JP2006510228A5 - - Google Patents
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- JP2006510228A5 JP2006510228A5 JP2004565459A JP2004565459A JP2006510228A5 JP 2006510228 A5 JP2006510228 A5 JP 2006510228A5 JP 2004565459 A JP2004565459 A JP 2004565459A JP 2004565459 A JP2004565459 A JP 2004565459A JP 2006510228 A5 JP2006510228 A5 JP 2006510228A5
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- Prior art keywords
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 230000007704 transition Effects 0.000 claims description 120
- 238000000034 method Methods 0.000 claims description 93
- 238000012545 processing Methods 0.000 claims description 58
- 230000008569 process Effects 0.000 claims description 55
- 238000001514 detection method Methods 0.000 claims description 42
- 239000004065 semiconductor Substances 0.000 claims description 41
- 230000008859 change Effects 0.000 claims description 25
- 238000005259 measurement Methods 0.000 claims description 11
- 238000012544 monitoring process Methods 0.000 claims description 8
- 238000004891 communication Methods 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 5
- 238000012986 modification Methods 0.000 claims description 4
- 230000004048 modification Effects 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 2
- 238000001228 spectrum Methods 0.000 claims description 2
- 230000004044 response Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 238000005498 polishing Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 229910008326 Si-Y Inorganic materials 0.000 description 2
- 229910006773 Si—Y Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000013213 extrapolation Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/318,967 US6859765B2 (en) | 2002-12-13 | 2002-12-13 | Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection |
| PCT/US2003/039778 WO2004061693A1 (en) | 2002-12-13 | 2003-12-11 | Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012164925A Division JP2012238882A (ja) | 2002-12-13 | 2012-07-25 | 処理状態モニタリングと終了点検出とのための、傾斜から閾値へ変換する方法および装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006510228A JP2006510228A (ja) | 2006-03-23 |
| JP2006510228A5 true JP2006510228A5 (https=) | 2011-07-28 |
Family
ID=32506518
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004565459A Pending JP2006510228A (ja) | 2002-12-13 | 2003-12-11 | 処理状態モニタリングと終了点検出とのための、傾斜から閾値へ変換する方法および装置 |
| JP2012164925A Pending JP2012238882A (ja) | 2002-12-13 | 2012-07-25 | 処理状態モニタリングと終了点検出とのための、傾斜から閾値へ変換する方法および装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012164925A Pending JP2012238882A (ja) | 2002-12-13 | 2012-07-25 | 処理状態モニタリングと終了点検出とのための、傾斜から閾値へ変換する方法および装置 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US6859765B2 (https=) |
| EP (1) | EP1570363B1 (https=) |
| JP (2) | JP2006510228A (https=) |
| KR (1) | KR101007159B1 (https=) |
| CN (1) | CN100350403C (https=) |
| AU (1) | AU2003303494A1 (https=) |
| TW (1) | TWI232530B (https=) |
| WO (1) | WO2004061693A1 (https=) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI240326B (en) * | 2002-10-31 | 2005-09-21 | Tokyo Electron Ltd | Method and apparatus for determining an etch property using an endpoint signal |
| US6859765B2 (en) * | 2002-12-13 | 2005-02-22 | Lam Research Corporation | Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection |
| US7186574B2 (en) * | 2004-09-30 | 2007-03-06 | Hitachi Global Storage Technologies Netherlands B.V. | CMP process metrology test structures |
| US7537511B2 (en) * | 2006-03-14 | 2009-05-26 | Micron Technology, Inc. | Embedded fiber acoustic sensor for CMP process endpoint |
| US7755011B2 (en) * | 2006-06-23 | 2010-07-13 | Lockheed Martin Corporation | Target maneuver detection |
| US8106651B2 (en) * | 2008-04-17 | 2012-01-31 | Novellus Systems, Inc. | Methods and apparatuses for determining thickness of a conductive layer |
| US8618807B2 (en) * | 2009-06-30 | 2013-12-31 | Lam Research Corporation | Arrangement for identifying uncontrolled events at the process module level and methods thereof |
| US8473089B2 (en) * | 2009-06-30 | 2013-06-25 | Lam Research Corporation | Methods and apparatus for predictive preventive maintenance of processing chambers |
| US8538572B2 (en) * | 2009-06-30 | 2013-09-17 | Lam Research Corporation | Methods for constructing an optimal endpoint algorithm |
| US8983631B2 (en) * | 2009-06-30 | 2015-03-17 | Lam Research Corporation | Arrangement for identifying uncontrolled events at the process module level and methods thereof |
| CN102541719A (zh) * | 2010-12-24 | 2012-07-04 | 鸿富锦精密工业（深圳）有限公司 | 排除错误观测值的系统及方法 |
| US9403254B2 (en) * | 2011-08-17 | 2016-08-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods for real-time error detection in CMP processing |
| US9308618B2 (en) * | 2012-04-26 | 2016-04-12 | Applied Materials, Inc. | Linear prediction for filtering of data during in-situ monitoring of polishing |
| US20140163907A1 (en) * | 2012-12-10 | 2014-06-12 | General Electric Company | Systems and methods for fault detection |
| JP6625098B2 (ja) * | 2017-07-20 | 2019-12-25 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | 基板処理システム、半導体装置の製造方法およびプログラム |
| US11504821B2 (en) | 2017-11-16 | 2022-11-22 | Applied Materials, Inc. | Predictive filter for polishing pad wear rate monitoring |
| JP6525044B1 (ja) * | 2017-12-13 | 2019-06-05 | オムロン株式会社 | 監視システム、学習装置、学習方法、監視装置及び監視方法 |
| KR102103150B1 (ko) * | 2018-03-14 | 2020-04-22 | (주)아이티공간 | 구동부의 정밀 예지 보전방법 |
| KR102103145B1 (ko) * | 2018-03-14 | 2020-04-22 | (주)아이티공간 | 구동부의 정밀 예지 보전방법 |
| KR102103143B1 (ko) * | 2018-03-14 | 2020-04-22 | (주)아이티공간 | 구동부의 정밀 예지 보전방법 |
| KR102103147B1 (ko) * | 2018-03-14 | 2020-04-22 | (주)아이티공간 | 구동부의 정밀 예지 보전방법 |
| KR102103144B1 (ko) * | 2018-03-14 | 2020-04-22 | (주)아이티공간 | 구동부의 정밀 예지 보전방법 |
| CN109118274B (zh) * | 2018-07-25 | 2021-11-16 | 武汉轻工大学 | 任务点去噪分类方法、系统、终端设备及存储介质 |
| WO2020185242A1 (en) * | 2019-03-08 | 2020-09-17 | Kla-Tencor Corporation | Dynamic amelioration of misregistration measurement |
| US11455154B2 (en) | 2020-12-10 | 2022-09-27 | International Business Machines Corporation | Vector-based identification of software dependency relationships |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56114329A (en) * | 1980-02-15 | 1981-09-08 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method for sensing time of completion of dry etching |
| US4809196A (en) * | 1986-04-10 | 1989-02-28 | International Business Machines Corporation | Method for designating/sorting semiconductor wafers according to predicted oxygen precipitation behavior |
| GB8703931D0 (en) * | 1987-02-19 | 1993-05-05 | British Aerospace | Tracking systems |
| GB2214813A (en) * | 1988-01-14 | 1989-09-13 | Stuart Charles Webb | Rate-responsive pacemaker |
| US4836213A (en) * | 1988-02-25 | 1989-06-06 | Nippon Colin Co., Ltd. | Pressure control system for continuous blood pressure monitor transducer |
| US5091963A (en) * | 1988-05-02 | 1992-02-25 | The Standard Oil Company | Method and apparatus for inspecting surfaces for contrast variations |
| JPH0428224A (ja) * | 1990-05-23 | 1992-01-30 | Seiko Instr Inc | 薄膜のエッチング方法 |
| JP3117355B2 (ja) * | 1993-03-04 | 2000-12-11 | 東京エレクトロン株式会社 | プラズマ処理の終点検出方法 |
| JP3400821B2 (ja) | 1993-06-08 | 2003-04-28 | 松下電器産業株式会社 | データ自動監視システム |
| US5704362A (en) * | 1993-08-13 | 1998-01-06 | Johnson & Johnson Medical, Inc. | Method for oscillometric blood pressure determination employing curve fitting |
| US5444637A (en) * | 1993-09-28 | 1995-08-22 | Advanced Micro Devices, Inc. | Programmable semiconductor wafer for sensing, recording and retrieving fabrication process conditions to which the wafer is exposed |
| JPH08148475A (ja) * | 1994-11-16 | 1996-06-07 | Sony Corp | エッチング処理装置 |
| US6538723B2 (en) * | 1996-08-05 | 2003-03-25 | Nikon Corporation | Scanning exposure in which an object and pulsed light are moved relatively, exposing a substrate by projecting a pattern on a mask onto the substrate with pulsed light from a light source, light sources therefor, and methods of manufacturing |
| US5828567A (en) * | 1996-11-07 | 1998-10-27 | Rosemount Inc. | Diagnostics for resistance based transmitter |
| US6063028A (en) * | 1997-03-20 | 2000-05-16 | Luciano; Joanne Sylvia | Automated treatment selection method |
| US6529460B1 (en) * | 1998-01-31 | 2003-03-04 | Seagate Technology Llc | Detection of pulse peak instance and amplitude in a storage drive |
| JP4227301B2 (ja) * | 1998-02-03 | 2009-02-18 | 東京エレクトロンＡｔ株式会社 | 半導体プラズマ処理における終点検出方法 |
| US6780657B2 (en) * | 1998-03-19 | 2004-08-24 | Kabushiki Kaisha Toshiba | Temperature measuring method and apparatus, measuring method for the thickness of the formed film, measuring apparatus for the thickness of the formed film thermometer for wafers |
| US6049220A (en) * | 1998-06-10 | 2000-04-11 | Boxer Cross Incorporated | Apparatus and method for evaluating a wafer of semiconductor material |
| WO2000024052A1 (en) * | 1998-10-19 | 2000-04-27 | The Secretary Of State For Defence | Layer processing |
| US6289288B1 (en) * | 1999-03-01 | 2001-09-11 | Chelsea Group Ltd | Method of determining measured gas data with remote sensors |
| US6449571B1 (en) * | 1999-07-09 | 2002-09-10 | Mykrolis Corporation | System and method for sensor response linearization |
| US6475153B1 (en) * | 2000-05-10 | 2002-11-05 | Motorola Inc. | Method for obtaining blood pressure data from optical sensor |
| GB2372324B (en) * | 2000-11-10 | 2004-12-22 | Leamount Ltd | Air flow measurement |
| CN1177295C (zh) * | 2001-01-04 | 2004-11-24 | 鸿友科技股份有限公司 | 判断扫描器扫描所得的影像是否发生掉线情形的方法 |
| JP3993396B2 (ja) * | 2001-03-30 | 2007-10-17 | 株式会社東芝 | 半導体装置の製造方法 |
| US6662116B2 (en) * | 2001-11-30 | 2003-12-09 | Exxonmobile Research And Engineering Company | Method for analyzing an unknown material as a blend of known materials calculated so as to match certain analytical data and predicting properties of the unknown based on the calculated blend |
| US6714338B2 (en) * | 2002-05-16 | 2004-03-30 | Texas Instruments Incorporated | MEM's mirror internal sensor linearization based on driver linearity |
| US6859765B2 (en) * | 2002-12-13 | 2005-02-22 | Lam Research Corporation | Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection |
-
2002
- 2002-12-13 US US10/318,967 patent/US6859765B2/en not_active Expired - Fee Related
-
2003
- 2003-12-11 KR KR1020057008757A patent/KR101007159B1/ko not_active Expired - Fee Related
- 2003-12-11 AU AU2003303494A patent/AU2003303494A1/en not_active Abandoned
- 2003-12-11 EP EP03808456A patent/EP1570363B1/en not_active Expired - Lifetime
- 2003-12-11 CN CNB2003801057276A patent/CN100350403C/zh not_active Expired - Fee Related
- 2003-12-11 JP JP2004565459A patent/JP2006510228A/ja active Pending
- 2003-12-11 TW TW092134960A patent/TWI232530B/zh not_active IP Right Cessation
- 2003-12-11 WO PCT/US2003/039778 patent/WO2004061693A1/en not_active Ceased
-
2005
- 2005-01-05 US US11/030,374 patent/US7010468B2/en not_active Expired - Lifetime
-
2012
- 2012-07-25 JP JP2012164925A patent/JP2012238882A/ja active Pending
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