JP2007073880A5 - - Google Patents
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- Publication number
- JP2007073880A5 JP2007073880A5 JP2005262122A JP2005262122A JP2007073880A5 JP 2007073880 A5 JP2007073880 A5 JP 2007073880A5 JP 2005262122 A JP2005262122 A JP 2005262122A JP 2005262122 A JP2005262122 A JP 2005262122A JP 2007073880 A5 JP2007073880 A5 JP 2007073880A5
- Authority
- JP
- Japan
- Prior art keywords
- liquid storage
- pressure
- processing chamber
- storage means
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims 12
- 238000001514 detection method Methods 0.000 claims 8
- 239000000463 material Substances 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 238000007599 discharging Methods 0.000 claims 3
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005262122A JP4813854B2 (ja) | 2005-09-09 | 2005-09-09 | 基板処理装置及び半導体の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005262122A JP4813854B2 (ja) | 2005-09-09 | 2005-09-09 | 基板処理装置及び半導体の製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007073880A JP2007073880A (ja) | 2007-03-22 |
JP2007073880A5 true JP2007073880A5 (enrdf_load_stackoverflow) | 2008-10-16 |
JP4813854B2 JP4813854B2 (ja) | 2011-11-09 |
Family
ID=37935045
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005262122A Expired - Lifetime JP4813854B2 (ja) | 2005-09-09 | 2005-09-09 | 基板処理装置及び半導体の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4813854B2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100883768B1 (ko) * | 2008-08-22 | 2009-02-18 | 주식회사 미래보 | 반도체 공정에서 액상 포집기로의 반응성 가스 역류방지장치 |
JP6342370B2 (ja) * | 2015-09-07 | 2018-06-13 | 株式会社東芝 | 半導体製造装置及び半導体製造装置用除去装置 |
JP7175782B2 (ja) * | 2019-01-25 | 2022-11-21 | 株式会社東芝 | ケイ素含有物質形成装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3592923B2 (ja) * | 1998-02-13 | 2004-11-24 | 東京エレクトロン株式会社 | 排気装置 |
JP3396431B2 (ja) * | 1998-08-10 | 2003-04-14 | 東京エレクトロン株式会社 | 酸化処理方法および酸化処理装置 |
JP3543949B2 (ja) * | 1999-11-09 | 2004-07-21 | 東京エレクトロン株式会社 | 熱処理装置 |
JP3554847B2 (ja) * | 2001-07-30 | 2004-08-18 | 東京エレクトロン株式会社 | 熱処理装置 |
JP2003318172A (ja) * | 2002-04-19 | 2003-11-07 | Tokyo Electron Ltd | 成膜方法、成膜処理時間補正式の導出方法、成膜装置、およびプログラム |
-
2005
- 2005-09-09 JP JP2005262122A patent/JP4813854B2/ja not_active Expired - Lifetime
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