JP2006319065A5 - - Google Patents
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- Publication number
- JP2006319065A5 JP2006319065A5 JP2005138949A JP2005138949A JP2006319065A5 JP 2006319065 A5 JP2006319065 A5 JP 2006319065A5 JP 2005138949 A JP2005138949 A JP 2005138949A JP 2005138949 A JP2005138949 A JP 2005138949A JP 2006319065 A5 JP2006319065 A5 JP 2006319065A5
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- exposure apparatus
- plate
- liquid
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000007788 liquid Substances 0.000 claims 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 1
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005138949A JP2006319065A (ja) | 2005-05-11 | 2005-05-11 | 露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005138949A JP2006319065A (ja) | 2005-05-11 | 2005-05-11 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006319065A JP2006319065A (ja) | 2006-11-24 |
| JP2006319065A5 true JP2006319065A5 (zh) | 2008-08-07 |
Family
ID=37539476
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005138949A Withdrawn JP2006319065A (ja) | 2005-05-11 | 2005-05-11 | 露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2006319065A (zh) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009054784A (ja) | 2007-08-27 | 2009-03-12 | Canon Inc | 補助板およびそれを有する露光装置 |
| JP2010251745A (ja) | 2009-04-10 | 2010-11-04 | Asml Netherlands Bv | 液浸リソグラフィ装置及びデバイス製造方法 |
| JP6155581B2 (ja) * | 2012-09-14 | 2017-07-05 | 株式会社ニコン | 露光装置、露光方法、デバイス製造方法 |
| JP6418281B2 (ja) * | 2017-06-07 | 2018-11-07 | 株式会社ニコン | 露光装置 |
| JP2019032552A (ja) * | 2018-10-10 | 2019-02-28 | 株式会社ニコン | 露光装置、露光方法、デバイス製造方法 |
-
2005
- 2005-05-11 JP JP2005138949A patent/JP2006319065A/ja not_active Withdrawn
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