JP2007158224A5 - - Google Patents

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Publication number
JP2007158224A5
JP2007158224A5 JP2005354543A JP2005354543A JP2007158224A5 JP 2007158224 A5 JP2007158224 A5 JP 2007158224A5 JP 2005354543 A JP2005354543 A JP 2005354543A JP 2005354543 A JP2005354543 A JP 2005354543A JP 2007158224 A5 JP2007158224 A5 JP 2007158224A5
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JP
Japan
Prior art keywords
correction amount
region
exposure method
slit
correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005354543A
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English (en)
Japanese (ja)
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JP2007158224A (ja
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Publication date
Application filed filed Critical
Priority to JP2005354543A priority Critical patent/JP2007158224A/ja
Priority claimed from JP2005354543A external-priority patent/JP2007158224A/ja
Priority to US11/567,499 priority patent/US7619716B2/en
Publication of JP2007158224A publication Critical patent/JP2007158224A/ja
Publication of JP2007158224A5 publication Critical patent/JP2007158224A5/ja
Withdrawn legal-status Critical Current

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JP2005354543A 2005-12-08 2005-12-08 露光方法 Withdrawn JP2007158224A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005354543A JP2007158224A (ja) 2005-12-08 2005-12-08 露光方法
US11/567,499 US7619716B2 (en) 2005-12-08 2006-12-06 Exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005354543A JP2007158224A (ja) 2005-12-08 2005-12-08 露光方法

Publications (2)

Publication Number Publication Date
JP2007158224A JP2007158224A (ja) 2007-06-21
JP2007158224A5 true JP2007158224A5 (enExample) 2009-01-29

Family

ID=38179832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005354543A Withdrawn JP2007158224A (ja) 2005-12-08 2005-12-08 露光方法

Country Status (2)

Country Link
US (1) US7619716B2 (enExample)
JP (1) JP2007158224A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010182704A (ja) * 2009-02-03 2010-08-19 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP5398318B2 (ja) * 2009-03-24 2014-01-29 株式会社東芝 露光装置および電子デバイスの製造方法
JP6422307B2 (ja) * 2014-11-05 2018-11-14 キヤノン株式会社 露光方法、露光装置、および物品の製造方法
EP3570110A1 (en) * 2018-05-16 2019-11-20 ASML Netherlands B.V. Estimating a parameter of a substrate

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3232473B2 (ja) 1996-01-10 2001-11-26 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
JP3937580B2 (ja) * 1998-04-30 2007-06-27 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
KR20010085493A (ko) * 2000-02-25 2001-09-07 시마무라 기로 노광장치, 그 조정방법, 및 상기 노광장치를 이용한디바이스 제조방법

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