JP2007225727A5 - - Google Patents

Claims (5)

The substrate is conveyed to the exposure table by the substrate conveying means, performs preliminary positioning and alignment of the substrate in the exposure table, a substrate exposure apparatus that exposes through an exposure optical system,
An exposure table that supports the transported substrate and moves it in the X-axis, Y-axis, θ-axis, and Z-axis directions;
So as to face the substrate supported in the exposure table, and baked frame for supporting the mask through the transparent plate,
First imaging means for imaging the alignment marks on the substrate and the mask to align the substrate with the mask;
A second imaging means movably provided at an imaging position at which at least three sides of the substrate can be imaged through the translucent plate and at a retracted position retracted from the optical path of the exposure optical system;
In order to obtain a contrast that can be imaged by the second imaging means, illumination that is movably provided at a lighting position at which illumination light is lit on at least three sides of the substrate and a retreat position that is retreated from the optical path of the exposure optical system Means,
In order to pre-position the substrate so that the images captured through the illumination unit and the second imaging unit are analyzed and the alignment marks of the substrate and the mask are within the field of view of the first imaging unit. Controlling the exposure table and analyzing the image captured by the first imaging unit to control the exposure table to align the alignment mark on the substrate and the alignment mark on the mask; A substrate exposure apparatus comprising:   The said control means controls the said exposure table so that the said preliminary | backup positioning may become the space | interval which the edge | side of the said mask and the edge | side of the said board | substrate parallel, and is set beforehand. Substrate exposure device.   2. The substrate exposure apparatus according to claim 1, wherein the control unit controls the exposure table so that the preliminary positioning is a position set in advance with respect to a position of the mask. 3. 2. The substrate exposure apparatus according to claim 1, wherein the illuminating unit is provided with illuminating lamps respectively installed corresponding to the sides of the substrate so as to be movable to a lighting position and a retracted position. Carrying the substrate onto the exposure table by the substrate transport means;
A step of bringing the substrate carried into the exposure table close to or in contact with the mask supported via the translucent plate of the printing frame;
Imaging the second side of the substrate corresponding to the side of the mask with the second imaging means through the translucent plate via irradiation light;
In the image of the side of the substrate corresponding to the imaged side of the mask, the preliminary positioning amount is analyzed by the control means from the amount of deviation between the position of at least the three sides of the mask and the position of the three sides of the corresponding substrate. Calculating
Preliminarily positioning the substrate and the mask by controlling the exposure table based on the preliminary positioning amount calculated by the control means in a state where the mask and the substrate are separated from each other;
Approaching or abutting the pre-positioned substrate to the mask;
Imaging the mask and the alignment mark of the substrate by first imaging means, analyzing by the control means, and calculating a deviation amount;
A step of aligning and moving the exposure table based on a shift amount calculated by the control means in a state where the mask and the substrate are separated from each other;
And exposing the substrate with an exposure optical system by bringing the mask and the substrate close to or in contact with each other.