JP2006338792A - 凹凸パターン形成方法及び磁気記録媒体の製造方法 - Google Patents
凹凸パターン形成方法及び磁気記録媒体の製造方法 Download PDFInfo
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- JP2006338792A JP2006338792A JP2005162680A JP2005162680A JP2006338792A JP 2006338792 A JP2006338792 A JP 2006338792A JP 2005162680 A JP2005162680 A JP 2005162680A JP 2005162680 A JP2005162680 A JP 2005162680A JP 2006338792 A JP2006338792 A JP 2006338792A
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- concavo
- convex pattern
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- convex
- resin layer
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- 230000005291 magnetic effect Effects 0.000 title claims description 68
- 238000000034 method Methods 0.000 title claims description 60
- 238000004519 manufacturing process Methods 0.000 title claims description 25
- 239000011347 resin Substances 0.000 claims abstract description 178
- 229920005989 resin Polymers 0.000 claims abstract description 178
- 230000001788 irregular Effects 0.000 claims abstract description 93
- 238000005530 etching Methods 0.000 claims description 51
- 239000000463 material Substances 0.000 claims description 36
- 239000010410 layer Substances 0.000 description 359
- 239000000945 filler Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 239000011241 protective layer Substances 0.000 description 7
- 238000001459 lithography Methods 0.000 description 6
- 230000005290 antiferromagnetic effect Effects 0.000 description 5
- 230000001050 lubricating effect Effects 0.000 description 5
- 230000018109 developmental process Effects 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 230000005389 magnetism Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000010952 cobalt-chrome Substances 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- -1 AlN Chemical class 0.000 description 1
- 229910019222 CoCrPt Inorganic materials 0.000 description 1
- 229910018979 CoPt Inorganic materials 0.000 description 1
- 229910005335 FePt Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910019041 PtMn Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005162680A JP2006338792A (ja) | 2005-06-02 | 2005-06-02 | 凹凸パターン形成方法及び磁気記録媒体の製造方法 |
| US11/445,336 US20060275692A1 (en) | 2005-06-02 | 2006-06-02 | Method for forming concavo-convex pattern, method for manufacturing master disk, method for manufacturing stamper, and method for manufacturing magnetic recording medium |
| CN 200610088681 CN1873531A (zh) | 2005-06-02 | 2006-06-02 | 凹凸图案形成方法、母盘、压模及磁记录介质的制造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005162680A JP2006338792A (ja) | 2005-06-02 | 2005-06-02 | 凹凸パターン形成方法及び磁気記録媒体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006338792A true JP2006338792A (ja) | 2006-12-14 |
| JP2006338792A5 JP2006338792A5 (enrdf_load_stackoverflow) | 2008-05-22 |
Family
ID=37484035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005162680A Withdrawn JP2006338792A (ja) | 2005-06-02 | 2005-06-02 | 凹凸パターン形成方法及び磁気記録媒体の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2006338792A (enrdf_load_stackoverflow) |
| CN (1) | CN1873531A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6956869B2 (ja) * | 2018-05-30 | 2021-11-02 | 富士フイルム株式会社 | パターン原盤、パターン原盤の製造方法、モールドの製造方法および基体の製造方法 |
-
2005
- 2005-06-02 JP JP2005162680A patent/JP2006338792A/ja not_active Withdrawn
-
2006
- 2006-06-02 CN CN 200610088681 patent/CN1873531A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN1873531A (zh) | 2006-12-06 |
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