JP2007161608A - N−(ヘテロ)アリール置換含窒素ヘテロアリール化合物の製造方法 - Google Patents
N−(ヘテロ)アリール置換含窒素ヘテロアリール化合物の製造方法 Download PDFInfo
- Publication number
- JP2007161608A JP2007161608A JP2005356876A JP2005356876A JP2007161608A JP 2007161608 A JP2007161608 A JP 2007161608A JP 2005356876 A JP2005356876 A JP 2005356876A JP 2005356876 A JP2005356876 A JP 2005356876A JP 2007161608 A JP2007161608 A JP 2007161608A
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- JP
- Japan
- Prior art keywords
- aryl
- group
- hetero
- heteroaryl compound
- substituted nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- -1 nitrogen-containing heteroaryl compound Chemical class 0.000 title claims abstract description 41
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 125000005842 heteroatom Chemical group 0.000 claims abstract description 28
- 239000003446 ligand Substances 0.000 claims abstract description 25
- 239000003054 catalyst Substances 0.000 claims abstract description 21
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical group [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 23
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 15
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 12
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 claims description 12
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 12
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 10
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- 125000001424 substituent group Chemical group 0.000 claims description 9
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 7
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 7
- KAESVJOAVNADME-UHFFFAOYSA-N 1H-pyrrole Natural products C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 6
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 claims description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims description 6
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 claims description 6
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 claims description 6
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 claims description 6
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 claims description 6
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 5
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 claims description 4
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 claims description 4
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 claims description 4
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 3
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 claims description 3
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 claims description 3
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 claims description 3
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 claims description 3
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 claims description 3
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 claims description 3
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 3
- 239000012964 benzotriazole Substances 0.000 claims description 3
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 claims description 3
- 150000003852 triazoles Chemical class 0.000 claims description 3
- 125000000168 pyrrolyl group Chemical group 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 15
- 238000005401 electroluminescence Methods 0.000 abstract description 6
- 239000003905 agrochemical Substances 0.000 abstract description 5
- 239000003814 drug Substances 0.000 abstract description 5
- 238000000034 method Methods 0.000 description 15
- 239000000047 product Substances 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 125000000623 heterocyclic group Chemical group 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 229910001868 water Inorganic materials 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- KZPYGQFFRCFCPP-UHFFFAOYSA-N 1,1'-bis(diphenylphosphino)ferrocene Chemical compound [Fe+2].C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1 KZPYGQFFRCFCPP-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- MUALRAIOVNYAIW-UHFFFAOYSA-N binap Chemical group C1=CC=CC=C1P(C=1C(=C2C=CC=CC2=CC=1)C=1C2=CC=CC=C2C=CC=1P(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 MUALRAIOVNYAIW-UHFFFAOYSA-N 0.000 description 3
- 125000001072 heteroaryl group Chemical group 0.000 description 3
- 238000004128 high performance liquid chromatography Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 239000000741 silica gel Substances 0.000 description 3
- 229910002027 silica gel Inorganic materials 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- LVEYOSJUKRVCCF-UHFFFAOYSA-N 1,3-bis(diphenylphosphino)propane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CCCP(C=1C=CC=CC=1)C1=CC=CC=C1 LVEYOSJUKRVCCF-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- OWIKHYCFFJSOEH-UHFFFAOYSA-N Isocyanic acid Chemical group N=C=O OWIKHYCFFJSOEH-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 description 2
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- 230000003197 catalytic effect Effects 0.000 description 2
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- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
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- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 2
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- BWHDROKFUHTORW-UHFFFAOYSA-N tritert-butylphosphane Chemical compound CC(C)(C)P(C(C)(C)C)C(C)(C)C BWHDROKFUHTORW-UHFFFAOYSA-N 0.000 description 2
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- 208000024172 Cardiovascular disease Diseases 0.000 description 1
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- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
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- 108010022355 Fibroins Proteins 0.000 description 1
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- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 1
- 239000012450 pharmaceutical intermediate Substances 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 1
- 125000005259 triarylamine group Chemical group 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- WTVXIBRMWGUIMI-UHFFFAOYSA-N trifluoro($l^{1}-oxidanylsulfonyl)methane Chemical group [O]S(=O)(=O)C(F)(F)F WTVXIBRMWGUIMI-UHFFFAOYSA-N 0.000 description 1
- IGNTWNVBGLNYDV-UHFFFAOYSA-N triisopropylphosphine Chemical compound CC(C)P(C(C)C)C(C)C IGNTWNVBGLNYDV-UHFFFAOYSA-N 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/325—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals directly attached to the ring nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/04—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Pyridine Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Pyrrole Compounds (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
【解決手段】不均一系白金族元素触媒、配位子および塩基の存在下、NH基を環構成成分とするヘテロアリール化合物と、脱離基を有する(ヘテロ)アリール化合物とを反応させることを特徴とするN−(ヘテロ)アリール置換含窒素へテロアリール化合物の製造方法。
【選択図】なし
Description
他の方法としては、パラジウム触媒とホスフィン系リガンドとを用いた均一系での製造方法も開示されている(特許文献4、非特許文献2参照)。しかし、この方法の場合、それらの触媒が空気中で不安定なため反応系から厳密に酸素を除去する必要があること、および触媒の回収・再利用が困難であるため製造コストが著しく高くなるという欠点があった。
<1>
不均一系白金族元素触媒、配位子および塩基の存在下、NH基を環構成成分とするヘテロアリール化合物と、脱離基を有する(ヘテロ)アリール化合物とを反応させることを特徴とするN−(ヘテロ)アリール置換含窒素へテロアリール化合物の製造方法。
<2>
NH基を環構成成分とするヘテロアリール化合物が、各々置換基を有してもよいピロール、インドール、ピラゾール、インダゾール、イミダゾール、ベンズイミダゾール、トリアゾールまたはベンゾトリアゾールである上記<1>のN−(ヘテロ)アリール置換含窒素へテロアリール化合物の製造方法。
脱離基を有する(ヘテロ)アリール化合物が、各々更に他の置換基を有してもよいベンゼン、ナフタレン、アントラセン、フェナントレン、ピリジン、ピリダジン、ピリミジン、ピラジン、トリアジン、キノリン、イソキノリン、オキサゾール、ベンズオキサゾール、チアゾール、ベンゾチアゾール、フランまたはベンゾフランである上記<1>のN−(ヘテロ)アリール置換含窒素へテロアリール化合物の製造方法。
<4>
不均一系白金族元素触媒が、炭素に担持されたパラジウムである上記<1>のN−(ヘテロ)アリール置換含窒素へテロアリール化合物の製造方法。
<5>
配位子がホスフィン系リガンドである上記<1>のN−(ヘテロ)アリール置換含窒素へテロアリール化合物の製造方法。
尚、(ヘテロ)アリールとは、アリールまたはヘテロアリールを表す。
本発明の方法をより詳しく説明するために、本発明の方法の一態様を一例として記載するが、本発明の内容はこれらに限定されるものではない。
これらのヘテロアリール化合物は置換基を有していても良く特に限定されないが、好ましくはアルキル基、アルケニル基、アルキニル基、アリール基、ヒドロキシル基、アルコキシ基、アリールオキシ基、カルボニル基、カルボニルオキシ基、スルホニル基、アミノ基、ウレイド基、カルバモイル基、カルボニルアミド基、スルファモイル基、スルホンアミド基、カルボキシ基、スルホ基、シアノ基、ハロゲン原子、ヘテロ環残基が挙げられる。
(ヘテロ)アリール化合物が含有する脱離基としては特に限定されないが、好ましくはヨウ素、臭素、塩素等のハロゲン原子;スルホニルオキシ基(例えばメチルスルホニルオキシ、トリフルオロメチルスルホニルオキシ等)等の酸素原子結合型置換基;アルキルスルホニル基(例えばメチルスルホニル、エチルスルホニル等)、アリールスルホニル基(例えばフェニルスルホニル、トシル等)等の硫黄原子結合型置換基であり、より好ましくはハロゲン原子、特に好ましくは塩素原子または臭素原子である。
本発明で用いるNH基を環構成成分とするヘテロアリール化合物は多種市販されており、容易に入手可能である。
本発明で用いる脱離基を有する(ヘテロ)アリール化合物も同様に多種市販されており、容易に入手可能である。脱離基を有する(ヘテロ)アリール化合物の使用量は、NH基を環構成成分とするヘテロアリール化合物に対し0.5〜2当量であり、好ましくは0.8〜1.5当量、より好ましくは0.9〜1.2当量である。
不均一系白金族元素触媒の使用量は、NH基を環構成成分とするヘテロアリール化合物に対して20モル%以下であり、好ましくは5モル%以下、より好ましくは1モル%以下である。
本発明で用いられる配位子の使用量は、不均一系白金族元素触媒の金属原子とこれに配位する原子比に換算して、好ましくは1:0.001〜1:20であり、特に好ましくは1:0.01〜1:4である。例えば、炭素に担持されたパラジウムとビス型ホスフィンリガンドを用いた場合、パラジウム原子とリン原子との比はより好ましくは1:0.001〜1:20であり、特に好ましくは1:0.01〜1:4である。
塩基の使用量は用いる塩基の種類や解離する置換基によって異なるが、NH基を環構成成分とするヘテロアリール化合物に対し、通常0.5〜5当量、好ましくは0.8〜4当量、より好ましくは1〜3当量である。
特に好ましくは1.5〜30倍質量である。
反応終了後、得られたN−(ヘテロ)アリール置換含窒素へテロアリール化合物は、通常の有機化合物の単離・精製方法を用いることが出来る。例えば、反応液中のパラジウム炭素をろ過した後、水を添加し分液処理して濃縮すれば粗成物が得られる。更にその粗成物は酢酸エチル、トルエン、アルコール、ヘキサン等を用いた再結晶、シリカゲルを用いたカラム精製、減圧蒸留等により精製する。これらの方法は、単独または2つ以上組み合わせて精製を行うことにより目的物を高純度で得ることが可能である。
4−クロロピリジン塩酸塩30.0g(0.20mol)、ナトリウム t−ブトキシド53.8g(0.56mol)、10w/w%パラジウム炭素(Pd−C)(54w/w%含水)19.6g(0.01mol)、インドール23.4g(0.20mol)、およびDPEphos5.39g(0.01mol)をトルエン600mlに溶解し、還流下で10時間攪拌した。反応終了後、室温まで冷却しパラジウム炭素を濾過して、反応液を濃縮した。残渣に酢酸エチル300mlと1M塩酸300mlを加え、目的物を水層へ抽出した。次いで酢酸エチル300mlと2M水酸化ナトリウム水溶液200mlを水層に添加し、今度は有機層へ目的物を抽出した。有機層を水200mLで洗浄後、硫酸マグネシウムで乾燥した。濾過、濃縮し油状の目的物33.3g(収率86%)を得た。純度は99.8%であった。
用いる触媒を均一系触媒である酢酸パラジウム(Pd(OCOCH3)2)に変更し、反応条件を下記のように変更した以外は、実施例1と同様の操作で目的物を合成した。
これらの結果を表1に示す。
本発明の方法は、他の方法に比べ短い反応時間で目的物を得ることが出来、収率も良好である。また、用いた触媒は回収して繰り返し使用可能であり、他の方法よりも低コストで目的物を合成することができる。
用いる配位子を表2に記載したものに変更した以外は実施例1と同様の操作で合成した。
配位子を添加しない以外は実施例1と同様の操作で合成した。
これらの結果を表2に示す。
用いる基質を表3に記載したものに変更した以外は実施例1と同様の操作で合成した。その結果を表3に示す。
Claims (5)
- 不均一系白金族元素触媒、配位子および塩基の存在下、NH基を環構成成分とするヘテロアリール化合物と、脱離基を有する(ヘテロ)アリール化合物とを反応させることを特徴とするN−(ヘテロ)アリール置換含窒素へテロアリール化合物の製造方法。
- NH基を環構成成分とするヘテロアリール化合物が、各々置換基を有してもよいピロール、インドール、ピラゾール、インダゾール、イミダゾール、ベンズイミダゾール、トリアゾールまたはベンゾトリアゾールである請求項1記載のN−(ヘテロ)アリール置換含窒素へテロアリール化合物の製造方法。
- 脱離基を有する(ヘテロ)アリール化合物が、各々更に他の置換基を有してもよいベンゼン、ナフタレン、アントラセン、フェナントレン、ピリジン、ピリダジン、ピリミジン、ピラジン、トリアジン、キノリン、イソキノリン、オキサゾール、ベンズオキサゾール、チアゾール、ベンゾチアゾール、フランまたはベンゾフランである請求項1記載のN−(ヘテロ)アリール置換含窒素へテロアリール化合物の製造方法。
- 不均一系白金族元素触媒が、炭素に担持されたパラジウムである請求項1記載のN−(ヘテロ)アリール置換含窒素へテロアリール化合物の製造方法。
- 配位子がホスフィン系リガンドである請求項1記載のN−(ヘテロ)アリール置換含窒素へテロアリール化合物の製造方法。
Priority Applications (5)
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JP2005356876A JP2007161608A (ja) | 2005-12-09 | 2005-12-09 | N−(ヘテロ)アリール置換含窒素ヘテロアリール化合物の製造方法 |
DE602006020102T DE602006020102D1 (de) | 2005-12-09 | 2006-12-05 | Prozess zur Herstellung von N-(Hetero)Aryl-substituierten Stickstoff enthaltenen Heteroaryl Verbindungen |
EP06025125A EP1795529B1 (en) | 2005-12-09 | 2006-12-05 | Process for producing N-(Hetero)Aryl-substituted nitrogen-containing heteroaryl compound |
CNA2006101642190A CN1978440A (zh) | 2005-12-09 | 2006-12-05 | 制备n-(杂)芳基-取代的含氮杂芳基化合物的方法 |
US11/635,664 US7834183B2 (en) | 2005-12-09 | 2006-12-08 | Process for producing N-(hetero)aryl-substituted nitrogen-containing heteroaryl compound |
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JP2005356876A JP2007161608A (ja) | 2005-12-09 | 2005-12-09 | N−(ヘテロ)アリール置換含窒素ヘテロアリール化合物の製造方法 |
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Citations (5)
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JPH1135514A (ja) * | 1997-07-18 | 1999-02-09 | Sankyo Co Ltd | ビアリール化合物の製造方法 |
US20040002507A1 (en) * | 2002-01-23 | 2004-01-01 | Bayer Corporation | Rho-kinase inhibitors |
JP2004182713A (ja) * | 2002-12-03 | 2004-07-02 | Api Corporation | ハロアリール置換ピリジン誘導体の製造方法 |
WO2004074283A1 (en) * | 2003-02-21 | 2004-09-02 | Pfizer Inc. | N-heterocyclyl-substituted amino-thiazole derivatives as protein kinase inhibitors |
US20050054631A1 (en) * | 2003-09-04 | 2005-03-10 | Aventis Pharmaceuticals Inc. | Substituted indoles as inhibitors of poly (ADP-ribose) polymerase (PARP) |
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JP2004502528A (ja) * | 2000-07-12 | 2004-01-29 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング | 新しい触媒システム |
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- 2006-12-05 DE DE602006020102T patent/DE602006020102D1/de active Active
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1135514A (ja) * | 1997-07-18 | 1999-02-09 | Sankyo Co Ltd | ビアリール化合物の製造方法 |
US20040002507A1 (en) * | 2002-01-23 | 2004-01-01 | Bayer Corporation | Rho-kinase inhibitors |
JP2004182713A (ja) * | 2002-12-03 | 2004-07-02 | Api Corporation | ハロアリール置換ピリジン誘導体の製造方法 |
WO2004074283A1 (en) * | 2003-02-21 | 2004-09-02 | Pfizer Inc. | N-heterocyclyl-substituted amino-thiazole derivatives as protein kinase inhibitors |
US20050054631A1 (en) * | 2003-09-04 | 2005-03-10 | Aventis Pharmaceuticals Inc. | Substituted indoles as inhibitors of poly (ADP-ribose) polymerase (PARP) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2022524290A (ja) * | 2019-01-31 | 2022-05-02 | 杏林製薬株式会社 | 15-pgdh阻害薬 |
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US20070135633A1 (en) | 2007-06-14 |
DE602006020102D1 (de) | 2011-03-31 |
EP1795529A3 (en) | 2008-03-05 |
EP1795529A2 (en) | 2007-06-13 |
CN1978440A (zh) | 2007-06-13 |
EP1795529B1 (en) | 2011-02-16 |
US7834183B2 (en) | 2010-11-16 |
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