JP2006319065A5 - - Google Patents

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Publication number
JP2006319065A5
JP2006319065A5 JP2005138949A JP2005138949A JP2006319065A5 JP 2006319065 A5 JP2006319065 A5 JP 2006319065A5 JP 2005138949 A JP2005138949 A JP 2005138949A JP 2005138949 A JP2005138949 A JP 2005138949A JP 2006319065 A5 JP2006319065 A5 JP 2006319065A5
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JP
Japan
Prior art keywords
wafer
exposure apparatus
plate
liquid
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005138949A
Other languages
English (en)
Japanese (ja)
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JP2006319065A (ja
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Publication date
Application filed filed Critical
Priority to JP2005138949A priority Critical patent/JP2006319065A/ja
Priority claimed from JP2005138949A external-priority patent/JP2006319065A/ja
Publication of JP2006319065A publication Critical patent/JP2006319065A/ja
Publication of JP2006319065A5 publication Critical patent/JP2006319065A5/ja
Withdrawn legal-status Critical Current

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JP2005138949A 2005-05-11 2005-05-11 露光装置 Withdrawn JP2006319065A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005138949A JP2006319065A (ja) 2005-05-11 2005-05-11 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005138949A JP2006319065A (ja) 2005-05-11 2005-05-11 露光装置

Publications (2)

Publication Number Publication Date
JP2006319065A JP2006319065A (ja) 2006-11-24
JP2006319065A5 true JP2006319065A5 (cg-RX-API-DMAC7.html) 2008-08-07

Family

ID=37539476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005138949A Withdrawn JP2006319065A (ja) 2005-05-11 2005-05-11 露光装置

Country Status (1)

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JP (1) JP2006319065A (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009054784A (ja) 2007-08-27 2009-03-12 Canon Inc 補助板およびそれを有する露光装置
JP2010251745A (ja) * 2009-04-10 2010-11-04 Asml Netherlands Bv 液浸リソグラフィ装置及びデバイス製造方法
JP6155581B2 (ja) * 2012-09-14 2017-07-05 株式会社ニコン 露光装置、露光方法、デバイス製造方法
JP6418281B2 (ja) * 2017-06-07 2018-11-07 株式会社ニコン 露光装置
JP2019032552A (ja) * 2018-10-10 2019-02-28 株式会社ニコン 露光装置、露光方法、デバイス製造方法

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