JP2006324119A5 - - Google Patents

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Publication number
JP2006324119A5
JP2006324119A5 JP2005146139A JP2005146139A JP2006324119A5 JP 2006324119 A5 JP2006324119 A5 JP 2006324119A5 JP 2005146139 A JP2005146139 A JP 2005146139A JP 2005146139 A JP2005146139 A JP 2005146139A JP 2006324119 A5 JP2006324119 A5 JP 2006324119A5
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JP
Japan
Prior art keywords
electron
electron gun
extraction
magnetic pole
electron beam
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Pending
Application number
JP2005146139A
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English (en)
Japanese (ja)
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JP2006324119A (ja
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Priority to JP2005146139A priority Critical patent/JP2006324119A/ja
Priority claimed from JP2005146139A external-priority patent/JP2006324119A/ja
Publication of JP2006324119A publication Critical patent/JP2006324119A/ja
Publication of JP2006324119A5 publication Critical patent/JP2006324119A5/ja
Pending legal-status Critical Current

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JP2005146139A 2005-05-19 2005-05-19 電子銃 Pending JP2006324119A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005146139A JP2006324119A (ja) 2005-05-19 2005-05-19 電子銃

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005146139A JP2006324119A (ja) 2005-05-19 2005-05-19 電子銃

Publications (2)

Publication Number Publication Date
JP2006324119A JP2006324119A (ja) 2006-11-30
JP2006324119A5 true JP2006324119A5 (enrdf_load_stackoverflow) 2008-06-26

Family

ID=37543638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005146139A Pending JP2006324119A (ja) 2005-05-19 2005-05-19 電子銃

Country Status (1)

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JP (1) JP2006324119A (enrdf_load_stackoverflow)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7923060B2 (en) * 2006-10-18 2011-04-12 Ngk Insulators, Ltd. Method of manufacturing ceramic filter
JP4988444B2 (ja) 2007-06-19 2012-08-01 株式会社日立製作所 検査方法および装置
JP5386229B2 (ja) * 2009-05-22 2014-01-15 株式会社日立ハイテクノロジーズ 電子銃
JP5290238B2 (ja) * 2010-05-21 2013-09-18 株式会社日立ハイテクノロジーズ 電子顕微鏡
EP2444990B1 (en) * 2010-10-19 2014-06-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Simplified particle emitter and method of operating thereof
JP6095338B2 (ja) * 2012-11-28 2017-03-15 株式会社日立製作所 電子銃および荷電粒子線装置
JP6340165B2 (ja) * 2013-04-25 2018-06-06 株式会社日立ハイテクノロジーズ 電子銃、荷電粒子銃およびそれらを用いた荷電粒子線装置
JP2013225521A (ja) * 2013-06-17 2013-10-31 Hitachi High-Technologies Corp 電子銃
US10410827B2 (en) 2017-05-03 2019-09-10 Fei Company Gun lens design in a charged particle microscope
WO2019049261A1 (ja) 2017-09-07 2019-03-14 株式会社日立ハイテクノロジーズ 電子銃および電子ビーム応用装置
EP4075475A4 (en) * 2019-12-17 2024-07-24 Inter-University Research Institute Corporation National Institutes of Natural Sciences CATHODE LENS FOR CORRECTING SPHERICAL ABERRATION, ELECTROSTATIC LENS FOR CORRECTING SPHERICAL ABERRATION, ELECTRON SPECTROSCOPE AND PHOTOEMISSION ELECTRON MICROSCOPE
US11508591B2 (en) * 2021-02-08 2022-11-22 Kla Corporation High resolution electron beam apparatus with dual-aperture schemes
CN116130323A (zh) * 2021-05-27 2023-05-16 中科晶源微电子技术（北京）有限公司 浸没式磁透镜电子枪及其光轴对中的方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH073771B2 (ja) * 1987-12-11 1995-01-18 日本電子株式会社 静磁界重畳型電子銃
JP2835265B2 (ja) * 1992-08-27 1998-12-14 株式会社東芝 磁界界浸型電子銃及び磁界界浸型電子銃操作方法
JP3900792B2 (ja) * 2000-04-26 2007-04-04 株式会社日立製作所 電子銃

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