JP2006527481A5 - - Google Patents

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Publication number
JP2006527481A5
JP2006527481A5 JP2006513139A JP2006513139A JP2006527481A5 JP 2006527481 A5 JP2006527481 A5 JP 2006527481A5 JP 2006513139 A JP2006513139 A JP 2006513139A JP 2006513139 A JP2006513139 A JP 2006513139A JP 2006527481 A5 JP2006527481 A5 JP 2006527481A5
Authority
JP
Japan
Prior art keywords
lid wafer
subwavelength structures
structures
wafer
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006513139A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006527481A (ja
Filing date
Publication date
Priority claimed from US10/428,745 external-priority patent/US6897469B2/en
Application filed filed Critical
Publication of JP2006527481A publication Critical patent/JP2006527481A/ja
Publication of JP2006527481A5 publication Critical patent/JP2006527481A5/ja
Withdrawn legal-status Critical Current

Links

JP2006513139A 2003-05-02 2004-04-19 シリコンウエハ用の反射防止サブ波長構造 Withdrawn JP2006527481A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/428,745 US6897469B2 (en) 2003-05-02 2003-05-02 Sub-wavelength structures for reduction of reflective properties
PCT/US2004/012088 WO2004099064A1 (en) 2003-05-02 2004-04-19 Anti-reflective sub-wavelengh structures for silicon wafers

Publications (2)

Publication Number Publication Date
JP2006527481A JP2006527481A (ja) 2006-11-30
JP2006527481A5 true JP2006527481A5 (enExample) 2007-05-24

Family

ID=33310488

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006513139A Withdrawn JP2006527481A (ja) 2003-05-02 2004-04-19 シリコンウエハ用の反射防止サブ波長構造

Country Status (4)

Country Link
US (2) US6897469B2 (enExample)
EP (1) EP1620353A1 (enExample)
JP (1) JP2006527481A (enExample)
WO (1) WO2004099064A1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7276798B2 (en) * 2002-05-23 2007-10-02 Honeywell International Inc. Integral topside vacuum package
JP2005321524A (ja) * 2004-05-07 2005-11-17 Seiko Epson Corp 光源装置およびプロジェクタ
KR100584972B1 (ko) * 2004-06-11 2006-05-29 삼성전기주식회사 밀봉용 스페이서가 형성된 ｍｅｍｓ 패키지 및 그 제조 방법
US7262412B2 (en) * 2004-12-10 2007-08-28 L-3 Communications Corporation Optically blocked reference pixels for focal plane arrays
US7528061B2 (en) 2004-12-10 2009-05-05 L-3 Communications Corporation Systems and methods for solder bonding
US7412441B2 (en) * 2005-05-31 2008-08-12 Microsoft Corporation Predictive phonetic data search
US7655909B2 (en) * 2006-01-26 2010-02-02 L-3 Communications Corporation Infrared detector elements and methods of forming same
US7459686B2 (en) * 2006-01-26 2008-12-02 L-3 Communications Corporation Systems and methods for integrating focal plane arrays
US7462831B2 (en) * 2006-01-26 2008-12-09 L-3 Communications Corporation Systems and methods for bonding
US7462931B2 (en) * 2006-05-15 2008-12-09 Innovative Micro Technology Indented structure for encapsulated devices and method of manufacture
US7718965B1 (en) * 2006-08-03 2010-05-18 L-3 Communications Corporation Microbolometer infrared detector elements and methods for forming same
US7687304B2 (en) * 2006-11-29 2010-03-30 Innovative Micro Technology Current-driven device using NiMn alloy and method of manufacture
US8153980B1 (en) 2006-11-30 2012-04-10 L-3 Communications Corp. Color correction for radiation detectors
US7968986B2 (en) * 2007-05-07 2011-06-28 Innovative Micro Technology Lid structure for microdevice and method of manufacture
FR2917910B1 (fr) * 2007-06-22 2010-06-11 Thales Sa Dispositif de lumiere optimisee par l'utilisation de materiaux artificiels et procede de fabrication associe
JP5424730B2 (ja) * 2009-06-12 2014-02-26 三菱電機株式会社 光学フィルタの製造方法
JP2011002546A (ja) * 2009-06-17 2011-01-06 Mitsubishi Electric Corp 光学フィルタ
US8765514B1 (en) 2010-11-12 2014-07-01 L-3 Communications Corp. Transitioned film growth for conductive semiconductor materials
US8980676B2 (en) 2012-06-25 2015-03-17 Raytheon Company Fabrication of window cavity cap structures in wafer level packaging
US12332408B2 (en) * 2022-08-23 2025-06-17 Apple Inc. Anti-reflective optical structures for optical systems

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6014251A (en) * 1997-04-08 2000-01-11 The United States Of America As Represented By The Secretary Of The Navy Optical filters based on uniform arrays of metallic waveguides
US6195478B1 (en) * 1998-02-04 2001-02-27 Agilent Technologies, Inc. Planar lightwave circuit-based optical switches using micromirrors in trenches
US6359333B1 (en) * 1998-03-31 2002-03-19 Honeywell International Inc. Wafer-pair having deposited layer sealed chambers
EP0951069A1 (en) * 1998-04-17 1999-10-20 Interuniversitair Microelektronica Centrum Vzw Method of fabrication of a microstructure having an inside cavity
US6791757B2 (en) 1999-07-12 2004-09-14 Coho Holdings, Llc Optical device for filtering and sensing
US6707518B1 (en) 1999-07-12 2004-03-16 Coho Holdings, Llc Electro-optic device allowing wavelength tuning
US6363183B1 (en) * 2000-01-04 2002-03-26 Seungug Koh Reconfigurable and scalable intergrated optic waveguide add/drop multiplexing element using micro-opto-electro-mechanical systems and methods of fabricating thereof
WO2001056921A2 (en) 2000-02-02 2001-08-09 Raytheon Company Vacuum package fabrication of microelectromechanical system devices with integrated circuit components
JP2002015565A (ja) * 2000-06-29 2002-01-18 Mitsubishi Electric Corp 半導体記憶装置
EP1286187A3 (en) * 2001-08-06 2004-08-11 Coho Holdings, LLC Optical device for filtering and sensing

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