JP2007073976A5 - - Google Patents
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- Publication number
- JP2007073976A5 JP2007073976A5 JP2006260304A JP2006260304A JP2007073976A5 JP 2007073976 A5 JP2007073976 A5 JP 2007073976A5 JP 2006260304 A JP2006260304 A JP 2006260304A JP 2006260304 A JP2006260304 A JP 2006260304A JP 2007073976 A5 JP2007073976 A5 JP 2007073976A5
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film transistor
- semiconductor device
- wiring layers
- thru
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006260304A JP4777203B2 (ja) | 2005-01-28 | 2006-09-26 | 半導体装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005022214 | 2005-01-28 | ||
| JP2005022214 | 2005-01-28 | ||
| JP2006260304A JP4777203B2 (ja) | 2005-01-28 | 2006-09-26 | 半導体装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006017033A Division JP4777078B2 (ja) | 2005-01-28 | 2006-01-26 | 半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007073976A JP2007073976A (ja) | 2007-03-22 |
| JP2007073976A5 true JP2007073976A5 (enrdf_load_stackoverflow) | 2010-04-15 |
| JP4777203B2 JP4777203B2 (ja) | 2011-09-21 |
Family
ID=37935104
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006260304A Expired - Fee Related JP4777203B2 (ja) | 2005-01-28 | 2006-09-26 | 半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4777203B2 (enrdf_load_stackoverflow) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI626744B (zh) * | 2008-07-31 | 2018-06-11 | 半導體能源研究所股份有限公司 | 半導體裝置及半導體裝置的製造方法 |
| JP2010056541A (ja) | 2008-07-31 | 2010-03-11 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
| US9666719B2 (en) | 2008-07-31 | 2017-05-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| JP5480554B2 (ja) * | 2008-08-08 | 2014-04-23 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP5608347B2 (ja) * | 2008-08-08 | 2014-10-15 | 株式会社半導体エネルギー研究所 | 半導体装置及び半導体装置の作製方法 |
| KR101634411B1 (ko) | 2008-10-31 | 2016-06-28 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 구동 회로, 표시 장치 및 전자 장치 |
| US8841661B2 (en) * | 2009-02-25 | 2014-09-23 | Semiconductor Energy Laboratory Co., Ltd. | Staggered oxide semiconductor TFT semiconductor device and manufacturing method thereof |
| KR101107158B1 (ko) * | 2009-07-10 | 2012-01-25 | 삼성모바일디스플레이주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
| KR102009813B1 (ko) | 2009-09-16 | 2019-08-12 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광 장치 및 이의 제조 방법 |
| KR102106817B1 (ko) * | 2018-10-30 | 2020-05-14 | 재단법인대구경북과학기술원 | 색순도 조절 다층 구조 필터 및 이의 제조 방법 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002100621A (ja) * | 2000-09-20 | 2002-04-05 | Seiko Epson Corp | 成膜装置、成膜方法、これにより成膜された基板及びこの基板を用いた液晶装置 |
| JP2003133691A (ja) * | 2001-10-22 | 2003-05-09 | Seiko Epson Corp | 膜パターンの形成方法、膜パターン形成装置、導電膜配線、電気光学装置、電子機器、並びに非接触型カード媒体 |
| JP4566578B2 (ja) * | 2003-02-24 | 2010-10-20 | 株式会社半導体エネルギー研究所 | 薄膜集積回路の作製方法 |
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2006
- 2006-09-26 JP JP2006260304A patent/JP4777203B2/ja not_active Expired - Fee Related