JP2006339350A - Printed wiring board and its manufacturing method - Google Patents

Printed wiring board and its manufacturing method Download PDF

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Publication number
JP2006339350A
JP2006339350A JP2005161337A JP2005161337A JP2006339350A JP 2006339350 A JP2006339350 A JP 2006339350A JP 2005161337 A JP2005161337 A JP 2005161337A JP 2005161337 A JP2005161337 A JP 2005161337A JP 2006339350 A JP2006339350 A JP 2006339350A
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plating
hole
back surfaces
printed wiring
wiring board
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Takahiro Namekawa
貴啓 滑川
Osamu Kawashima
修 川島
Eiji Imamura
英治 今村
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Daisho Denshi Co Ltd
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Daisho Denshi Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a printed wiring board which can attain thinning and high-density arrangement, and high connection reliability of conductor patterns, and also to provide its manufacturing method. <P>SOLUTION: The printed wiring board comprises an insulation substrate 1, conductor patterns 2 formed on the front and rear faces 1A and 1B of the insulation substrate 1, a through-hole 4 formed in the insulation substrate 1, a penetration-direction plating portion 41 in the penetrating direction which is deposited on the inner wall of the through-hole 4, a lateral plating portion 42 which is extended along the insulation substrate 1 from both ends of the plating portion 41 in the penetration direction and is connected to the conductor patterns 2, a resin layer 5 which fills up the through-hole 4 and is formed with concave portions 5a on the front and rear faces thereof, and lid plating portions 43 which are formed on both front and rear faces of the resin layer 5 and are connected to the plating portion 41 in the penetration direction and the lateral plating portion 42. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、絶縁基板の表裏両面に形成された導体パターンを適所で層間接続させたプリント配線板とその製造方法に関する。   The present invention relates to a printed wiring board in which conductor patterns formed on both front and back surfaces of an insulating substrate are interlayer-connected at appropriate positions, and a method for manufacturing the same.

プリント配線板は、生産性の向上、量産品質の確保、信頼性の向上等を目的として、テレビ等の量産機器からロケット等の高い信頼性を要求される機器まで、あらゆる電子機器に使用されている。近年、電子機器の小型化が進み、それに伴いプリント配線板の高精度化及び高密度化が要求されている。
この種のプリント配線板としては、絶縁基板の表裏両面に形成された導体パターンをめっきスルーホールを介して適所で電気的に接続させた構成のものが一般的である。
Printed wiring boards are used in all types of electronic equipment, from mass production equipment such as televisions to equipment that requires high reliability such as rockets, for the purpose of improving productivity, ensuring mass production quality, and improving reliability. Yes. In recent years, electronic devices have been miniaturized, and accordingly, there has been a demand for higher precision and higher density of printed wiring boards.
This type of printed wiring board generally has a configuration in which conductor patterns formed on both front and back surfaces of an insulating substrate are electrically connected at appropriate positions via plated through holes.

プリント配線板の用途によっては、めっきスルーホールを穴埋めしておいた方が好ましい場合がある。穴埋め法としては、絶縁基板上の銅箔に重ねてスルーホールごとめっきを施して穴埋めする、いわゆるフィルドめっき法(例えば、特許文献1参照)や、銅箔に重ねて一次めっきを施した後、スルーホールを導電ペースト等で穴埋めし、この導電ペースト体の両端を研磨して一次めっき層と面一にした後、これら一次めっき層と導電ペースト体の上に重ねてめっきを施す、いわゆる蓋めっき法(例えば、特許文献2参照)等が知られている。
特開2003−046248号公報 特開2003−069228号公報
Depending on the use of the printed wiring board, it may be preferable to fill the plated through hole. As the hole filling method, the copper foil on the insulating substrate is overlaid by plating the entire through hole to fill the hole, so-called filled plating method (for example, refer to Patent Document 1), or after the primary plating over the copper foil, So-called lid plating that fills through holes with conductive paste, etc., polishes both ends of this conductive paste body to make it flush with the primary plating layer, and then applies plating on these primary plating layer and conductive paste body The law (see, for example, Patent Document 2) is known.
JP 2003-046248 A JP 2003-069228 A

しかしながら、これら従来におけるフィルドめっき法と蓋めっき法の場合には、スルーホールを穴埋めして更にその上にめっき層を形成しているので、スルーホールの内壁に施されためっき部と、表裏両面に形成された導体パターン間の接続信頼性を確保することはできるものの、銅箔の上にめっき層が積層されるので、導体パターン形成のための導体層(銅箔とめっき層)の厚みが増大し、パターン形成が困難になるという問題がある。特に、従来における蓋めっき法では、銅箔の上にめっき層が2層も積層されるので、その傾向が顕著となる。   However, in the case of these conventional filled plating methods and lid plating methods, the through hole is filled and a plating layer is further formed thereon, so that the plated portion applied to the inner wall of the through hole and both the front and back surfaces Although it is possible to ensure the connection reliability between the conductor patterns formed on the copper foil, since the plating layer is laminated on the copper foil, the thickness of the conductor layer (copper foil and plating layer) for forming the conductor pattern is There is a problem that pattern formation becomes difficult. In particular, in the conventional lid plating method, since two plating layers are laminated on the copper foil, the tendency becomes remarkable.

従って、本発明は、上記事情に鑑みてなされたものであり、その目的は、導体パターンの細線化及び高密度化と接続信頼性の双方を兼ね備えたプリント配線板と、その製造方法を提供することにある。   Therefore, the present invention has been made in view of the above circumstances, and an object of the present invention is to provide a printed wiring board having both thinning and high density of a conductor pattern and connection reliability, and a manufacturing method thereof. There is.

上記課題を解決するために、本発明の請求項1に係るプリント配線板は、絶縁基板と、該絶縁基板の表裏両面に設けられた導体層と、該絶縁基板に形成されたスルーホールと、該スルーホールの内壁に析出してなる第1のめっき部と、該第1のめっき部の両端から前記絶縁基板に沿って延出し、前記導体層に接続される第2のめっき部とを備え、該スルーホールを穴埋めし、その表裏両面に凹部が形成された樹脂層と、該樹脂層の表裏両面に形成され、前記第1のめっき部または前記第2のめっき部の少なくともいずれかに接続される第3のめっき部と、を備えることを特徴とする。   In order to solve the above problems, a printed wiring board according to claim 1 of the present invention includes an insulating substrate, a conductor layer provided on both front and back surfaces of the insulating substrate, a through hole formed in the insulating substrate, A first plated portion deposited on an inner wall of the through hole; and a second plated portion extending from both ends of the first plated portion along the insulating substrate and connected to the conductor layer. A resin layer in which the through hole is filled and recesses are formed on both front and back surfaces thereof, and formed on both the front and back surfaces of the resin layer and connected to at least one of the first plating portion and the second plating portion. And a third plating part.

この発明によれば、前記スルーホールを穴埋めする樹脂層の表裏両面に凹部が形成されているので、該凹部に収容されるように前記第3のめっき部を備えることができ、これにより、導体パターン形成のための導体層(銅箔とめっき層)の厚みの増大を抑制することができ、また、パターン形成を容易に行うことが可能となる。そして、前記第3のめっき部が前記第1のめっき部または前記第2のめっき部の少なくともいずれかに接続されるので、スルーホールの内壁に施された第1のめっき部と、表裏両面に形成された導体パターン間の接続信頼性を確保することができる。   According to this invention, since the concave portions are formed on both the front and back surfaces of the resin layer that fills the through hole, the third plating portion can be provided so as to be accommodated in the concave portion. An increase in the thickness of the conductor layer (copper foil and plating layer) for pattern formation can be suppressed, and pattern formation can be easily performed. And since the said 3rd plating part is connected to at least any one of the said 1st plating part or the said 2nd plating part, the 1st plating part given to the inner wall of a through hole, and both front and back surfaces Connection reliability between the formed conductor patterns can be ensured.

本発明の請求項2に係るプリント配線板は、請求項1に記載のものであって、前記第3のめっき部は、その表裏両面を前記導体層および前記第2のめっき部と面一になるように形成されていることを特徴とする。
この発明によれば、前記第3のめっき部が、前記導体層および前記第2のめっき部に対して突出することを防止できるので、前記プリント配線板の厚さ増大を抑制することができる。また、面一にすることで、後工程を行う際の利便性が高まる。
A printed wiring board according to a second aspect of the present invention is the printed wiring board according to the first aspect, wherein the third plating portion is flush with the conductive layer and the second plating portion. It is formed so that it may become.
According to this invention, since it can prevent that the said 3rd plating part protrudes with respect to the said conductor layer and the said 2nd plating part, the increase in the thickness of the said printed wiring board can be suppressed. Moreover, the convenience at the time of performing a post process increases by making it flush.

本発明の請求項3に係るプリント配線板は、請求項1または請求項2のいずれかに記載のものであって、前記樹脂層は、導電性樹脂により形成されていることを特徴とする。
この発明によれば、前記第3のめっき部を形成する場合に、前記導体層に給電した電力を前記樹脂層に伝達することができるため、前記樹脂層の表裏両面へのめっきの析出が容易となり、前記第3のめっき部の形成を容易に行うことができる。
A printed wiring board according to a third aspect of the present invention is the printed wiring board according to the first or second aspect, wherein the resin layer is formed of a conductive resin.
According to this invention, when the third plating portion is formed, the power supplied to the conductor layer can be transmitted to the resin layer, so that the deposition of plating on the front and back surfaces of the resin layer is easy. Thus, the third plating portion can be easily formed.

本発明の請求項4に係るプリント配線板の製造方法は、スルーホールを有する銅張り積層板の表裏両面に、前記スルーホールの開口周縁部を残してめっきレジスト層を形成するマスク工程と、前記スルーホールの開口周縁部に露出する銅箔をその厚み方向にエッチングするエッチング工程と、前記スルーホールの内壁及び前記エッチングにより露出した前記積層板の表裏両面にめっき層を析出させる第1のめっき工程と、前記第1のめっき工程により形成されためっきスルーホールの内空部を、樹脂により穴埋めする穴埋め工程と、前記樹脂の表裏両面に凹部を形成する凹部形成工程と、前記めっきレジスト層下の銅箔を給電部として電気めっきにより前記樹脂の表裏両面にめっき層を析出させる第2のめっき工程を備えることを特徴とする。   According to a fourth aspect of the present invention, there is provided a printed wiring board manufacturing method comprising: a masking step of forming a plating resist layer on both front and back surfaces of a copper-clad laminate having through holes, leaving an opening peripheral edge of the through holes; Etching process for etching copper foil exposed at the peripheral edge of the opening of the through hole in the thickness direction, and a first plating process for depositing plating layers on both the inner wall of the through hole and the front and back surfaces of the laminate exposed by the etching A hole filling step of filling a hollow portion of the plated through hole formed by the first plating step with a resin, a concave portion forming step of forming concave portions on both the front and back surfaces of the resin, and a layer under the plating resist layer A second plating step is provided, in which a plating layer is deposited on both the front and back surfaces of the resin by electroplating using copper foil as a power feeding part.

この発明によれば、パターン形成時にエッチングされる導体層の厚みが、銅張り積層板に元々積層されていた銅箔の厚みになるから、導体パターンの形成が容易になると共に、その細線化及び高密度化も容易に実現することができる。また、前記樹脂の表裏両面に凹部を形成することで、該凹部に収容されるように前記第3のめっき部を備えることができ、これにより、導体パターン形成のための導体層(銅箔とめっき層)の厚みの増大を抑制することができ、また、パターン形成を容易に行うことが可能となる。   According to this invention, since the thickness of the conductor layer etched at the time of pattern formation becomes the thickness of the copper foil originally laminated on the copper-clad laminate, the formation of the conductor pattern is facilitated, the thinning and Densification can be easily realized. Further, by forming recesses on both the front and back sides of the resin, the third plating part can be provided so as to be accommodated in the recesses, whereby a conductor layer (copper foil and copper foil) for forming a conductor pattern can be provided. An increase in the thickness of the plating layer) can be suppressed, and pattern formation can be easily performed.

本発明の請求項5に係るプリント配線板の製造方法は、請求項4に記載のものであって、前記第2のめっき工程により形成されためっき層を、前記銅箔および前記第1のめっき工程により形成されためっき層と、表裏両面で面一になるように研磨する研磨工程を備えることを特徴とする。
この発明によれば、前記第2のめっき工程により形成されためっき層が、前記銅箔および前記第1の工程により形成されためっき層に対して突出することを防止できるので、前記プリント配線板の厚さ増大を抑制することができる。また、面一にすることで、後工程を行う際の利便性が高まる。
The manufacturing method of the printed wiring board concerning Claim 5 of this invention is a thing of Claim 4, Comprising: The plating layer formed by the said 2nd plating process is said copper foil and said 1st plating. It is characterized by comprising a polishing step of polishing so as to be flush with the plating layer formed by the step and both the front and back sides.
According to this invention, since the plating layer formed by the second plating step can be prevented from protruding with respect to the copper foil and the plating layer formed by the first step, the printed wiring board. The increase in thickness can be suppressed. Moreover, the convenience at the time of performing a post process increases by making it flush.

本発明のプリント配線板によれば、導体パターン形成のための導体層(銅箔とめっき層)の厚みの増大を抑制することができ、また、パターン形成を容易に行うことが可能となる。そして、スルーホールの内壁に施された第1のめっき部と、表裏両面に形成された導体パターン間の接続信頼性を確保することができる。   According to the printed wiring board of the present invention, it is possible to suppress an increase in the thickness of a conductor layer (copper foil and plating layer) for forming a conductor pattern, and it is possible to easily perform pattern formation. And the connection reliability between the 1st plating part given to the inner wall of a through hole, and the conductor pattern formed in front and back both surfaces can be ensured.

本発明のプリント配線板の製造方法によれば、導体パターンの形成が容易になると共に、その細線化及び高密度化も容易に実現することができる。導体パターン形成のための導体層(銅箔とめっき層)の厚みの増大を抑制することができ、また、パターン形成を容易に行うことが可能となる。   According to the method for manufacturing a printed wiring board of the present invention, it is easy to form a conductor pattern, and it is also possible to easily realize thinning and high density. An increase in the thickness of the conductor layer (copper foil and plating layer) for forming the conductor pattern can be suppressed, and the pattern can be easily formed.

以下、本発明を実施するための最良の形態について、図1〜図10を参照して説明する。
まず、プリント配線板の一実施例について、図10を参照しながら説明する。
このプリント配線板Pにおいて、絶縁基板1の表裏両面1A,1Bには、例えば銅張り積層板の銅箔(導体層)から切り出された導体パターン(導体層)2が一層設けられている。この導体パターン2のうち、穴埋めされたスルーホール3の開口部周縁に形成された導体パターン2aは、めっきスルーホール4の面方向めっき部(第2のめっき部)42と面一になるように構成されている。そして、導体パターン2aと、面方向めっき部42とが、それぞれ厚さ方向に対して接触している。
The best mode for carrying out the present invention will be described below with reference to FIGS.
First, an example of a printed wiring board will be described with reference to FIG.
In this printed wiring board P, a conductive pattern (conductor layer) 2 cut out from, for example, a copper foil (conductor layer) of a copper-clad laminate is provided on both the front and back surfaces 1A and 1B of the insulating substrate 1. Of the conductor pattern 2, the conductor pattern 2 a formed at the periphery of the opening of the through hole 3 filled in the hole is flush with the surface-direction plating portion (second plating portion) 42 of the plating through hole 4. It is configured. And the conductor pattern 2a and the surface direction plating part 42 are contacting with respect to the thickness direction, respectively.

めっきスルーホール4は、スルーホール3の内壁に形成された円筒状の貫通方向めっき部(第1のめっき部)41と、この貫通方向めっき部41の軸方向両端から絶縁基板1に沿って延びる(はみ出す)リング状の面方向めっき部42とから構成されており、貫通方向めっき部41に包囲された内空部は、例えばポリアセチレンのような導電性樹脂からなる穴埋め部5で穴埋めされている。
導体パターン2,2aの厚みは、銅張り積層板に予め積層されている銅箔の厚みと同じかそれよりも若干薄く、例えば、12μmかそれ以下に設定されている。また、面方向めっき部42の厚みTは、導体パターン2,2aの厚みと同様であり、面方向めっき部42の面方向の張出寸法Lは、例えば、L=0.1〜0.2mmに設定されている。
The plated through hole 4 extends along the insulating substrate 1 from a cylindrical through direction plated portion (first plated portion) 41 formed on the inner wall of the through hole 3 and from both axial ends of the through direction plated portion 41. It is composed of a ring-shaped surface direction plating part 42 (extruding), and the inner space surrounded by the penetration direction plating part 41 is filled with a hole filling part 5 made of a conductive resin such as polyacetylene. .
The thickness of the conductor patterns 2 and 2a is the same as or slightly smaller than the thickness of the copper foil previously laminated on the copper-clad laminate, and is set to 12 μm or less, for example. Moreover, the thickness T of the surface direction plating part 42 is the same as the thickness of the conductor patterns 2 and 2a, and the overhanging dimension L in the surface direction of the surface direction plating part 42 is, for example, L = 0.1 to 0.2 mm. Is set to

また、穴埋め部5の表裏両面には、周縁部から中心部に対して湾曲してなる凹部5aがそれぞれ形成されている。そして、穴埋め部5上には、前記凹部5aに収容されるように、蓋めっき部(第3のめっき部)43が形成されている。
さらに、蓋めっき部43は、その表裏両面を導体パターン2aとめっきスルーホール4とに対して面一に形成されている。
In addition, on both the front and back surfaces of the hole filling portion 5, concave portions 5 a that are curved from the peripheral portion to the center portion are formed. A lid plating part (third plating part) 43 is formed on the hole filling part 5 so as to be accommodated in the recess 5a.
Further, the lid plating portion 43 is formed so that both the front and back surfaces thereof are flush with the conductor pattern 2 a and the plated through hole 4.

以上説明したように、本実施例のプリント配線板Pによれば、前記穴埋め部5上に形成された蓋めっき部43が、貫通方向めっき部41と面方向めっき部42とに接続されるので、スルーホール3の内壁に施されためっきスルーホール4と、絶縁基板1の表裏両面に形成された導体パターン2間の接続信頼性を確保することができる。ゆえに、導体パターン2が微細化及び高密度化に対しても、層間接続の信頼性が高い。   As described above, according to the printed wiring board P of the present embodiment, the lid plating part 43 formed on the hole filling part 5 is connected to the penetration direction plating part 41 and the surface direction plating part 42. The connection reliability between the plated through hole 4 formed on the inner wall of the through hole 3 and the conductor pattern 2 formed on both the front and back surfaces of the insulating substrate 1 can be ensured. Therefore, the reliability of interlayer connection is high even when the conductor pattern 2 is miniaturized and densified.

次に、このプリント配線板Pの製造方法の一実施例について、図1〜図9を参照しながら説明する。
まず、絶縁基板1の表裏両面に導体パターン2を形成するための銅箔12が貼着されてなる銅張り積層板Qを用意し(図1)、その一方の面から他方の面にかけて、絶縁基板1の表裏両面に形成される導体パターン2を適所で層間接続させるためのスルーホール3を形成する(図2)。
次いで、製面及びデスミアを行い、無電解銅めっきの付着性を向上させるための触媒、例えばパラジウム(Pd)を銅箔12の表面及びスルーホール3の内壁に吸着させる。
Next, an example of a method for manufacturing the printed wiring board P will be described with reference to FIGS.
First, a copper-clad laminate Q having copper foils 12 for forming the conductor pattern 2 on both the front and back surfaces of the insulating substrate 1 is prepared (FIG. 1) and insulated from one surface to the other surface. Through-holes 3 are formed for interlayer connection of conductor patterns 2 formed on both the front and back surfaces of the substrate 1 at appropriate positions (FIG. 2).
Next, surface preparation and desmearing are performed, and a catalyst for improving the adhesion of electroless copper plating, for example, palladium (Pd), is adsorbed on the surface of the copper foil 12 and the inner wall of the through hole 3.

次に、スルーホール3の開口周縁部を残して(外して)、つまり、スルーホール3の開口周縁部においては銅箔12が露出するようにめっきレジスト層13を形成する(図3、マスク工程)。そして、この開口周縁部に露出する銅箔12aをその厚み方向にエッチングする(図4、エッチング工程)。   Next, the plating resist layer 13 is formed so that the copper foil 12 is exposed at the opening periphery of the through hole 3 leaving (excluding) the opening periphery of the through hole 3 (FIG. 3, masking process). ). And the copper foil 12a exposed to this opening peripheral part is etched in the thickness direction (FIG. 4, an etching process).

このエッチングにより除去される銅箔12aの厚みは、例えば銅箔12の初期厚さ12μmと同一に設定される。なお、エッチングの際には、エッチング液としてアルカリタイプのものを使用することにより、前工程で吸着させたPd触媒を銅箔12の表面及びスルーホール3の内壁に残存させつつ、銅箔12aのみを選択的にエッチングする。   The thickness of the copper foil 12a removed by this etching is set to be the same as the initial thickness 12 μm of the copper foil 12, for example. In the etching, an alkaline type etchant is used so that the Pd catalyst adsorbed in the previous step remains on the surface of the copper foil 12 and the inner wall of the through hole 3 while only the copper foil 12a. Is selectively etched.

次いで、エッチングされた結果、めっきレジスト層13の直下における銅箔12よりも内周側の絶縁基板露出面21と、スルーホール3の内壁とに無電解銅めっきを施して銅めっきを析出させる。
すると、スルーホール3の内壁にはその貫通方向に延びる円筒状の貫通方向めっき部41が析出し、絶縁基板1の面方向にはみ出す、言い換えれば、スルーホール3の径方向外方に沿ってはみ出すリング状の面方向めっき部42が析出する(図5、第1のめっき工程)。
Next, as a result of the etching, electroless copper plating is applied to the insulating substrate exposed surface 21 on the inner peripheral side of the copper foil 12 directly below the plating resist layer 13 and the inner wall of the through hole 3 to deposit copper plating.
Then, a cylindrical penetration direction plating portion 41 extending in the penetration direction is deposited on the inner wall of the through hole 3 and protrudes in the surface direction of the insulating substrate 1, in other words, protrudes along the radially outer side of the through hole 3. A ring-shaped surface direction plating portion 42 is deposited (FIG. 5, first plating step).

これら貫通方向めっき部41と面方向めっき部42とは一体をなして析出するので、スルーホール3は後工程で絶縁基板1の両面に形成される導体パターン2,2間を電気的に層間接続するめっきスルーホール4となる。
次に、めっきスルーホール4の内空部14を、導電性樹脂を充填して穴埋めする穴埋め処理を行う(図6、穴埋め工程)。
Since the through-direction plated portion 41 and the surface-direction plated portion 42 are deposited together, the through-hole 3 is electrically connected between the conductor patterns 2 and 2 formed on both surfaces of the insulating substrate 1 in a later step. The plated through hole 4 is formed.
Next, a filling process for filling the inner space 14 of the plated through hole 4 with a conductive resin is performed (FIG. 6, filling process).

そして、穴埋め処理により形成した穴埋め部5の表裏両面に凹部5aを形成する処理を行う(図7、凹部形成工程)。この凹部を形成する処理としては、例えば、アニール処理を行って収縮させることで凹部5aを形成すると、穴埋め部5の剛性を高めつつ凹部5aを形成することができる点で好ましい。   And the process which forms the recessed part 5a in the front and back both surfaces of the hole-filling part 5 formed by the hole-filling process is performed (FIG. 7, recessed part formation process). As the processing for forming the concave portion, for example, it is preferable to form the concave portion 5a by shrinking by performing an annealing process because the concave portion 5a can be formed while increasing the rigidity of the hole filling portion 5.

次いで、めっきレジスト層13の直下にある銅箔12を給電部として用いて電気銅めっきを行い、穴埋め部5の表裏両面にめっき銅を析出させて蓋めっき部43を形成する(図8、第2のめっき工程)。この蓋めっき部43は、銅箔12の外表面12Aから膨出するまで形成される。本実施の形態では、穴埋め部5を導電性樹脂により形成しているので、銅箔12に給電した電力を穴埋め部5に伝達することができるため、穴埋め部5の表裏両面へのめっきの析出が容易となり、前記第3のめっき部の形成を容易に行うことができる。   Next, electrolytic copper plating is performed using the copper foil 12 immediately below the plating resist layer 13 as a power feeding portion, and plated copper is deposited on both the front and back surfaces of the hole filling portion 5 to form a lid plating portion 43 (FIG. 8, first). 2 plating step). The lid plating portion 43 is formed until it bulges from the outer surface 12A of the copper foil 12. In the present embodiment, since the hole filling portion 5 is formed of a conductive resin, the power supplied to the copper foil 12 can be transmitted to the hole filling portion 5, so that plating is deposited on both the front and back surfaces of the hole filling portion 5. Thus, the third plating portion can be easily formed.

次いで、めっきレジスト層13を除去し、さらに、銅張り積層板Qの表裏両面を研磨する。研磨に際しては、穴埋め部15の膨出部だけを研磨するのではなく、銅箔12がその外表面から0.1〜0.2μm研磨される程度の研磨しろを設定しておいて、銅箔12と、めっきスルーホール4の面方向めっき部42と、蓋めっき部43とが面一となるように外表面を研磨する(図9)。
このとき、めっきスルーホール4には、研磨方向すなわち絶縁基板1に沿う方向に外力が作用するが、めっきスルーホール4が穴埋めされているので、面方向めっき部42が研磨方向に引きずられることはなく、仮に引きずられることがあったとしても、面方向めっき部42と、銅箔12との接触状態はそのまま維持されるので、層間接続は確保される。
Next, the plating resist layer 13 is removed, and the front and back surfaces of the copper-clad laminate Q are polished. At the time of polishing, not only the bulging portion of the hole filling portion 15 is polished, but a polishing margin is set such that the copper foil 12 is polished by 0.1 to 0.2 μm from its outer surface. 12, the outer surface is polished so that the surface direction plating portion 42 of the plated through hole 4 and the lid plating portion 43 are flush with each other (FIG. 9).
At this time, an external force acts on the plated through hole 4 in the polishing direction, that is, in the direction along the insulating substrate 1. However, since the plated through hole 4 is filled, the surface direction plated portion 42 is dragged in the polishing direction. However, even if it may be dragged, the contact state between the planar plating portion 42 and the copper foil 12 is maintained as it is, so that interlayer connection is ensured.

しかる後、銅箔12をサブトラクティブ法により所定のパターンでエッチングすると、絶縁基板1の表裏両面1A,1Bに導体パターン(回路パターン)2が形成されると共に、これら導体パターン2同士がめっきスルーホール4を介して電気的に層間接続されたプリント配線板Pが形成される(図8)。
このとき、エッチングされる導体層の厚みは、銅張り積層板Qに元々積層されていた銅箔12から前記研磨しろを差し引いた厚みであるから、導体パターン2の形成が容易になると共に、その細線化及び高密度化も容易に実現することができる。
Thereafter, when the copper foil 12 is etched in a predetermined pattern by the subtractive method, conductor patterns (circuit patterns) 2 are formed on the front and back surfaces 1A and 1B of the insulating substrate 1, and the conductor patterns 2 are plated through holes. A printed wiring board P electrically connected to each other through 4 is formed (FIG. 8).
At this time, since the thickness of the conductor layer to be etched is the thickness obtained by subtracting the polishing margin from the copper foil 12 originally laminated on the copper-clad laminate Q, the formation of the conductor pattern 2 is facilitated. Thinning and high density can be easily realized.

なお、本発明は上記実施例に限定されるものではなく、その要旨を逸脱しない範囲で種々の設計変更が可能である。
例えば、穴埋め部5の材料として導電性樹脂を用いたが、これに限らずエポキシ樹脂等の非導電性樹脂を用いてもよい。
In addition, this invention is not limited to the said Example, A various design change is possible in the range which does not deviate from the summary.
For example, although the conductive resin is used as the material of the hole filling portion 5, the present invention is not limited to this, and a nonconductive resin such as an epoxy resin may be used.

本発明の一実施例によるプリント配線板の製造に用いられる銅張積層板を示す断面図である。It is sectional drawing which shows the copper clad laminated board used for manufacture of the printed wiring board by one Example of this invention. 図1に示す銅張り積層板にスルーホールを形成した状態を示す断面図である。It is sectional drawing which shows the state which formed the through hole in the copper clad laminated board shown in FIG. 図2に続いて、スルーホールの開口周縁部を残して銅箔上にめっきレジスト層を形成した状態を示す断面図である。FIG. 3 is a cross-sectional view illustrating a state in which a plating resist layer is formed on the copper foil, leaving the opening peripheral edge of the through hole, following FIG. 2. 図3に続いて、開口周縁部に露出する銅箔をエッチングを施した状態を示す断面図である。FIG. 4 is a cross-sectional view illustrating a state where the copper foil exposed at the peripheral edge of the opening is etched following FIG. 3. 図4に続いて、スルーホールの内壁とエッチングされた銅箔部分に無電解めっきを施した状態を示す断面図である。FIG. 5 is a cross-sectional view showing a state in which electroless plating is applied to the inner wall of the through hole and the etched copper foil portion following FIG. 4. 図5に続いて、スルーホール内を導電性樹脂で穴埋めした状態を示す断面図である。FIG. 6 is a cross-sectional view illustrating a state where the through hole is filled with a conductive resin following FIG. 5. 図6に続いて、導電性樹脂の表裏両面に凹部を形成した状態を示す断面図である。FIG. 7 is a cross-sectional view showing a state in which concave portions are formed on both the front and back surfaces of the conductive resin following FIG. 6. 図7に続いて、めっきレジスト層下の銅箔を給電部として、導電性樹脂の表裏両面に凹部を形成した状態を示す断面図である。FIG. 8 is a cross-sectional view showing a state in which concave portions are formed on both the front and back surfaces of the conductive resin with the copper foil under the plating resist layer as a power feeding portion following FIG. 7. 図8に続いて、めっきレジスト層を除去した後、基板表面を研磨して穴埋め部分と銅箔とを面一にした状態を示す断面図である。FIG. 9 is a cross-sectional view illustrating a state in which, after removing the plating resist layer, the substrate surface is polished and the hole filling portion and the copper foil are flush with each other after FIG. 8. 図9に続いて、銅箔を所定の導体パターンにエッチングしてプリント配線板とした状態を示す断面図である。FIG. 10 is a cross-sectional view illustrating a state in which the copper foil is etched into a predetermined conductor pattern to obtain a printed wiring board following FIG. 9.

符号の説明Explanation of symbols

1…絶縁基板
1A、1B…表裏両面
2…導体パターン(導体層)
3…スルーホール
5…穴埋め部
5a…凹部
12…銅箔(導体層)
13…めっきレジスト層
14…内空部
41…貫通方向めっき部(第1のめっき部)
42…面方向めっき部(第2のめっき部)
43…蓋めっき部(第3のめっき部)
P…プリント配線板
Q…銅張り積層板
1 ... Insulating substrate 1A, 1B ... Both sides
2 ... Conductor pattern (conductor layer)
3 through hole 5 hole filling portion 5a concave portion 12 copper foil (conductor layer)
13 ... Plating resist layer
14 ... The inner space
41 ... Plating direction plating part (first plating part)
42 ... plane direction plating part (second plating part)
43 ... Lid plating part (third plating part)
P ... Printed wiring board
Q ... Copper-clad laminate

Claims (5)

絶縁基板と、
該絶縁基板の表裏両面に設けられた導体層と、
該絶縁基板に形成されたスルーホールと、
該スルーホールの内壁に析出してなる第1のめっき部と、
該第1のめっき部の両端から前記絶縁基板に沿って延出し、前記導体層に接続される第2のめっき部と、
該スルーホールを穴埋めし、その表裏両面に凹部が形成された樹脂層と、
該樹脂層の表裏両面に形成され、前記第1のめっき部または前記第2のめっき部の少なくともいずれかに接続される第3のめっき部と、を備えることを特徴とするプリント配線板。
An insulating substrate;
A conductor layer provided on both front and back surfaces of the insulating substrate;
A through hole formed in the insulating substrate;
A first plating portion deposited on the inner wall of the through hole;
A second plating portion extending from both ends of the first plating portion along the insulating substrate and connected to the conductor layer;
A resin layer in which the through hole is filled, and recesses are formed on both front and back surfaces;
A printed wiring board comprising: a third plating portion formed on both front and back surfaces of the resin layer and connected to at least one of the first plating portion and the second plating portion.
前記第3のめっき部は、その表裏両面を前記導体層および前記第2のめっき部と面一になるように形成されていることを特徴とする請求項1に記載のプリント配線板。   The printed wiring board according to claim 1, wherein the third plating portion is formed so that both front and back surfaces thereof are flush with the conductor layer and the second plating portion. 前記樹脂層は、導電性樹脂により形成されていることを特徴とする請求項1または請求項2のいずれかに記載のプリント配線板。   The printed wiring board according to claim 1, wherein the resin layer is made of a conductive resin. スルーホールを有する銅張り積層板の表裏両面に、前記スルーホールの開口周縁部を残してめっきレジスト層を形成するマスク工程と、
前記スルーホールの開口周縁部に露出する銅箔をその厚み方向にエッチングするエッチング工程と、
前記スルーホールの内壁及び前記エッチングにより露出した前記積層板の表裏両面にめっき層を析出させる第1のめっき工程と、
前記第1のめっき工程により形成されためっきスルーホールの内空部を、樹脂により穴埋めする穴埋め工程と、
前記樹脂の表裏両面に凹部を形成する凹部形成工程と、
前記めっきレジスト層下の銅箔を給電部として電気めっきにより前記樹脂の表裏両面にめっき層を析出させる第2のめっき工程を備えることを特徴とするプリント配線板の製造方法。
A mask process for forming a plating resist layer on both the front and back surfaces of the copper-clad laminate having a through hole, leaving an opening peripheral edge of the through hole; and
Etching process for etching the copper foil exposed at the opening peripheral edge of the through hole in the thickness direction;
A first plating step of depositing plating layers on both the inner wall of the through-hole and the front and back surfaces of the laminate exposed by the etching;
A hole filling step of filling the inner space of the plated through hole formed by the first plating step with a resin;
A recess forming step of forming recesses on both the front and back surfaces of the resin;
A printed wiring board manufacturing method comprising a second plating step of depositing a plating layer on both front and back surfaces of the resin by electroplating using the copper foil under the plating resist layer as a power feeding portion.
前記第2のめっき工程により形成されためっき層を、前記銅箔および前記第1のめっき工程により形成されためっき層と、表裏両面で面一になるように研磨する研磨工程を備えることを特徴とする請求項4に記載のプリント配線板の製造方法。
It comprises a polishing step of polishing the plating layer formed by the second plating step so as to be flush with the copper foil and the plating layer formed by the first plating step. The manufacturing method of the printed wiring board of Claim 4.
JP2005161337A 2005-06-01 2005-06-01 Printed wiring board and its manufacturing method Withdrawn JP2006339350A (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009133886A1 (en) * 2008-04-28 2009-11-05 日本電気株式会社 Multilayer wiring board and method for manufacturing the same
WO2011062037A1 (en) * 2009-11-20 2011-05-26 イビデン株式会社 Printed circuit board and manufacturing method of printed circuit board
JP2018098424A (en) * 2016-12-15 2018-06-21 凸版印刷株式会社 Wiring board, multilayer wiring board, and manufacturing method of wiring board
JP2020150095A (en) * 2019-03-13 2020-09-17 イビデン株式会社 Method for manufacturing glass circuit board
CN114340214A (en) * 2021-12-14 2022-04-12 生益电子股份有限公司 PCB manufacturing method and PCB

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009133886A1 (en) * 2008-04-28 2009-11-05 日本電気株式会社 Multilayer wiring board and method for manufacturing the same
WO2011062037A1 (en) * 2009-11-20 2011-05-26 イビデン株式会社 Printed circuit board and manufacturing method of printed circuit board
US8552312B2 (en) 2009-11-20 2013-10-08 Ibiden Co., Ltd. Printed wiring board and method for manufacturing printed wiring board
JP2018098424A (en) * 2016-12-15 2018-06-21 凸版印刷株式会社 Wiring board, multilayer wiring board, and manufacturing method of wiring board
JP2020150095A (en) * 2019-03-13 2020-09-17 イビデン株式会社 Method for manufacturing glass circuit board
JP7227798B2 (en) 2019-03-13 2023-02-22 イビデン株式会社 Glass circuit board manufacturing method
CN114340214A (en) * 2021-12-14 2022-04-12 生益电子股份有限公司 PCB manufacturing method and PCB

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