CN1873531A - 凹凸图案形成方法、母盘、压模及磁记录介质的制造方法 - Google Patents
凹凸图案形成方法、母盘、压模及磁记录介质的制造方法 Download PDFInfo
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- CN1873531A CN1873531A CN 200610088681 CN200610088681A CN1873531A CN 1873531 A CN1873531 A CN 1873531A CN 200610088681 CN200610088681 CN 200610088681 CN 200610088681 A CN200610088681 A CN 200610088681A CN 1873531 A CN1873531 A CN 1873531A
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- 238000000034 method Methods 0.000 title claims abstract description 180
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 88
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 56
- 239000011347 resin Substances 0.000 claims abstract description 378
- 229920005989 resin Polymers 0.000 claims abstract description 378
- 230000001788 irregular Effects 0.000 claims abstract description 178
- 239000000463 material Substances 0.000 claims description 123
- 238000005530 etching Methods 0.000 claims description 98
- 238000003825 pressing Methods 0.000 claims description 83
- 238000013459 approach Methods 0.000 claims description 51
- 238000005520 cutting process Methods 0.000 claims description 42
- 230000007261 regionalization Effects 0.000 claims description 33
- 230000008569 process Effects 0.000 claims description 29
- 230000015572 biosynthetic process Effects 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 230000003628 erosive effect Effects 0.000 claims description 13
- 238000010023 transfer printing Methods 0.000 claims description 9
- 238000000465 moulding Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 description 48
- 238000012546 transfer Methods 0.000 description 22
- 238000012545 processing Methods 0.000 description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 238000012856 packing Methods 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 8
- 239000000956 alloy Substances 0.000 description 8
- 238000010884 ion-beam technique Methods 0.000 description 8
- 238000003801 milling Methods 0.000 description 8
- 238000001259 photo etching Methods 0.000 description 8
- 238000001020 plasma etching Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000011161 development Methods 0.000 description 5
- 230000018109 developmental process Effects 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- 230000001050 lubricating effect Effects 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 230000005290 antiferromagnetic effect Effects 0.000 description 4
- 230000005294 ferromagnetic effect Effects 0.000 description 4
- 239000012467 final product Substances 0.000 description 4
- 230000003321 amplification Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000010952 cobalt-chrome Substances 0.000 description 2
- 238000001802 infusion Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910019222 CoCrPt Inorganic materials 0.000 description 1
- 229910018979 CoPt Inorganic materials 0.000 description 1
- 229910005335 FePt Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910017709 Ni Co Inorganic materials 0.000 description 1
- 229910003267 Ni-Co Inorganic materials 0.000 description 1
- 229910003262 Ni‐Co Inorganic materials 0.000 description 1
- 229910019041 PtMn Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000005307 ferromagnetism Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 150000002221 fluorine Chemical class 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 238000002715 modification method Methods 0.000 description 1
- DITXJPASYXFQAS-UHFFFAOYSA-N nickel;sulfamic acid Chemical compound [Ni].NS(O)(=O)=O DITXJPASYXFQAS-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- -1 oxide Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
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Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005162680A JP2006338792A (ja) | 2005-06-02 | 2005-06-02 | 凹凸パターン形成方法及び磁気記録媒体の製造方法 |
JP2005162680 | 2005-06-02 | ||
JP2005244804 | 2005-08-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN1873531A true CN1873531A (zh) | 2006-12-06 |
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Application Number | Title | Priority Date | Filing Date |
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CN 200610088681 Pending CN1873531A (zh) | 2005-06-02 | 2006-06-02 | 凹凸图案形成方法、母盘、压模及磁记录介质的制造方法 |
Country Status (2)
Country | Link |
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JP (1) | JP2006338792A (enrdf_load_stackoverflow) |
CN (1) | CN1873531A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115503159A (zh) * | 2018-05-30 | 2022-12-23 | 富士胶片株式会社 | 图案原盘、模具的制造方法及基体的制造方法 |
-
2005
- 2005-06-02 JP JP2005162680A patent/JP2006338792A/ja not_active Withdrawn
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2006
- 2006-06-02 CN CN 200610088681 patent/CN1873531A/zh active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115503159A (zh) * | 2018-05-30 | 2022-12-23 | 富士胶片株式会社 | 图案原盘、模具的制造方法及基体的制造方法 |
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Open date: 20061206 |