JP2006501362A - 銅の表面酸化物の除去 - Google Patents
銅の表面酸化物の除去 Download PDFInfo
- Publication number
- JP2006501362A JP2006501362A JP2004523829A JP2004523829A JP2006501362A JP 2006501362 A JP2006501362 A JP 2006501362A JP 2004523829 A JP2004523829 A JP 2004523829A JP 2004523829 A JP2004523829 A JP 2004523829A JP 2006501362 A JP2006501362 A JP 2006501362A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- copper
- anode
- oxygen
- reduction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
- C25F1/02—Pickling; Descaling
- C25F1/04—Pickling; Descaling in solution
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20021425 | 2002-07-31 | ||
FI20021425A FI114871B (fi) | 2002-07-31 | 2002-07-31 | Kuparin pintaoksidien poistaminen |
PCT/FI2003/000572 WO2004011699A1 (en) | 2002-07-31 | 2003-07-17 | Removing surface oxides from copper |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2006501362A true JP2006501362A (ja) | 2006-01-12 |
Family
ID=8564392
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004523829A Abandoned JP2006501362A (ja) | 2002-07-31 | 2003-07-17 | 銅の表面酸化物の除去 |
Country Status (12)
Country | Link |
---|---|
US (1) | US20060091021A1 (ru) |
EP (1) | EP1552042A1 (ru) |
JP (1) | JP2006501362A (ru) |
CN (1) | CN1671890A (ru) |
AU (1) | AU2003281678A1 (ru) |
BR (1) | BR0313009A (ru) |
EA (1) | EA006828B1 (ru) |
FI (1) | FI114871B (ru) |
MX (1) | MXPA05001196A (ru) |
PL (1) | PL373766A1 (ru) |
TW (1) | TW200403360A (ru) |
WO (1) | WO2004011699A1 (ru) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101514477B (zh) * | 2009-03-03 | 2011-02-02 | 天津力神电池股份有限公司 | 一种锂离子电池失效后负极铜箔片的清洗电化学方法 |
EP2570520B1 (en) * | 2011-09-15 | 2017-11-22 | General Electric Company | Method of rejuvenating a multilayer structure |
CN103469255B (zh) * | 2013-09-09 | 2015-12-23 | 重庆潼双机械制造有限公司 | 铜阳极板泡洗液的循环利用装置及方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1773160A (en) * | 1927-10-28 | 1930-08-19 | Hanovia Chemical & Mfg Co | Process for cupric-oxide removal |
GB586250A (en) * | 1944-12-11 | 1947-03-12 | Du Pont | Electrolytic cleaning of metals |
US2749611A (en) * | 1951-03-07 | 1956-06-12 | Ver Deutsche Metallwerke Ag | Production of wire rod and wire |
JPS505988B1 (ru) * | 1970-03-23 | 1975-03-10 | ||
GB2133806B (en) * | 1983-01-20 | 1986-06-04 | Electricity Council | Regenerating solutions for etching copper |
JPS59232279A (ja) * | 1983-06-13 | 1984-12-27 | Hitachi Ltd | 金属表面酸化物の除去方法 |
CA2109708C (fr) * | 1991-05-30 | 1999-09-28 | Hans Joseph May | Electrode pour cellule electrolytique, son utilisation et procede l'utilisant |
US5795460A (en) * | 1996-04-10 | 1998-08-18 | Dynamotive Corporation | Method for removal of films from metal surfaces using electrolysis and cavitation action |
EP1326721A1 (en) * | 2000-10-19 | 2003-07-16 | Bwe Limited | Method and apparatus for production of a continuously extruded product |
-
2002
- 2002-07-31 FI FI20021425A patent/FI114871B/fi not_active IP Right Cessation
-
2003
- 2003-07-17 BR BR0313009-6A patent/BR0313009A/pt not_active IP Right Cessation
- 2003-07-17 JP JP2004523829A patent/JP2006501362A/ja not_active Abandoned
- 2003-07-17 EP EP03740525A patent/EP1552042A1/en not_active Withdrawn
- 2003-07-17 AU AU2003281678A patent/AU2003281678A1/en not_active Abandoned
- 2003-07-17 US US10/523,552 patent/US20060091021A1/en not_active Abandoned
- 2003-07-17 CN CN03818395.1A patent/CN1671890A/zh active Pending
- 2003-07-17 WO PCT/FI2003/000572 patent/WO2004011699A1/en not_active Application Discontinuation
- 2003-07-17 EA EA200500075A patent/EA006828B1/ru unknown
- 2003-07-17 MX MXPA05001196A patent/MXPA05001196A/es unknown
- 2003-07-17 PL PL03373766A patent/PL373766A1/xx not_active Application Discontinuation
- 2003-07-22 TW TW092119934A patent/TW200403360A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2004011699A1 (en) | 2004-02-05 |
PL373766A1 (en) | 2005-09-19 |
BR0313009A (pt) | 2005-06-07 |
EA006828B1 (ru) | 2006-04-28 |
CN1671890A (zh) | 2005-09-21 |
TW200403360A (en) | 2004-03-01 |
US20060091021A1 (en) | 2006-05-04 |
EA200500075A1 (ru) | 2005-08-25 |
AU2003281678A1 (en) | 2004-02-16 |
FI20021425A (fi) | 2004-02-01 |
MXPA05001196A (es) | 2005-05-16 |
EP1552042A1 (en) | 2005-07-13 |
FI114871B (fi) | 2005-01-14 |
FI20021425A0 (fi) | 2002-07-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5028304A (en) | Method of electrochemical machining of articles made of conducting materials | |
EP0617459A2 (en) | Semiconductor wafer cleaning and rinsing techniques | |
JP2010236091A (ja) | 耐食性導電部材とその製造方法及び燃料電池 | |
EP0430623B1 (en) | Non-cyanide electrode cleaning process | |
JP4961776B2 (ja) | パターン形成用マスクおよびその洗浄方法 | |
JP2006501362A (ja) | 銅の表面酸化物の除去 | |
GB2026544A (en) | A method of drawing a conductor | |
JP4436802B2 (ja) | 成膜装置用構成部品およびその洗浄方法 | |
JPH02240292A (ja) | 耐食性に優れたアルミニウム材料の陽極酸化処理方法 | |
JP2011127147A (ja) | Cu系材料のSnめっき層の剥離方法 | |
JP4470741B2 (ja) | 電解コンデンサ用電極箔の製造装置 | |
JP2002135936A (ja) | 樹脂皮膜剥離方法 | |
KR20210063972A (ko) | 알루미늄 부재의 산화알루미늄 피막 제거 방법 | |
JP2551274B2 (ja) | アルミ系材料の表面処理方法 | |
JP2005038968A (ja) | 基板処理方法及び基板処理装置 | |
JP2003171788A (ja) | 被メッキ物から金属母材を分別回収する装置および前記分別回収方法 | |
KR100678299B1 (ko) | 반도체 소자 제조방법 | |
JP3002616B2 (ja) | 金属薄板の洗浄装置 | |
US5487820A (en) | Process for removing lead dioxide residues | |
JP3288492B2 (ja) | 金型の洗浄方法 | |
JPS6034811B2 (ja) | 樹脂封止型半導体装置の製造方法 | |
JPH01188856A (ja) | レジスト除去方法 | |
JP2005298919A (ja) | 洗浄方法 | |
JP5836985B2 (ja) | 金属めっきされたTi材の製造方法および多孔質電極の製造方法 | |
JP2011140678A (ja) | 銀めっきが施された銅又は銅合金屑のリサイクル方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A762 | Written abandonment of application |
Free format text: JAPANESE INTERMEDIATE CODE: A762 Effective date: 20070111 |