JP2006520485A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2006520485A5 JP2006520485A5 JP2006504077A JP2006504077A JP2006520485A5 JP 2006520485 A5 JP2006520485 A5 JP 2006520485A5 JP 2006504077 A JP2006504077 A JP 2006504077A JP 2006504077 A JP2006504077 A JP 2006504077A JP 2006520485 A5 JP2006520485 A5 JP 2006520485A5
- Authority
- JP
- Japan
- Prior art keywords
- composition according
- radiation
- mol
- lithographic printing
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims 11
- 150000001875 compounds Chemical class 0.000 claims 7
- 230000005855 radiation Effects 0.000 claims 5
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 claims 4
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims 3
- 239000011354 acetal resin Substances 0.000 claims 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 3
- 238000006243 chemical reaction Methods 0.000 claims 3
- 229920006324 polyoxymethylene Polymers 0.000 claims 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 claims 2
- ZYUVGYBAPZYKSA-UHFFFAOYSA-N 5-(3-hydroxybutan-2-yl)-4-methylbenzene-1,3-diol Chemical compound CC(O)C(C)C1=CC(O)=CC(O)=C1C ZYUVGYBAPZYKSA-UHFFFAOYSA-N 0.000 claims 2
- JPYHHZQJCSQRJY-UHFFFAOYSA-N Phloroglucinol Natural products CCC=CCC=CCC=CCC=CCCCCC(=O)C1=C(O)C=C(O)C=C1O JPYHHZQJCSQRJY-UHFFFAOYSA-N 0.000 claims 2
- 239000004372 Polyvinyl alcohol Substances 0.000 claims 2
- GGNQRNBDZQJCCN-UHFFFAOYSA-N benzene-1,2,4-triol Chemical compound OC1=CC=C(O)C(O)=C1 GGNQRNBDZQJCCN-UHFFFAOYSA-N 0.000 claims 2
- NHADDZMCASKINP-HTRCEHHLSA-N decarboxydihydrocitrinin Natural products C1=C(O)C(C)=C2[C@H](C)[C@@H](C)OCC2=C1O NHADDZMCASKINP-HTRCEHHLSA-N 0.000 claims 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 claims 2
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 claims 2
- 229960001553 phloroglucinol Drugs 0.000 claims 2
- 229920002451 polyvinyl alcohol Polymers 0.000 claims 2
- 239000002243 precursor Substances 0.000 claims 2
- 230000001737 promoting effect Effects 0.000 claims 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- WHJVDJMYJOEKQZ-UHFFFAOYSA-N 2-dodecylbenzene-1,3-diol Chemical compound CCCCCCCCCCCCC1=C(O)C=CC=C1O WHJVDJMYJOEKQZ-UHFFFAOYSA-N 0.000 claims 1
- 239000004101 4-Hexylresorcinol Substances 0.000 claims 1
- WFJIVOKAWHGMBH-UHFFFAOYSA-N 4-hexylbenzene-1,3-diol Chemical compound CCCCCCC1=CC=C(O)C=C1O WFJIVOKAWHGMBH-UHFFFAOYSA-N 0.000 claims 1
- 235000019360 4-hexylresorcinol Nutrition 0.000 claims 1
- 239000012670 alkaline solution Substances 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 125000003709 fluoroalkyl group Chemical group 0.000 claims 1
- 229960003258 hexylresorcinol Drugs 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- 239000003112 inhibitor Substances 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 229940079877 pyrogallol Drugs 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CA2003/000373 WO2003079113A1 (en) | 2002-03-15 | 2003-03-14 | Sensitivity enhancement of radiation-sensitive elements |
| US64791003A | 2003-08-25 | 2003-08-25 | |
| PCT/CA2004/000381 WO2004081662A2 (en) | 2003-03-14 | 2004-03-12 | Development enhancement of radiation-sensitive elements |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010000879A Division JP2010146013A (ja) | 2003-03-14 | 2010-01-06 | 放射線感受性素子の現像性促進 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006520485A JP2006520485A (ja) | 2006-09-07 |
| JP2006520485A5 true JP2006520485A5 (https=) | 2007-04-19 |
| JP4473262B2 JP4473262B2 (ja) | 2010-06-02 |
Family
ID=35311042
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006504077A Expired - Fee Related JP4473262B2 (ja) | 2003-03-14 | 2004-03-12 | 放射線感受性素子の現像性促進 |
| JP2010000879A Pending JP2010146013A (ja) | 2003-03-14 | 2010-01-06 | 放射線感受性素子の現像性促進 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010000879A Pending JP2010146013A (ja) | 2003-03-14 | 2010-01-06 | 放射線感受性素子の現像性促進 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP1603749A2 (https=) |
| JP (2) | JP4473262B2 (https=) |
| WO (1) | WO2004081662A2 (https=) |
Families Citing this family (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1588847B1 (en) * | 2004-04-21 | 2007-05-09 | Agfa Graphics N.V. | Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic plate material |
| JP4762604B2 (ja) * | 2004-06-09 | 2011-08-31 | 富士フイルム株式会社 | 平版印刷版原版 |
| US7279263B2 (en) * | 2004-06-24 | 2007-10-09 | Kodak Graphic Communications Canada Company | Dual-wavelength positive-working radiation-sensitive elements |
| CN101389476B (zh) * | 2006-02-28 | 2010-06-23 | 爱克发印艺公司 | 平版印版的制作方法 |
| WO2007099053A1 (en) | 2006-02-28 | 2007-09-07 | Agfa Graphics Nv | Method for making a lithographic printing plate |
| WO2007131336A1 (en) | 2006-05-17 | 2007-11-22 | American Dye Source Inc. | New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
| US7544462B2 (en) | 2007-02-22 | 2009-06-09 | Eastman Kodak Company | Radiation-sensitive composition and elements with basic development enhancers |
| US7399576B1 (en) | 2007-02-28 | 2008-07-15 | Eastman Kodak Company | Positive-working radiation-sensitive composition and elements |
| US7723012B2 (en) | 2007-06-28 | 2010-05-25 | Eastman Kodak Company | Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s |
| US8198011B2 (en) * | 2008-02-04 | 2012-06-12 | Eastman Kodak Company | Method of imaging and developing positive-working imageable elements |
| US8084189B2 (en) * | 2008-05-22 | 2011-12-27 | Eastman Kodak Company | Method of imaging and developing positive-working imageable elements |
| US8187792B2 (en) | 2008-08-21 | 2012-05-29 | Eastman Kodak Company | Processing of positive-working lithographic printing plate precursor |
| EP2194429A1 (en) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates |
| US8048609B2 (en) | 2008-12-19 | 2011-11-01 | Eastman Kodak Company | Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s |
| US20100227269A1 (en) | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
| ATE555904T1 (de) | 2009-08-10 | 2012-05-15 | Eastman Kodak Co | Lithografische druckplattenvorläufer mit betahydroxy-alkylamid-vernetzern |
| US8383319B2 (en) | 2009-08-25 | 2013-02-26 | Eastman Kodak Company | Lithographic printing plate precursors and stacks |
| EP2293144B1 (en) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Method of drying lithographic printing plates after single-step-processing |
| US8298750B2 (en) | 2009-09-08 | 2012-10-30 | Eastman Kodak Company | Positive-working radiation-sensitive imageable elements |
| ATE555905T1 (de) | 2009-10-27 | 2012-05-15 | Agfa Graphics Nv | Neuartige cyaninfarbstoffe und lithografische druckerplattenvorläufer mit den farbstoffen |
| US20110097666A1 (en) | 2009-10-27 | 2011-04-28 | Celin Savariar-Hauck | Lithographic printing plate precursors |
| ES2395993T3 (es) | 2010-03-19 | 2013-02-18 | Agfa Graphics N.V. | Precursor de plancha de impresión litográfica |
| US8939080B2 (en) | 2010-11-18 | 2015-01-27 | Eastman Kodak Company | Methods of processing using silicate-free developer compositions |
| US20120129093A1 (en) | 2010-11-18 | 2012-05-24 | Moshe Levanon | Silicate-free developer compositions |
| US8530143B2 (en) | 2010-11-18 | 2013-09-10 | Eastman Kodak Company | Silicate-free developer compositions |
| US20120192741A1 (en) | 2011-01-31 | 2012-08-02 | Moshe Nakash | Method for preparing lithographic printing plates |
| EP2796928B1 (en) | 2011-03-31 | 2015-12-30 | Fujifilm Corporation | Lithographic printing plate precursor and method of preparing the same |
| EP2796929B1 (en) | 2011-03-31 | 2015-12-30 | Fujifilm Corporation | Lithographic printing plate precursor and method of preparing the same |
| US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| JP5705675B2 (ja) * | 2011-07-25 | 2015-04-22 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版及び平版印刷版の作製方法 |
| US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| JP6094271B2 (ja) * | 2012-03-05 | 2017-03-15 | 味の素株式会社 | 感光性樹脂組成物 |
| US20130255515A1 (en) | 2012-03-27 | 2013-10-03 | Celin Savariar-Hauck | Positive-working lithographic printing plate precursors |
| WO2014106554A1 (en) | 2013-01-01 | 2014-07-10 | Agfa Graphics Nv | (ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
| EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
| EP2944657B1 (en) | 2014-05-15 | 2017-01-11 | Agfa Graphics Nv | (Ethylene, Vinyl Acetal) Copolymers and Their Use In Lithographic Printing Plate Precursors |
| ES2660063T3 (es) | 2014-06-13 | 2018-03-20 | Agfa Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
| EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
| ES2655798T3 (es) | 2014-12-08 | 2018-02-21 | Agfa Nv | Sistema para reducir los residuos de ablación |
| EP3130465B1 (en) | 2015-08-12 | 2020-05-13 | Agfa Nv | Heat-sensitive lithographic printing plate precursor |
| EP3430474A1 (en) | 2016-03-16 | 2019-01-23 | Agfa Nv | Method and apparatus for processing a lithographic printing plate |
| JP2020064082A (ja) | 2017-02-17 | 2020-04-23 | 富士フイルム株式会社 | ポジ型平版印刷版原版、及び、平版印刷版の作製方法 |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
| EP3778253A1 (en) | 2019-08-13 | 2021-02-17 | Agfa Nv | Method for processing a lithographic printing plate |
| US11760081B2 (en) * | 2020-09-04 | 2023-09-19 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| EP4382306A1 (en) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Lithographic printing press make-ready method |
| EP4714657A1 (en) * | 2024-09-24 | 2026-03-25 | FUJIFILM Corporation | Positive-working lithographic printing plate precursor and method of preparing lithographic printing plate |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2646241B2 (ja) * | 1988-07-20 | 1997-08-27 | 富士写真フイルム株式会社 | フォトレジスト組成物 |
| DE3938788A1 (de) * | 1989-11-23 | 1991-05-29 | Hoechst Ag | Verfahren zur herstellung einer negativ arbeitenden lichtempfindlichen druckform |
| JP3158386B2 (ja) * | 1991-09-27 | 2001-04-23 | 大日本インキ化学工業株式会社 | 感熱記録体 |
| JPH11288093A (ja) * | 1998-04-06 | 1999-10-19 | Fuji Photo Film Co Ltd | 赤外線レーザ用ポジ型感光性組成物 |
| US6255033B1 (en) * | 1999-07-30 | 2001-07-03 | Creo, Ltd. | Positive acting photoresist compositions and imageable element |
| GB9928506D0 (en) * | 1999-12-02 | 2000-02-02 | Agfa Gevaert Ltd | Sensitised heat sensitive printing plate precursors |
| JP2002080821A (ja) * | 2000-09-05 | 2002-03-22 | Mitsui Chemicals Inc | 光増感剤および該光増感剤を用いる可視光硬化性樹脂組成物およびその用途 |
| JP3856298B2 (ja) * | 2001-02-08 | 2006-12-13 | 富士フイルムホールディングス株式会社 | 平版印刷版原版 |
| JP4141120B2 (ja) * | 2001-08-16 | 2008-08-27 | 富士フイルム株式会社 | 平版印刷版用原版 |
| DE10239505B4 (de) * | 2002-08-28 | 2005-05-04 | Kodak Polychrome Graphics Gmbh | Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer mit hoher Chemikalienbeständigkeit |
| EP1576421A2 (en) * | 2002-12-19 | 2005-09-21 | Kodak Polychrome Graphics GmbH | Process for the production of negative working lithographic printing plate precursors with a coating comprising diazo resin |
-
2004
- 2004-03-12 JP JP2006504077A patent/JP4473262B2/ja not_active Expired - Fee Related
- 2004-03-12 WO PCT/CA2004/000381 patent/WO2004081662A2/en not_active Ceased
- 2004-03-12 EP EP04719888A patent/EP1603749A2/en not_active Withdrawn
-
2010
- 2010-01-06 JP JP2010000879A patent/JP2010146013A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2006520485A5 (https=) | ||
| KR950007226B1 (ko) | 내식막 조성물, 형상화된 내식막 기재 복합물의 제조방법 및 이로부터 제조된 복합물 | |
| CN104781731B (zh) | 正性工作光敏材料 | |
| JP2839678B2 (ja) | 陽画処理照射感応性混合物およびそれから製造した照射感応性複写材料 | |
| CN1145651C (zh) | 水溶性负性光刻胶组合物 | |
| JPWO2000008525A1 (ja) | オニウム塩系酸発生剤を含む化学増幅型感放射線性組成物 | |
| JP2659055B2 (ja) | 高感度の乾式現像可能な深ｕｖ光用ホトレジスト | |
| JP2010531476A5 (https=) | ||
| CN1246655A (zh) | 用于高光敏度高抗蚀厚涂层i－线光刻胶的磺酰肟类 | |
| EP1033624A1 (en) | Radiation-sensitive composition of chemical amplification type | |
| JP2010146013A5 (https=) | ||
| TW201743132A (zh) | 正向感光材料 | |
| JP2010536063A5 (https=) | ||
| JP4551510B2 (ja) | 色素含有感光性耐食膜および方法ならびにこれを含む工業製品 | |
| JP3069805B2 (ja) | 酸に不安定な溶解抑制剤、及びそれらに基づいたポジ型及びネガ型感光性組成物 | |
| JP7637137B2 (ja) | 化学増幅型フォトレジスト | |
| CN105348432A (zh) | 一类聚合物型硫鎓盐类光生酸剂、制备方法及其应用 | |
| JPH01106040A (ja) | ポジ型感放射線性混合物、ポジ型感放射線性記録材料および該記録材料の製造法 | |
| JP4991074B2 (ja) | 光反応性酸発生剤およびそれを含有してなるフォトレジスト | |
| TWI816671B (zh) | 用於產生底切圖樣輪廓之負型光阻調配物以及使光阻組合物成像之方法和用於使基板上之圖樣化光阻劑金屬化之剝離方法 | |
| TW202124569A (zh) | 正型光敏材料 | |
| JP2598998B2 (ja) | 感光性組成物 | |
| JP3709657B2 (ja) | 感放射線性組成物 | |
| JP2684246B2 (ja) | 感光性組成物 | |
| CN1424625A (zh) | 化学增幅型正性抗蚀剂组合物 |