JP2006344584A5 - - Google Patents
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- JP2006344584A5 JP2006344584A5 JP2006132109A JP2006132109A JP2006344584A5 JP 2006344584 A5 JP2006344584 A5 JP 2006344584A5 JP 2006132109 A JP2006132109 A JP 2006132109A JP 2006132109 A JP2006132109 A JP 2006132109A JP 2006344584 A5 JP2006344584 A5 JP 2006344584A5
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- JP
- Japan
- Prior art keywords
- manufacturing
- conductive film
- water vapor
- gas
- flow rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006132109A JP4860343B2 (ja) | 2005-05-13 | 2006-05-11 | 表示装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005141899 | 2005-05-13 | ||
| JP2005141899 | 2005-05-13 | ||
| JP2006132109A JP4860343B2 (ja) | 2005-05-13 | 2006-05-11 | 表示装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006344584A JP2006344584A (ja) | 2006-12-21 |
| JP2006344584A5 true JP2006344584A5 (https=) | 2009-05-21 |
| JP4860343B2 JP4860343B2 (ja) | 2012-01-25 |
Family
ID=37641369
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006132109A Expired - Fee Related JP4860343B2 (ja) | 2005-05-13 | 2006-05-11 | 表示装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4860343B2 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5352878B2 (ja) * | 2008-03-31 | 2013-11-27 | 公立大学法人高知工科大学 | 表示用基板及びその製造方法並びに表示装置 |
| WO2010035627A1 (en) * | 2008-09-25 | 2010-04-01 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| US8735874B2 (en) * | 2011-02-14 | 2014-05-27 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting device, display device, and method for manufacturing the same |
| KR102304724B1 (ko) * | 2014-12-19 | 2021-09-27 | 삼성디스플레이 주식회사 | 박막트랜지스터 기판, 이를 포함하는 디스플레이 장치, 박막트랜지스터 기판 제조방법 및 이를 이용한 디스플레이 장치 제조방법 |
| KR102367250B1 (ko) * | 2015-09-17 | 2022-02-25 | 삼성디스플레이 주식회사 | 유기 발광 소자 |
| KR102505880B1 (ko) * | 2017-09-06 | 2023-03-06 | 삼성디스플레이 주식회사 | 박막 트랜지스터 및 그 제조방법, 이를 포함하는 표시 장치 |
| TWI714979B (zh) | 2018-03-19 | 2021-01-01 | 日商理光股份有限公司 | 無機電致發光元件、顯示元件、影像顯示裝置及系統 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4187315B2 (ja) * | 1998-08-07 | 2008-11-26 | 帝人株式会社 | 液晶表示用透明導電積層体の製造方法 |
| JP2003016858A (ja) * | 2001-06-29 | 2003-01-17 | Sanyo Electric Co Ltd | インジウムスズ酸化膜の製造方法 |
| JP4917725B2 (ja) * | 2001-09-26 | 2012-04-18 | 東ソー株式会社 | 透明導電膜およびその製造方法並びにその用途 |
| WO2004105054A1 (ja) * | 2003-05-20 | 2004-12-02 | Idemitsu Kosan Co. Ltd. | 非晶質透明導電膜、及びその原料スパッタリングターゲット、及び非晶質透明電極基板、及びその製造方法、及び液晶ディスプレイ用カラーフィルタ |
| JP2005258115A (ja) * | 2004-03-12 | 2005-09-22 | Idemitsu Kosan Co Ltd | 薄膜トランジスタ型基板及び薄膜トランジスタ型液晶表示装置及び薄膜トランジスタ型基板の製造方法 |
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2006
- 2006-05-11 JP JP2006132109A patent/JP4860343B2/ja not_active Expired - Fee Related