JP2006339660A - Vertical diffusion/cvd equipment and wafer transfer method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide vertical diffusion/CVD equipment and a wafer transfer method which can allot the transfer positions for monitor wafers by a short period, as well as simple operations. <P>SOLUTION: In the vertical diffusion/CVD equipment a controller includes a processing means having a plurality of calculating processings so that the transfer positions of the monitor wafers are calculated on a boat for every number of monitor wafers. This processing means selects one calculating processing out of the plurality of calculating processings in accordance with parameters of the number of monitor wafers, performs calculating processing of calculating the transfer positions of the monitor wafers on the boat by the selected calculating processing, and prepares transfer data, based on the result of this calculating processing. Based on the transfer data thus prepared, the controller controls a wafer transfer machine so as to transfer the monitor wafers. The wafer transfer method thereof is also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

(Technical field to which the invention belongs)
The present invention relates to a vertical diffusion / CVD apparatus used in semiconductor manufacturing, and in particular, a vertical type capable of automatically calculating a monitor wafer transfer position to create wafer transfer data and performing a transfer operation. The present invention relates to a diffusion / CVD apparatus and a wafer transfer method.

(Conventional technology)
First, a conventional wafer transfer operation control device will be described with reference to FIG. FIG. 3 is a block diagram of a conventional wafer transfer operation control device. As shown in FIG. 3, a conventional wafer transfer operation control apparatus includes a cassette 1 for storing wafers, a boat 2 for transferring wafers, and a wafer transfer machine for transferring wafers from the cassette 1 to the boat 2. 3, a mechanical controller 4 that controls the wafer transfer device 3, a main controller 5 that controls the entire apparatus, and an operation panel 6.

  Next, the configuration of each part will be described in detail. The cassette 1 stores a process wafer as a product, a monitor wafer for testing, a side dummy wafer transferred as a dummy above and below the process wafer, etc. However, when transfer data of all wafers is input from the operation panel 6, the mechanical controller 4 controls the wafer transfer device 3 under the control of the main controller 5 in accordance with the transfer data to transfer various wafers from the cassette 1 to the boat 2. It is supposed to be transferred to.

  Next, a monitor wafer transfer position calculation method in a conventional wafer transfer operation control device will be described. In the conventional wafer transfer operation control device, the total number of grooves in the boat, the number of upper and lower side dummy wafers to be transferred, the number of “process + fill dummy wafers” to be transferred, and the number of monitor wafers to be transferred are determined in the boat. The operator calculates the transfer position of the monitor wafer so that the monitor wafers are evenly distributed to each other, and creates transfer data for all wafers in the data format suitable for the equipment to be used according to the calculated transfer position. The transfer data was input from the panel 6. Then, under the control of the main controller 5 according to the input transfer data, the mechanical controller 4 controls the wafer transfer device 3 to transfer various wafers from the cassette 1 to the boat 2.

(Problems to be solved by the invention)
However, in the conventional wafer transfer operation control apparatus and the monitor wafer transfer position distribution method in the above, the calculation of the monitor wafer transfer position, creation of transfer data, and input of the transfer data are all performed by the operator. Therefore, the work is complicated, and there is a high possibility that a human error such as a calculation error or an operation error occurs in each work process, and further, it takes time to prepare for transfer.

  The present invention has been made in view of the above circumstances, and provides a vertical diffusion / CVD apparatus and a wafer transfer method capable of evenly assigning transfer positions of monitor wafers in a short time and with simple operations. With the goal.

(Means for solving the problem)
The present invention for solving the problems of the conventional example described above is a vertical diffusion / CVD apparatus for controlling the operation of a wafer transfer machine for transferring wafers from a cassette to a boat according to the transfer data. A vertical diffusion / CVD system that determines the transfer position of the monitor wafer so that the monitor wafer is transferred above and below the entire process + fill dummy wafer and in the middle of the entire process + fill dummy wafer. Transfer position calculation and transfer data creation are automated, there are no calculation errors or human error during data creation and input, transfer preparation time is shortened, and device reliability and efficiency are improved. Can do.

  Further, the present invention provides at least a total number of processes + the number of fill dummy wafers and the number of monitor wafers in a vertical diffusion / CVD apparatus for controlling the operation of a wafer transfer machine for transferring wafers from a cassette to a boat according to transfer data. The vertical diffusion / CVD system that determines the transfer position of the monitor wafer so that the monitor wafer on the boat is evenly placed between the whole process and the fill dummy wafer using the parameters of Transfer position calculation and transfer data creation are automated, there are no calculation errors or human error during data creation and input, transfer preparation time is shortened, and device reliability and efficiency are improved. Can do.

  Further, the present invention provides at least a total number of processes + the number of fill dummy wafers and the number of monitor wafers in a vertical diffusion / CVD apparatus for controlling the operation of a wafer transfer machine for transferring wafers from a cassette to a boat according to transfer data. It is a vertical diffusion / CVD system that determines the transfer position of the monitor wafer on the boat using the parameters of the above, and the calculation of the transfer position of the complex monitor wafer and the transfer data creation are automated. There is no human error during input, transfer preparation time is shortened, and the reliability and efficiency of the apparatus can be improved.

  Further, according to the present invention, in the wafer transfer method, when transferring wafers from the cassette to the boat, the number of monitor wafers is three, and monitoring is performed at the top and bottom of all processes + fill dummy wafers and at the middle of all processes + fill dummy wafers. The wafer transfer method determines the transfer position of the monitor wafer so that the wafer is transferred. The calculation of the transfer position of the monitor wafer and the transfer data creation are automated. This eliminates human error, shortens the transfer preparation time, and improves the reliability and efficiency of the apparatus.

  Further, according to the present invention, when transferring a wafer from a cassette to a boat in the wafer transfer method, at least on the basis of the total number of processes transferred to the boat + the number of fill dummy wafers and the number of monitor wafers on the boat. This is a wafer transfer method that determines the transfer position of the monitor wafer so that the monitor wafers are evenly arranged between all processes and the fill dummy wafer. Thus, calculation errors and human error during data creation and input are eliminated, transfer preparation time is shortened, and reliability and efficiency of the apparatus can be improved.

  Further, according to the present invention, in the wafer transfer method, when transferring a wafer from a cassette to a boat, at least on the basis of the total number of processes transferred to the boat + the number of fill dummy wafers and the number of monitor wafers. This is a wafer transfer method that determines the transfer position of the monitor wafer in the system. The calculation of the transfer position and transfer data creation of complex monitor wafers is automated, and calculation errors and human errors during data creation and input are automated. And the transfer preparation time is shortened, and the reliability and efficiency of the apparatus can be improved.

(Embodiment of the Invention)
Embodiments of the present invention will be described with reference to the drawings.
The configuration of the wafer transfer operation control device according to the embodiment of the present invention is almost the same as that of a conventional wafer transfer operation control device, and as shown in FIG. 3, a cassette 1 for storing wafers and a boat for stacking wafers. 2, a wafer transfer machine 3 for transferring wafers from the cassette 1 to the boat 2, a mechanical controller 4 for controlling the wafer transfer machine 3, a main controller 5 for controlling the entire apparatus, and an operation panel 6. As a characteristic part of the present embodiment, processing means for calculating the monitor wafer transfer position and creating transfer data for all wafers is provided in the mechanical controller 4.

  In the wafer transfer operation control apparatus of this embodiment, the processing means is provided in the mechanical controller 4, but the processing means for calculating the monitor wafer transfer position and creating transfer data for all wafers is the main. It may be provided inside the controller 5.

  Next, the operation of each part will be described in detail. When the operator inputs the number of monitor wafers from the operation panel 6, the input number data is sent to the mechanical controller 4 via the main controller 5. The processing means of the mechanical controller 4 performs calculation processing for calculating the transfer position of the monitor wafer, creates transfer data for all wafers based on the result, and transfers the created transfer data to the wafer transfer machine 3. send. The wafer transfer device 3 sequentially transfers the side dummy wafer, the process wafer, the fill dummy wafer, and the monitor wafer from the cassette 1 to the boat 2 according to the transfer data.

  Next, a monitor wafer transfer position distribution method in the wafer transfer operation control apparatus of this embodiment will be described. First, a method for evenly arranging monitor wafers between “process + fill dummy wafer” will be described with reference to FIG. FIG. 1 is a state diagram of a boat showing transfer positions according to the number of monitor wafers in this embodiment.

  In the monitor wafer transfer position distribution method of this embodiment, in order to transfer the monitor wafer evenly between the “process + fill dummy wafer”, the monitor wafer is transferred in one case, We will consider separately the case of three sheets and the case of three or more sheets.

  When the number of monitor wafers to be transferred is one, as shown in FIG. 1A, the monitor wafer is transferred so that the monitor wafer is inserted in the middle of the “process + fill dummy wafer”. The upper side dummy wafer, the process + fill dummy wafer, the monitor wafer, the process + fill dummy wafer, and the lower side dummy wafer are transferred in this order.

  When there are two monitor wafers to be transferred, as shown in FIG. 1B, the monitor wafers are transferred so that the monitor wafers are inserted on both sides of the “process + fill dummy wafer”. The upper side dummy wafer, the monitor wafer, the process + fill dummy wafer, the monitor wafer, and the lower side dummy wafer are transferred in this order.

  When there are 3 or more monitor wafers to be transferred, as shown in Fig. 1 (c), equally separate the "process + fill dummy wafer" on both sides of the "process + fill dummy wafer" and the remaining monitor wafers. The boat is in the upper side dummy wafer, monitor wafer, process + fill dummy wafer, monitor wafer, ..., process + fill dummy wafer, monitor wafer, bottom The side dummy wafers are transferred in this order.

  Next, a method for calculating the monitor wafer transfer position according to the present embodiment will be described. In this embodiment, in order for the mechanical controller 4 to automatically calculate the transfer position of the monitor wafer, the operator sets in advance from the operation panel 6 using the following five values as parameters. The five parameters are the total number of grooves in the boat (B), the number of upper side dummy wafers (S1), the number of lower side dummy wafers (S2), the number of “process + fill dummy wafers” (Pt), the monitor The number of wafers (M).

When there is one monitor wafer to be transferred, as shown in FIG. 1A, the monitor wafer is inserted in the middle of “process + fill dummy wafer”, so that it is transferred above and below the monitor wafer. Calculation of the number of processes + fill dummy wafers P1 and P2
Pt ÷ 2
If the quotient calculated by the equation is a and the remainder is b,
P1 = a + b
P2 = a
Desired. Therefore, the monitor wafer transfer position (M1) on the boat is
M1 = B-S1-P1
It can be obtained by an expression.

When there are two monitor wafers to be transferred, as shown in FIG. 1B, the monitor wafers are inserted on both sides of the “process + fill dummy wafer”. M1, M2)
M1 = B-S1
M2 = M1 -1-Pt
It can be obtained by an expression.

When there are 3 or more monitor wafers to be transferred, as shown in FIG. 1 (c), the "process + fill dummy wafer" is evenly distributed on both sides of the "process + fill dummy wafer" and the remaining monitor wafers. In order to transfer the sheets so as to be inserted between the divided parts, first, the number of “process + fill dummy wafers” P1, P2,..., Pm (m = M−1) equally divided by the monitor wafer is obtained.
Pt ÷ (M-1)
If the quotient calculated by the equation is a and the remainder is b, the distribution number Pn of the n (1 ≦ n ≦ m) th “process + fill dummy wafer” is the case where the remainder b is not 0,
The value of Pn = a + cc is 1 if n≤b, and 0 if n> b.
However, the distribution number Pn when the remainder b is 0 is
Pn = a
It is calculated by the following formula.

Therefore, the transfer positions M1, M2,... Mm + 1 of the first, second,.
M1 = B-S1
M2 = M1-1-P1
:
Mn = Mn-1-1-1-Pn-1
:
Mm + 1 = Mm-1-Pm
It can be calculated by the following formula.

Next, an operation for realizing the method for calculating the monitor wafer transfer position according to the present embodiment will be described with reference to FIG. FIG. 2 is a flowchart of the calculation processing of the monitor wafer transfer position according to the present embodiment. The parameters are the total number of grooves in the boat (B), the number of upper side dummy wafers (S1), the number of lower side dummy wafers (S2), the number of “process + fill dummy wafers” (Pt), and the monitor wafer. Assume that the number of sheets (M) is already set.

First, in order to store the position of the monitor wafer, tables MP (M) corresponding to the number of monitor wafers (M) are secured (100), the number of monitor wafers (M) is checked (101), and if M = 1. The process moves to one monitor wafer. If M = 2, the process moves to two monitor wafers. If M ≧ 3, the process moves to three or more monitor wafers.

In processing one monitor wafer, the quotient a and the remainder b of Pt ÷ 2 are obtained (110), the number of first “process + fill dummy wafer” P1 = a + b is obtained (111), and the monitor wafer transfer position is obtained. MP (1) = B-S1-P1 is obtained (112), and the process is terminated.

In processing two monitor wafers, the first monitor wafer transfer position MP (1) = B−S1 is obtained (120), and the second monitor wafer transfer position MP (2) = MP (1) −. Pt is obtained (121), and the process is terminated.

In the processing of three or more monitor wafers, first, the first monitor wafer transfer position MP (1) = B−S1 is obtained (130), and then the quotient “a” and the remainder “b” of Pt ÷ (M−1) are obtained. (131). Then, the counter n is set to 1 (132), and it is determined whether or not the counter n is larger than b (133). If it is larger than b (n> b), 0 is put into c (134) and larger than b. Otherwise (n ≦ b), 1 is put into c (135).

  Next, the number P = a + c of “process + fill dummy wafer” is obtained (136), the (n + 1) th monitor wafer transfer position MP (n + 1) = MP (n) -1-P is obtained (137), 1 is added to the counter n (138), and it is determined whether the counter n is smaller than M (n <M) (139). If it is smaller, the process returns to the process 133. Otherwise, the process is terminated.

  With the method described above, the work involving the worker is only to set five parameters, which reduces the burden on the worker and, as a result, reduces the possibility of operation mistakes and improves the reliability of the device. There is an effect that can be improved.

  Furthermore, since the calculation of the transfer position of the monitor wafer and the creation of transfer data for all the wafers are automated, there are no calculation errors or human error during data creation and input, and the transfer preparation time is shortened. There is an effect that the reliability and efficiency of the entire apparatus and work can be improved.

(The invention's effect)
According to the present invention, there are three monitor wafers, and the vertical position for determining the transfer position of the monitor wafer so that the monitor wafer is transferred to the upper and lower sides of all processes + fill dummy wafers and to the middle of all processes + fill dummy wafers. Since it is a diffusion / CVD system, complex monitor wafer transfer position calculations and transfer data creation are automated, eliminating calculation errors and human error during data creation and input, and reducing transfer preparation time. Thus, the reliability and efficiency of the apparatus can be improved.

Further, according to the present invention, at least the parameters of the number of all processes + fill dummy wafers and the number of monitor wafers are used so that the monitor wafers on the boat are evenly arranged between all processes + fill dummy wafers. Since the vertical diffusion / CVD system determines the transfer position of the monitor wafer, the calculation of the transfer position of the monitor wafer and the transfer data creation are automated, making calculation errors and artificial data creation and input. This eliminates mistakes, shortens the transfer preparation time, and improves the reliability and efficiency of the apparatus.

  Further, according to the present invention, the vertical diffusion / CVD apparatus is configured to determine the transfer position of the monitor wafer on the boat using at least parameters of the total process + the number of fill dummy wafers and the number of monitor wafers. As a result, transfer position calculation and transfer data creation of complex monitor wafers are automated, eliminating calculation errors, human error during data creation and input, and shortening transfer preparation time, and reliability of the equipment In addition, the efficiency can be improved.

  Further, according to the present invention, when transferring wafers from the cassette to the boat, the number of monitor wafers is three, and the monitor wafers are transferred in the upper and lower sides of all processes + fill dummy wafers and in the middle of all processes + fill dummy wafers. Since the wafer transfer method determines the transfer position of the monitor wafer as described above, the calculation of the transfer position and transfer data creation of complex monitor wafers is automated, and calculation errors and human creation at the time of data creation and input This makes it possible to eliminate unnecessary mistakes, shorten the transfer preparation time, and improve the reliability and efficiency of the apparatus.

  Further, according to the present invention, when transferring wafers from a cassette to a boat, the monitor wafers on the boat are transferred based on at least the total number of processes transferred to the boat + the number of fill dummy wafers and the number of monitor wafers. Since the wafer transfer method determines the transfer position of the monitor wafer so that it is evenly placed between all processes and the fill dummy wafer, the calculation of the transfer position of the monitor wafer and the transfer data creation are automated. In addition, there are no calculation errors or human error in data creation and input, and the transfer preparation time is shortened, and the reliability and efficiency of the apparatus can be improved.

  According to the present invention, when transferring a wafer from a cassette to a boat, the monitor on the boat is based on at least the total number of processes transferred to the boat + the number of fill dummy wafers and the number of monitor wafers. Since it is a wafer transfer method that determines the transfer position of the wafer, transfer position calculation and transfer data creation of complex monitor wafers are automated, eliminating calculation errors and human error during data creation and input, In addition, the transfer preparation time is shortened, and the reliability and efficiency of the apparatus can be improved.

It is a state diagram of a boat showing transfer positions according to the number of monitor wafers by the vertical diffusion / CVD apparatus and wafer transfer method according to the embodiment of the present invention. It is a flowchart figure of the arithmetic processing of the vertical diffusion / CVD apparatus and wafer transfer method which concern on embodiment of this invention. It is a block diagram of the conventional wafer transfer operation control apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Cassette, 2 ... Boat, 3 ... Wafer transfer machine, 4 ... Mechanical controller, 5 ... Main controller, 6 ... Operation panel

Claims (2)

In a semiconductor manufacturing apparatus having a controller for controlling the operation of a wafer transfer machine for transferring wafers from a cassette to a boat according to transfer data, the controller includes the monitor wafer on the boat according to the number of monitor wafers. A processing means having a plurality of arithmetic processes for calculating the transfer position is provided, and the processing means selects one of the plurality of arithmetic processes according to the parameter of the number of monitor wafers and selects the selected arithmetic process An arithmetic process for calculating the transfer position of the monitor wafer on the boat is performed by an arithmetic process, and the transfer data is created based on the result of the arithmetic process, and the controller is configured to monitor the monitor based on the transfer data. A semiconductor manufacturing apparatus, wherein the wafer transfer device is controlled to transfer a wafer. A controller having a processing means having a plurality of arithmetic processes for calculating the transfer position of the monitor wafer on the boat according to the number of monitor wafers transfers the wafer transfer machine operation for transferring the wafer from the cassette to the boat. A wafer transfer method controlled in accordance with loading data, wherein the processing means selects one of the plurality of calculation processes according to the parameter of the number of monitor wafers, and the selected calculation process is performed on the boat. The calculation process of calculating the transfer position of the monitor wafer in the above is performed, the transfer data is created based on the calculation process result, and the controller transfers the monitor wafer based on the transfer data A wafer transfer method comprising controlling the wafer transfer machine.

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