JP2007165849A5 - - Google Patents

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Publication number
JP2007165849A5
JP2007165849A5 JP2006275409A JP2006275409A JP2007165849A5 JP 2007165849 A5 JP2007165849 A5 JP 2007165849A5 JP 2006275409 A JP2006275409 A JP 2006275409A JP 2006275409 A JP2006275409 A JP 2006275409A JP 2007165849 A5 JP2007165849 A5 JP 2007165849A5
Authority
JP
Japan
Prior art keywords
outer peripheral
plasma processing
processing apparatus
peripheral portion
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006275409A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007165849A (ja
JP4522980B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2006275409A external-priority patent/JP4522980B2/ja
Priority to JP2006275409A priority Critical patent/JP4522980B2/ja
Priority to KR1020087010672A priority patent/KR101242248B1/ko
Priority to PCT/JP2006/321890 priority patent/WO2007052711A1/ja
Priority to TW095140375A priority patent/TWI409873B/zh
Priority to CN2006800502745A priority patent/CN101351871B/zh
Priority to US12/092,381 priority patent/US20090218045A1/en
Publication of JP2007165849A publication Critical patent/JP2007165849A/ja
Publication of JP2007165849A5 publication Critical patent/JP2007165849A5/ja
Publication of JP4522980B2 publication Critical patent/JP4522980B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006275409A 2005-11-02 2006-10-06 プラズマ処理装置及びプラズマ処理方法 Expired - Fee Related JP4522980B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2006275409A JP4522980B2 (ja) 2005-11-15 2006-10-06 プラズマ処理装置及びプラズマ処理方法
CN2006800502745A CN101351871B (zh) 2005-11-02 2006-11-01 等离子体处理装置
PCT/JP2006/321890 WO2007052711A1 (ja) 2005-11-02 2006-11-01 プラズマ処理装置
TW095140375A TWI409873B (zh) 2005-11-02 2006-11-01 電漿處理裝置
KR1020087010672A KR101242248B1 (ko) 2005-11-02 2006-11-01 플라즈마 처리 장치
US12/092,381 US20090218045A1 (en) 2005-11-02 2006-11-01 Plasma processing apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005329756 2005-11-15
JP2006275409A JP4522980B2 (ja) 2005-11-15 2006-10-06 プラズマ処理装置及びプラズマ処理方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010061115A Division JP2010183092A (ja) 2005-11-15 2010-03-17 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2007165849A JP2007165849A (ja) 2007-06-28
JP2007165849A5 true JP2007165849A5 (https=) 2009-12-24
JP4522980B2 JP4522980B2 (ja) 2010-08-11

Family

ID=38248343

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006275409A Expired - Fee Related JP4522980B2 (ja) 2005-11-02 2006-10-06 プラズマ処理装置及びプラズマ処理方法

Country Status (1)

Country Link
JP (1) JP4522980B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4895920B2 (ja) * 2007-06-08 2012-03-14 パナソニック株式会社 プラズマ処理装置
KR101507392B1 (ko) * 2008-07-19 2015-03-31 주식회사 뉴파워 프라즈마 플라즈마 반응기
JP6600990B2 (ja) * 2015-01-27 2019-11-06 東京エレクトロン株式会社 プラズマ処理装置
US10483092B2 (en) * 2016-04-13 2019-11-19 Lam Research Corporation Baffle plate and showerhead assemblies and corresponding manufacturing method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10261630A (ja) * 1997-03-19 1998-09-29 Matsushita Electric Ind Co Ltd プラズマ処理方法及び装置
JP4028534B2 (ja) * 1999-05-13 2007-12-26 東京エレクトロン株式会社 誘導結合プラズマ処理装置
JP2002043289A (ja) * 2000-07-24 2002-02-08 Matsushita Electric Ind Co Ltd プラズマ処理方法及び装置
JP3913681B2 (ja) * 2003-01-21 2007-05-09 東京エレクトロン株式会社 誘導結合プラズマ処理装置
JP4381963B2 (ja) * 2003-11-19 2009-12-09 パナソニック株式会社 プラズマ処理装置

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