JP2006310223A5 - - Google Patents
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- Publication number
- JP2006310223A5 JP2006310223A5 JP2005134136A JP2005134136A JP2006310223A5 JP 2006310223 A5 JP2006310223 A5 JP 2006310223A5 JP 2005134136 A JP2005134136 A JP 2005134136A JP 2005134136 A JP2005134136 A JP 2005134136A JP 2006310223 A5 JP2006310223 A5 JP 2006310223A5
- Authority
- JP
- Japan
- Prior art keywords
- zeb
- sample
- focus value
- focus
- inspection apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005134136A JP4959149B2 (ja) | 2005-05-02 | 2005-05-02 | 試料検査装置 |
| PCT/JP2006/308843 WO2006120917A1 (ja) | 2005-05-02 | 2006-04-27 | 試料検査装置 |
| US11/913,387 US7964844B2 (en) | 2005-05-02 | 2006-04-27 | Sample inspection apparatus |
| KR1020077027719A KR101213587B1 (ko) | 2005-05-02 | 2006-04-27 | 시료검사장치 |
| TW095115198A TWI390648B (zh) | 2005-05-02 | 2006-04-28 | 樣本檢查裝置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005134136A JP4959149B2 (ja) | 2005-05-02 | 2005-05-02 | 試料検査装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006310223A JP2006310223A (ja) | 2006-11-09 |
| JP2006310223A5 true JP2006310223A5 (enExample) | 2008-05-29 |
| JP4959149B2 JP4959149B2 (ja) | 2012-06-20 |
Family
ID=37396426
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005134136A Expired - Lifetime JP4959149B2 (ja) | 2005-05-02 | 2005-05-02 | 試料検査装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7964844B2 (enExample) |
| JP (1) | JP4959149B2 (enExample) |
| KR (1) | KR101213587B1 (enExample) |
| TW (1) | TWI390648B (enExample) |
| WO (1) | WO2006120917A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2126955A1 (en) * | 2007-01-25 | 2009-12-02 | NFAB Limited | Improved particle beam generator |
| JP2008252070A (ja) * | 2007-03-07 | 2008-10-16 | Nuflare Technology Inc | 荷電粒子ビームの焦点合わせ方法及び荷電粒子ビームの非点調整方法 |
| JP5243912B2 (ja) * | 2008-01-24 | 2013-07-24 | 日本電子株式会社 | 荷電粒子ビーム装置におけるビーム位置較正方法 |
| JP5325802B2 (ja) | 2010-01-28 | 2013-10-23 | 株式会社日立ハイテクノロジーズ | 観察方法および観察装置 |
| US8519353B2 (en) * | 2010-12-29 | 2013-08-27 | Varian Semiconductor Equipment Associates, Inc. | Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam |
| JP5331828B2 (ja) * | 2011-01-14 | 2013-10-30 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US8912488B2 (en) * | 2012-11-15 | 2014-12-16 | Fei Company | Automated sample orientation |
| US9110039B2 (en) * | 2013-07-25 | 2015-08-18 | Kla-Tencor Corporation | Auto-focus system and methods for die-to-die inspection |
| JP6309366B2 (ja) * | 2014-06-30 | 2018-04-11 | 株式会社ホロン | 荷電粒子線装置における高さ測定装置およびオートフォーカス装置 |
| JP7455676B2 (ja) | 2020-06-05 | 2024-03-26 | 株式会社日立ハイテク | 電子顕微鏡および電子顕微鏡のフォーカス調整方法 |
| JP7367215B2 (ja) * | 2020-06-08 | 2023-10-23 | 株式会社日立ハイテク | 荷電粒子線装置、およびそのフォーカス調整方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2542356C2 (de) * | 1975-09-19 | 1977-10-20 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Fokussierung der Objektivlinse eines Korpuskular-Durchstrahlungs-Rastermikroskops und Einrichtung zur selbsttätigen Durchführung des Verfahrens, sowie Anwendung |
| JPH053013A (ja) * | 1991-06-24 | 1993-01-08 | Shimadzu Corp | 自動焦点調節装置 |
| JPH07245075A (ja) * | 1994-03-04 | 1995-09-19 | Horon:Kk | 自動焦点合わせ装置 |
| JPH1048163A (ja) * | 1996-08-07 | 1998-02-20 | Shimadzu Corp | 表面分析方法およびその装置 |
| JPH11149895A (ja) * | 1997-08-11 | 1999-06-02 | Hitachi Ltd | 電子線式検査または測定装置およびその方法、高さ検出装置並びに電子線式描画装置 |
| US6107637A (en) * | 1997-08-11 | 2000-08-22 | Hitachi, Ltd. | Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus |
| JP2000228166A (ja) * | 1999-02-05 | 2000-08-15 | Horon:Kk | 試料観察装置 |
| JP4610798B2 (ja) * | 2001-06-19 | 2011-01-12 | エスアイアイ・ナノテクノロジー株式会社 | レーザ欠陥検出機能を備えた走査型電子顕微鏡とそのオートフォーカス方法 |
| US6946656B2 (en) * | 2001-07-12 | 2005-09-20 | Hitachi, Ltd. | Sample electrification measurement method and charged particle beam apparatus |
| JP4388270B2 (ja) * | 2002-11-18 | 2009-12-24 | 株式会社日立ハイテクノロジーズ | 表面検査方法及び表面検査装置 |
| TWI345054B (en) * | 2003-05-30 | 2011-07-11 | Ebara Corp | Specimen inspection device and method, and method for making a semiconductor device using such specimen inspection device and method |
| WO2007035834A2 (en) * | 2005-09-21 | 2007-03-29 | Kla-Tencor Technologies Corporation | Methods and systems for creating a recipe for a defect review process |
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2005
- 2005-05-02 JP JP2005134136A patent/JP4959149B2/ja not_active Expired - Lifetime
-
2006
- 2006-04-27 WO PCT/JP2006/308843 patent/WO2006120917A1/ja not_active Ceased
- 2006-04-27 KR KR1020077027719A patent/KR101213587B1/ko active Active
- 2006-04-27 US US11/913,387 patent/US7964844B2/en active Active
- 2006-04-28 TW TW095115198A patent/TWI390648B/zh active