JP2006527481A - シリコンウエハ用の反射防止サブ波長構造 - Google Patents
シリコンウエハ用の反射防止サブ波長構造 Download PDFInfo
- Publication number
- JP2006527481A JP2006527481A JP2006513139A JP2006513139A JP2006527481A JP 2006527481 A JP2006527481 A JP 2006527481A JP 2006513139 A JP2006513139 A JP 2006513139A JP 2006513139 A JP2006513139 A JP 2006513139A JP 2006527481 A JP2006527481 A JP 2006527481A
- Authority
- JP
- Japan
- Prior art keywords
- lid wafer
- subwavelength structures
- lid
- wafer
- structures
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910052710 silicon Inorganic materials 0.000 title claims description 9
- 239000010703 silicon Substances 0.000 title claims description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title description 8
- 235000012431 wafers Nutrition 0.000 title 1
- 238000000034 method Methods 0.000 claims abstract description 37
- 239000000463 material Substances 0.000 claims description 30
- 238000005530 etching Methods 0.000 claims description 23
- 238000004519 manufacturing process Methods 0.000 claims description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 5
- 239000000945 filler Substances 0.000 claims description 4
- 230000003667 anti-reflective effect Effects 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 2
- 238000002329 infrared spectrum Methods 0.000 claims 1
- 239000006117 anti-reflective coating Substances 0.000 abstract description 11
- 230000005540 biological transmission Effects 0.000 abstract description 8
- 230000000737 periodic effect Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 8
- 238000007789 sealing Methods 0.000 description 6
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000003637 basic solution Substances 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 150000002484 inorganic compounds Chemical class 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- NHWNVPNZGGXQQV-UHFFFAOYSA-J [Si+4].[O-]N=O.[O-]N=O.[O-]N=O.[O-]N=O Chemical compound [Si+4].[O-]N=O.[O-]N=O.[O-]N=O.[O-]N=O NHWNVPNZGGXQQV-UHFFFAOYSA-J 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 239000005387 chalcogenide glass Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000009461 vacuum packaging Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/428,745 US6897469B2 (en) | 2003-05-02 | 2003-05-02 | Sub-wavelength structures for reduction of reflective properties |
| PCT/US2004/012088 WO2004099064A1 (en) | 2003-05-02 | 2004-04-19 | Anti-reflective sub-wavelengh structures for silicon wafers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006527481A true JP2006527481A (ja) | 2006-11-30 |
| JP2006527481A5 JP2006527481A5 (enExample) | 2007-05-24 |
Family
ID=33310488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006513139A Withdrawn JP2006527481A (ja) | 2003-05-02 | 2004-04-19 | シリコンウエハ用の反射防止サブ波長構造 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US6897469B2 (enExample) |
| EP (1) | EP1620353A1 (enExample) |
| JP (1) | JP2006527481A (enExample) |
| WO (1) | WO2004099064A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007522648A (ja) * | 2003-12-29 | 2007-08-09 | ハネウェル・インターナショナル・インコーポレーテッド | 一体型上側真空パッケージ |
| JP2010286706A (ja) * | 2009-06-12 | 2010-12-24 | Mitsubishi Electric Corp | 光学フィルタおよびその製造方法 |
| JP2011002546A (ja) * | 2009-06-17 | 2011-01-06 | Mitsubishi Electric Corp | 光学フィルタ |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005321524A (ja) * | 2004-05-07 | 2005-11-17 | Seiko Epson Corp | 光源装置およびプロジェクタ |
| KR100584972B1 (ko) * | 2004-06-11 | 2006-05-29 | 삼성전기주식회사 | 밀봉용 스페이서가 형성된 mems 패키지 및 그 제조 방법 |
| US7528061B2 (en) | 2004-12-10 | 2009-05-05 | L-3 Communications Corporation | Systems and methods for solder bonding |
| US7262412B2 (en) * | 2004-12-10 | 2007-08-28 | L-3 Communications Corporation | Optically blocked reference pixels for focal plane arrays |
| US7412441B2 (en) * | 2005-05-31 | 2008-08-12 | Microsoft Corporation | Predictive phonetic data search |
| US7462831B2 (en) * | 2006-01-26 | 2008-12-09 | L-3 Communications Corporation | Systems and methods for bonding |
| US7655909B2 (en) * | 2006-01-26 | 2010-02-02 | L-3 Communications Corporation | Infrared detector elements and methods of forming same |
| US7459686B2 (en) * | 2006-01-26 | 2008-12-02 | L-3 Communications Corporation | Systems and methods for integrating focal plane arrays |
| US7462931B2 (en) * | 2006-05-15 | 2008-12-09 | Innovative Micro Technology | Indented structure for encapsulated devices and method of manufacture |
| US7718965B1 (en) * | 2006-08-03 | 2010-05-18 | L-3 Communications Corporation | Microbolometer infrared detector elements and methods for forming same |
| US7687304B2 (en) * | 2006-11-29 | 2010-03-30 | Innovative Micro Technology | Current-driven device using NiMn alloy and method of manufacture |
| US8153980B1 (en) | 2006-11-30 | 2012-04-10 | L-3 Communications Corp. | Color correction for radiation detectors |
| US7968986B2 (en) * | 2007-05-07 | 2011-06-28 | Innovative Micro Technology | Lid structure for microdevice and method of manufacture |
| FR2917910B1 (fr) * | 2007-06-22 | 2010-06-11 | Thales Sa | Dispositif de lumiere optimisee par l'utilisation de materiaux artificiels et procede de fabrication associe |
| US8765514B1 (en) | 2010-11-12 | 2014-07-01 | L-3 Communications Corp. | Transitioned film growth for conductive semiconductor materials |
| US8980676B2 (en) * | 2012-06-25 | 2015-03-17 | Raytheon Company | Fabrication of window cavity cap structures in wafer level packaging |
| US12332408B2 (en) * | 2022-08-23 | 2025-06-17 | Apple Inc. | Anti-reflective optical structures for optical systems |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6014251A (en) * | 1997-04-08 | 2000-01-11 | The United States Of America As Represented By The Secretary Of The Navy | Optical filters based on uniform arrays of metallic waveguides |
| US6195478B1 (en) * | 1998-02-04 | 2001-02-27 | Agilent Technologies, Inc. | Planar lightwave circuit-based optical switches using micromirrors in trenches |
| US6359333B1 (en) * | 1998-03-31 | 2002-03-19 | Honeywell International Inc. | Wafer-pair having deposited layer sealed chambers |
| EP0951069A1 (en) * | 1998-04-17 | 1999-10-20 | Interuniversitair Microelektronica Centrum Vzw | Method of fabrication of a microstructure having an inside cavity |
| US6791757B2 (en) * | 1999-07-12 | 2004-09-14 | Coho Holdings, Llc | Optical device for filtering and sensing |
| US6707518B1 (en) * | 1999-07-12 | 2004-03-16 | Coho Holdings, Llc | Electro-optic device allowing wavelength tuning |
| US6363183B1 (en) * | 2000-01-04 | 2002-03-26 | Seungug Koh | Reconfigurable and scalable intergrated optic waveguide add/drop multiplexing element using micro-opto-electro-mechanical systems and methods of fabricating thereof |
| JP2003531475A (ja) | 2000-02-02 | 2003-10-21 | レイセオン・カンパニー | 集積回路コンポーネントを備えたマイクロ電気機械システムデバイスの真空パッケージの製造 |
| JP2002015565A (ja) * | 2000-06-29 | 2002-01-18 | Mitsubishi Electric Corp | 半導体記憶装置 |
| CA2396859A1 (en) * | 2001-08-06 | 2003-02-06 | Coho Holdings, Llc | Optical device for filtering and sensing |
-
2003
- 2003-05-02 US US10/428,745 patent/US6897469B2/en not_active Expired - Lifetime
-
2004
- 2004-04-19 EP EP04760558A patent/EP1620353A1/en not_active Withdrawn
- 2004-04-19 JP JP2006513139A patent/JP2006527481A/ja not_active Withdrawn
- 2004-04-19 WO PCT/US2004/012088 patent/WO2004099064A1/en not_active Ceased
- 2004-10-19 US US10/968,588 patent/US7220621B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007522648A (ja) * | 2003-12-29 | 2007-08-09 | ハネウェル・インターナショナル・インコーポレーテッド | 一体型上側真空パッケージ |
| JP2010286706A (ja) * | 2009-06-12 | 2010-12-24 | Mitsubishi Electric Corp | 光学フィルタおよびその製造方法 |
| JP2011002546A (ja) * | 2009-06-17 | 2011-01-06 | Mitsubishi Electric Corp | 光学フィルタ |
Also Published As
| Publication number | Publication date |
|---|---|
| US6897469B2 (en) | 2005-05-24 |
| WO2004099064A1 (en) | 2004-11-18 |
| US20050054212A1 (en) | 2005-03-10 |
| US20040219704A1 (en) | 2004-11-04 |
| US7220621B2 (en) | 2007-05-22 |
| EP1620353A1 (en) | 2006-02-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070329 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070329 |
|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20070329 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20080409 |