JP2006349800A - ポジ型レジスト組成物およびレジストパターン形成方法 - Google Patents
ポジ型レジスト組成物およびレジストパターン形成方法 Download PDFInfo
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- JP2006349800A JP2006349800A JP2005173315A JP2005173315A JP2006349800A JP 2006349800 A JP2006349800 A JP 2006349800A JP 2005173315 A JP2005173315 A JP 2005173315A JP 2005173315 A JP2005173315 A JP 2005173315A JP 2006349800 A JP2006349800 A JP 2006349800A
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- 239000000203 mixture Substances 0.000 title claims abstract description 61
- 238000000034 method Methods 0.000 title claims abstract description 13
- 239000002253 acid Substances 0.000 claims abstract description 90
- 229920001577 copolymer Polymers 0.000 claims abstract description 77
- 125000004122 cyclic group Chemical group 0.000 claims abstract description 47
- 239000011347 resin Substances 0.000 claims abstract description 43
- 229920005989 resin Polymers 0.000 claims abstract description 43
- 230000002401 inhibitory effect Effects 0.000 claims abstract description 42
- 239000003513 alkali Substances 0.000 claims abstract description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 138
- -1 acrylate ester Chemical class 0.000 claims description 71
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 63
- 125000004432 carbon atom Chemical group C* 0.000 claims description 54
- 238000004090 dissolution Methods 0.000 claims description 42
- 125000001931 aliphatic group Chemical group 0.000 claims description 27
- 125000003367 polycyclic group Chemical group 0.000 claims description 24
- 125000005843 halogen group Chemical group 0.000 claims description 18
- 150000002596 lactones Chemical class 0.000 claims description 15
- 125000002950 monocyclic group Chemical group 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 6
- 230000009471 action Effects 0.000 claims description 5
- 230000000694 effects Effects 0.000 abstract description 8
- 125000005396 acrylic acid ester group Chemical group 0.000 abstract description 4
- 125000003118 aryl group Chemical group 0.000 description 37
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 36
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 35
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 27
- 125000001153 fluoro group Chemical group F* 0.000 description 26
- 125000001424 substituent group Chemical group 0.000 description 25
- 239000000243 solution Substances 0.000 description 24
- 229910052731 fluorine Inorganic materials 0.000 description 22
- 229910052757 nitrogen Inorganic materials 0.000 description 20
- 238000006116 polymerization reaction Methods 0.000 description 20
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- 239000002244 precipitate Substances 0.000 description 18
- 238000003756 stirring Methods 0.000 description 18
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- 229910052799 carbon Inorganic materials 0.000 description 17
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 14
- 150000001721 carbon Chemical group 0.000 description 13
- 239000000126 substance Substances 0.000 description 13
- 125000002947 alkylene group Chemical group 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 12
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 11
- JGTNAGYHADQMCM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-M 0.000 description 10
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- XBWQFDNGNOOMDZ-UHFFFAOYSA-N 1,1,2,2,3,3,3-heptafluoropropane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)F XBWQFDNGNOOMDZ-UHFFFAOYSA-N 0.000 description 9
- 239000007877 V-601 Substances 0.000 description 9
- 125000005907 alkyl ester group Chemical group 0.000 description 9
- 238000007664 blowing Methods 0.000 description 9
- 125000006165 cyclic alkyl group Chemical group 0.000 description 9
- 239000011259 mixed solution Substances 0.000 description 9
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 9
- 238000010992 reflux Methods 0.000 description 9
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 8
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 8
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- 125000004430 oxygen atom Chemical group O* 0.000 description 8
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 125000004093 cyano group Chemical group *C#N 0.000 description 7
- 150000002148 esters Chemical class 0.000 description 7
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 6
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 6
- 229940116333 ethyl lactate Drugs 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
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- 150000003839 salts Chemical class 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 125000003545 alkoxy group Chemical group 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 5
- SRQUTZJZABSZRQ-NKWVEPMBSA-N (2S,3R)-4-methylene-5-oxo-2-propyl-3-oxolanecarboxylic acid Chemical compound CCC[C@@H]1OC(=O)C(=C)[C@H]1C(O)=O SRQUTZJZABSZRQ-NKWVEPMBSA-N 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 4
- DLAXSFQUZITJGP-UHFFFAOYSA-N 2-methylbutan-2-yl 2-methylprop-2-enoate Chemical compound CCC(C)(C)OC(=O)C(C)=C DLAXSFQUZITJGP-UHFFFAOYSA-N 0.000 description 4
- IFDUTQGPGFEDHJ-UHFFFAOYSA-N 2-methylprop-2-enoic acid;oxolan-2-one Chemical compound CC(=C)C(O)=O.O=C1CCCO1 IFDUTQGPGFEDHJ-UHFFFAOYSA-N 0.000 description 4
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 4
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical class C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 230000018109 developmental process Effects 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 238000010494 dissociation reaction Methods 0.000 description 4
- 230000005593 dissociations Effects 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical compound C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 4
- 125000000962 organic group Chemical group 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 239000002798 polar solvent Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- OOIBFPKQHULHSQ-UHFFFAOYSA-N (3-hydroxy-1-adamantyl) 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC2(O)CC1(OC(=O)C(=C)C)C3 OOIBFPKQHULHSQ-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
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- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 3
- 230000004304 visual acuity Effects 0.000 description 3
- VDDICZVAQMPRIB-UHFFFAOYSA-N (2-hydroxy-1-adamantyl) 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC2C(O)C1(OC(=O)C(=C)C)C3 VDDICZVAQMPRIB-UHFFFAOYSA-N 0.000 description 2
- ZEFPSJCRLPUDJQ-UHFFFAOYSA-N (2-hydroxy-1-adamantyl) prop-2-enoate Chemical compound C1C(C2)CC3CC1C(O)C2(OC(=O)C=C)C3 ZEFPSJCRLPUDJQ-UHFFFAOYSA-N 0.000 description 2
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
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- 239000004215 Carbon black (E152) Substances 0.000 description 2
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- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 2
- 125000003670 adamantan-2-yl group Chemical group [H]C1([H])C(C2([H])[H])([H])C([H])([H])C3([H])C([*])([H])C1([H])C([H])([H])C2([H])C3([H])[H] 0.000 description 2
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- 125000005078 alkoxycarbonylalkyl group Chemical group 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
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- KOOHRIRWWIYFRH-UHFFFAOYSA-N oxolan-2-one;prop-2-enoic acid Chemical compound OC(=O)C=C.O=C1CCCO1 KOOHRIRWWIYFRH-UHFFFAOYSA-N 0.000 description 2
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- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
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- VISTUMYXGYLTFC-UHFFFAOYSA-N (1-cyanobutylideneamino) propane-1-sulfonate Chemical compound CCCC(C#N)=NOS(=O)(=O)CCC VISTUMYXGYLTFC-UHFFFAOYSA-N 0.000 description 1
- YQCKLEXBDDKTRB-UHFFFAOYSA-N (1-cyanopropylideneamino) ethanesulfonate Chemical compound CCC(C#N)=NOS(=O)(=O)CC YQCKLEXBDDKTRB-UHFFFAOYSA-N 0.000 description 1
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- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
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- OESYNCIYSBWEQV-UHFFFAOYSA-N 1-[diazo-(2,4-dimethylphenyl)sulfonylmethyl]sulfonyl-2,4-dimethylbenzene Chemical compound CC1=CC(C)=CC=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(C)C=C1C OESYNCIYSBWEQV-UHFFFAOYSA-N 0.000 description 1
- GYQQFWWMZYBCIB-UHFFFAOYSA-N 1-[diazo-(4-methylphenyl)sulfonylmethyl]sulfonyl-4-methylbenzene Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(C)C=C1 GYQQFWWMZYBCIB-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
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- DRYBUHKBBRHEAE-UHFFFAOYSA-N 2-[diazo(propan-2-ylsulfonyl)methyl]sulfonylpropane Chemical compound CC(C)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C(C)C DRYBUHKBBRHEAE-UHFFFAOYSA-N 0.000 description 1
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- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- IZJVVXCHJIQVOL-UHFFFAOYSA-N nitro(phenyl)methanesulfonic acid Chemical compound OS(=O)(=O)C([N+]([O-])=O)C1=CC=CC=C1 IZJVVXCHJIQVOL-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- FJDUDHYHRVPMJZ-UHFFFAOYSA-N nonan-1-amine Chemical compound CCCCCCCCCN FJDUDHYHRVPMJZ-UHFFFAOYSA-N 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- WLGDAKIJYPIYLR-UHFFFAOYSA-N octane-1-sulfonic acid Chemical group CCCCCCCCS(O)(=O)=O WLGDAKIJYPIYLR-UHFFFAOYSA-N 0.000 description 1
- CDXVUROVRIFQMV-UHFFFAOYSA-N oxo(diphenoxy)phosphanium Chemical compound C=1C=CC=CC=1O[P+](=O)OC1=CC=CC=C1 CDXVUROVRIFQMV-UHFFFAOYSA-N 0.000 description 1
- RQKYHDHLEMEVDR-UHFFFAOYSA-N oxo-bis(phenylmethoxy)phosphanium Chemical compound C=1C=CC=CC=1CO[P+](=O)OCC1=CC=CC=C1 RQKYHDHLEMEVDR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- OFCXPBMPEYPFFP-UHFFFAOYSA-N pentan-3-yl 2-methylprop-2-enoate Chemical compound CCC(CC)OC(=O)C(C)=C OFCXPBMPEYPFFP-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000006551 perfluoro alkylene group Chemical group 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- MLCHBQKMVKNBOV-UHFFFAOYSA-N phenylphosphinic acid Chemical compound OP(=O)C1=CC=CC=C1 MLCHBQKMVKNBOV-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical group CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 150000005619 secondary aliphatic amines Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- LYPVBFXTKUJYDL-UHFFFAOYSA-N sulfanium;trifluoromethanesulfonate Chemical compound [SH3+].[O-]S(=O)(=O)C(F)(F)F LYPVBFXTKUJYDL-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003510 tertiary aliphatic amines Chemical class 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- SWZDQOUHBYYPJD-UHFFFAOYSA-N tridodecylamine Chemical compound CCCCCCCCCCCCN(CCCCCCCCCCCC)CCCCCCCCCCCC SWZDQOUHBYYPJD-UHFFFAOYSA-N 0.000 description 1
- ZZJNLOGMYQURDL-UHFFFAOYSA-M trifluoromethanesulfonate;tris(4-methylphenyl)sulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(C)=CC=C1[S+](C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 ZZJNLOGMYQURDL-UHFFFAOYSA-M 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005173315A JP2006349800A (ja) | 2005-06-14 | 2005-06-14 | ポジ型レジスト組成物およびレジストパターン形成方法 |
| PCT/JP2006/309475 WO2006134739A1 (ja) | 2005-06-14 | 2006-05-11 | ポジ型レジスト組成物およびレジストパターン形成方法 |
| TW95118489A TWI319121B (en) | 2005-06-14 | 2006-05-24 | Positive resist composition and method for forming resist pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005173315A JP2006349800A (ja) | 2005-06-14 | 2005-06-14 | ポジ型レジスト組成物およびレジストパターン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006349800A true JP2006349800A (ja) | 2006-12-28 |
| JP2006349800A5 JP2006349800A5 (enrdf_load_stackoverflow) | 2008-05-29 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005173315A Pending JP2006349800A (ja) | 2005-06-14 | 2005-06-14 | ポジ型レジスト組成物およびレジストパターン形成方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2006349800A (enrdf_load_stackoverflow) |
| TW (1) | TWI319121B (enrdf_load_stackoverflow) |
| WO (1) | WO2006134739A1 (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007199709A (ja) * | 2005-12-27 | 2007-08-09 | Fujifilm Corp | ポジ型レジスト組成物およびそれを用いたパターン形成方法 |
| WO2008053697A1 (en) * | 2006-10-31 | 2008-05-08 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition and method for formation of resist pattern |
| JP2008116496A (ja) * | 2006-10-31 | 2008-05-22 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物およびレジストパターン形成方法 |
| US8519073B2 (en) | 2006-10-31 | 2013-08-27 | Tokyo Ohka Kogyo Co., Ltd. | Compound and polymeric compound |
| US9023580B2 (en) | 2011-11-24 | 2015-05-05 | Tokyo Ohka Kogyo Co., Ltd. | Method of forming polymeric compound, resist composition and method of forming resist pattern |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5548406B2 (ja) * | 2008-08-22 | 2014-07-16 | 東京応化工業株式会社 | ポジ型レジスト組成物、レジストパターン形成方法、高分子化合物 |
| JP5470053B2 (ja) | 2010-01-05 | 2014-04-16 | 東京応化工業株式会社 | ポジ型レジスト組成物、レジストパターン形成方法 |
| US8795948B2 (en) | 2012-03-22 | 2014-08-05 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern and polymeric compound |
| US8795947B2 (en) | 2012-03-22 | 2014-08-05 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000336121A (ja) * | 1998-11-02 | 2000-12-05 | Shin Etsu Chem Co Ltd | 新規なエステル化合物、高分子化合物、レジスト材料、及びパターン形成方法 |
| JP2003241385A (ja) * | 2001-12-03 | 2003-08-27 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法 |
| JP2004233953A (ja) * | 2002-12-02 | 2004-08-19 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物 |
| WO2004108780A1 (ja) * | 2003-06-05 | 2004-12-16 | Tokyo Ohka Kogyo Co., Ltd. | ホトレジスト組成物用樹脂、ホトレジスト組成物、およびレジストパターン形成方法 |
| JP2004361629A (ja) * | 2003-06-04 | 2004-12-24 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| JP2005010488A (ja) * | 2003-06-19 | 2005-01-13 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物 |
| WO2005040922A1 (ja) * | 2003-10-23 | 2005-05-06 | Tokyo Ohka Kogyo Co., Ltd. | レジスト組成物およびレジストパターン形成方法 |
| JP2005258362A (ja) * | 2004-02-12 | 2005-09-22 | Jsr Corp | 共重合体およびそれを用いた感放射線性樹脂組成物 |
-
2005
- 2005-06-14 JP JP2005173315A patent/JP2006349800A/ja active Pending
-
2006
- 2006-05-11 WO PCT/JP2006/309475 patent/WO2006134739A1/ja active Application Filing
- 2006-05-24 TW TW95118489A patent/TWI319121B/zh active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000336121A (ja) * | 1998-11-02 | 2000-12-05 | Shin Etsu Chem Co Ltd | 新規なエステル化合物、高分子化合物、レジスト材料、及びパターン形成方法 |
| JP2003241385A (ja) * | 2001-12-03 | 2003-08-27 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法 |
| JP2004233953A (ja) * | 2002-12-02 | 2004-08-19 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物 |
| JP2004361629A (ja) * | 2003-06-04 | 2004-12-24 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| WO2004108780A1 (ja) * | 2003-06-05 | 2004-12-16 | Tokyo Ohka Kogyo Co., Ltd. | ホトレジスト組成物用樹脂、ホトレジスト組成物、およびレジストパターン形成方法 |
| JP2005010488A (ja) * | 2003-06-19 | 2005-01-13 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物 |
| WO2005040922A1 (ja) * | 2003-10-23 | 2005-05-06 | Tokyo Ohka Kogyo Co., Ltd. | レジスト組成物およびレジストパターン形成方法 |
| JP2005258362A (ja) * | 2004-02-12 | 2005-09-22 | Jsr Corp | 共重合体およびそれを用いた感放射線性樹脂組成物 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007199709A (ja) * | 2005-12-27 | 2007-08-09 | Fujifilm Corp | ポジ型レジスト組成物およびそれを用いたパターン形成方法 |
| WO2008053697A1 (en) * | 2006-10-31 | 2008-05-08 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition and method for formation of resist pattern |
| JP2008116496A (ja) * | 2006-10-31 | 2008-05-22 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物およびレジストパターン形成方法 |
| US8105747B2 (en) | 2006-10-31 | 2012-01-31 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition and method of forming resist pattern |
| US8519073B2 (en) | 2006-10-31 | 2013-08-27 | Tokyo Ohka Kogyo Co., Ltd. | Compound and polymeric compound |
| US9023580B2 (en) | 2011-11-24 | 2015-05-05 | Tokyo Ohka Kogyo Co., Ltd. | Method of forming polymeric compound, resist composition and method of forming resist pattern |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI319121B (en) | 2010-01-01 |
| WO2006134739A1 (ja) | 2006-12-21 |
| TW200707108A (en) | 2007-02-16 |
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