JP2007059566A5 - - Google Patents

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Publication number
JP2007059566A5
JP2007059566A5 JP2005242033A JP2005242033A JP2007059566A5 JP 2007059566 A5 JP2007059566 A5 JP 2007059566A5 JP 2005242033 A JP2005242033 A JP 2005242033A JP 2005242033 A JP2005242033 A JP 2005242033A JP 2007059566 A5 JP2007059566 A5 JP 2007059566A5
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JP
Japan
Prior art keywords
optical system
reticle
polarization state
projection optical
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005242033A
Other languages
English (en)
Japanese (ja)
Other versions
JP4976670B2 (ja
JP2007059566A (ja
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Publication date
Application filed filed Critical
Priority to JP2005242033A priority Critical patent/JP4976670B2/ja
Priority claimed from JP2005242033A external-priority patent/JP4976670B2/ja
Priority to US11/463,657 priority patent/US7525656B2/en
Publication of JP2007059566A publication Critical patent/JP2007059566A/ja
Publication of JP2007059566A5 publication Critical patent/JP2007059566A5/ja
Application granted granted Critical
Publication of JP4976670B2 publication Critical patent/JP4976670B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005242033A 2005-08-24 2005-08-24 露光装置及びデバイス製造方法 Expired - Fee Related JP4976670B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005242033A JP4976670B2 (ja) 2005-08-24 2005-08-24 露光装置及びデバイス製造方法
US11/463,657 US7525656B2 (en) 2005-08-24 2006-08-10 Exposure apparatus and device fabrication method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005242033A JP4976670B2 (ja) 2005-08-24 2005-08-24 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2007059566A JP2007059566A (ja) 2007-03-08
JP2007059566A5 true JP2007059566A5 (https=) 2008-10-09
JP4976670B2 JP4976670B2 (ja) 2012-07-18

Family

ID=37803600

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005242033A Expired - Fee Related JP4976670B2 (ja) 2005-08-24 2005-08-24 露光装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US7525656B2 (https=)
JP (1) JP4976670B2 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006078843A1 (en) * 2005-01-19 2006-07-27 Litel Instruments Method and apparatus for determination of source polarization matrix
JP2008108851A (ja) * 2006-10-24 2008-05-08 Canon Inc 照明装置及び当該照明装置を有する露光装置、並びに、デバイス製造方法
JP2009033045A (ja) 2007-07-30 2009-02-12 Canon Inc 調整方法、露光方法、デバイス製造方法及び露光装置
JP2009099629A (ja) * 2007-10-12 2009-05-07 Nikon Corp 照明光学装置、露光方法及び装置、並びに電子デバイスの製造方法
JP5033015B2 (ja) 2008-02-15 2012-09-26 キヤノン株式会社 露光装置、露光方法及びデバイス製造方法
TW200938957A (en) * 2008-03-05 2009-09-16 Nanya Technology Corp Feedback system and feedback method for controlling power ratio of light source
DE102009015393B3 (de) * 2009-03-20 2010-09-02 Carl Zeiss Smt Ag Messverfahren und Messsystem zur Messung der Doppelbrechung
JP2011014660A (ja) * 2009-06-30 2011-01-20 Canon Inc 偏光状態の計測装置、露光装置及びデバイス製造方法
JP2011014707A (ja) * 2009-07-01 2011-01-20 Canon Inc 露光装置およびデバイス製造方法
JP6897092B2 (ja) * 2016-12-22 2021-06-30 カシオ計算機株式会社 投影制御装置、投影制御方法及びプログラム
CN121348673B (zh) * 2025-12-17 2026-03-17 光科芯图(北京)科技有限公司 基于平面波的照明系统及曝光设备

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57196131A (en) * 1981-05-27 1982-12-02 Olympus Optical Co Ltd Measuring method for wave front aberration
GB8701521D0 (en) * 1987-01-23 1993-12-01 British Aerospace Multi-parameter imaging polarimeter
JPH01115236U (https=) * 1988-01-29 1989-08-03
JPH03231420A (ja) * 1990-02-06 1991-10-15 Nikon Corp 投影光学装置
JPH03288976A (ja) 1990-04-05 1991-12-19 Matsushita Electric Ind Co Ltd 点広がり関数決定装置
JP3288976B2 (ja) 1998-08-07 2002-06-04 彰二郎 川上 偏光子とその作製方法
JP2003043223A (ja) * 2001-07-30 2003-02-13 Nikon Corp 結晶材料で形成されたビームスプリッターおよび波長板、並びにこれらの結晶光学部品を備えた光学装置、露光装置並びに検査装置
JP2004061515A (ja) * 2002-07-29 2004-02-26 Cark Zeiss Smt Ag 光学系による偏光状態への影響を決定する方法及び装置と、分析装置
TWI609410B (zh) * 2004-02-06 2017-12-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
WO2006016584A1 (ja) * 2004-08-09 2006-02-16 Nikon Corporation 光学特性計測装置及び光学特性計測方法、露光装置及び露光方法、並びにデバイス製造方法
JP4580797B2 (ja) * 2005-03-28 2010-11-17 株式会社東芝 偏光状態検査方法及び半導体装置の製造方法
JP4739411B2 (ja) * 2005-06-13 2011-08-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ投影システムおよび投影レンズ偏光センサ
EP1910898B1 (en) * 2005-06-13 2012-10-10 ASML Netherlands B.V. Lithographic apparatus and method for determining a polarization property of a lithographic apparatus

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