JP2006310577A - 反射ミラー装置およびそれを用いた露光装置 - Google Patents

反射ミラー装置およびそれを用いた露光装置 Download PDF

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Publication number
JP2006310577A
JP2006310577A JP2005131834A JP2005131834A JP2006310577A JP 2006310577 A JP2006310577 A JP 2006310577A JP 2005131834 A JP2005131834 A JP 2005131834A JP 2005131834 A JP2005131834 A JP 2005131834A JP 2006310577 A JP2006310577 A JP 2006310577A
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JP
Japan
Prior art keywords
reflection mirror
air
exposure apparatus
mirror
reflecting
Prior art date
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Pending
Application number
JP2005131834A
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English (en)
Japanese (ja)
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JP2006310577A5 (enExample
Inventor
Shinji Uchida
真司 内田
Choshoku Sai
長植 崔
Katsumi Asada
克己 浅田
Hirohito Ito
博仁 伊藤
Shigeo Sakino
茂夫 崎野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005131834A priority Critical patent/JP2006310577A/ja
Priority to US11/408,881 priority patent/US7453623B2/en
Publication of JP2006310577A publication Critical patent/JP2006310577A/ja
Publication of JP2006310577A5 publication Critical patent/JP2006310577A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2005131834A 2005-04-28 2005-04-28 反射ミラー装置およびそれを用いた露光装置 Pending JP2006310577A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005131834A JP2006310577A (ja) 2005-04-28 2005-04-28 反射ミラー装置およびそれを用いた露光装置
US11/408,881 US7453623B2 (en) 2005-04-28 2006-04-21 Reflecting mirror and exposure apparatus using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005131834A JP2006310577A (ja) 2005-04-28 2005-04-28 反射ミラー装置およびそれを用いた露光装置

Publications (2)

Publication Number Publication Date
JP2006310577A true JP2006310577A (ja) 2006-11-09
JP2006310577A5 JP2006310577A5 (enExample) 2008-05-22

Family

ID=37234160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005131834A Pending JP2006310577A (ja) 2005-04-28 2005-04-28 反射ミラー装置およびそれを用いた露光装置

Country Status (2)

Country Link
US (1) US7453623B2 (enExample)
JP (1) JP2006310577A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009229686A (ja) * 2008-03-21 2009-10-08 Mitsubishi Electric Corp 形状可変ミラーおよびその形状可変ミラーを用いたレーザ加工装置
JP2014518011A (ja) * 2011-05-05 2014-07-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 測定装置を備えた光学モジュール

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007010906A1 (de) * 2007-03-05 2008-09-11 Seereal Technologies S.A. Abbildungsvorrichtung zum Beeinflussen von auftreffendem Licht
WO2008122313A1 (en) * 2007-04-05 2008-10-16 Carl Zeiss Smt Ag Optical element module with imaging error and position correction
US8437072B2 (en) * 2009-06-30 2013-05-07 Hewlett-Packard Development Company, L.P. Individually addressable nano-scale mechanical actuators
US9097577B2 (en) * 2011-06-29 2015-08-04 KLA—Tencor Corporation Adaptive optics for compensating aberrations in light-sustained plasma cells
DE102012209309A1 (de) * 2012-06-01 2013-12-05 Carl Zeiss Smt Gmbh Lithographievorrichtung und Verfahren zur Herstellung einer Spiegelanordnung
KR102278351B1 (ko) 2013-01-28 2021-07-19 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 위한 방사선 소스, 거울 및 투영 시스템
EP2784566A1 (en) * 2013-03-25 2014-10-01 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Steerable MOEMS device comprising a micromirror
JP2014225639A (ja) * 2013-04-16 2014-12-04 キヤノン株式会社 ミラーユニット及び露光装置
CN104459986B (zh) * 2013-09-13 2017-02-15 上海微电子装备有限公司 一种微动变形像差校正装置
JP6231361B2 (ja) * 2013-11-25 2017-11-15 キヤノン電子株式会社 振動素子および光走査装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09152505A (ja) * 1995-11-30 1997-06-10 Sharp Corp 変形可能ミラー及びその製造方法及び光学装置並びに記録再生装置
JPH10144602A (ja) * 1996-11-14 1998-05-29 Nikon Corp 反射ミラー保持装置及び投影露光装置
JPH10256148A (ja) * 1997-03-13 1998-09-25 Nikon Corp 投影露光装置
JP2003172811A (ja) * 2001-12-06 2003-06-20 Ricoh Co Ltd 形状可変鏡及びその制御方法並びに光ディスク情報入出力装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3860884A (en) * 1973-10-10 1975-01-14 Bell Telephone Labor Inc Optically pumped laser using N{HD 2{B O or similar gas mixed with energy-transferring CO{HD 2{B
US4162825A (en) * 1977-08-05 1979-07-31 Ford Aerospace & Communications Corp. Method for adjusting the radius of curvature of a spherical mirror
DE8703884U1 (de) * 1987-03-14 1987-04-23 FAG Kugelfischer Georg Schäfer KGaA, 97421 Schweinfurt Pneumatisch-hydraulischer Druckgeber
US5444566A (en) * 1994-03-07 1995-08-22 Texas Instruments Incorporated Optimized electronic operation of digital micromirror devices
US6014598A (en) 1996-06-28 2000-01-11 Arcelik A.S. Model-based fault detection system for electric motors
US6043863A (en) * 1996-11-14 2000-03-28 Nikon Corporation Holder for reflecting member and exposure apparatus having the same
US6398373B1 (en) 2000-08-09 2002-06-04 Asml Us, Inc. Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems
JP3799275B2 (ja) * 2002-01-08 2006-07-19 キヤノン株式会社 走査露光装置及びその製造方法並びにデバイス製造方法
US6842277B2 (en) 2002-07-23 2005-01-11 Nikon Corporation Deformable mirror with high-bandwidth servo for rigid body control

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09152505A (ja) * 1995-11-30 1997-06-10 Sharp Corp 変形可能ミラー及びその製造方法及び光学装置並びに記録再生装置
JPH10144602A (ja) * 1996-11-14 1998-05-29 Nikon Corp 反射ミラー保持装置及び投影露光装置
JPH10256148A (ja) * 1997-03-13 1998-09-25 Nikon Corp 投影露光装置
JP2003172811A (ja) * 2001-12-06 2003-06-20 Ricoh Co Ltd 形状可変鏡及びその制御方法並びに光ディスク情報入出力装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009229686A (ja) * 2008-03-21 2009-10-08 Mitsubishi Electric Corp 形状可変ミラーおよびその形状可変ミラーを用いたレーザ加工装置
JP2014518011A (ja) * 2011-05-05 2014-07-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 測定装置を備えた光学モジュール

Also Published As

Publication number Publication date
US7453623B2 (en) 2008-11-18
US20060245035A1 (en) 2006-11-02

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