid gathering-device according to claim 1, is characterized in that, described gas-liquid separation device is provided with drain line and gas exhaust piping, and is communicated with described gas and liquid collecting cavity by air inlet pipeline.
9. cleaning liquid gathering-device according to claim 8, is characterized in that, described gas-liquid separation device is communicated with described gas and liquid collecting cavity by one to air inlet pipeline described in several.
10. cleaning liquid gathering-device according to claim 1, is characterized in that, described bottom part body is provided with process cavity base ring and discharging tube, discharges for the cleaning liquid collected from described rotary body sidewall drippage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520532330.5U CN204792723U (en) | 2015-07-21 | 2015-07-21 | A cleaning fluid collection device for wafer monolithic cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520532330.5U CN204792723U (en) | 2015-07-21 | 2015-07-21 | A cleaning fluid collection device for wafer monolithic cleaning equipment |
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| Publication Number | Publication Date |
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| CN204792723U true CN204792723U (en) | 2015-11-18 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201520532330.5U Withdrawn - After Issue CN204792723U (en) | 2015-07-21 | 2015-07-21 | A cleaning fluid collection device for wafer monolithic cleaning equipment |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105161442A (en) * | 2015-07-21 | 2015-12-16 | 北京七星华创电子股份有限公司 | Cleaning liquid collecting device |
| CN110523729A (en) * | 2018-11-26 | 2019-12-03 | 北京北方华创微电子装备有限公司 | Gas-liquid two-phase flow atomization cleaning method |
| CN111940376A (en) * | 2020-07-22 | 2020-11-17 | 广州多得医疗设备服务有限公司 | Flushing equipment for medical equipment maintenance and cleaning method thereof |
| CN117153739A (en) * | 2023-10-31 | 2023-12-01 | 沈阳芯达科技有限公司 | Wafer cleaning device |
-
2015
- 2015-07-21 CN CN201520532330.5U patent/CN204792723U/en not_active Withdrawn - After Issue
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105161442A (en) * | 2015-07-21 | 2015-12-16 | 北京七星华创电子股份有限公司 | Cleaning liquid collecting device |
| CN105161442B (en) * | 2015-07-21 | 2018-02-23 | 北京七星华创电子股份有限公司 | A kind of cleaning liquid collection device |
| CN110523729A (en) * | 2018-11-26 | 2019-12-03 | 北京北方华创微电子装备有限公司 | Gas-liquid two-phase flow atomization cleaning method |
| CN111940376A (en) * | 2020-07-22 | 2020-11-17 | 广州多得医疗设备服务有限公司 | Flushing equipment for medical equipment maintenance and cleaning method thereof |
| CN117153739A (en) * | 2023-10-31 | 2023-12-01 | 沈阳芯达科技有限公司 | Wafer cleaning device |
| CN117153739B (en) * | 2023-10-31 | 2024-01-30 | 沈阳芯达科技有限公司 | Wafer cleaning device |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20151118 Effective date of abandoning: 20180223 |