JP2007217782A - 希土類元素のフッ化物皮膜を有する耐食性皮膜およびその製造方法 - Google Patents

希土類元素のフッ化物皮膜を有する耐食性皮膜およびその製造方法 Download PDF

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JP2007217782A
JP2007217782A JP2006043012A JP2006043012A JP2007217782A JP 2007217782 A JP2007217782 A JP 2007217782A JP 2006043012 A JP2006043012 A JP 2006043012A JP 2006043012 A JP2006043012 A JP 2006043012A JP 2007217782 A JP2007217782 A JP 2007217782A
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rare earth
film
corrosion
earth element
resistant
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JP2007217782A5 (https=
Inventor
Masakazu Kobayashi
正和 小林
Akira Kojima
顕 児島
Takashi Ueda
隆 植田
Makoto Saito
信 齋藤
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Resonac Holdings Corp
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Showa Denko KK
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Publication of JP2007217782A5 publication Critical patent/JP2007217782A5/ja
Abandoned legal-status Critical Current

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  • Other Surface Treatments For Metallic Materials (AREA)
  • Drying Of Semiconductors (AREA)
JP2006043012A 2006-02-20 2006-02-20 希土類元素のフッ化物皮膜を有する耐食性皮膜およびその製造方法 Abandoned JP2007217782A (ja)

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JP2006043012A JP2007217782A (ja) 2006-02-20 2006-02-20 希土類元素のフッ化物皮膜を有する耐食性皮膜およびその製造方法

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JP2006043012A JP2007217782A (ja) 2006-02-20 2006-02-20 希土類元素のフッ化物皮膜を有する耐食性皮膜およびその製造方法

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JP2007217782A true JP2007217782A (ja) 2007-08-30
JP2007217782A5 JP2007217782A5 (https=) 2009-01-15

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Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013147691A (ja) * 2012-01-18 2013-08-01 Tocalo Co Ltd フッ化物膜被覆サーメット複合皮膜被覆部材およびその製造方法
JP2014109066A (ja) * 2012-12-04 2014-06-12 Nippon Yttrium Co Ltd 溶射材料
US8896210B2 (en) 2011-12-05 2014-11-25 Tokyo Electron Limited Plasma processing apparatus and method
US10186400B2 (en) 2017-01-20 2019-01-22 Applied Materials, Inc. Multi-layer plasma resistant coating by atomic layer deposition
US10443126B1 (en) 2018-04-06 2019-10-15 Applied Materials, Inc. Zone-controlled rare-earth oxide ALD and CVD coatings
CN110382730A (zh) * 2017-03-01 2019-10-25 信越化学工业株式会社 喷镀被膜、喷镀用粉、喷镀用粉的制造方法和喷镀被膜的制造方法
US10676819B2 (en) 2016-06-23 2020-06-09 Applied Materials, Inc. Non-line of sight deposition of erbium based plasma resistant ceramic coating
US10755900B2 (en) 2017-05-10 2020-08-25 Applied Materials, Inc. Multi-layer plasma erosion protection for chamber components
US10858741B2 (en) 2019-03-11 2020-12-08 Applied Materials, Inc. Plasma resistant multi-layer architecture for high aspect ratio parts
US20210317572A1 (en) * 2020-04-14 2021-10-14 Entegris, Inc. Yttrium fluoride films and methods of preparing and using yttrium fluoride films
US11180847B2 (en) 2018-12-06 2021-11-23 Applied Materials, Inc. Atomic layer deposition coatings for high temperature ceramic components
US11198936B2 (en) 2016-04-27 2021-12-14 Applied Materials, Inc. Atomic layer deposition of protective coatings for semiconductor process chamber components
US11279656B2 (en) 2017-10-27 2022-03-22 Applied Materials, Inc. Nanopowders, nanoceramic materials and methods of making and use thereof
CN114649179A (zh) * 2020-12-18 2022-06-21 中微半导体设备(上海)股份有限公司 半导体零部件、等离子处理装置及耐腐蚀涂层的形成方法
US11667575B2 (en) 2018-07-18 2023-06-06 Applied Materials, Inc. Erosion resistant metal oxide coatings
JP2024511364A (ja) * 2021-03-19 2024-03-13 インテグリス・インコーポレーテッド フッ素化イットリウムコーティングを有する基材、ならびに基材を製造および使用する方法

Cited By (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8896210B2 (en) 2011-12-05 2014-11-25 Tokyo Electron Limited Plasma processing apparatus and method
JP2013147691A (ja) * 2012-01-18 2013-08-01 Tocalo Co Ltd フッ化物膜被覆サーメット複合皮膜被覆部材およびその製造方法
JP2014109066A (ja) * 2012-12-04 2014-06-12 Nippon Yttrium Co Ltd 溶射材料
US11198937B2 (en) 2016-04-27 2021-12-14 Applied Materials, Inc. Atomic layer deposition of protective coatings for semiconductor process chamber components
US12104246B2 (en) 2016-04-27 2024-10-01 Applied Materials, Inc. Atomic layer deposition of protective coatings for semiconductor process chamber components
US11198936B2 (en) 2016-04-27 2021-12-14 Applied Materials, Inc. Atomic layer deposition of protective coatings for semiconductor process chamber components
US11326253B2 (en) 2016-04-27 2022-05-10 Applied Materials, Inc. Atomic layer deposition of protective coatings for semiconductor process chamber components
US10676819B2 (en) 2016-06-23 2020-06-09 Applied Materials, Inc. Non-line of sight deposition of erbium based plasma resistant ceramic coating
US10573497B2 (en) 2017-01-20 2020-02-25 Applied Materials, Inc. Multi-layer plasma resistant coating by atomic layer deposition
US12002657B2 (en) 2017-01-20 2024-06-04 Applied Materials, Inc. Multi-layer plasma resistant coating by atomic layer deposition
US11251023B2 (en) 2017-01-20 2022-02-15 Applied Materials, Inc. Multi-layer plasma resistant coating by atomic layer deposition
US10186400B2 (en) 2017-01-20 2019-01-22 Applied Materials, Inc. Multi-layer plasma resistant coating by atomic layer deposition
CN110382730B (zh) * 2017-03-01 2022-09-23 信越化学工业株式会社 喷镀被膜、喷镀用粉、喷镀用粉的制造方法和喷镀被膜的制造方法
CN110382730A (zh) * 2017-03-01 2019-10-25 信越化学工业株式会社 喷镀被膜、喷镀用粉、喷镀用粉的制造方法和喷镀被膜的制造方法
US10755900B2 (en) 2017-05-10 2020-08-25 Applied Materials, Inc. Multi-layer plasma erosion protection for chamber components
US11667578B2 (en) 2017-10-27 2023-06-06 Applied Materials, Inc. Methods of making nanopowders, nanoceramic materials and nanoceramic components
US11279656B2 (en) 2017-10-27 2022-03-22 Applied Materials, Inc. Nanopowders, nanoceramic materials and methods of making and use thereof
US12098107B2 (en) 2017-10-27 2024-09-24 Applied Materials, Inc. Methods of making nanopowders, nanoceramic materials and nanoceramic components
US10443126B1 (en) 2018-04-06 2019-10-15 Applied Materials, Inc. Zone-controlled rare-earth oxide ALD and CVD coatings
US12209307B2 (en) 2018-04-06 2025-01-28 Applied Materials, Inc. Zone-controlled rare-earth oxide ALD and CVD coatings
US12049696B2 (en) 2018-04-06 2024-07-30 Applied Materials, Inc. Plasma resistant process chamber lid
US11667575B2 (en) 2018-07-18 2023-06-06 Applied Materials, Inc. Erosion resistant metal oxide coatings
US11180847B2 (en) 2018-12-06 2021-11-23 Applied Materials, Inc. Atomic layer deposition coatings for high temperature ceramic components
US12442072B2 (en) 2018-12-06 2025-10-14 Applied Materials, Inc. Atomic layer deposition coatings for high temperature ceramic components
US10858741B2 (en) 2019-03-11 2020-12-08 Applied Materials, Inc. Plasma resistant multi-layer architecture for high aspect ratio parts
EP4136272A4 (en) * 2020-04-14 2024-05-22 Entegris, Inc. YTTRIUM FLUORIDE FILMS AND METHODS FOR PRODUCING AND USING YTTRIUM FLUORIDE FILMS
US12031212B2 (en) * 2020-04-14 2024-07-09 Entegris, Inc. Yttrium fluoride films and methods of preparing and using yttrium fluoride films
US20210317572A1 (en) * 2020-04-14 2021-10-14 Entegris, Inc. Yttrium fluoride films and methods of preparing and using yttrium fluoride films
CN114649179A (zh) * 2020-12-18 2022-06-21 中微半导体设备(上海)股份有限公司 半导体零部件、等离子处理装置及耐腐蚀涂层的形成方法
JP2024511364A (ja) * 2021-03-19 2024-03-13 インテグリス・インコーポレーテッド フッ素化イットリウムコーティングを有する基材、ならびに基材を製造および使用する方法
US12270104B2 (en) 2021-03-19 2025-04-08 Entegris, Inc. Substrate with fluorinated yttrium coatings, and methods of preparing and using the substrates
JP7699217B2 (ja) 2021-03-19 2025-06-26 インテグリス・インコーポレーテッド フッ素化イットリウムコーティングを有する基材、ならびに基材を製造および使用する方法

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